JP5959326B2 - 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置 - Google Patents

荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置 Download PDF

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Publication number
JP5959326B2
JP5959326B2 JP2012132103A JP2012132103A JP5959326B2 JP 5959326 B2 JP5959326 B2 JP 5959326B2 JP 2012132103 A JP2012132103 A JP 2012132103A JP 2012132103 A JP2012132103 A JP 2012132103A JP 5959326 B2 JP5959326 B2 JP 5959326B2
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Japan
Prior art keywords
electrodes
potential
electrode
housing
charged particle
Prior art date
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Expired - Fee Related
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JP2012132103A
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English (en)
Japanese (ja)
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JP2013257983A (ja
JP2013257983A5 (enExample
Inventor
大西　崇
崇 大西
渡辺　俊一
俊一 渡辺
実 金田
実 金田
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Publication date
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Priority to JP2012132103A priority Critical patent/JP5959326B2/ja
Priority to DE112013002551.5T priority patent/DE112013002551T5/de
Priority to CN201380030519.8A priority patent/CN104364878A/zh
Priority to PCT/JP2013/062896 priority patent/WO2013187155A1/ja
Priority to US14/406,909 priority patent/US9548182B2/en
Publication of JP2013257983A publication Critical patent/JP2013257983A/ja
Publication of JP2013257983A5 publication Critical patent/JP2013257983A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/067—Replacing parts of guns; Mutual adjustment of electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/485—Construction of the gun or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/248—Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
JP2012132103A 2012-06-11 2012-06-11 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置 Expired - Fee Related JP5959326B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012132103A JP5959326B2 (ja) 2012-06-11 2012-06-11 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置
DE112013002551.5T DE112013002551T5 (de) 2012-06-11 2013-05-08 Vorrichtung zur Erzeugung eines Strahls geladener Teilchen, mit einem Strahl geladener Teilchen arbeitende Vorrichtung, Vorrichtung zur Erzeugung einer Hochspannung und mit einem hohen Potential arbeitende Vorrichtung
CN201380030519.8A CN104364878A (zh) 2012-06-11 2013-05-08 带电粒子束产生装置、带电粒子束装置、高电压产生装置以及高电位装置
PCT/JP2013/062896 WO2013187155A1 (ja) 2012-06-11 2013-05-08 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置
US14/406,909 US9548182B2 (en) 2012-06-11 2013-05-08 Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012132103A JP5959326B2 (ja) 2012-06-11 2012-06-11 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置

Publications (3)

Publication Number Publication Date
JP2013257983A JP2013257983A (ja) 2013-12-26
JP2013257983A5 JP2013257983A5 (enExample) 2015-04-23
JP5959326B2 true JP5959326B2 (ja) 2016-08-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012132103A Expired - Fee Related JP5959326B2 (ja) 2012-06-11 2012-06-11 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置

Country Status (5)

Country Link
US (1) US9548182B2 (enExample)
JP (1) JP5959326B2 (enExample)
CN (1) CN104364878A (enExample)
DE (1) DE112013002551T5 (enExample)
WO (1) WO2013187155A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019003863A (ja) * 2017-06-16 2019-01-10 株式会社島津製作所 電子ビーム装置、ならびに、これを備えるｘ線発生装置および走査電子顕微鏡
JP7519442B2 (ja) * 2020-07-22 2024-07-19 株式会社日立ハイテク 直流高電圧源装置および荷電粒子ビーム装置
CN114867183A (zh) * 2022-06-02 2022-08-05 上海守真北电子科技有限公司 一种高功率加速系统
WO2024157394A1 (ja) * 2023-01-25 2024-08-02 キヤノンアネルバ株式会社 Ｘ線発生装置およびｘ線撮像装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484866A (en) * 1967-04-26 1969-12-16 Nippon Electron Optics Lab Direct current high voltage generator
JPS529971B2 (enExample) * 1973-07-02 1977-03-19
GB1503517A (en) * 1974-09-10 1978-03-15 Science Res Council Electrostatic accelerators
JPH0766772B2 (ja) * 1983-11-30 1995-07-19 株式会社日立製作所 多段加速方式電界放射形電子顕微鏡
JP2796305B2 (ja) * 1988-06-17 1998-09-10 株式会社日立製作所 電界放射電子銃
US5059859A (en) * 1989-04-14 1991-10-22 Hitachi, Ltd. Charged particle beam generating apparatus of multi-stage acceleration type
JP2898658B2 (ja) * 1989-08-28 1999-06-02 株式会社日立製作所 多段加速方式荷電粒子線加速装置
JP3091850B2 (ja) * 1990-06-20 2000-09-25 株式会社日立製作所 荷電粒子線装置
JPH0482150A (ja) * 1990-07-24 1992-03-16 Jeol Ltd 電子線発生装置
US5463268A (en) * 1994-05-23 1995-10-31 National Electrostatics Corp. Magnetically shielded high voltage electron accelerator
JPH1092363A (ja) * 1996-09-19 1998-04-10 Jeol Ltd 電子線用加速管
CN101630623B (zh) * 2003-05-09 2012-02-22 株式会社荏原制作所 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP4576437B2 (ja) * 2008-02-18 2010-11-10 株式会社日立ハイテクノロジーズ 荷電粒子加速装置
JP2009289505A (ja) * 2008-05-28 2009-12-10 Hitachi Ltd 電子線発生装置
JP5023199B2 (ja) * 2010-07-29 2012-09-12 株式会社日立ハイテクノロジーズ 荷電粒子線放射装置
US8558486B2 (en) * 2010-12-08 2013-10-15 Gtat Corporation D. c. Charged particle accelerator, a method of accelerating charged particles using d. c. voltages and a high voltage power supply apparatus for use therewith

Also Published As

Publication number Publication date
CN104364878A (zh) 2015-02-18
JP2013257983A (ja) 2013-12-26
US9548182B2 (en) 2017-01-17
WO2013187155A1 (ja) 2013-12-19
US20150179387A1 (en) 2015-06-25
DE112013002551T5 (de) 2015-02-05

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