TWI586613B - Adsorption platform manufacturing method and adsorption platform - Google Patents

Adsorption platform manufacturing method and adsorption platform Download PDF

Info

Publication number
TWI586613B
TWI586613B TW102106381A TW102106381A TWI586613B TW I586613 B TWI586613 B TW I586613B TW 102106381 A TW102106381 A TW 102106381A TW 102106381 A TW102106381 A TW 102106381A TW I586613 B TWI586613 B TW I586613B
Authority
TW
Taiwan
Prior art keywords
plate
layer
adsorption platform
groove
substrate
Prior art date
Application number
TW102106381A
Other languages
Chinese (zh)
Other versions
TW201404743A (en
Inventor
岡島康智
三谷卓朗
林將圭
Original Assignee
三星鑽石工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三星鑽石工業股份有限公司 filed Critical 三星鑽石工業股份有限公司
Publication of TW201404743A publication Critical patent/TW201404743A/en
Application granted granted Critical
Publication of TWI586613B publication Critical patent/TWI586613B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20Bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25BTOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005Vacuum work holders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K37/00Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
    • B23K37/04Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
    • B23K37/0426Fixtures for other work
    • B23K37/0435Clamps
    • B23K37/0443Jigs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/52Ceramics

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laser Beam Processing (AREA)

Description

吸附平台之製造方法及吸附平台 Adsorption platform manufacturing method and adsorption platform

本發明係關於一種用以於在玻璃、矽、陶瓷(LTCC基板等)、化合物半導體等脆性材料基板(以下將該等統稱為基板)加工刻劃槽(割斷用之切槽)或沿著該刻劃槽進行裂斷時,吸附保持所述基板之吸附平台之製造方法及吸附平台。 The present invention relates to a method for processing a groove (a slit for cutting) on a substrate of a brittle material such as glass, tantalum, ceramic (LTCC substrate, etc.) or a compound semiconductor (hereinafter collectively referred to as a substrate) When the scribed groove is broken, the manufacturing method and the adsorption platform of the adsorption platform for holding the substrate are adsorbed.

在刻劃裝置或裂斷裝置等之基板加工裝置中所使用之吸附平台,已知有如圖6所示,於金屬製之台板10朝向基板載置面12開口有多個空氣吸引孔11者。各空氣吸引孔11於台板下部與中空空間之歧管(manifold)11a相連,藉由設置於外部之真空泵P且經由該歧管11a從空氣吸引孔11進行吸引,從而吸附載置於基板載置面12之基板W。 In the adsorption stage used in the substrate processing apparatus such as the scribing device or the rupturing device, as shown in FIG. 6, a plurality of air suction holes 11 are opened in the metal platen 10 toward the substrate mounting surface 12. . Each of the air suction holes 11 is connected to a manifold 11a of the hollow space at a lower portion of the platen, and is suctioned from the air suction hole 11 through the vacuum pump P provided outside, and is adsorbed and placed on the substrate. The substrate W of the surface 12 is placed.

此外,在金屬製台板10設置有空氣吸引孔11之平台中,具有為了使載置於基板載置面之基板之密接性變良好而改良之如圖7所示之吸附平台。該吸附平台,係沿台板10之基板載置面12之各端緣附近,以描畫四邊形之軌跡(閉合曲線之軌跡)之方式加工剖面為倒T字形之槽13,且於該剖面倒T字形槽13中,使於俯視時輪廓為四邊形之非透氣性之緩衝材料14,以其頂部略微露出之狀態嵌入。而且,於基板加工時,將基板W之端緣抵接於立設在基板載置面12之定位用基準銷15而進行定位,且將基板W載置於緩衝材料14之頂面。於該狀態下,一旦從空氣吸引孔11進行吸引,則基板W一邊壓縮緩衝材料14一邊被吸引至台板10之基板載置面12。藉此,即使於基板W略微存在扭曲或彎曲變形,亦可使其遍及形成有 空氣吸引孔11之整個區域而均等地密接。 Further, in the stage in which the air suction hole 11 is provided in the metal platen 10, there is an adsorption platform as shown in FIG. 7 which is improved in order to improve the adhesion of the substrate placed on the substrate mounting surface. The adsorption platform is formed along the edge of each end surface of the substrate mounting surface 12 of the platen 10, and the trough 13 having an inverted T shape is processed in a manner of drawing a trajectory of a quadrilateral (a track of a closed curve), and the T is inverted in the cross section. In the gutter groove 13, the non-breathable cushioning material 14 having a quadrangular shape in plan view is embedded in a state in which the top portion thereof is slightly exposed. Further, at the time of substrate processing, the edge of the substrate W is brought into contact with the positioning reference pin 15 that is erected on the substrate mounting surface 12 to be positioned, and the substrate W is placed on the top surface of the buffer material 14. In this state, when suction is performed from the air suction hole 11, the substrate W is attracted to the substrate mounting surface 12 of the platen 10 while compressing the cushioning material 14. Thereby, even if the substrate W is slightly distorted or bent, it can be formed throughout The air suction holes 11 are uniformly connected to the entire area.

於在台板10設置有多個空氣吸引孔11之吸附平台之情形,在將片狀之薄基板載置於吸附平台並進行加工時,必需以適當之吸附力(吸引力)吸附基板。一旦吸附力過強,則於空氣吸引孔11之部分,基板(被加工物)會凹陷。一旦產生如此之凹陷,則例如於使刀輪壓接於基板表面並轉動之加工中,因刀輪之上下移動而導致加工品質劣化,此外,於利用雷射光束之加工中,因光束焦點之位置偏移或照射功率密度之下降而導致加工品質劣化。此外,一旦於吸附時在基板出現因凹陷而導致之皺褶,則因皺褶而使膨脹後之部分之加工品質因與上述相同之理由而劣化。 In the case where the platen 10 is provided with a plurality of adsorption platforms of the air suction holes 11, when the sheet-like thin substrate is placed on the adsorption platform and processed, it is necessary to adsorb the substrate with an appropriate adsorption force (attractive force). When the adsorption force is too strong, the substrate (the workpiece) is recessed in the portion of the air suction hole 11. Once such a depression occurs, for example, in the process of pressing the cutter wheel against the surface of the substrate and rotating, the processing quality is deteriorated due to the upward movement of the cutter wheel, and in addition, in the processing using the laser beam, the focus of the beam is The positional shift or the decrease in the irradiation power density causes the processing quality to deteriorate. Further, when the substrate is wrinkled due to the depression at the time of adsorption, the processing quality of the portion after the expansion due to the wrinkles is deteriorated for the same reason as described above.

