JP6016891B2 - 有機半導体化合物及びその製造方法、並びにそれを採用した有機半導体デバイス - Google Patents
有機半導体化合物及びその製造方法、並びにそれを採用した有機半導体デバイス Download PDFInfo
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- JP6016891B2 JP6016891B2 JP2014508293A JP2014508293A JP6016891B2 JP 6016891 B2 JP6016891 B2 JP 6016891B2 JP 2014508293 A JP2014508293 A JP 2014508293A JP 2014508293 A JP2014508293 A JP 2014508293A JP 6016891 B2 JP6016891 B2 JP 6016891B2
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- 150000001875 compounds Chemical class 0.000 title claims description 100
- 239000004065 semiconductor Substances 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 7
- 230000008569 process Effects 0.000 title description 4
- 239000000126 substance Substances 0.000 claims description 48
- 125000003545 alkoxy group Chemical group 0.000 claims description 28
- 125000000217 alkyl group Chemical group 0.000 claims description 20
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 19
- 229920000642 polymer Polymers 0.000 claims description 19
- 125000001424 substituent group Chemical group 0.000 claims description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910052717 sulfur Inorganic materials 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical group 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 7
- 125000006239 protecting group Chemical group 0.000 claims description 7
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 7
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 7
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims description 6
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052794 bromium Inorganic materials 0.000 claims description 4
- IVDFJHOHABJVEH-UHFFFAOYSA-N pinacol Chemical compound CC(C)(O)C(C)(C)O IVDFJHOHABJVEH-UHFFFAOYSA-N 0.000 claims description 4
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims description 3
- WJUKOGPNGRUXMG-UHFFFAOYSA-N 1,2-dibromo-1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)(Br)C(Cl)(Cl)Br WJUKOGPNGRUXMG-UHFFFAOYSA-N 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 claims description 3
- 230000002140 halogenating effect Effects 0.000 claims description 3
- 125000005549 heteroarylene group Chemical group 0.000 claims description 3
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 claims description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- 125000003172 aldehyde group Chemical group 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 claims description 2
- 229920000166 polytrimethylene carbonate Polymers 0.000 claims description 2
- ZJLMKPKYJBQJNH-UHFFFAOYSA-N propane-1,3-dithiol Chemical compound SCCCS ZJLMKPKYJBQJNH-UHFFFAOYSA-N 0.000 claims description 2
- 230000026030 halogenation Effects 0.000 claims 1
