JP5961064B2 - Suction table manufacturing method and suction table - Google Patents

Suction table manufacturing method and suction table Download PDF

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JP5961064B2
JP5961064B2 JP2012170131A JP2012170131A JP5961064B2 JP 5961064 B2 JP5961064 B2 JP 5961064B2 JP 2012170131 A JP2012170131 A JP 2012170131A JP 2012170131 A JP2012170131 A JP 2012170131A JP 5961064 B2 JP5961064 B2 JP 5961064B2
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layer plate
upper layer
groove
middle layer
suction
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JP2014028418A (en
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康智 岡島
康智 岡島
卓朗 三谷
卓朗 三谷
将圭 林
将圭 林
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Mitsuboshi Diamond Industrial Co Ltd
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Mitsuboshi Diamond Industrial Co Ltd
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Priority to JP2012170131A priority Critical patent/JP5961064B2/en
Priority to TW102106381A priority patent/TWI586613B/en
Priority to KR1020130025904A priority patent/KR101891340B1/en
Priority to CN201310143150.3A priority patent/CN103567912B/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20Bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25BTOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005Vacuum work holders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K37/00Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
    • B23K37/04Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
    • B23K37/0426Fixtures for other work
    • B23K37/0435Clamps
    • B23K37/0443Jigs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/52Ceramics

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laser Beam Processing (AREA)

Description

本発明は、ガラス、シリコン、セラミック(LTCC基板等)、化合物半導体等の脆性材料基板(以下これらを総称して基板という)にスクライブ溝(割断用の切溝)を加工したり、該スクライブ溝に沿ってブレイクしたりする際に、前記基板を吸着保持するための吸着テーブルの製造方法並びに吸着テーブルに関する。   The present invention processes a scribe groove (cutting groove) on a brittle material substrate (hereinafter collectively referred to as a substrate) such as glass, silicon, ceramic (LTCC substrate, etc.), compound semiconductor, etc. The present invention relates to a method of manufacturing a suction table for sucking and holding the substrate when breaking along the surface and a suction table.

スクライブ装置やブレイク装置などの基板加工装置に用いられる吸着テーブルは、図6に示すように、金属製の台板10に多数のエア吸引孔11を基板載置面12に向かって開口させたものが知られている。各エア吸引孔11は台板下部で中空空間のマニホールド11aに連なっており、外部に設けた真空ポンプPにより当該マニホールド11aを介してエア吸引孔11から吸引して基板載置面12に載置した基板Wを吸着するようにしている。   As shown in FIG. 6, the suction table used in the substrate processing apparatus such as a scribing device or a break device is formed by opening a large number of air suction holes 11 toward the substrate mounting surface 12 in a metal base plate 10. It has been known. Each air suction hole 11 is connected to a hollow space manifold 11a at the bottom of the base plate, and is sucked from the air suction hole 11 via the manifold 11a by the vacuum pump P provided outside and placed on the substrate placement surface 12. The substrate W is sucked.

また、金属製台板10にエア吸引孔11を設けたテーブルにおいて、基板載置面に置いた基板の密着性をよくするために改良された図7に示すような吸着テーブルがある。
この吸着テーブルは、台板10の基板載置面12の各端縁近傍に沿って、断面が逆T字形の溝13が四角形の軌跡(閉曲線の軌跡)を描くように加工されており、この断面逆T字形溝13に、平面視で四角形に枠組された非通気性のクッション材14がその頂部を少し露出させた状態で嵌め込まれている。そして、基板加工時には、基板載置面12に立設された位置決め用基準ピン15に基板Wの端縁を当てて位置決めし、クッション材14の頂面に基板Wを載置する。この状態で、エア吸引孔11から吸引すると、基板Wはクッション材14を圧縮しながら台板10の基板載置面12に吸引される。これにより、基板Wに多少のゆがみや湾曲変形があっても、エア吸引孔11が形成された全エリアにわたって均等に密着させることができる。
Further, in the table in which the air suction hole 11 is provided in the metal base plate 10, there is a suction table as shown in FIG. 7 which is improved in order to improve the adhesion of the substrate placed on the substrate mounting surface.
This suction table is processed so that a groove 13 having an inverted T-shaped cross section draws a square locus (closed curve locus) along the vicinity of each edge of the substrate mounting surface 12 of the base plate 10. A non-breathable cushioning material 14 framed in a quadrangular shape in a plan view is fitted into the inverted T-shaped groove 13 in a state where the top is slightly exposed. When processing the substrate, the substrate W is placed on the top surface of the cushioning material 14 by positioning the substrate W against the positioning reference pin 15 erected on the substrate mounting surface 12. When sucked from the air suction hole 11 in this state, the substrate W is sucked to the substrate mounting surface 12 of the base plate 10 while compressing the cushion material 14. As a result, even if the substrate W is slightly distorted or curved, it can be evenly adhered over the entire area where the air suction holes 11 are formed.