因此,必需以適當之吸附力吸附基板,且儘可能防止基板面之凹凸之產生。適當之吸附力係根據所加工之基板材質或厚度而有所變化,具體而言,例如,越是材質柔軟且厚度較薄之基板越必須減弱吸附力。為了實現適當之吸附,必須使空氣吸引孔小口徑化並減弱各自之吸附力,且增加孔數來確保作為整體之吸附力。為了以不產生凹凸之方式吸附厚度為數十μm左右之片狀基板,必須以高密度加工多個孔徑非常小之空氣吸引孔,但該加工存在極限。 Therefore, it is necessary to adsorb the substrate with an appropriate adsorption force, and to prevent the occurrence of irregularities on the surface of the substrate as much as possible. The appropriate adsorption force varies depending on the material or thickness of the substrate to be processed. Specifically, for example, the more the substrate is soft and the thickness is thinner, the more the adsorption force must be weakened. In order to achieve proper adsorption, it is necessary to make the air suction holes small in diameter and weaken the respective adsorption forces, and increase the number of holes to ensure the adsorption force as a whole. In order to adsorb a sheet-like substrate having a thickness of about several tens of μm without causing unevenness, it is necessary to process a plurality of air suction holes having a very small aperture at a high density, but this processing has a limit.

因此,利用縱橫地具有無數個小孔之多孔質之陶瓷板而形成平台之基板載置部者,一直以來與上述金屬製之吸附平台一起使用(參照專利文獻1)。由於該多孔質陶瓷板之多孔質部分之孔徑十分小,因此一個孔之吸附力較弱而不會產生局部性之基板之凹陷,但為了對多孔質陶瓷板與基板抵接之整個面進行吸附,作為吸附基板整體之力較充分,且作為用於固定較薄之基板之吸附平台較為有效。 Therefore, a substrate mounting portion for forming a platform by using a porous ceramic plate having a plurality of small holes vertically and horizontally has been used together with the above-described metal adsorption platform (see Patent Document 1). Since the porous portion of the porous ceramic plate has a very small pore diameter, the adsorption force of one hole is weak and the local substrate is not depressed, but the entire surface of the porous ceramic plate abutting the substrate is adsorbed. The force for adsorbing the entire substrate is sufficient, and it is effective as an adsorption platform for fixing a thin substrate.

專利文獻1:日本特開2001-138095號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2001-138095

然而,由於陶瓷板之材質較脆,尤其是多孔質之陶瓷材料之 脆性較高,因此難以精密地加工如上述圖7所示之剖面倒T字形槽之複雜之槽、或用以供基準銷旋入之螺孔等。因此,本發明之目的在於:提供一種係使用多孔質之陶瓷板作為吸附平台之吸附面者,並且可進行用以於吸附面之一部分嵌入緩衝材料之剖面倒T字形槽等之複雜之加工的吸附平台之製造方法、及藉由該製造方法而獲得之吸附平台。 However, since the material of the ceramic plate is relatively brittle, especially the porous ceramic material Since the brittleness is high, it is difficult to precisely process the complicated groove of the inverted T-shaped groove as shown in Fig. 7 described above, or the screw hole for screwing the reference pin. Accordingly, it is an object of the present invention to provide a porous ceramic plate as an adsorption surface of an adsorption platform, and to perform complicated processing such as a cross-sectional inverted T-shaped groove in which a cushioning material is partially embedded in a suction surface. A method for producing an adsorption platform, and an adsorption platform obtained by the production method.

為了達成上述目的,於本發明中採取如下之技術手段。亦即,本發明之吸附平台之製造方法,該吸附平台係由多孔質陶瓷材料所形成且以上面作為基板載置面之上層板,接合於具有貫通上下之多個空氣吸引孔之中層板之上面,且藉由與所述空氣吸引孔連通之真空排氣手段進行減壓,而藉此用以吸附保持載置於所述基板載置面之基板;該吸附平台之製造方法係由如下步驟構成:於所述上層板之下面加工下槽成閉合曲線狀;使槽寬較該下槽之槽寬狹窄之貫通槽從上層板之上面貫通至下槽並將剖面為倒T字形之槽加工成所述閉合曲線狀,藉此將所述上層板分斷成成為吸附區域之中心構件與框構件;藉由非透氣性之塗布材料(例如,環氧樹脂)被覆所述框構件之內側面及中心構件之外側面;以及於將所述上層板之中心構件以嵌入於框構件之狀態載置於所述中層板之上面,並藉由安裝治具將中心構件定位於框構件之中心後,將上層板與中層板接合。 In order to achieve the above object, the following technical means are employed in the present invention. That is, in the manufacturing method of the adsorption platform of the present invention, the adsorption platform is formed of a porous ceramic material and is used as a laminate on the substrate mounting surface, and is bonded to a laminate having a plurality of air suction holes penetrating up and down. Above, and depressurizing by means of a vacuum exhausting means communicating with the air suction hole, thereby absorbing and holding the substrate placed on the substrate mounting surface; the manufacturing method of the adsorption platform is as follows The bottom groove is formed into a closed curve shape under the upper plate; the through groove having a groove width narrower than the groove width of the lower groove penetrates from the upper surface of the upper plate to the lower groove and the groove is cut into an inverted T-shaped groove. Forming the closed curve, thereby dividing the upper plate into a central member and a frame member that become an adsorption region; coating the inner side of the frame member with a non-breathable coating material (for example, epoxy resin) And a side surface of the center member; and placing the center member of the upper layer on the middle of the middle plate in a state of being embedded in the frame member, and positioning the center member to the frame member by installing the jig After the heart, the upper plate and the plies bonded.

根據本發明之分斷方法,於上層板之下面首先加工下槽,接著加工槽寬較該下槽之槽寬狹窄之貫通槽,藉此將上層板一次分離成框構件與中心構件,且將其再次組合並貼合於中層板之上面。藉此,例如即使是難以加工之較脆之多孔質陶瓷材料為素材,亦可精度良好地形成倒T字形槽。此外,於將上層板分離成框構件與中心構件時,可簡單地進行對框構件之內側面及中心構件之外側面之非透氣性塗布材料(例如,環氧樹脂)之塗布,因此可防止因來自倒T字形槽之洩漏而導致吸附力(吸引力)之下降。 According to the breaking method of the present invention, the lower groove is first processed under the upper plate, and then the through groove having a narrow groove width narrower than the groove of the lower groove is processed, thereby separating the upper plate into the frame member and the central member at a time, and It is combined again and attached to the top of the middle panel. Thereby, for example, even if the porous ceramic material which is difficult to process is a material, the inverted T-shaped groove can be formed with high precision. Further, when the upper layer is separated into the frame member and the center member, the inner side surface of the frame member and the non-air permeable coating material (for example, epoxy resin) on the outer side surface of the center member can be easily applied, thereby preventing The decrease in adsorption force (attraction) due to leakage from the inverted T-shaped groove.

於本發明之製造方法中,較佳為成為包含如下步驟之構成:於藉由接著劑(例如,環氧樹脂)將所述上層板與中層板接合後,從所述中層板之空氣吸引孔之下方,將面向該空氣吸引孔之上層板與中層板之接著層切削去除。藉此,可避免由接著層導致之吸引之下降。 In the manufacturing method of the present invention, it is preferable to comprise a step of: after the upper layer and the intermediate layer are joined by an adhesive (for example, an epoxy resin), the air suction hole from the middle layer Below it, the adhesive layer facing the upper layer of the air suction hole and the intermediate layer is cut and removed. Thereby, the drop in attraction caused by the subsequent layer can be avoided.