- 238000005658 halogenation reaction Methods 0.000 claims 1
- -1 polyphenylene vinylene Polymers 0.000 description 28
- 238000006243 chemical reaction Methods 0.000 description 20
- 239000000243 solution Substances 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000010410 layer Substances 0.000 description 9
- UHHOTOYDCIDUJQ-UHFFFAOYSA-N 1-(4,6-dibromothieno[2,3-c]thiophen-2-yl)-2-ethylhexan-1-one Chemical compound S1C(Br)=C2SC(C(=O)C(CC)CCCC)=CC2=C1Br UHHOTOYDCIDUJQ-UHFFFAOYSA-N 0.000 description 8
- 125000003710 aryl alkyl group Chemical group 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- ADFBVKNIDDWIIN-UHFFFAOYSA-N naphthalene;thiophene Chemical compound C=1C=CSC=1.C=1C=CSC=1.C1=CC=CC2=CC=CC=C21 ADFBVKNIDDWIIN-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- 125000001072 heteroaryl group Chemical group 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- QERYCTSHXKAMIS-UHFFFAOYSA-M thiophene-2-carboxylate Chemical compound [O-]C(=O)C1=CC=CS1 QERYCTSHXKAMIS-UHFFFAOYSA-M 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 0 CC(*)(C(C=O)C(*)=CC1(C)C2*)C1=CC(*)=C2C=O Chemical compound CC(*)(C(C=O)C(*)=CC1(C)C2*)C1=CC(*)=C2C=O 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- 229920000144 PEDOT:PSS Polymers 0.000 description 4
- 125000004414 alkyl thio group Chemical group 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 3
- VWHTUVWZHPHQOO-UHFFFAOYSA-N 1,5-bis(2-ethylhexoxy)naphthalene Chemical compound C1=CC=C2C(OCC(CC)CCCC)=CC=CC2=C1OCC(CC)CCCC VWHTUVWZHPHQOO-UHFFFAOYSA-N 0.000 description 3
- CRFDDLOVLQNFFR-UHFFFAOYSA-N 4,9-bis(2-ethylhexoxy)-[1]benzothiolo[6,5-f][1]benzothiole Chemical compound C1=C2C(OCC(CC)CCCC)=C(C=CS3)C3=CC2=C(OCC(CC)CCCC)C2=C1SC=C2 CRFDDLOVLQNFFR-UHFFFAOYSA-N 0.000 description 3
- 229920003026 Acene Polymers 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- YQEILISFULMNRR-UHFFFAOYSA-N [1]benzothiolo[6,5-f][1]benzothiole Chemical compound C1=C2C=C(SC=C3)C3=CC2=CC2=C1C=CS2 YQEILISFULMNRR-UHFFFAOYSA-N 0.000 description 3
- 239000012267 brine Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- MICSSXLYNUZWOE-UHFFFAOYSA-N 1,5-bis(2-ethylhexoxy)naphthalene-2,6-dicarbaldehyde Chemical compound O=CC1=CC=C2C(OCC(CC)CCCC)=C(C=O)C=CC2=C1OCC(CC)CCCC MICSSXLYNUZWOE-UHFFFAOYSA-N 0.000 description 2
- ZUSIHNCQTKKZDG-UHFFFAOYSA-N 2,6-dibromo-1,5-bis(2-ethylhexoxy)naphthalene Chemical compound BrC1=CC=C2C(OCC(CC)CCCC)=C(Br)C=CC2=C1OCC(CC)CCCC ZUSIHNCQTKKZDG-UHFFFAOYSA-N 0.000 description 2
- ATMIDVCBPPBFHI-UHFFFAOYSA-N 3,7-dibromo-1,5-bis(2-ethylhexoxy)naphthalene-2,6-dicarbaldehyde Chemical compound O=CC1=C(Br)C=C2C(OCC(CC)CCCC)=C(C=O)C(Br)=CC2=C1OCC(CC)CCCC ATMIDVCBPPBFHI-UHFFFAOYSA-N 0.000 description 2