台板10に多数のエア吸引孔11を設けた吸着テーブルの場合、シート状の薄い基板を吸着テーブルに載置して加工する時には、適正な吸着力(吸引力)で基板を吸着させることが必要である。吸着力が強過ぎるとエア吸引孔11の部分で基板(被加工物)がへこむ。このようなへこみが生じると、例えば、基板表面にカッターホイールを圧接して転動させる加工では、カッターホイールの上下動によって、また、レーザビームによる加工では、ビーム焦点の位置ずれや照射パワー密度の低下によって加工品質が劣化する。また、吸着時に基板にへこみによるしわができると、しわで膨らんだ部分の加工品質が前述と同様の理由で劣化する。   In the case of a suction table in which a large number of air suction holes 11 are provided in the base plate 10, when processing a sheet-like thin substrate placed on the suction table, the substrate can be sucked with an appropriate suction force (suction force). is necessary. If the suction force is too strong, the substrate (workpiece) is recessed at the air suction hole 11. When such a dent occurs, for example, in the process of rolling by pressing the cutter wheel against the substrate surface, due to the vertical movement of the cutter wheel, and in the process using a laser beam, the position shift of the beam focus and the irradiation power density Processing quality deteriorates due to the decrease. Further, if the substrate is wrinkled due to dents during adsorption, the processing quality of the wrinkled portion deteriorates for the same reason as described above.

したがって、適正な吸着力で基板を吸着し、基板面の凹凸の発生をできるだけ防止することが必要である。適正な吸着力は加工される基板の材質や厚みによって変化し、具体的には、例えば材質が柔らかく厚みの薄い基板ほど吸着力を弱めなければならない。適正な吸着のためにはエア吸引孔を小口径化して個々の吸着力を弱め、孔数を増やして全体としての吸着力を確保する必要がある。厚みが数十μm程度のシート状基板を凹凸が発生しないように吸着するためには、非常に小さな孔径のエア吸引孔を高密度で多数加工しなければならないが、その加工には限界がある。   Therefore, it is necessary to suck the substrate with an appropriate suction force and prevent the unevenness of the substrate surface as much as possible. The appropriate adsorption force varies depending on the material and thickness of the substrate to be processed. Specifically, for example, a substrate having a softer material and a thinner thickness must weaken the adsorption force. For proper suction, it is necessary to reduce the air suction holes to reduce the individual suction force and increase the number of holes to ensure the overall suction force. In order to adsorb a sheet-like substrate having a thickness of about several tens of μm so that unevenness does not occur, a large number of air suction holes having a very small hole diameter must be processed at a high density, but there is a limit to the processing. .

そこで、テーブルの基板載置部を縦横に無数の小孔を有する多孔質のセラミック板で形成したものが、上述した金属製の吸着テーブルとともに従来から用いられている(特許文献1参照)。
当該多孔質セラミック板の多孔質部分の孔径は充分小さいため、一つの孔による吸着力は弱くて局所的な基板のへこみが生じないが、多孔質セラミック板と基板とが接する全面を吸着するために、基板全体を吸着する力としては充分であり、薄い基板を固定するための吸着テーブルとして有効である。
Therefore, a substrate mounting portion of a table formed of a porous ceramic plate having countless small holes vertically and horizontally has been conventionally used together with the metal suction table described above (see Patent Document 1).
Since the pore diameter of the porous part of the porous ceramic plate is sufficiently small, the adsorption force by one hole is weak and local dent does not occur, but it adsorbs the entire surface where the porous ceramic plate and the substrate are in contact In addition, the force for adsorbing the entire substrate is sufficient, and it is effective as an adsorption table for fixing a thin substrate.

特開2001−138095号公報JP 2001-138095 A

しかしながら、セラミック板の材質は脆く、特に多孔質のセラミック材は脆性が高いため、上記図7で示した断面逆T字形溝のような複雑な溝や、基準ピンをねじ込むためのネジ孔などを精密に加工することが困難であった。
そこで本発明は、多孔質のセラミック板を吸着テーブルの吸着面として使用するものでありながら、吸着面の一部にクッション材を嵌め込むための断面逆T字形溝などの複雑な加工を可能とした吸着テーブルの製造方法、並びに、当該製造方法により得られる吸着テーブルを提供することを目的とするものである。
However, the material of the ceramic plate is fragile, and especially the porous ceramic material is highly brittle. Therefore, a complicated groove such as the inverted T-shaped groove shown in FIG. 7 or a screw hole for screwing the reference pin is used. It was difficult to process precisely.
Therefore, the present invention enables a complicated processing such as a cross-section inverted T-shaped groove for fitting a cushion material to a part of the suction surface while using a porous ceramic plate as the suction surface of the suction table. It is an object of the present invention to provide a method for manufacturing a suction table and a suction table obtained by the manufacturing method.

上記目的を達成するために本発明では次のような技術的手段を講じた。すなわち、本発明の吸着テーブルの製造方法は、多孔質セラミック材で形成され、かつ、上面を基板載置面とした上層板が、上下に貫通する多数のエア吸引孔を有する中層板の上面に接合され、前記エア吸引孔に連通された真空排気手段によって減圧することにより前記基板載置面に載置した基板を吸着保持するための吸着テーブルの製造方法であって、前記上層板の下面に下溝を閉曲線状に加工する工程と、この下溝の溝幅より狭い溝幅の貫通溝を上層板の上面から下溝に貫通させて断面が逆T字形の溝を前記閉曲線状に加工し、これにより前記上層板を吸着エリアとなるセンター部材と枠部材とに分断する工程と、前記枠部材の内側面並びにセンター部材の外側面を非通気性のコーティング材(例えば、エポキシ樹脂)によって被覆する工程と、前記上層板のセンター部材を枠部材に嵌め込んだ状態で、前記中層板の上面に載置して取付治具によりセンター部材を枠部材のセンターに位置決めした後、上層板と中層板とを接合する工程とからなるようにした。   In order to achieve the above object, the present invention takes the following technical means. That is, in the method for manufacturing the suction table of the present invention, the upper layer plate made of a porous ceramic material and having the upper surface as the substrate mounting surface is formed on the upper surface of the middle layer plate having a number of air suction holes penetrating vertically. A suction table manufacturing method for sucking and holding a substrate placed on the substrate placement surface by reducing pressure by a vacuum evacuation unit joined and communicated with the air suction hole, wherein the suction table is formed on a lower surface of the upper layer plate. A step of processing the lower groove into a closed curve shape, a through groove having a groove width narrower than the groove width of the lower groove is passed through the lower groove from the upper surface of the upper plate, and a groove having an inverted T-shaped cross section is processed into the closed curve shape, thereby A step of dividing the upper layer plate into a center member and a frame member serving as an adsorption area, and an inner surface of the frame member and an outer surface of the center member are covered with a non-breathable coating material (for example, epoxy resin). After the center member of the upper layer plate is fitted in the frame member, the upper member is placed on the upper surface of the middle layer plate, and the center member is positioned at the center of the frame member by a mounting jig. And the process of joining.