於本發明之製造方法中,較佳為:對呈同軸狀地設置於所述上層板及中層板之基準銷插通孔進行加工,且將該中層板之插通孔之直徑形成為大於上層板之插通孔,並於所述中層板之插通孔填充合成樹脂之填充材料,且於將所述上層板接合於所述中層板後,於所述填充材料加工基準銷用之銷孔。藉此,即使中層板係由難以進行較小之螺紋加工之陶瓷材料所形成,亦可吻合上層板之基準銷插通孔之位置並準確地加工用以供基準銷插通之銷孔。 In the manufacturing method of the present invention, preferably, the reference pin insertion hole that is coaxially disposed on the upper plate and the intermediate plate is processed, and the diameter of the insertion hole of the intermediate plate is formed to be larger than the upper layer. Inserting a through hole into the plate, filling the insert hole of the middle plate with a filling material of the synthetic resin, and after joining the upper plate to the middle plate, processing the pin hole for the reference pin in the filling material . Thereby, even if the intermediate plate is formed of a ceramic material which is difficult to perform small threading, the position of the reference pin insertion hole of the upper plate can be matched and the pin hole for inserting the reference pin can be accurately processed.

此外,本發明之吸附平台,係由如下構件構成:上層板,係由多孔質之陶瓷材料形成,且以上面作為基板載置面;中層板,係接合於所述上層板之下面,且具有貫通上下之多個空氣吸引孔;框狀之下層板,係接合於所述中層板之下面,且以不堵塞所述空氣吸引孔之下端側之開口之方式於中央部分形成中空空間;以及底板,係安裝於所述下層板之下面;所述上層板,係由藉由貫通上下、剖面為倒T字形且俯視時為閉合曲線狀之槽而分斷成之框構件、與中心構件所形成,並接合於所述中層板之上面,藉由所述槽而隔開之框構件之內側面及中心構件之外側面係由非透氣性之塗布材料被覆,且所述下層板之中空空間與外部之吸引空氣源(真空排氣手段)連通。本發明之吸附平台,係以將下層板設置於加工裝置之底板上之狀態而使用。藉此,可提供如下之吸附平台:即使上層板為多孔質陶瓷,亦可於上層板之基板載置面加工精度良好地形成剖面為倒T字形且形成閉合曲線之槽,並且防止因來自倒T字形槽之洩漏而導致吸引力之下降。 In addition, the adsorption platform of the present invention is composed of an upper layer plate formed of a porous ceramic material and having a top surface as a substrate mounting surface, and a middle layer plate bonded to the lower surface of the upper layer plate and having a plurality of air suction holes penetrating up and down; a frame-shaped lower layer plate is joined to the lower surface of the middle layer plate, and a hollow space is formed at a central portion so as not to block an opening at a lower end side of the air suction hole; and a bottom plate And being attached to the lower surface of the lower layer; the upper layer is formed by a frame member that is separated by a groove that passes through the upper and lower sides, has an inverted T-shaped cross section, and is closed in a plan view, and is formed by the central member. And being bonded to the upper surface of the middle plate, the inner side surface of the frame member separated by the groove and the outer side surface of the center member are covered by a non-breathable coating material, and the hollow space of the lower layer plate is The external suction air source (vacuum exhaust means) is connected. The adsorption platform of the present invention is used in a state in which the lower layer is placed on the bottom plate of the processing apparatus. Thereby, the following adsorption platform can be provided: even if the upper layer is a porous ceramic, the substrate mounting surface of the upper layer can be formed with a groove having an inverted T-shaped cross section and forming a closed curve, and can be prevented from coming from the bottom. Leakage of the T-shaped groove results in a decrease in attractive force.

W‧‧‧基板 W‧‧‧Substrate

A‧‧‧吸附平台 A‧‧‧Adsorption platform

M‧‧‧填充材料 M‧‧‧Filling materials

1‧‧‧上層板 1‧‧‧Upper board

1a‧‧‧基板載置面 1a‧‧‧Substrate mounting surface

1b‧‧‧倒T字形槽 1b‧‧‧ inverted T-shaped groove

1c‧‧‧框構件 1c‧‧‧frame components

1d‧‧‧中心構件 1d‧‧‧central components

1e‧‧‧基準銷插通孔 1e‧‧‧reference pin insertion hole

2‧‧‧中層板 2‧‧‧ mid-layer board

2a‧‧‧空氣吸引孔 2a‧‧‧Air suction hole

2b‧‧‧基準銷插通孔 2b‧‧‧reference pin insertion hole

2c‧‧‧銷孔 2c‧‧ ‧ pinhole

3‧‧‧下層板 3‧‧‧lower board

3a‧‧‧中空空間 3a‧‧‧ hollow space

4‧‧‧底板 4‧‧‧floor

4a‧‧‧空氣孔 4a‧‧‧Air holes

5‧‧‧連結螺栓 5‧‧‧Link bolt

6‧‧‧配管 6‧‧‧Pipe

7‧‧‧緩衝材料 7‧‧‧ cushioning material

8‧‧‧基準銷 8‧‧‧Related sales

8a‧‧‧筒構件 8a‧‧‧Cylinder components

9‧‧‧安裝治具 9‧‧‧Installation fixture

圖1:係表示本發明之吸附平台之使用時之狀態之剖面圖。 Figure 1 is a cross-sectional view showing the state of the adsorption platform of the present invention in use.

圖2:係表示將圖1之吸附平台之緩衝材料卸除後之狀態之立體圖。 Fig. 2 is a perspective view showing a state in which the cushioning material of the adsorption platform of Fig. 1 is removed.

圖3:係圖1之吸附平台之分解立體圖。 Figure 3 is an exploded perspective view of the adsorption platform of Figure 1.

圖4:係表示圖1之吸附平台之製造步驟之說明圖。 Figure 4 is an explanatory view showing the manufacturing steps of the adsorption platform of Figure 1.

圖5:係表示本發明之吸附平台之另一實施例之立體圖。 Figure 5 is a perspective view showing another embodiment of the adsorption platform of the present invention.

圖6:係表示習知之吸附平台之一例之剖面圖。 Figure 6 is a cross-sectional view showing an example of a conventional adsorption platform.

圖7:係表示習知之吸附平台之另一例之剖面圖。 Figure 7 is a cross-sectional view showing another example of a conventional adsorption platform.