- NZWIYPLSXWYKLH-UHFFFAOYSA-N 3-(bromomethyl)heptane Chemical compound CCCCC(CC)CBr NZWIYPLSXWYKLH-UHFFFAOYSA-N 0.000 description 2
- LNRKUMZKUZZKHF-UHFFFAOYSA-N 4,9-bis(2-butyloctoxy)-[1]benzothiolo[6,5-f][1]benzothiole Chemical compound C1=C2C(OCC(CCCC)CCCCCC)=C(C=CS3)C3=CC2=C(OCC(CCCC)CCCCCC)C2=C1SC=C2 LNRKUMZKUZZKHF-UHFFFAOYSA-N 0.000 description 2
- ASHQXHYEZNEDHB-UHFFFAOYSA-N 5,10-bis(2-ethylhexoxy)-[1]benzothiolo[6,5-f][1]benzothiole-2,7-dicarboxylic acid Chemical compound C1=C2C(OCC(CC)CCCC)=C(SC(=C3)C(O)=O)C3=CC2=C(OCC(CC)CCCC)C2=C1C=C(C(O)=O)S2 ASHQXHYEZNEDHB-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- NEDWVOKPMKCXKG-UHFFFAOYSA-N [4,9-bis(2-butyloctoxy)-7-trimethylstannyl-[1]benzothiolo[6,5-f][1]benzothiol-2-yl]-trimethylstannane Chemical compound C1=C2C(OCC(CCCC)CCCCCC)=C(C=C(S3)[Sn](C)(C)C)C3=CC2=C(OCC(CCCC)CCCCCC)C2=C1SC([Sn](C)(C)C)=C2 NEDWVOKPMKCXKG-UHFFFAOYSA-N 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- ICNUHEMHISQACQ-UHFFFAOYSA-N diethyl 5,10-bis(2-ethylhexoxy)-[1]benzothiolo[6,5-f][1]benzothiole-2,7-dicarboxylate Chemical compound C1=C2C(OCC(CC)CCCC)=C(SC(=C3)C(=O)OCC)C3=CC2=C(OCC(CC)CCCC)C2=C1C=C(C(=O)OCC)S2 ICNUHEMHISQACQ-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
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- 235000019341 magnesium sulphate Nutrition 0.000 description 2
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- 125000001624 naphthyl group Chemical group 0.000 description 2
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- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000013087 polymer photovoltaic Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
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- 238000006467 substitution reaction Methods 0.000 description 2
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- CPRHXJNYCFYUPG-UHFFFAOYSA-N 1-(4,6-dibromo-3-fluorothieno[2,3-c]thiophen-2-yl)-2-ethylhexan-1-one Chemical compound S1C(Br)=C2C(F)=C(C(=O)C(CC)CCCC)SC2=C1Br CPRHXJNYCFYUPG-UHFFFAOYSA-N 0.000 description 1
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- DDPJPFVJNRBHDO-UHFFFAOYSA-N 4,7-bis[4-(2-ethylhexyl)thiophen-2-yl]-[1,2,5]thiadiazolo[3,4-c]pyridine Chemical compound CCCCC(CC)CC1=CSC(C=2C3=NSN=C3C(C=3SC=C(CC(CC)CCCC)C=3)=NC=2)=C1 DDPJPFVJNRBHDO-UHFFFAOYSA-N 0.000 description 1
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- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
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- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
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- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
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- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical group S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