本発明の分断方法によれば、上層板の下面にまず下溝を加工し、次いで、この下溝の溝幅より狭い溝幅の貫通溝を加工することによって、上層板を一度、枠部材とセンター部材とに分離し、これを再び組み合わせて中層板の上面に貼り合わせる。これにより、たとえ加工が困難な脆い多孔質セラミック材が素材であるとしても、逆T字形溝を精度よく形成することが可能となる。
また、上層板を枠部材とセンター部材とに分離した際に、枠部材の内側面並びにセンター部材の外側面への非通気性のコーティング材(例えば、エポキシ樹脂)のコーティングが簡単にできるので、逆T字形溝からの漏れによる吸着力(吸引力)の低下を防止することができる。
According to the dividing method of the present invention, the lower groove is first processed on the lower surface of the upper layer plate, and then the upper layer plate is once processed into the frame member and the center member by processing a through groove having a groove width narrower than the groove width of the lower groove. These are recombined and bonded to the upper surface of the middle layer plate. As a result, even if a brittle porous ceramic material that is difficult to process is a raw material, it is possible to accurately form an inverted T-shaped groove.
In addition, when the upper layer plate is separated into the frame member and the center member, the non-breathable coating material (for example, epoxy resin) can be easily coated on the inner surface of the frame member and the outer surface of the center member. A decrease in adsorption force (suction force) due to leakage from the inverted T-shaped groove can be prevented.

本発明の製造方法において、前記上層板と中層板とを接着剤(例えば、エポキシ樹脂)で接合した後、前記中層板のエア吸引孔の下方から、当該エア吸引孔に面する上層板と中層板との接着層を切削除去する工程を含む構成とするのがよい。
これにより、接着層による吸引の低下を回避することができる。
In the manufacturing method of the present invention, after joining the upper layer plate and the middle layer plate with an adhesive (for example, epoxy resin), the upper layer plate and the middle layer facing the air suction hole from below the air suction hole of the middle layer plate It is good to set it as the structure including the process of cutting and removing the contact bonding layer with a board.
Thereby, the fall of attraction | suction by an adhesive layer can be avoided.

本発明の製造方法において、前記上層板並びに中層板に同軸状に設けられる基準ピン挿通孔を加工し、当該中層板の挿通孔の直径を、上層板の挿通孔よりも大きく形成しておいて前記中層板の挿通孔に合成樹脂の充填材を充填し、前記上層板を前記中層板に接合した後に前記充填材に基準ピン用のピン穴を加工するようにするのがよい。
これにより、中層板が小さなネジ加工の困難なセラミック材で形成されていても、上層板の基準ピン挿通孔の位置に合わせて基準ピンを挿通するためのピン孔を正確に加工することができる。
In the manufacturing method of the present invention, the reference pin insertion hole provided coaxially in the upper layer plate and the middle layer plate is processed, and the diameter of the insertion hole of the middle layer plate is formed larger than the insertion hole of the upper layer plate. Preferably, a synthetic resin filler is filled in the insertion hole of the intermediate layer plate, and after the upper layer plate is joined to the intermediate layer plate, a pin hole for a reference pin is processed in the filler.
Thereby, even if the middle layer plate is formed of a ceramic material that is difficult to thread, the pin hole for inserting the reference pin can be accurately processed in accordance with the position of the reference pin insertion hole of the upper layer plate. .