以下,針對本發明之吸附平台之製造方法根據表示其實施形態之圖式進行詳細地說明。圖1係表示本發明之吸附平台之使用時之狀態之剖面圖,圖2係吸附平台之立體圖,圖3係吸附平台之分解立體圖,圖4係表示吸附平台之製造步驟之說明圖。 Hereinafter, the method for producing the adsorption platform of the present invention will be described in detail based on the drawings showing the embodiments thereof. 1 is a cross-sectional view showing a state in which the adsorption platform of the present invention is used, FIG. 2 is a perspective view of the adsorption platform, FIG. 3 is an exploded perspective view of the adsorption platform, and FIG. 4 is an explanatory view showing a manufacturing step of the adsorption platform.

吸附平台A,係藉由(例如,利用螺旋夾)組合上層板1、中層板2、及下層板3而構成。上層板1係由縱橫地具有無數個微細之小孔之多孔質之陶瓷材料所形成,且上面成為基板載置面1a。沿著上層板1之基板載置面1a之各端緣附近,並以描畫四邊形之軌跡(閉合曲線)之方式呈環狀形成有剖面為倒T字形之槽1b(以下,稱為倒T字形槽1b)。倒T字形槽1b貫通上下,藉此,將上層板1分斷成藉由倒T字形槽1b分斷而成之框構件1c、與成為實質上的吸附區域之中心構件1d,並藉由接著劑接合於中層板2之上面。該分斷而成之框構件1c之內側面1c'、以及中心構件1d之外側面1d',由非透氣性之塗布材料(例如,環氧樹脂)被覆(參照圖4)。藉此,防止於減壓時從倒T字形槽1b部分之洩漏(空氣之流入),而防止成為吸附區域之中心構件1d之吸附力減弱。此外,於上層板1中,立設有用於將應加工之基板W載置於基板載置面1a時之定位之基準銷8。該 基準銷8貫通上層板1之銷插通孔1e(參照圖4)並插入至中層板2之銷孔2c中。另外,基準銷8,如圖1(b)所示,係以將無頭全螺紋固定螺釘8c旋入筒構件8a之內螺紋8b,且使無頭全螺紋固定螺釘8c之前端抵接於銷孔2c之底之方式形成。且以如下方式形成:使螺絲起子等之旋動工具卡合在形成於該無頭全螺紋固定螺釘8c之上端之卡合部8d並旋動,藉此使無頭全螺紋固定螺釘8c上下移動而調整基準銷8之長度(從上層板1之突出量)。 The adsorption platform A is constructed by combining the upper plate 1, the intermediate plate 2, and the lower plate 3 (for example, by means of a screw clamp). The upper plate 1 is formed of a porous ceramic material having a plurality of minute small holes vertically and horizontally, and the upper surface thereof serves as a substrate mounting surface 1a. A groove 1b having an inverted T-shaped cross section is formed in a ring shape in the vicinity of each end edge of the substrate mounting surface 1a of the upper layer 1 in a manner of drawing a quadrilateral trajectory (closed curve) (hereinafter, referred to as an inverted T shape) Slot 1b). The inverted T-shaped groove 1b penetrates the upper and lower sides, whereby the upper plate 1 is divided into a frame member 1c which is divided by the inverted T-shaped groove 1b, and a center member 1d which becomes a substantially adsorption region, and is then The agent is bonded to the upper surface of the intermediate layer 2. The inner side surface 1c' of the divided frame member 1c and the outer side surface 1d' of the center member 1d are covered with a non-breathable coating material (for example, epoxy resin) (see Fig. 4). Thereby, leakage from the portion of the inverted T-shaped groove 1b (inflow of air) during decompression is prevented, and the adsorption force of the center member 1d which becomes the adsorption region is prevented from being weakened. Further, in the upper layer board 1, a reference pin 8 for positioning the substrate W to be processed on the substrate mounting surface 1a is provided. The The reference pin 8 passes through the pin insertion hole 1e (see FIG. 4) of the upper plate 1 and is inserted into the pin hole 2c of the intermediate plate 2. Further, as shown in Fig. 1(b), the reference pin 8 is screwed into the internal thread 8b of the tubular member 8a by the endless full-thread fixing screw 8c, and the front end of the headless full-thread fixing screw 8c is abutted against the pin. The bottom of the hole 2c is formed. It is formed by engaging a rotary tool such as a screwdriver or the like on the engaging portion 8d formed at the upper end of the endless full-thread fixing screw 8c, thereby rotating the headless full-thread fixing screw 8c up and down. The length of the reference pin 8 (the amount of protrusion from the upper panel 1) is adjusted.

中層板2係由無透氣性之無機質陶瓷材料所形成,且於面對由上層板1之中心構件1d所覆蓋之區域之位置,具備貫通上下之多個空氣吸引孔2a。 The intermediate plate 2 is formed of a non-gas permeable inorganic ceramic material, and has a plurality of air suction holes 2a penetrating up and down at a position facing a region covered by the center member 1d of the upper plate 1.

關於下層板3,亦由無透氣性之無機質陶瓷材料所形成,且藉由接著劑而接合於中層板2之下面。下層板3係形成為以不堵塞中層板2之空氣吸引孔2a之下端側之開口部之方式形成有將中央部分挖除而成之中空空間3a之四邊框狀之形狀。上述之上層板1、中層板2、下層板3,即使存在多孔質陶瓷材料或無機質陶瓷材料之差異,亦由於以同種之陶瓷材料形成,因此若利用接著劑將該等各層接合,則可接著性良好地且確實地接合,且由於各層之熱膨脹率相等,因此即使溫度產生變化亦可維持精度,並且可整體地輕量化地形成。 The lower layer 3 is also formed of a non-gas permeable inorganic ceramic material and joined to the underside of the intermediate layer 2 by an adhesive. The lower deck 3 is formed in a shape of a four-frame shape in which the hollow space 3a formed by excavating the central portion is formed so as not to block the opening on the lower end side of the air suction hole 2a of the intermediate layer 2. The above-mentioned upper layer 1, middle layer 2, and lower layer 3 are formed of the same kind of ceramic material even if there is a difference between the porous ceramic material or the inorganic ceramic material. Therefore, if the layers are joined by an adhesive, the layer can be followed by The bonding is good and sure, and since the thermal expansion coefficients of the respective layers are equal, the accuracy can be maintained even if the temperature changes, and the overall thickness can be formed.

底板4,係由鐵等金屬製素材所形成,於其上面承接相互接合之上層板1、中層板2及下層板3,且透過從上層板1貫通之連結螺栓5(參照圖2及圖3)以使各層與底板緊固之方式安裝。於底板4,設置有通往下層板3之中空空間3a之空氣孔4a,空氣孔4a透過配管6而與設置於外部之真空泵等之真空排氣裝置P連通。 The bottom plate 4 is formed of a metal material such as iron, and the upper plate 1, the intermediate plate 2, and the lower plate 3 are joined to each other, and the connecting bolt 5 penetrating from the upper plate 1 is passed through (see FIGS. 2 and 3). ) is installed in such a manner that the layers are fastened to the bottom plate. The bottom plate 4 is provided with an air hole 4a that leads to the hollow space 3a of the lower plate 3, and the air hole 4a communicates with the vacuum exhaust device P such as a vacuum pump provided outside through the pipe 6.

