CN104364878A - 带电粒子束产生装置、带电粒子束装置、高电压产生装置以及高电位装置 - Google Patents

带电粒子束产生装置、带电粒子束装置、高电压产生装置以及高电位装置 Download PDF

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Publication number
CN104364878A
CN104364878A CN201380030519.8A CN201380030519A CN104364878A CN 104364878 A CN104364878 A CN 104364878A CN 201380030519 A CN201380030519 A CN 201380030519A CN 104364878 A CN104364878 A CN 104364878A
Authority
CN
China
Prior art keywords
electrodes
electrode
potential
charged particle
generating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201380030519.8A
Other languages
English (en)
Chinese (zh)
Inventor
大西崇
渡边俊一
金田实
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of CN104364878A publication Critical patent/CN104364878A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/067Replacing parts of guns; Mutual adjustment of electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/022Details
    • H01J27/024Extraction optics, e.g. grids
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/485Construction of the gun or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/026Means for avoiding or neutralising unwanted electrical charges on tube components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/073Electron guns using field emission, photo emission, or secondary emission electron sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/24Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241High voltage power supply or regulation circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/248Components associated with high voltage supply
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16Vessels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/16Vessels; Containers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
CN201380030519.8A 2012-06-11 2013-05-08 带电粒子束产生装置、带电粒子束装置、高电压产生装置以及高电位装置 Pending CN104364878A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-132103 2012-06-11
JP2012132103A JP5959326B2 (ja) 2012-06-11 2012-06-11 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置
PCT/JP2013/062896 WO2013187155A1 (ja) 2012-06-11 2013-05-08 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置

Publications (1)

Publication Number Publication Date
CN104364878A true CN104364878A (zh) 2015-02-18

Family

ID=49757987

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380030519.8A Pending CN104364878A (zh) 2012-06-11 2013-05-08 带电粒子束产生装置、带电粒子束装置、高电压产生装置以及高电位装置

Country Status (5)

Country Link
US (1) US9548182B2 (enExample)
JP (1) JP5959326B2 (enExample)
CN (1) CN104364878A (enExample)
DE (1) DE112013002551T5 (enExample)
WO (1) WO2013187155A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114867183A (zh) * 2022-06-02 2022-08-05 上海守真北电子科技有限公司 一种高功率加速系统

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019003863A (ja) * 2017-06-16 2019-01-10 株式会社島津製作所 電子ビーム装置、ならびに、これを備えるx線発生装置および走査電子顕微鏡
JP7519442B2 (ja) * 2020-07-22 2024-07-19 株式会社日立ハイテク 直流高電圧源装置および荷電粒子ビーム装置
WO2024157394A1 (ja) * 2023-01-25 2024-08-02 キヤノンアネルバ株式会社 X線発生装置およびx線撮像装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5059859A (en) * 1989-04-14 1991-10-22 Hitachi, Ltd. Charged particle beam generating apparatus of multi-stage acceleration type
JPH0451439A (ja) * 1990-06-20 1992-02-19 Hitachi Ltd 荷電粒子線装置
JPH1092363A (ja) * 1996-09-19 1998-04-10 Jeol Ltd 電子線用加速管
CN1820346A (zh) * 2003-05-09 2006-08-16 株式会社荏原制作所 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法
US20090224701A1 (en) * 2008-02-18 2009-09-10 Hiroshi Morita Charged particle accelerator

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484866A (en) * 1967-04-26 1969-12-16 Nippon Electron Optics Lab Direct current high voltage generator
JPS529971B2 (enExample) * 1973-07-02 1977-03-19
GB1503517A (en) * 1974-09-10 1978-03-15 Science Res Council Electrostatic accelerators
JPH0766772B2 (ja) * 1983-11-30 1995-07-19 株式会社日立製作所 多段加速方式電界放射形電子顕微鏡
JP2796305B2 (ja) * 1988-06-17 1998-09-10 株式会社日立製作所 電界放射電子銃
JP2898658B2 (ja) * 1989-08-28 1999-06-02 株式会社日立製作所 多段加速方式荷電粒子線加速装置
JPH0482150A (ja) * 1990-07-24 1992-03-16 Jeol Ltd 電子線発生装置
US5463268A (en) * 1994-05-23 1995-10-31 National Electrostatics Corp. Magnetically shielded high voltage electron accelerator
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP2009289505A (ja) * 2008-05-28 2009-12-10 Hitachi Ltd 電子線発生装置
JP5023199B2 (ja) * 2010-07-29 2012-09-12 株式会社日立ハイテクノロジーズ 荷電粒子線放射装置
US8558486B2 (en) * 2010-12-08 2013-10-15 Gtat Corporation D. c. Charged particle accelerator, a method of accelerating charged particles using d. c. voltages and a high voltage power supply apparatus for use therewith

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5059859A (en) * 1989-04-14 1991-10-22 Hitachi, Ltd. Charged particle beam generating apparatus of multi-stage acceleration type
JPH0451439A (ja) * 1990-06-20 1992-02-19 Hitachi Ltd 荷電粒子線装置
JPH1092363A (ja) * 1996-09-19 1998-04-10 Jeol Ltd 電子線用加速管
CN1820346A (zh) * 2003-05-09 2006-08-16 株式会社荏原制作所 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法
US20090224701A1 (en) * 2008-02-18 2009-09-10 Hiroshi Morita Charged particle accelerator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114867183A (zh) * 2022-06-02 2022-08-05 上海守真北电子科技有限公司 一种高功率加速系统

Also Published As

Publication number Publication date
JP5959326B2 (ja) 2016-08-02
DE112013002551T5 (de) 2015-02-05
US20150179387A1 (en) 2015-06-25
US9548182B2 (en) 2017-01-17
WO2013187155A1 (ja) 2013-12-19
JP2013257983A (ja) 2013-12-26

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C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
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Application publication date: 20150218