また、本発明の吸着テーブルは、多孔質のセラミック材で形成され、かつ、上面を基板載置面とした上層板と、前記上層板の下面に接合され、かつ、上下に貫通する多数のエア吸引孔を有する中層板と、前記中層板の下面に接合され、かつ、前記エア吸引孔の下端側の開口が塞がれないように中央部分に中空空間を形成する枠状の下層板と、前記下層板の下面に取り付けられたベースプレートとからなり、前記上層板が、上下に貫通し断面が逆T字形かつ平面視が閉曲線状の溝によって分断された枠部材とセンター部材とから形成されて前記中層板の上面に接合されており、前記溝によって隔てられた枠部材の内側面並びにセンター部材の外側面が非通気性のコーティング材によって被覆されており、前記下層板の中空空間が外部の吸引エア源(真空排気手段)に連通されている構成とした。本発明の吸着テーブルは、下層板を加工装置のベースプレート上に設置された状態で使用される。
これにより、上層板が多孔質セラミックであっても、断面が逆T字形で閉曲線をなす溝を、上層板の基板載置面に加工精度よく形成することができるとともに、逆T字形溝からの漏れによる吸引力の低下を防止した吸着テーブルを提供することができる。
The suction table of the present invention is formed of a porous ceramic material and has an upper layer plate whose upper surface is a substrate mounting surface, and a large number of air that is bonded to the lower surface of the upper layer plate and penetrates vertically. An intermediate layer plate having a suction hole, a frame-shaped lower layer plate that is bonded to the lower surface of the intermediate layer plate, and that forms a hollow space in the central portion so that the opening on the lower end side of the air suction hole is not blocked; A base plate attached to the lower surface of the lower layer plate, wherein the upper layer plate is formed of a frame member and a center member that are vertically penetrated, and whose cross section is divided by a groove having an inverted T shape and a plan view. The inner surface of the frame member and the outer surface of the center member, which are joined to the upper surface of the intermediate layer plate and separated by the groove, are covered with a non-breathable coating material, and the hollow space of the lower layer plate is external Suction air It has a configuration which is communicated with the (evacuation means). The suction table of the present invention is used in a state where the lower layer plate is installed on the base plate of the processing apparatus.
As a result, even if the upper layer plate is a porous ceramic, it is possible to form a groove having an inverted T-shaped cross section and a closed curve on the substrate mounting surface of the upper layer plate with high processing accuracy, and from the inverted T-shaped groove. It is possible to provide a suction table that prevents a reduction in suction force due to leakage.

本発明に係る吸着テーブルの使用時の状態を示す断面図。Sectional drawing which shows the state at the time of use of the adsorption | suction table which concerns on this invention. 図1の吸着テーブルのクッション材を取り外した状態を示す斜視図。The perspective view which shows the state which removed the cushion material of the adsorption | suction table of FIG. 図1の吸着テーブルの分解斜視図。The disassembled perspective view of the adsorption | suction table of FIG. 図1の吸着テーブルの製造工程を示す説明図。Explanatory drawing which shows the manufacturing process of the adsorption | suction table of FIG. 本発明に係る吸着テーブルの他の実施例を示す斜視図。The perspective view which shows the other Example of the adsorption | suction table which concerns on this invention. 従来の吸着テーブルの一例を示す断面図。Sectional drawing which shows an example of the conventional suction table. 従来の吸着テーブルの別の一例を示す断面図。Sectional drawing which shows another example of the conventional adsorption | suction table.

以下において本発明に係る吸着テーブルの製造方法をその実施の形態を示す図面に基づいて詳細に説明する。
図1は本発明に係る吸着テーブルの使用時の状態を示す断面図であり、図2は吸着テーブルの斜視図であり、図3は吸着テーブルの分解斜視図であり、図4は吸着テーブルの製造工程を示す説明図である。
Hereinafter, a suction table manufacturing method according to the present invention will be described in detail with reference to the drawings showing embodiments thereof.
FIG. 1 is a cross-sectional view showing a state in use of the suction table according to the present invention, FIG. 2 is a perspective view of the suction table, FIG. 3 is an exploded perspective view of the suction table, and FIG. It is explanatory drawing which shows a manufacturing process.

吸着テーブルAは、上層板1と、中層板2と、下層板3とが(例えば、ネジ留めで)組み合わされることにより構成される。
上層板1は、縦横に無数の微細な小孔を有する多孔質のセラミック材で形成され、かつ、上面が基板載置面1aとなっている。上層板1の基板載置面1aの各端縁近傍に沿って断面が逆T字形の溝1b(以下、逆T字形溝1bという)が四角形の軌跡(閉曲線)を描くようにループ状に形成されている。逆T字形溝1bは上下に貫通しており、これにより上層板1が逆T字形溝1bによって分断された枠部材1cと、実質的な吸着エリアとなるセンター部材1dとに分断されて中層板2の上面に接着剤で接合されている。この分断された枠部材1cの内側面1c’並びにセンター部材1dの外側面1d’は非通気性のコーティング材(例えば、エポキシ樹脂)によって被覆されている(図4参照)。これにより減圧時に逆T字形溝1bの部分からの漏れ(エアの流入)が防止されて、吸着エリアとなるセンター部材1dの吸着力が弱まるのを防止している。
また、上層板1には、加工すべき基板Wを基板載置面1aに載置する際の位置決めに用いる基準ピン8が立設されている。この基準ピン8は、上層板1のピン挿通孔1e(図4参照)を貫通して中層板2のピン穴2cに挿入されている。
なお、基準ピン8は、図1(b)に示すように、筒部材8aの内ネジ8bにイモネジ8cがねじ込まれており、イモネジ8cの先端がピン穴2cの底に当接して形成されている。このイモネジ8cの上端に形成された係合部8dにドライバー等の回動工具を係合させて回動することにより、イモネジ8cを上下動させて基準ピン8の長さ(上層板1からの突出量)を調整するように形成されている。
The suction table A is configured by combining the upper layer plate 1, the middle layer plate 2, and the lower layer plate 3 (for example, by screwing).
The upper layer plate 1 is formed of a porous ceramic material having countless fine holes in the vertical and horizontal directions, and the upper surface is a substrate mounting surface 1a. A groove 1b having an inverted T-shaped cross section (hereinafter referred to as an inverted T-shaped groove 1b) is formed in a loop shape along the vicinity of each edge of the substrate mounting surface 1a of the upper layer plate 1 so as to draw a square locus (closed curve). Has been. The inverted T-shaped groove 1b penetrates up and down, so that the upper layer plate 1 is divided into a frame member 1c divided by the inverted T-shaped groove 1b and a center member 1d serving as a substantial adsorption area. It is joined to the upper surface of 2 with an adhesive. The inner surface 1c ′ of the divided frame member 1c and the outer surface 1d ′ of the center member 1d are covered with a non-breathable coating material (for example, epoxy resin) (see FIG. 4). This prevents leakage (inflow of air) from the portion of the inverted T-shaped groove 1b during decompression, and prevents the suction force of the center member 1d serving as the suction area from weakening.
Further, the upper layer plate 1 is provided with a reference pin 8 used for positioning when the substrate W to be processed is placed on the substrate placement surface 1a. The reference pin 8 passes through the pin insertion hole 1e (see FIG. 4) of the upper layer plate 1 and is inserted into the pin hole 2c of the middle layer plate 2.
As shown in FIG. 1B, the reference pin 8 is formed such that a female screw 8c is screwed into an inner screw 8b of the cylindrical member 8a, and the tip of the female screw 8c is in contact with the bottom of the pin hole 2c. Yes. By engaging and rotating a rotating tool such as a screwdriver with an engaging portion 8d formed at the upper end of the female screw 8c, the female screw 8c is moved up and down to the length of the reference pin 8 (from the upper plate 1). (Projection amount) is adjusted.