於基板W之加工時,如圖1、圖2所示,於上層板1之倒T字形槽1b,使於俯視時輪廓成四邊形之緩衝材料7,以其頂部略微露出之狀態嵌入。緩衝材料7之下端設置有膨大部7a,藉由將該膨大部7a強制性 地壓入至倒T字形槽1b,膨大部7a於倒T字形槽1b之寬幅之下槽1b'中膨脹而難以拔出緩衝材料7。所加工之基板W,係一邊將基板W之端緣抵接於立設在基板載置面1a之定位用基準銷8而進行定位,一邊載置於緩衝材料7之頂面。於此狀態下,一旦驅動真空排氣裝置P,則基板W一邊壓縮緩衝材料7一邊被吸引至平台之基板載置面1a,最終吸附整個面。藉此,即使於基板略微存在扭曲或變形,亦可遍及整個區域均等地密接保持。 In the processing of the substrate W, as shown in Figs. 1 and 2, the inverted T-shaped groove 1b of the upper layer 1 is placed in a state in which the buffer material 7 having a quadrangular shape in a plan view is embedded in a state where the top portion thereof is slightly exposed. The lower end of the cushioning material 7 is provided with an enlarged portion 7a, which is mandatory by the enlarged portion 7a The ground portion is pressed into the inverted T-shaped groove 1b, and the enlarged portion 7a is expanded in the groove 1b' below the width of the inverted T-shaped groove 1b, so that it is difficult to pull out the cushioning material 7. The substrate W to be processed is placed on the top surface of the cushioning material 7 while abutting the end edge of the substrate W against the positioning reference pin 8 standing on the substrate mounting surface 1a. In this state, when the vacuum exhaust device P is driven, the substrate W is attracted to the substrate mounting surface 1a of the stage while compressing the buffer material 7, and finally the entire surface is adsorbed. Thereby, even if the substrate is slightly distorted or deformed, it can be uniformly held and held throughout the entire area.

接著,針對上述吸附平台A之製造方法進行說明。首先,如圖4(a)、(b)所示,藉由NC(Numerical Control,數控)切削裝置等加工於上層板1之下面成為倒T字形槽1b之一部分之下槽1b'。接著,如圖4(c)所示,藉由噴水(water-jet)加工裝置以從上層板1之上面貫通至下槽1b'之方式加工槽寬較該下槽1b'之槽寬狹窄之貫通槽1b"。利用藉此所形成之倒T字形槽1b,如圖4(d)所示,將上層板1分斷成框構件1c、與成為吸附區域之中心構件1d。藉由非透氣性之塗布材料(例如,環氧樹脂),被覆該分斷而成之框構件1c之內側面1c'、以及中心構件1d之外側面1d'。此外,於該階段中,亦預先在上層板1之框構件1c加工基準銷插通用之貫通孔1e。 Next, a method of manufacturing the adsorption platform A will be described. First, as shown in Figs. 4(a) and 4(b), the lower surface of the upper layer 1 is processed by a NC (Numerical Control) cutting device or the like to form a groove 1b' below one of the inverted T-shaped grooves 1b. Next, as shown in FIG. 4(c), the groove width is narrower than the groove width of the lower groove 1b' so as to pass through from the upper surface of the upper plate 1 to the lower groove 1b' by a water-jet processing device. The through-groove 1b" is formed by the inverted T-shaped groove 1b formed thereby, and the upper layer 1 is divided into the frame member 1c and the center member 1d which becomes the adsorption region, as shown in Fig. 4 (d). a coating material (for example, an epoxy resin) covering the inner side surface 1c' of the divided frame member 1c and the outer side surface 1d' of the center member 1d. Further, in this stage, the upper layer is also preliminarily The frame member 1c of 1 is used to machine the through hole 1e into which the reference pin is inserted.

此外,於中層板2中,如圖4(e)所示,使貫通上下之多個空氣吸引孔2a與上層板1之基準銷插通孔1e成為同軸,並且加工較插通孔1e更大直徑之基準銷插通孔2b。於該中層板2之下面,如圖4(f)所示,藉由接著劑接合以不堵塞中層板2之空氣吸引孔2a之下端開口部之方式具有將中央部分挖除而成之中空空間3a之四邊框狀之下層板3。之後,於中層板2之基準銷插通孔2b填充樹脂M。 Further, in the intermediate plate 2, as shown in Fig. 4(e), the plurality of air suction holes 2a penetrating the upper and lower sides are coaxial with the reference pin insertion holes 1e of the upper plate 1, and are processed larger than the insertion holes 1e. The reference pin of the diameter is inserted into the through hole 2b. Below the intermediate plate 2, as shown in Fig. 4(f), the hollow space is formed by excavating the central portion so as not to block the opening of the lower end of the air suction hole 2a of the intermediate plate 2 by adhesive bonding. 3a of the fourth frame under the border plate 3. Thereafter, the resin pin M is filled in the reference pin insertion hole 2b of the intermediate plate 2.

接著,如圖4(g)所示,將上層板1之中心構件1d以配置於框構件1c之內部之狀態載置於中層板2之上面。而且(例如,以將於俯視時呈四邊框狀之安裝治具9插入至倒T字形槽1b之方式),將中心構件 1d定位於框構件1c之中心,並藉由接著劑將上層板1與中層板2接合。之後,從中層板2之空氣吸引孔2a之下方插入鑽孔器(drill),將面向空氣吸引孔2a之上層板1與中層板2之接著材料層切削去除而確保透氣性。接著,如圖4(h)所示,使用以於填充材料M中插入基準銷8之銷孔2c對準上層板1之基準銷插通孔1e之位置而進行加工。 Next, as shown in FIG. 4(g), the center member 1d of the upper plate 1 is placed on the upper surface of the intermediate plate 2 in a state of being disposed inside the frame member 1c. Further, (for example, a manner in which the mounting jig 9 having a four-frame shape in a plan view is inserted into the inverted T-shaped groove 1b) 1d is positioned at the center of the frame member 1c, and the upper layer 1 and the intermediate layer 2 are joined by an adhesive. Thereafter, a drill is inserted from below the air suction hole 2a of the intermediate layer 2, and the material layer facing the upper layer 1 and the intermediate layer 2 of the air suction hole 2a is cut and removed to ensure gas permeability. Next, as shown in FIG. 4(h), the processing is performed by aligning the pin hole 2c into which the reference pin 8 is inserted into the filling material M to the position of the reference pin insertion hole 1e of the upper layer 1.

