JP5997153B2 - 荷電粒子検出器 - Google Patents
荷電粒子検出器 Download PDFInfo
- Publication number
- JP5997153B2 JP5997153B2 JP2013524216A JP2013524216A JP5997153B2 JP 5997153 B2 JP5997153 B2 JP 5997153B2 JP 2013524216 A JP2013524216 A JP 2013524216A JP 2013524216 A JP2013524216 A JP 2013524216A JP 5997153 B2 JP5997153 B2 JP 5997153B2
- Authority
- JP
- Japan
- Prior art keywords
- detector
- charged particle
- charged
- target
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 title claims description 186
- 239000011163 secondary particle Substances 0.000 claims description 119
- 150000002500 ions Chemical group 0.000 claims description 17
- 238000010884 ion-beam technique Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000011109 contamination Methods 0.000 claims description 14
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 description 22
- 230000005684 electric field Effects 0.000 description 21
- 238000001514 detection method Methods 0.000 description 20
- 239000004020 conductor Substances 0.000 description 17
- 238000009826 distribution Methods 0.000 description 15
- 230000000875 corresponding effect Effects 0.000 description 14
- 230000008901 benefit Effects 0.000 description 10
- 230000010354 integration Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000003321 amplification Effects 0.000 description 5
- 238000003199 nucleic acid amplification method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000000356 contaminant Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- CKHJYUSOUQDYEN-UHFFFAOYSA-N gallium(3+) Chemical compound [Ga+3] CKHJYUSOUQDYEN-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000002003 electron diffraction Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- -1 gallium ions Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0475—Changing particle velocity decelerating
- H01J2237/04756—Changing particle velocity decelerating with electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/053—Arrangements for energy or mass analysis electrostatic
- H01J2237/0535—Mirror analyser
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/854,008 | 2010-08-10 | ||
| US12/854,008 US8481962B2 (en) | 2010-08-10 | 2010-08-10 | Distributed potential charged particle detector |
| PCT/US2011/047294 WO2012021652A2 (en) | 2010-08-10 | 2011-08-10 | Charged particle detector |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013535800A JP2013535800A (ja) | 2013-09-12 |
| JP2013535800A5 JP2013535800A5 (enExample) | 2014-09-25 |
| JP5997153B2 true JP5997153B2 (ja) | 2016-09-28 |
Family
ID=45564131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013524216A Active JP5997153B2 (ja) | 2010-08-10 | 2011-08-10 | 荷電粒子検出器 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8481962B2 (enExample) |
| EP (1) | EP2603926B1 (enExample) |
| JP (1) | JP5997153B2 (enExample) |
| CN (1) | CN103038856B (enExample) |
| WO (1) | WO2012021652A2 (enExample) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5386596B2 (ja) * | 2010-01-20 | 2014-01-15 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US8481962B2 (en) | 2010-08-10 | 2013-07-09 | Fei Company | Distributed potential charged particle detector |
| EP2487703A1 (en) | 2011-02-14 | 2012-08-15 | Fei Company | Detector for use in charged-particle microscopy |
| EP2518755B1 (en) | 2011-04-26 | 2014-10-15 | FEI Company | In-column detector for particle-optical column |
| JP5663412B2 (ja) * | 2011-06-16 | 2015-02-04 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| EP2654068B1 (en) * | 2012-04-16 | 2017-05-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Switchable multi perspective detector, optics therefore and method of operating thereof |
| EP2654069B1 (en) * | 2012-04-16 | 2016-02-24 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi channel detector, optics therefore and method of operating thereof |