中層板2は、通気性のない無機質セラミック材で形成され、上層板1のセンター部材1dによって覆われる領域に対面する位置に、上下に貫通する多数のエア吸引孔2aを備えている。   The middle layer plate 2 is formed of a non-breathable inorganic ceramic material, and includes a plurality of air suction holes 2a penetrating vertically at a position facing the region covered by the center member 1d of the upper layer plate 1.

下層板3についても、通気性のない無機質セラミック材で形成され、中層板2の下面に接着剤で接合されている。下層板3は、中層板2のエア吸引孔2aの下端側の開口部を塞がないように中央部分をくり抜いた中空空間3aが形成された四角枠状の形状にしてある。
上記した上層板1、中層板2、下層板3は、多孔質セラミック材か無機質セラミック材かの相違はあっても同種のセラミック材で形成されているので、これら各層を接着剤で接合すれば、接着性がよく確実に接合することができ、各層の熱膨張率が同等であるため、温度が変化しても精度を維持することができるとともに、全体として軽量に形成することができる。
The lower layer plate 3 is also formed of an inorganic ceramic material having no air permeability, and is bonded to the lower surface of the middle layer plate 2 with an adhesive. The lower layer plate 3 has a rectangular frame shape in which a hollow space 3a is formed by hollowing out the central portion so as not to block the opening on the lower end side of the air suction hole 2a of the intermediate layer plate 2.
Since the upper layer plate 1, the middle layer plate 2, and the lower layer plate 3 are formed of the same kind of ceramic material regardless of whether they are a porous ceramic material or an inorganic ceramic material, these layers can be joined with an adhesive. Since the adhesiveness is good and can be reliably bonded, and the thermal expansion coefficient of each layer is the same, the accuracy can be maintained even when the temperature changes, and the overall weight can be reduced.

ベースプレート4は、鉄などの金属製素材で形成され、互いに接合された上層板1、中層板2並びに下層板3をその上面で受け止め、上層板1から貫通する連結ボルト5(図2図3参照)を介して各層とベースプレートとが締結されるようにして取り付けられている。ベースプレート4には、下層板3の中空空間3aに通じるエア孔4aが設けられており、エア孔4aが、外部に設けた真空ポンプなどの真空排気装置Pに配管6を介して連通されている。   The base plate 4 is made of a metal material such as iron, and receives the upper layer plate 1, the middle layer plate 2 and the lower layer plate 3 joined to each other on its upper surface, and a connecting bolt 5 penetrating from the upper layer plate 1 (see FIG. 2 and FIG. 3). ) And the base plate are attached so as to be fastened. The base plate 4 is provided with an air hole 4 a that communicates with the hollow space 3 a of the lower layer plate 3, and the air hole 4 a communicates with a vacuum exhaust device P such as a vacuum pump provided outside via a pipe 6. .

基板Wの加工時には、図1、図2に示すように、上層板1の逆T字形溝1bに、平面視で四角形に枠組されたクッション材7がその頂部を少し露出させた状態で嵌め込まれる。クッション材7の下端は膨大部7aが設けられており、この膨大部7aを逆T字形溝1bに強制的に押し込むことにより、膨大部7aが逆T字形溝1bの幅広の下溝1b’で膨らんでクッション材7を抜けにくくしている。
加工される基板Wは、基板載置面1aに立設された位置決め用基準ピン8に基板Wの端縁を当てて位置決めしながら、クッション材7の頂面に載置する。この状態で、真空排気装置Pを駆動すると、基板Wはクッション材7を圧縮しながらテーブルの基板載置面1aに吸引され、やがて全面が吸着される。これにより、基板に多少のゆがみや変形があっても、全エリアにわたって均等に密着保持させることができる。
When processing the substrate W, as shown in FIGS. 1 and 2, the cushion material 7 framed in a square shape in a plan view is fitted into the inverted T-shaped groove 1 b of the upper layer plate 1 with its top portion slightly exposed. . The lower end of the cushion material 7 is provided with a large portion 7a. By forcibly pushing the large portion 7a into the inverted T-shaped groove 1b, the large portion 7a swells in the wide lower groove 1b ′ of the inverted T-shaped groove 1b. This makes it difficult for the cushion material 7 to come off.
The substrate W to be processed is placed on the top surface of the cushion material 7 while positioning by positioning the edge of the substrate W against the positioning reference pins 8 erected on the substrate placement surface 1a. When the vacuum evacuation device P is driven in this state, the substrate W is sucked to the substrate mounting surface 1a of the table while compressing the cushion material 7, and eventually the entire surface is adsorbed. Thereby, even if there is some distortion or deformation in the substrate, it is possible to hold the substrate evenly over the entire area.