於經過上述步驟而將上層板1、中層板2、下層板3接合後,使下層板3之下面以密接於具備空氣孔4a之底板4上之方式載置,且藉由連結螺栓5(參照圖2)將上層板1、中層板2、下層板3及底板4緊固。用以使該連結螺栓5插通之孔,亦可於各個構件之加工階段預先設置,但就精度等方面而言,較佳為於中下層貼合後一體地設置。 After the upper layer 1, the intermediate layer 2, and the lower layer 3 are joined by the above steps, the lower surface of the lower layer 3 is placed in close contact with the bottom plate 4 having the air holes 4a, and the bolts 5 are connected by reference (refer to 2) The upper plate 1, the intermediate plate 2, the lower plate 3, and the bottom plate 4 are fastened. The hole through which the connecting bolt 5 is inserted may be provided in advance in the processing stage of each member. However, in terms of accuracy and the like, it is preferable to integrally provide the intermediate layer and the lower layer.

如上所述,首先於上層板1之下面加工下槽1b',接著,加工槽寬較該下槽1b'之槽寬狹窄之貫通槽1b",藉此,將上層板1一次分離成框構件1c與中心構件1d,且將其再次組合並貼合於中層板2之上面,藉此,即使素材為多孔質陶瓷材料,亦可精度佳地形成複雜之倒T字形槽1b。此外,於將上層板1分離成框構件1c與中心構件1d時,可容易地將用以防止洩漏(空氣之流入)之塗布材料被覆於框構件1c之內側面1c'及中心構件1d之外側面1d'。 As described above, the lower groove 1b' is first processed under the upper plate 1, and then the through groove 1b" having a groove width narrower than that of the lower groove 1b' is processed, whereby the upper plate 1 is once separated into a frame member. 1c and the center member 1d, and reassembling and bonding them to the upper surface of the intermediate layer 2, whereby even if the material is a porous ceramic material, the complicated inverted T-shaped groove 1b can be formed with high precision. When the upper plate 1 is separated into the frame member 1c and the center member 1d, the coating material for preventing leakage (inflow of air) can be easily applied to the inner side surface 1c' of the frame member 1c and the outer side surface 1d' of the center member 1d.

另外,於上述實施例中,表示了僅形成有一個成為上層板1之實質性之吸引區域之俯視四邊形之中心構件1d及包圍其周邊之倒T字形槽1b的實施例,但亦可使該等形成2個以上之複數個,例如,如圖5所示,於同一平面上形成4個吸附區域。 Further, in the above embodiment, an embodiment in which only one central quadrangular member 1d which is a substantial suction region of the upper layer 1 and an inverted T-shaped groove 1b surrounding the periphery thereof are formed, but the embodiment may be A plurality of two or more are formed, for example, as shown in FIG. 5, four adsorption regions are formed on the same plane.

以上,針對本發明之代表性的實施例進行了說明,但本發明並不一定僅限定於上述之實施形態。例如,中層板2及下層板3亦可取代無機質陶瓷而由鐵等金屬材料形成。此外,雖然省略了圖示,但亦可省略下層板3,而於底板4形成導通中層板2之空氣吸引孔2a之中空空間(歧 管),並使該空間連接於真空排氣裝置P。此外,於本發明中,在達成其目的且不脫離申請專利範圍之範圍內可進行適當修正、變更。 Although the representative embodiments of the present invention have been described above, the present invention is not necessarily limited to the above embodiments. For example, the intermediate layer 2 and the lower layer 3 may be formed of a metal material such as iron instead of the inorganic ceramic. Further, although the illustration is omitted, the lower layer 3 may be omitted, and the hollow space of the air suction hole 2a that turns on the middle plate 2 may be formed in the bottom plate 4. Tube) and connect the space to the vacuum exhaust unit P. Further, in the present invention, appropriate modifications and changes can be made without departing from the scope of the invention.

本發明可利用於在對玻璃、矽、陶瓷(例如,LTCC)及化合物半導體等脆性材料基板進行加工時,吸附保持所述基板之吸附平台。 The present invention can be utilized for adsorbing and holding an adsorption platform of the substrate when processing a brittle material substrate such as glass, tantalum, ceramic (for example, LTCC) or a compound semiconductor.

1‧‧‧上層板 1‧‧‧Upper board

1a‧‧‧基板載置面 1a‧‧‧Substrate mounting surface

1b‧‧‧倒T字形槽 1b‧‧‧ inverted T-shaped groove

1b'‧‧‧下槽 1b'‧‧‧ trough

1b"‧‧‧貫通槽 1b"‧‧‧through slot

1c‧‧‧框構件 1c‧‧‧frame components

1c'‧‧‧框構件之內側面 1c'‧‧‧ inside the frame member

1d‧‧‧中心構件 1d‧‧‧central components

1d'‧‧‧中心構件之外側面 1d'‧‧‧ outside the center member

1e‧‧‧基準銷插通孔 1e‧‧‧reference pin insertion hole

2‧‧‧中層板 2‧‧‧ mid-layer board

2a‧‧‧空氣吸引孔 2a‧‧‧Air suction hole

2b‧‧‧基準銷插通孔 2b‧‧‧reference pin insertion hole

2c‧‧‧銷孔 2c‧‧ ‧ pinhole

3‧‧‧下層板 3‧‧‧lower board

3a‧‧‧中空空間 3a‧‧‧ hollow space

4‧‧‧底板 4‧‧‧floor

4a‧‧‧空氣孔 4a‧‧‧Air holes

6‧‧‧配管 6‧‧‧Pipe

7‧‧‧緩衝材料 7‧‧‧ cushioning material

7a‧‧‧膨大部 7a‧‧‧Expanded

8‧‧‧基準銷 8‧‧‧Related sales

9‧‧‧安裝治具 9‧‧‧Installation fixture

M‧‧‧填充材料 M‧‧‧Filling materials

P‧‧‧真空泵(真空排氣裝置) P‧‧‧vacuum pump (vacuum exhaust)

Claims (8)