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Description
Zは、S又はSeであり、
R1及びR2は、互いに独立して、(C1−C20)アルキル、(C1−C20)アルコキシ、(C1−C20)アルキルチオ、又は(C6−C20)アル(C1−C20)アルキルであり、前記アルキル及びアラルキルは、(C1−C20)アルキル、(C2−C20)アルケニル、(C2−C20)アルキニル、(C1−C20)アルコキシ、アミノ基、ヒドロキシ基、ハロゲン基、シアノ基、ニトロ基、トリフルオロメチル基、及びシリル基から選択される1つ以上の置換基でさらに置換されることができる。)
Zは、S又はSeであり、
R1及びR2は、互いに独立して、(C1−C20)アルキル、(C1−C20)アルコキシ、(C1−C20)アルキルチオ、又は(C6−C20)アル(C1−C20)アルキルであり、前記アルキル及びアラルキルは、(C1−C20)アルキル、(C2−C20)アルケニル、(C2−C20)アルキニル、(C1−C20)アルコキシ、アミノ基、ヒドロキシ基、ハロゲン基、シアノ基、ニトロ基、トリフルオロメチル基、及びシリル基から選択される1つ以上の置換基でさらに置換されることができ、
Pは保護基であり、Xはハロゲンであり、
Rは、ヒドロキシ又は(C1−C20)アルコキシである。)
Xはハロゲンであり、
Rは、ヒドロキシ又は(C1−C20)アルコキシである。)
Aは、(C6−C20)アリーレン又は(C3−C20)ヘテロアリーレンであり、
Zは、S又はSeであり、
R1及びR2は、互いに独立して、(C1−C20)アルキル、(C1−C20)アルコキシ、(C1−C20)アルキルチオ、又は(C6−C20)アル(C1−C20)アルキルであり、前記アルキル及びアラルキルは、(C1−C20)アルキル、(C2−C20)アルケニル、(C2−C20)アルキニル、(C1−C20)アルコキシ、アミノ基、ヒドロキシ基、ハロゲン基、シアノ基、ニトロ基、トリフルオロメチル基、及びシリル基から選択される1つ以上の置換基でさらに置換されることができ、
nは、1〜500の整数である。)
Zは、S又はSeであり
R’及びR’’は、互いに独立して、水素、(C1−C20)アルキル、(C6−C20)アリール、(C3−C20)ヘテロアリール、又は(C6−C20)アル(C1−C20)アルキルであり、
R11〜R14は、互いに独立して、水素、ハロゲン、(C1−C20)アルキル、(C1−C20)アルコキシ、又は(C6−C20)アル(C1−C20)アルキルであり、
R’及びR’’のアルキル、アリール、ヘテロアリール及びアラルキルとR11〜R14のアルキル、アルコキシ及びアラルキルは、(C1−C20)アルキル、(C2−C20)アルケニル、(C2−C20)アルキニル、(C1−C20)アルコキシ、アミノ基、ヒドロキシ基、ハロゲン基、シアノ基、ニトロ基、トリフルオロメチル基、及びシリル基から選択される1つ以上の置換基でさらに置換されることができ、
o、p及びqは、1〜2の整数である。)
Zは、S又はSeであり、
R1及びR2は、互いに独立して、(C1−C20)アルキル、(C1−C20)アルコキシ、(C1−C20)アルキルチオ、又は(C6−C20)アル(C1−C20)アルキルであり、前記アルキル及びアラルキルは、(C1−C20)アルキル、(C2−C20)アルケニル、(C2−C20)アルキニル、(C1−C20)アルコキシ、アミノ基、ヒドロキシ基、ハロゲン基、シアノ基、ニトロ基、トリフルオロメチル基、及びシリル基から選択される1つ以上の置換基でさらに置換されることができ、
R’は、水素、(C1−C20)アルキル、(C6−C20)アリール、(C3−C20)ヘテロアリール、又は(C6−C20)アル(C1−C20)アルキルであり、
R11〜R13は、互いに独立して、水素、ハロゲン、(C1−C20)アルキル、(C1−C20)アルコキシ、又は(C6−C20)アル(C1−C20)アルキルであり、
R’のアルキル、アリール、ヘテロアリール及びアラルキルとR11〜R13のアルキル、アルコキシ及びアラルキルは、(C1−C20)アルキル、(C2−C20)アルケニル、(C2−C20)アルキニル、(C1−C20)アルコキシ、アミノ基、ヒドロキシ基、ハロゲン基、シアノ基、ニトロ基、トリフルオロメチル基、及びシリル基から選択される1つ以上の置換基でさらに置換されることができ、
nは、1〜500の整数であり、
oとpは、1〜2の整数である。)
Mass:m/z 384.
Mass:m/z 542.
Mass(EI):m/z 584.
13C−NMR(500MHz,CDCl3):δ149.7,138.3,130.4,127.3,124.7,120.3,110.8,78.4,41.1,30.6,29.3,24.0,23.3,14.3,11.4;
MS(EI):m/z 496;
Elemental Analysis Calcd.C30H40O2S2:C,72.53;H,8.12;S,12.91%.Found:C,72.46;H,8.44;S,12.92%.
13CNMR(75MHz,CDCl3):δ149.64,138.35,130.43,127.17,124.68,120.26,110.80,78.42,39.62,32.10,31.49,31.19,29.97,29.40,27.14,23.33,22.89,14.35,14.30;
EI Mass:mass calculated for C38H56O2S2,608.37,Found 608.
(4,9−ビス((2−ブチルオクチル)オキシ)ナフト[2,3−b:6,7−b’]ジチオフェン−2,7−ジイル)ビス(トリメチルスタンナン)の合成
13C NMR(75MHz,CDCl3,ppm):δ148.86,142.81,142.22,131.93,128.05,124.39,110.13,78.39,39.70,32.16,31.66,31.34,30.04,29.50,27.27,23.37,22.93,14.38,14.31;
EI Mass:calcd for C44H72O2S2Sn2,934.59,found 934.