次に上記吸着テーブルAの製造方法について説明する。
まず、図4(a)、(b)に示すように、上層板1の下面に逆T字形溝1bの一部となる下溝1b’をNC切削装置などにより加工する。次いで、図4(c)に示すように、この下溝1b’の溝幅より狭い溝幅の貫通溝1b”をウオータジェット加工装置により上層板1の上面から下溝1b’に貫通して加工する。これにより形成された逆T字形溝1bによって、図4(d)に示すように、上層板1が枠部材1cと、吸着エリアとなるセンター部材1dとに分断される。この分断された枠部材1cの内側面1c’並びにセンター部材1dの外側面1d’を非通気性のコーティング材(例えば、エポキシ樹脂)によって被覆する。また、上層板1の枠部材1cには基準ピン挿通用の貫通孔1eもこの段階で加工しておく。
Next, a manufacturing method of the suction table A will be described.
First, as shown in FIGS. 4A and 4B, a lower groove 1b ′, which is a part of the inverted T-shaped groove 1b, is processed on the lower surface of the upper layer plate 1 with an NC cutting device or the like. Next, as shown in FIG. 4C, a through groove 1b ″ having a groove width narrower than the groove width of the lower groove 1b ′ is processed by being penetrated from the upper surface of the upper layer plate 1 to the lower groove 1b ′ by a water jet machining apparatus. 4 (d), the upper layer plate 1 is divided into a frame member 1c and a center member 1d serving as an adsorption area by the inverted T-shaped groove 1b formed thereby. The inner surface 1c ′ of 1c and the outer surface 1d ′ of the center member 1d are covered with a non-breathable coating material (for example, epoxy resin), and the frame member 1c of the upper layer board 1 has a through hole for inserting a reference pin. 1e is also processed at this stage.

また、中層板2には、図4(e)に示すように、上下に貫通する多数のエア吸引孔2aと、上層板1の基準ピン挿通孔1eと同軸になるようにして、しかも挿通孔1eより大径の基準ピン挿通孔2bを加工する。この中層板2の下面に、図4(f)に示すように、中層板2のエア吸引孔2aの下端開口部を塞がないように中央部分をくり抜いた中空空間3aを有する四角枠状の下層板3を接着剤で接合する。この後、中層板2の基準ピン挿通孔2bに樹脂Mを充填する。   Further, as shown in FIG. 4 (e), the middle layer plate 2 is arranged so as to be coaxial with the numerous air suction holes 2 a penetrating vertically and the reference pin insertion hole 1 e of the upper layer plate 1. The reference pin insertion hole 2b having a diameter larger than 1e is processed. As shown in FIG. 4 (f), a rectangular frame-like shape having a hollow space 3 a that is hollowed out at the center so as not to block the lower end opening of the air suction hole 2 a of the intermediate layer plate 2 on the lower surface of the intermediate layer plate 2. The lower layer plate 3 is joined with an adhesive. Thereafter, the resin M is filled in the reference pin insertion hole 2b of the intermediate layer plate 2.

次いで、図4(g)に示すように、上層板1のセンター部材1dを枠部材1cの内部に配置した状態で、中層板2の上面に載置する。そして(例えば、平面視で四角枠状の取付治具9を逆T字形溝1bに差し込んで)、センター部材1dを枠部材1cのセンターに位置決めして、上層板1と中層板2とを接着剤で接合する。この後、中層板2のエア吸引孔2aの下方からドリルを差し込んで、エア吸引孔2aに面する上層板1と中層板2との接着材層を切削除去して通気性を確保する。
次いで、図4(h)に示すように、充填材Mに基準ピン8を挿入するためのピン穴2cを、上層板1の基準ピン挿通孔1eの位置に合わせて加工する。
Next, as shown in FIG. 4G, the center member 1d of the upper layer plate 1 is placed on the upper surface of the middle layer plate 2 in a state where the center member 1d is disposed inside the frame member 1c. Then (for example, a square frame-shaped mounting jig 9 is inserted into the inverted T-shaped groove 1b in plan view), the center member 1d is positioned at the center of the frame member 1c, and the upper layer plate 1 and the middle layer plate 2 are bonded. Join with agent. Thereafter, a drill is inserted from below the air suction hole 2a of the middle layer plate 2, and the adhesive layer between the upper layer plate 1 and the middle layer plate 2 facing the air suction hole 2a is removed by cutting to ensure air permeability.
Next, as shown in FIG. 4 (h), the pin hole 2 c for inserting the reference pin 8 into the filler M is processed according to the position of the reference pin insertion hole 1 e of the upper layer plate 1.

上記の工程を経て上層板1、中層板2、下層板3を接合した後、エア孔4aを備えたベースプレート4上に下層板3の下面が密着するようにして載置し、連結ボルト5(図2参照)で上層板1、中層板2、下層板3並びにベースプレート4を締結する。この連結ボルト5を挿通するための穴は、それぞれの部材の加工段階で予め設けておいてもよいが、精度等の点から、中下層は貼り合わせ後に一体で設けるようにしたほうがよい。   After the upper layer plate 1, the middle layer plate 2, and the lower layer plate 3 are joined through the above steps, the lower plate 3 is placed on the base plate 4 provided with the air holes 4a so that the lower surface of the lower layer plate 3 is in close contact with the connecting bolt 5 ( 2), the upper layer plate 1, the middle layer plate 2, the lower layer plate 3 and the base plate 4 are fastened. The holes for inserting the connecting bolts 5 may be provided in advance at the processing stage of each member. However, in terms of accuracy and the like, it is better to provide the middle and lower layers integrally after bonding.

上記のように、上層板1の下面にまず下溝1b’を加工し、次いで、この下溝1b’の溝幅より狭い溝幅の貫通溝1b”を加工することによって、上層板1を一度枠部材1cとセンター部材1dとに分離し、これを再び組み合わせて中層板2の上面に貼り合わせるようにしたことにより、素材が多孔質セラミック材であっても複雑な逆T字形溝1bを精度よく形成することが可能となる。また、上層板1を枠部材1cとセンター部材1dとに分離した際に、枠部材1cの内側面1c’並びにセンター部材1dの外側面1d’に漏れ(エアの流入)を防止するためのコーティング材を容易に被覆させることができる。   As described above, the lower groove 1b ′ is first processed on the lower surface of the upper layer plate 1, and then the through groove 1b ″ having a groove width narrower than the groove width of the lower groove 1b ′ is processed, whereby the upper layer plate 1 is once framed. 1c and center member 1d are separated and recombined so that they are attached to the upper surface of the middle layer plate 2 to accurately form a complex inverted T-shaped groove 1b even if the material is a porous ceramic material. Further, when the upper layer plate 1 is separated into the frame member 1c and the center member 1d, it leaks into the inner side surface 1c 'of the frame member 1c and the outer side surface 1d' of the center member 1d (inflow of air). ) Can be easily coated with a coating material.

なお、上記した実施例では、上層板1の実質的な吸引エリアとなる平面視四角形のセンター部材1d並びにその周辺を取り囲む逆T字形溝1bを一つだけ形成した実施例を示したが、これらを2つ以上の複数個、例えば、図5に示すように、4つの吸着エリアを同一平面上に形成することも可能である。   In the above-described embodiment, the center member 1d having a rectangular shape in plan view which is a substantial suction area of the upper layer plate 1 and only one inverted T-shaped groove 1b surrounding the periphery thereof are shown. It is also possible to form two or more plural, for example, four suction areas on the same plane as shown in FIG.

以上本発明の代表的な実施例について説明したが、本発明は必ずしも上記の実施形態に特定されるものでない。例えば、中層板2並びに下層板3は、無機質セラミックに代えて鉄などの金属材で形成することも可能である。また、図示は省略するが、下層板3を省略して、ベースプレート4に中層板2のエア吸引孔2aに通じる中空空間(マニホールド)を形成して、この空間を真空排気装置Pに接続するようにしてもよい。その他本発明では、その目的を達成し、請求の範囲を逸脱しない範囲内で適宜修正、変更することが可能である。   While typical examples of the present invention have been described above, the present invention is not necessarily limited to the above embodiments. For example, the middle layer plate 2 and the lower layer plate 3 can be formed of a metal material such as iron instead of the inorganic ceramic. Although not shown, the lower layer plate 3 is omitted, and a hollow space (manifold) that leads to the air suction hole 2a of the middle layer plate 2 is formed in the base plate 4 so that this space is connected to the vacuum exhaust device P. It may be. Others The present invention can be appropriately modified and changed within the scope of achieving the object and without departing from the scope of the claims.

本発明は、ガラス、シリコン、セラミック(例えば、LTCC)、化合物半導体等の脆性材料基板を加工する際に、前記基板を吸着保持する吸着テーブルに利用することができる。   INDUSTRIAL APPLICABILITY The present invention can be used for an adsorption table that adsorbs and holds a substrate when processing a brittle material substrate such as glass, silicon, ceramic (for example, LTCC), and a compound semiconductor.

W 基板
A 吸着テーブル
M 充填材
1 上層板
1a 基板載置面
1b 逆T字形溝
1c 枠部材
1d センター部材
1e 基準ピン挿通孔
2 中層板
2a エア吸引孔
2b 基準ピン挿通孔
2c ピン穴
3 下層板
3a 中空空間
4 ベースプレート
4a エア孔
5 連結ボルト
6 配管
7 クッション材
8 基準ピン
8a 筒部材
9 取付治具
W Substrate A Adsorption table M Filler 1 Upper layer plate 1a Substrate mounting surface 1b Reverse T-shaped groove 1c Frame member 1d Center member 1e Reference pin insertion hole 2 Middle layer plate 2a Air suction hole 2b Reference pin insertion hole 2c Pin hole 3 Lower layer plate 3a Hollow space 4 Base plate 4a Air hole 5 Connection bolt 6 Piping 7 Cushion material 8 Reference pin 8a Cylindrical member 9 Mounting jig

Claims (6)

多孔質セラミック材で形成され、かつ、上面を基板載置面とした上層板が、上下に貫通する多数のエア吸引孔を有する中層板の上面に接合され、前記エア吸引孔に連通された真空排気手段によって減圧することにより前記基板載置面に載置した基板を吸着保持するための吸着テーブルの製造方法であって、
前記上層板の下面に下溝を閉曲線状に加工する工程と、
この下溝の溝幅より狭い溝幅の貫通溝を上層板の上面から下溝に貫通させて断面が逆T字形の溝を前記閉曲線状に加工し、これにより前記上層板を吸着エリアとなるセンター部材と枠部材とに分断する工程と、
前記枠部材の内側面並びにセンター部材の外側面を非通気性のコーティング材によって被覆する工程と、
前記上層板のセンター部材を枠部材に嵌め込んだ状態で、前記中層板の上面に載置して取付治具によりセンター部材を枠部材のセンターに位置決めした後、上層板と中層板とを接合する工程と、
からなる吸着テーブルの製造方法。
An upper layer plate formed of a porous ceramic material and having an upper surface as a substrate mounting surface is joined to the upper surface of a middle layer plate having a number of air suction holes penetrating vertically and communicated with the air suction holes. A suction table manufacturing method for sucking and holding a substrate placed on the substrate placement surface by reducing the pressure by an exhaust means,
Processing the lower groove on the lower surface of the upper layer plate into a closed curve; and
A through member having a narrower groove width than the width of the lower groove is penetrated from the upper surface of the upper layer plate to the lower groove, and a groove having an inverted T-shaped cross section is processed into the closed curve, whereby the upper layer plate serves as a suction area. And a step of dividing into a frame member,
Coating the inner surface of the frame member and the outer surface of the center member with a non-breathable coating material;
After the center member of the upper layer plate is fitted in the frame member, the center member is placed on the upper surface of the middle layer plate and positioned at the center of the frame member by a mounting jig, and then the upper layer plate and the middle layer plate are joined together. And a process of
Manufacturing method of the adsorption table.
前記上層板と中層板とを接着剤で接合した後、
前記中層板の吸引孔の下方からエア吸引孔に面する上層板と中層板との接着層を切削除去する工程を含む請求項1に記載の吸着テーブルの製造方法。
After joining the upper layer plate and the middle layer plate with an adhesive,
The method for manufacturing a suction table according to claim 1, further comprising the step of cutting and removing an adhesive layer between the upper layer plate and the middle layer plate facing the air suction hole from below the suction hole of the middle layer plate.
前記中層板の下面に、前記エア吸引孔の下端を開口するための中空空間を中央部分に形成した枠状の下層板を接合する工程を含む請求項1又は請求項2に記載の吸着テーブルの製造方法。   3. The suction table according to claim 1, further comprising a step of joining a frame-like lower layer plate formed with a hollow space in a central portion for opening a lower end of the air suction hole to a lower surface of the middle layer plate. Production method. 前記中層板並びに下層板が通気性のないセラミック材で形成されている請求項1〜請求項3の何れかに記載の吸着テーブルの製造方法。   The suction table manufacturing method according to any one of claims 1 to 3, wherein the intermediate layer plate and the lower layer plate are formed of a ceramic material having no air permeability. 前記上層板並びに中層板に同軸状に設けられる基準ピン挿通孔を加工し、
前記中層板の挿通孔の直径を前記上層板の挿通孔よりも大きく形成しておいて前記中層板の挿通孔に合成樹脂の充填材を充填し、前記上層板を前記中層板に接合した後に前記充填材に基準ピン用のピン穴を加工するようにした請求項4に記載の吸着テーブルの製造方法。
Processing the reference pin insertion hole provided coaxially in the upper layer plate and the middle layer plate,
After the diameter of the insertion hole of the intermediate layer plate is formed larger than the insertion hole of the upper layer plate, the insertion hole of the intermediate layer plate is filled with a synthetic resin filler, and the upper layer plate is joined to the intermediate layer plate The suction table manufacturing method according to claim 4, wherein a pin hole for a reference pin is processed in the filler.
多孔質のセラミック材で形成され、かつ、上面を基板載置面とした上層板と、
前記上層板の下面に接合され、かつ、上下に貫通する多数のエア吸引孔を有する中層板と、
前記中層板の下面に接合され、かつ、前記エア吸引孔の下端側の開口が塞がれないように中央部分に中空空間を形成する枠状の下層板と、
前記下層板の下面に取り付けられたベースプレートとからなり、
前記上層板が、クッション材を嵌め込むための溝であって上下に貫通し断面が逆T字形かつ平面視が閉曲線状の溝によって隔てられた枠部材とセンター部材とから形成されて前記中層板の上面に接合されており、前記溝によって隔てられた枠部材の内側面並びにセンター部材の外側面が非通気性のコーティング材によって被覆されており、前記下層板の中空空間が真空排気手段に連通されていることを特徴とする吸着テーブル。
An upper layer plate formed of a porous ceramic material and having an upper surface as a substrate mounting surface;
A middle layer plate joined to the lower surface of the upper layer plate and having a number of air suction holes penetrating vertically;
A frame-like lower layer plate which is bonded to the lower surface of the middle layer plate and forms a hollow space in the central portion so that the opening on the lower end side of the air suction hole is not blocked;
It consists of a base plate attached to the lower surface of the lower layer plate,
Wherein the upper layer plate, formed from the frame member and the center member to a groove penetrating in the vertical cross section inverted T-shape and a plan view is found separated by a closed curve shaped groove for fitting the cushioning material middle layer The inner surface of the frame member and the outer surface of the center member separated by the groove are covered with a non-breathable coating material, and the hollow space of the lower plate is used as a vacuum exhaust means. A suction table characterized by being connected.
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