一種吸附平台之製造方法,該吸附平台係由多孔質陶瓷材料形成且以上面作為基板載置面之上層板,接合於具有貫通上下之多個空氣吸引孔之中層板之上面,且藉由與所述空氣吸引孔連通之真空排氣手段進行減壓,而藉此用以吸附保持載置於所述基板載置面之基板,其特徵在於係由如下步驟構成:於所述上層板之下面加工下槽成閉合曲線狀;使槽寬較該下槽之槽寬狹窄之貫通槽從上層板之上面貫通至下槽並將剖面為倒T字形之槽加工成所述閉合曲線狀,藉此將所述上層板分斷成成為吸附區域之中心構件與框構件;藉由非透氣性之塗布材料被覆所述框構件之內側面及中心構件之外側面;以及將所述上層板之中心構件以嵌入於框構件之狀態載置於所述中層板之上面,並藉由安裝治具將中心構件定位於框構件之中心後,將上層板與中層板接合。 The invention relates to a method for manufacturing an adsorption platform, which is formed of a porous ceramic material and has a top layer as a substrate mounting surface, and is bonded to a top surface of a plurality of air suction holes which penetrate the upper and lower sides, and The vacuum exhausting means that communicates with the air suction hole is decompressed, thereby absorbing and holding the substrate placed on the substrate mounting surface, and is characterized by the following steps: under the upper layer The lower groove is formed into a closed curve shape; the through groove having a groove width narrower than the groove width of the lower groove penetrates from the upper surface of the upper plate to the lower groove, and the groove having the inverted T-shaped cross section is processed into the closed curve shape, thereby Separating the upper plate into a central member and a frame member that become an adsorption region; coating an inner side surface of the frame member and an outer side surface of the center member by a non-breathable coating material; and a central member of the upper plate The upper layer is joined to the middle layer plate by being placed on the upper surface of the middle plate in a state of being embedded in the frame member, and positioning the center member at the center of the frame member by the mounting jig. 如申請專利範圍第1項之吸附平台之製造方法,其中,包含如下步驟:於藉由接著劑將所述上層板與中層板接合後,從所述中層板之吸引孔之下方,將面向空氣吸引孔之上層板與中層板之接著層切削去除。 The manufacturing method of the adsorption platform of claim 1, wherein the method comprises the steps of: after joining the upper plate and the middle plate by an adhesive, facing the air from below the suction hole of the middle plate; The upper layer of the upper and lower layers of the suction hole are cut and removed. 如申請專利範圍第1或2項之吸附平台之製造方法,其中,包含如下步驟:於所述中層板之下面,接合在中央部分形成有用以對所述空氣吸引孔之下端開口之中空空間之框狀之下層板。 The manufacturing method of the adsorption platform according to claim 1 or 2, wherein the method comprises the steps of: forming a hollow space at the central portion for opening to the lower end of the air suction hole under the middle plate; Framed under the laminate. 如申請專利範圍第1或2項之吸附平台之製造方法,其中,以不具有透氣性之陶瓷材料形成所述中層板及下層板。 The method for producing an adsorption platform according to claim 1 or 2, wherein the intermediate layer and the lower layer are formed of a ceramic material having no gas permeability. 如申請專利範圍第3項之吸附平台之製造方法,其中,以不具有透氣性之陶瓷材料形成所述中層板及下層板。 The method for producing an adsorption platform according to the third aspect of the invention, wherein the intermediate layer and the lower layer are formed of a ceramic material having no gas permeability. 如申請專利範圍第4項之吸附平台之製造方法,其中,對呈同軸狀設置於所述上層板及中層板之基準銷插通孔進行加工;將所述中層板之插通孔之直徑形成為大於所述上層板之插通孔,並於所述中層板之插通孔填充合成樹脂之填充材料,且於將所述上層板接合於所述中層板後,於所述填充材料加工基準銷用之銷孔。 The manufacturing method of the adsorption platform of claim 4, wherein the reference pin insertion hole coaxially disposed on the upper plate and the middle plate is processed; and the diameter of the insertion hole of the middle plate is formed. a filler material larger than the insertion hole of the upper layer, and a filling material of the synthetic resin is filled in the insertion hole of the middle layer, and after the upper layer is joined to the middle layer, the filling material processing reference is Pin hole for pinning. 如申請專利範圍第5項之吸附平台之製造方法,其中,對呈同軸狀設置於所述上層板及中層板之基準銷插通孔進行加工;將所述中層板之插通孔之直徑形成為大於所述上層板之插通孔,並於所述中層板之插通孔填充合成樹脂之填充材料,且於將所述上層板接合於所述中層板後,於所述填充材料加工基準銷用之銷孔。 The manufacturing method of the adsorption platform of claim 5, wherein the reference pin insertion hole disposed coaxially on the upper plate and the middle plate is processed; and the diameter of the insertion hole of the middle plate is formed. a filler material larger than the insertion hole of the upper layer, and a filling material of the synthetic resin is filled in the insertion hole of the middle layer, and after the upper layer is joined to the middle layer, the filling material processing reference is Pin hole for pinning. 一種吸附平台,其特徵在於,係由如下構件構成:上層板,係由多孔質之陶瓷材料形成,且以上面作為基板載置面;中層板,係接合於所述上層板之下面,且具有貫通上下之多個空氣吸引孔;框狀之下層板,係接合於所述中層板之下面,且以不堵塞所述空氣吸引孔之下端側之開口之方式於中央部分形成中空空間;以及底板,係安裝於所述下層板之下面;所述上層板,係由藉由貫通上下、剖面為倒T字形且為基板加工時供 緩衝材料嵌入之俯視時為閉合曲線狀之槽而分斷成之框構件與中心構件所形成,並接合於所述中層板之上面,藉由所述槽而隔開之框構件之內側面及中心構件之外側面係由非透氣性之塗布材料被覆,且所述下層板之中空空間與真空排氣手段連通。 An adsorption platform comprising: an upper plate formed of a porous ceramic material and having an upper surface as a substrate mounting surface; and a middle plate joined to the lower surface of the upper plate and having a plurality of air suction holes penetrating up and down; a frame-shaped lower layer plate is joined to the lower surface of the middle layer plate, and a hollow space is formed at a central portion so as not to block an opening at a lower end side of the air suction hole; and a bottom plate Attached to the underside of the lower deck; the upper deck is provided by the upper and lower sides, the cross section is inverted T-shaped and is used for processing the substrate The buffer material is embedded in a plan view and is formed by closing the curved groove and forming the frame member and the center member, and is joined to the upper surface of the middle plate, and the inner side surface of the frame member separated by the groove and The outer side of the center member is covered by a non-breathable coating material, and the hollow space of the lower layer is in communication with the vacuum exhaust means.
TW102106381A 2012-07-31 2013-02-23 Adsorption platform manufacturing method and adsorption platform TWI586613B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012170131A JP5961064B2 (en) 2012-07-31 2012-07-31 Suction table manufacturing method and suction table

Publications (2)

Publication Number Publication Date
TW201404743A TW201404743A (en) 2014-02-01
TWI586613B true TWI586613B (en) 2017-06-11

Family

ID=50041072

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102106381A TWI586613B (en) 2012-07-31 2013-02-23 Adsorption platform manufacturing method and adsorption platform

Country Status (4)