| WO2013160800A1 (en) * | 2012-04-27 | 2013-10-31 | Indian Institute Of Technology Kanpur | System for characterizing focused charged beams |
| US8759764B2 (en) * | 2012-06-29 | 2014-06-24 | Fei Company | On-axis detector for charged particle beam system |
| US20140112840A1 (en) * | 2012-10-23 | 2014-04-24 | Wisconsin Alumni Research Foundation | Device For And Method Of Extracting A Fraction From A Biological Sample |
| US9190241B2 (en) * | 2013-03-25 | 2015-11-17 | Hermes-Microvision, Inc. | Charged particle beam apparatus |
| EP2811506B1 (en) | 2013-06-05 | 2016-04-06 | Fei Company | Method for imaging a sample in a dual-beam charged particle apparatus |
| JP6228870B2 (ja) * | 2013-06-19 | 2017-11-08 | 日本電子株式会社 | 検出器および荷電粒子線装置 |
| US9418819B2 (en) | 2013-09-06 | 2016-08-16 | Kla-Tencor Corporation | Asymmetrical detector design and methodology |
| US10040062B2 (en) | 2014-01-14 | 2018-08-07 | Wisconsin Alumni Research Foundation | Device and method for transferring a target between locations |
| CN103823234B (zh) * | 2014-03-12 | 2017-02-08 | 中国工程物理研究院电子工程研究所 | 一种脉冲带电粒子束探测器 |
| JP6294758B2 (ja) * | 2014-05-12 | 2018-03-14 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置及び荷電粒子ビームのドーズ量異常検出方法 |
| US9673019B2 (en) | 2014-09-22 | 2017-06-06 | El-Mul Technologies Ltd. | Electron detection system |
| CZ305883B6 (cs) * | 2014-11-07 | 2016-04-20 | Tescan Orsay Holding, A.S. | Zobrazovací zařízení zobrazující svazkem nabitých částic a detekující signální nabité částice víceúčelovým selektivním detektorem |
| US10236156B2 (en) | 2015-03-25 | 2019-03-19 | Hermes Microvision Inc. | Apparatus of plural charged-particle beams |
| KR20200007103A (ko) | 2015-11-30 | 2020-01-21 | 에이에스엠엘 네델란즈 비.브이. | 복수의 하전된 입자 빔의 장치 |
| US10605755B2 (en) * | 2015-12-01 | 2020-03-31 | Academia Sinica | Method and device for detecting charged particles |
| EP3176808B1 (en) * | 2015-12-03 | 2019-10-16 | Carl Zeiss Microscopy Ltd. | Method for detecting charged particles and particle beam device for carrying out the method |
| KR20200044100A (ko) * | 2017-09-29 | 2020-04-28 | 에이에스엠엘 네델란즈 비.브이. | 하전 입자에 대한 다중 셀 검출기 |
| KR101914881B1 (ko) * | 2017-11-01 | 2018-11-02 | 한국기초과학지원연구원 | 소형 비행시간 질량 분석기 |
| US10692694B2 (en) * | 2017-12-27 | 2020-06-23 | Fei Company | Method and apparatus for enhancing SE detection in mirror-based light imaging charged particle microscopes |
| JP7074479B2 (ja) * | 2018-01-11 | 2022-05-24 | 株式会社ニューフレアテクノロジー | マルチビーム検査装置 |
| DE102018107529B4 (de) | 2018-03-29 | 2023-03-23 | Bruker Daltonics GmbH & Co. KG | Verfahren zum Betrieb eines Sekundärelektronenvervielfachers im Ionendetektor eines Massenspektrometers für die Verlängerung der Lebensdauer |
| US10770262B1 (en) * | 2018-05-30 | 2020-09-08 | National Technology & Engineering Solutions Of Sandia, Llc | Apparatus, method and system for imaging and utilization of SEM charged particles |
| JP7495939B2 (ja) * | 2019-01-08 | 2024-06-05 | アプライド マテリアルズ イスラエル リミテッド | 走査電子顕微鏡およびオーバーレイ監視方法 |
| CN109742007B (zh) * | 2019-01-18 | 2021-02-26 | 西藏大学 | 一种紧凑型带电粒子检测器 |
| JP7362477B2 (ja) * | 2019-12-27 | 2023-10-17 | 浜松ホトニクス株式会社 | 電子増倍器およびそれを含む光電子増倍器 |
| US10861666B1 (en) * | 2020-01-30 | 2020-12-08 | ICT Integrated Circuit Testing Gesellschaft für Halbletterprüftechnik mbH | Method of operating a charged particle gun, charged particle gun, and charged particle beam device |
| WO2021255886A1 (ja) * | 2020-06-18 | 2021-12-23 | 株式会社日立ハイテク | 荷電粒子線装置 |
| EP3929962A1 (en) * | 2020-06-25 | 2021-12-29 | FEI Company | Method of imaging a specimen using a transmission charged particle microscope |
| US11921488B2 (en) * | 2020-12-15 | 2024-03-05 | Xerox Corporation | System and method for machine-learning-enabled micro-object density distribution control with the aid of a digital computer |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2585616B2 (ja) * | 1987-08-12 | 1997-02-26 | 株式会社日立製作所 | 二次イオン質量分析計方法 |
| JPH01117260A (ja) * | 1987-10-30 | 1989-05-10 | Fujitsu Ltd | エネルギー分析器 |
| DE69501144T2 (de) | 1994-04-12 | 1998-06-04 | Philips Electronics Nv | Teilchenoptisches gerät mit einem sekondärelektronen detektor |
| US5903004A (en) * | 1994-11-25 | 1999-05-11 | Hitachi, Ltd. | Energy dispersive X-ray analyzer |
| JPH09283072A (ja) | 1996-04-15 | 1997-10-31 | Hitachi Ltd | 2次荷電粒子検出方法及びそのシステム並びにイオンビーム加工装置 |
| US5900667A (en) * | 1996-10-04 | 1999-05-04 | Etec Systems, Inc. | Operating a solid state particle detector within a magnetic deflection field so as to minimize eddy currents |
| GB9623768D0 (en) | 1996-11-15 | 1997-01-08 | Leo Electron Microscopy Limite | Scanning electron microscope |
| IL124333A0 (en) | 1998-05-05 | 1998-12-06 | El Mul Technologies Ltd | Charges particle detector |
| EP1236220B8 (de) * | 1999-11-29 | 2013-02-20 | Carl Zeiss Microscopy GmbH | Detektor für ein rasterelektronenmikroskop mit variablem druck und rasterelektronenmikroskop mit einem solchen detektor |
| US6545277B1 (en) * | 2000-08-15 | 2003-04-08 | Applied Materials, Inc. | High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM |
| TW579536B (en) * | 2001-07-02 | 2004-03-11 | Zeiss Carl Semiconductor Mfg | Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
| JP2003031178A (ja) * | 2001-07-17 | 2003-01-31 | Anelva Corp | 四重極型質量分析計 |
| WO2003038418A1 (en) * | 2001-11-02 | 2003-05-08 | Hitachi, Ltd. | Elemental analyser, scanning transmission electron microscope, and element analyzing method |
| US7009187B2 (en) | 2002-08-08 | 2006-03-07 | Fei Company | Particle detector suitable for detecting ions and electrons |
| JP2005166373A (ja) * | 2003-12-01 | 2005-06-23 | Mitsubishi Electric Corp | 飛行時間型質量分析装置および該装置を備えた固形試料不純物分析装置 |
| US7119333B2 (en) * | 2004-11-10 | 2006-10-10 | International Business Machines Corporation | Ion detector for ion beam applications |
| JP4612838B2 (ja) * | 2004-12-28 | 2011-01-12 | キヤノン株式会社 | 荷電粒子線露光装置およびその露光方法 |
| US20070228922A1 (en) * | 2006-03-29 | 2007-10-04 | Mamora Nakasuji | Electron gun and electron beam apparatus field of invention |
| DE102006043895B9 (de) * | 2006-09-19 | 2012-02-09 | Carl Zeiss Nts Gmbh | Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen |
| JP2008140723A (ja) | 2006-12-05 | 2008-06-19 | Horiba Ltd | 分析装置 |
| US7847268B2 (en) * | 2008-05-30 | 2010-12-07 | El-Mul Technologies, Ltd. | Three modes particle detector |
| US7714287B1 (en) * | 2008-06-05 | 2010-05-11 | Kla-Tencor Corporation | Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope |
| US8481962B2 (en) | 2010-08-10 | 2013-07-09 | Fei Company | Distributed potential charged particle detector |
-
2010
- 2010-08-10 US US12/854,008 patent/US8481962B2/en not_active Expired - Fee Related
-
2011
- 2011-08-10 WO PCT/US2011/047294 patent/WO2012021652A2/en not_active Ceased
- 2011-08-10 CN CN201180039297.7A patent/CN103038856B/zh active Active
- 2011-08-10 US US13/816,466 patent/US8907305B2/en active Active
- 2011-08-10 EP EP11817004.2A patent/EP2603926B1/en active Active
- 2011-08-10 JP JP2013524216A patent/JP5997153B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2603926A4 (en) | 2014-07-09 |
| US8481962B2 (en) | 2013-07-09 |
| CN103038856B (zh) | 2015-10-07 |
| EP2603926B1 (en) | 2016-12-21 |
| JP2013535800A (ja) | 2013-09-12 |
| US20130214156A1 (en) | 2013-08-22 |
| EP2603926A2 (en) | 2013-06-19 |
| US8907305B2 (en) | 2014-12-09 |
| CN103038856A (zh) | 2013-04-10 |
| WO2012021652A3 (en) | 2012-05-03 |
| US20120037802A1 (en) | 2012-02-16 |
| WO2012021652A2 (en) | 2012-02-16 |
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