Mn=21,408;Mw=68,877;PDI=3.2;
Mn=22,116;Mw=53,440;PDI=2.4;
Mn=40,201;Mw=112,800;PDI=2.8;
Mn=10,115;Mw=29,136;PDI=2.88;
Mn=24,095;Mw=94,205;PDI=3.91;
Mn=24,119;Mw=50,921;PDI=2.11;
Mn=60,062;Mw=183,970;PDI=3.06;
Mn=61,018;Mw=136,054;PDI=2.23;
Mn=4,372;Mw=7,184;PDI=1.64;
前記実施例3〜11から得られた高分子とPC71BMの複合溶液(実施例3〜11で製造された高分子:PC71BM=1:0.5〜4.0(重量比))を、1,2−ジクロロベンゼン又はコロロベンゼンを溶媒として用いて製造した。濃度は1.0〜2.0重量%に調節した。また、1,8−ジヨードオクタンを重量比1〜5%で用いた。実施例3〜11の高分子を含有する高分子光起電力デバイスを、典型的なサンドイッチ構造(ITO/PEDOT:PSS/活性層/LiF又はTiOX/Al)を有するように製作した。ITOでコーティングされたガラス基板を、通常の洗浄工程、洗浄剤中での超音波処理、及び蒸留水、アセトン、2−プロパノールを用いた洗浄により洗った。ITO面を10分間オゾンに露出させた後、厚さ45nmのPEDOT:PSS(Baytron P)層をITO基板上にスピンコーティングした。PEDOT:PSS層をホットプレート上で140℃で10分間ベークした。活性層は、0.45μmの(PTFE)シリンジフィルタ(syringe filter)を用いて濾過した後、予め溶解させた複合溶液をスピンコーティングすることで形成した。得られたデバイス構造体上に、厚さ0.7nmのLiF電極又は厚さ2.0nmのCa電極、及び最上部電極として厚さ100nmのAlカソードを熱蒸留器内で3x10−6torr真空下で蒸着することで、光起電力デバイスを完成した。全ての高分子光起電力セルの電流密度−電圧(J−V)特性を、Oriel 1000W solar simulatorを用いて太陽光を模擬した100mW/cm2(AM1.5G)の照明光下で測定した。電気的データをKeithley 236 source−measure unitを用にて記録し、全ての特性は室温で測定した。照度を、NREL(National Renewable Energy Labortary)で較正された標準シリコンフォトダイオード検出器(PV measurements Inc.)を用いて補正した。IPCE(incident photon−to−current conversion efficiency)を、光源としてハロゲンランプを用いて360〜800nm(PV measurement Inc.)範囲の波長関数として測定し、標準シリコンフォトダイオードを用いて較正した。薄膜の厚さは、KLA Tencor Alpha−step IQ surface profilometerを用いて正確度±1nmで測定した。
110 基板
120 第1電極
130 バッファ層
140 光電変換層
150 第2電極
Claims (9)
- 前記ZはSである、請求項1に記載の有機半導体化合物。
- 下記化学式2で表される化合物に保護基を導入して、化学式3で表される化合物を製造する段階と、
化学式3で表される化合物をハロゲン化して、化学式4で表される化合物を製造する段階と、
化学式4で表される化合物と化学式5で表される化合物とを反応させて、化学式6で表される化合物を製造する段階と、
化学式6で表される化合物から化学式1で表される化合物を製造する段階と、を含む、化学式1で表される有機半導体化合物の製造方法。
Zは、S又はSeであり、
R1及びR2は、互いに独立して、(C1−C20)アルコキシであり、
Pは、前記化学式2のアルデヒド基を保護する保護基であり、Xはハロゲンであり、
Rは、ヒドロキシ又は(C1−C20)アルコキシである。) - 前記保護基は、N,N−ジメチルエチレンジアミン、1,3−プロパンジオール、1,3−プロパンジチオール、及びピナコール(pinacol)なる群から選択される1つである、請求項3に記載の化学式1で表される有機半導体化合物の製造方法。
- ハロゲン化は、臭素、塩素、N−ブロモスクシンイミド、及び1,2−ジブロモテトラクロロエタンから選択される1つを用いて行われる、請求項3に記載の化学式1で表される有機半導体化合物の製造方法。
- ZはSであり、Rは(C1−C20)アルコキシである、請求項3に記載の化学式1で表される有機半導体化合物の製造方法。
- 下記構造式から選択される高分子半導体化合物。
Zは、S又はSeであり、
R1及びR2は、互いに独立して、(C1−C20)アルコキシであり、
R’は、水素、(C1−C20)アルキル、(C6−C20)アリール、又は(C3−C20)ヘテロアリールであり、
R11〜R13は、互いに独立して、水素、ハロゲン、(C1−C20)アルキル、又は(C1−C20)アルコキシであり、
R’のアルキル、アリール、及びヘテロアリールとR11〜R13のアルキル、及びアルコキシは、(C1−C20)アルキル、(C2−C20)アルケニル、(C2−C20)アルキニル、(C1−C20)アルコキシ、アミノ基、ヒドロキシ基、ハロゲン基、シアノ基、ニトロ基、トリフルオロメチル基、及びシリル基から選択される1つ以上の置換基でさらに置換されることができ、
nは、1〜500の整数であり、
oとpは、1〜2の整数である。) - 請求項8に記載の高分子化合物を含有する有機半導体デバイス。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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KR20110039597 | 2011-04-27 | ||
KR10-2011-0039597 | 2011-04-27 | ||
KR1020120043437A KR101934806B1 (ko) | 2011-04-27 | 2012-04-25 | 유기 반도체 화합물, 이의 제조방법 및 이를 채용한 유기 반도체 디바이스 |
KR10-2012-0043437 | 2012-04-25 | ||
PCT/KR2012/003230 WO2012148185A2 (ko) | 2011-04-27 | 2012-04-26 | 유기 반도체 화합물, 이의 제조방법 및 이를 채용한 유기 반도체 디바이스 |
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KR101587268B1 (ko) | 2015-04-21 | 2016-01-20 | 주식회사 이너지테크놀러지스 | 지중열로 직접 냉방하는 지열히트펌프 냉난방 급탕 시스템 |
KR101713543B1 (ko) | 2015-08-14 | 2017-03-09 | 주식회사 이너지테크놀러지스 | 열회수 온수공급 기능을 보유한 히트펌프 냉난방기 |
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US5936259A (en) | 1997-10-16 | 1999-08-10 | Lucent Technologies Inc. | Thin film transistor and organic semiconductor material thereof |
JP2006216814A (ja) * | 2005-02-04 | 2006-08-17 | Konica Minolta Holdings Inc | 有機半導体材料、有機半導体薄膜、有機薄膜トランジスタ、電界効果トランジスタ及びスイッチング素子 |
JP2007067262A (ja) * | 2005-09-01 | 2007-03-15 | Konica Minolta Holdings Inc | 有機半導体材料、有機半導体膜、有機半導体デバイス及び有機薄膜トランジスタ |
KR101314998B1 (ko) * | 2006-12-13 | 2013-10-04 | 삼성전자주식회사 | 헤테로아센 화합물, 이를 포함하는 유기 박막 및 당해 박막을 포함하는 전자 소자 |
CN101412651A (zh) * | 2007-10-18 | 2009-04-22 | 北京化工大学 | 并五苯及其衍生物和制备 |
JP5544650B2 (ja) | 2008-11-21 | 2014-07-09 | 国立大学法人広島大学 | 新規化合物の製造方法 |
JP2010180151A (ja) * | 2009-02-04 | 2010-08-19 | Hokkaido Univ | チオフェン環縮合多環芳香族化合物 |
KR101156630B1 (ko) * | 2009-02-27 | 2012-06-15 | 경상대학교산학협력단 | 디알콕시치환체를 갖는 나프탈렌 교대 공중합체와 이를 이용한 유기전자소자 |
WO2011078246A1 (ja) * | 2009-12-25 | 2011-06-30 | 住友化学株式会社 | 高分子化合物、これを含む薄膜及びインク組成物 |
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EP2706060A2 (en) | 2014-03-12 |
KR101934806B1 (ko) | 2019-01-04 |
WO2012148185A2 (ko) | 2012-11-01 |
US20140046013A1 (en) | 2014-02-13 |
EP2706060A4 (en) | 2014-10-29 |
CN103502251A (zh) | 2014-01-08 |
KR20120122924A (ko) | 2012-11-07 |
JP2014517826A (ja) | 2014-07-24 |
US9236573B2 (en) | 2016-01-12 |
WO2012148185A3 (ko) | 2013-03-21 |
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