Country Link
JP (1) JP5961064B2 (en)
KR (1) KR101891340B1 (en)
CN (1) CN103567912B (en)
TW (1) TWI586613B (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101570764B1 (en) * 2014-02-27 2015-11-20 주식회사 페코텍 Collet for boding semiconductor die
CN104843488B (en) * 2015-04-10 2017-12-29 京东方科技集团股份有限公司 A kind of output device and cutting splitting system
CN106181053B (en) * 2015-04-29 2019-03-12 宁波舜宇光电信息有限公司 Prevent from cutting pollution cuts localization tool and its dust outlet geometry and method
CN105072814B (en) * 2015-08-31 2018-04-03 广州超音速自动化科技股份有限公司 Abnormity material efficient absorption device
CN105397530B (en) * 2015-12-14 2017-12-15 中南林业科技大学 A kind of fixture for the processing of thin-walled framework series parts milling
CN106141536A (en) * 2016-07-29 2016-11-23 平湖市海特合金有限公司 Vacuum inhales copper sheet device
CN106711076A (en) * 2016-12-02 2017-05-24 北京中电科电子装备有限公司 Vacuum ceramic sucker for absorbing multiple chips
JP2019016700A (en) * 2017-07-07 2019-01-31 Towa株式会社 Holding member, method for manufacturing holding member, holding device, conveyance device, and device for manufacturing electronic component
CN108176929B (en) * 2017-12-16 2021-02-09 武汉吉事达科技股份有限公司 Method for manufacturing terrazzo material adsorption platform
CN110098143B (en) * 2018-01-31 2021-06-04 上海微电子装备(集团)股份有限公司 Chip adsorption device and chip bonding system
CN108637474A (en) * 2018-05-30 2018-10-12 武汉吉事达科技股份有限公司 A kind of absorption platform having absorption and blowing function concurrently and assembly production method
CN110113876B (en) * 2019-06-04 2021-01-22 中国电子科技集团公司第二十四研究所 Manufacturing method of clamp for loading circuit and clamp
CN110139487B (en) * 2019-06-04 2021-01-22 中国电子科技集团公司第二十四研究所 Clamp manufacturing method and clamp
CN110509205B (en) * 2019-08-21 2022-03-29 深圳中科飞测科技股份有限公司 Suction plate
CN110935596A (en) * 2019-12-31 2020-03-31 苏州威格尔纳米科技有限公司 Coating platform shifts sample piece mould and has coating unit of this mould
CN111132539A (en) * 2020-01-17 2020-05-08 安徽博微长安电子有限公司 Tool and method for nondestructive mounting of chip in gel box by manual dispensing chip mounter
KR102122785B1 (en) * 2020-03-27 2020-06-15 (주)연암테크 Jig for a fuel tank of satellite projectiles
CN111229551A (en) * 2020-04-01 2020-06-05 常州纳捷机电科技有限公司 Novel duplex position point gum machine
CN111515733B (en) * 2020-04-30 2021-11-09 中国航发哈尔滨东安发动机有限公司 Viscose clamping tool for machine tool
CN112757018A (en) * 2021-01-15 2021-05-07 中国工程物理研究院材料研究所 Thin-wall plane piece processing vacuum adsorption device based on Archimedes spiral
CN114473238A (en) * 2022-02-22 2022-05-13 上海航天电子通讯设备研究所 Clamping and positioning device applied to foil laser cutting
CN115213832A (en) * 2022-06-20 2022-10-21 江西正皓瑞森精密智能制造股份有限公司 A encapsulation anchor clamps for centre gripping pottery box body

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000021959A (en) * 1998-06-29 2000-01-21 Kyocera Corp Vacuum chuck disk
CN1750917A (en) * 2003-02-21 2006-03-22 三星钻石工业股份有限公司 Substrate-processing table and substrate processing device

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594045A (en) * 1982-06-30 1984-01-10 Fujitsu Ltd Vacuum attracting and fixing means
JPS60103651U (en) * 1983-12-19 1985-07-15 シチズン時計株式会社 vacuum suction table
US4828304A (en) * 1986-09-09 1989-05-09 Kabushiki Kaisha Yakult Honsha Vacuum adsorption hand
JPH06114664A (en) * 1992-10-09 1994-04-26 Nippondenso Co Ltd Vacuum suction table
JPH0641143U (en) * 1992-10-29 1994-05-31 株式会社エンヤシステム Spin chuck
JPH0839376A (en) * 1994-07-29 1996-02-13 Ckd Corp Adsorbing plate of vacuum chuck and manufacture of vacuum chuck and adsorbing plate
JPH11226833A (en) * 1998-02-13 1999-08-24 Ckd Corp Adsorptive plate for vacuum chuck and manufacture thereof
JP4046913B2 (en) 1999-11-09 2008-02-13 松下電器産業株式会社 Processing table and laser processing machine
DE20117390U1 (en) * 2001-10-24 2002-04-25 Wissner Rolf Device for clamping plates to be processed with negative pressure
JP3880977B2 (en) * 2003-03-27 2007-02-14 イビデン株式会社 Vacuum chuck
US8469342B2 (en) * 2007-07-23 2013-06-25 Creative Technology Corporation Substrate suction apparatus and method for manufacturing the same
TWI439351B (en) * 2008-09-29 2014-06-01 Nitto Denko Corp Adsorption tablets
CN201323704Y (en) * 2008-11-10 2009-10-07 苏州群策科技有限公司 Vacuum adsorption device
JP5388700B2 (en) * 2009-05-29 2014-01-15 京セラ株式会社 Vacuum suction member and method of manufacturing vacuum suction member

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000021959A (en) * 1998-06-29 2000-01-21 Kyocera Corp Vacuum chuck disk
CN1750917A (en) * 2003-02-21 2006-03-22 三星钻石工业股份有限公司 Substrate-processing table and substrate processing device

Also Published As

Publication number Publication date
CN103567912A (en) 2014-02-12
KR101891340B1 (en) 2018-08-23
JP2014028418A (en) 2014-02-13
JP5961064B2 (en) 2016-08-02
CN103567912B (en) 2017-04-26
KR20140016804A (en) 2014-02-10
TW201404743A (en) 2014-02-01

Similar Documents

Publication Publication Date Title
TWI586613B (en) Adsorption platform manufacturing method and adsorption platform
TWI409127B (en) Verfahren und vorrichtung zum trennen einer planplatte aus sproedbruechigem material in mehrere einzelplatten mittels laser
US7446020B2 (en) Wafer dividing method and dividing apparatus
US7888239B2 (en) Semiconductor device manufacturing method
JP7080551B2 (en) Processing method of work piece
JP2005252078A5 (en)
JP5092004B2 (en) Suction table
WO2004038779A1 (en) Expansion method and device
TWI485747B (en) Securing mechanism and method for wafer bonder
JP2009194064A (en) Apparatus and method for sticking adhesive film to substrate
JP5085452B2 (en) Tape expansion unit
JP2007095780A (en) Tool and method for manufacturing semiconductor device
TW201819086A (en) Substrate processing method
JP5985245B2 (en) Tip spacing maintenance device
JP2006047575A5 (en)
RU2323090C2 (en) Method of producing fiber-reinforced laminates
JP2005057158A (en) Method and device for expansion
JP2010147316A (en) Method and apparatus for expanding tape
US20050016678A1 (en) Method of manufacturing semiconductor device and manufacturing apparatus of semiconductor device
JP4865306B2 (en) Tape applicator
KR101940678B1 (en) Glass film lamination apparatus
JP2018006486A (en) Support separation device, and support separation method
JPH03293745A (en) Semiconductor chip aligning device
US20230068722A1 (en) Apparatus for manufacturing display processing mask and method of manufacturing display processing mask using the same
JP2019177615A (en) Lamination apparatus

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees