JP5952784B2 - 表示装置および表示装置の製造方法 - Google Patents

表示装置および表示装置の製造方法 Download PDF

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Publication number
JP5952784B2
JP5952784B2 JP2013144015A JP2013144015A JP5952784B2 JP 5952784 B2 JP5952784 B2 JP 5952784B2 JP 2013144015 A JP2013144015 A JP 2013144015A JP 2013144015 A JP2013144015 A JP 2013144015A JP 5952784 B2 JP5952784 B2 JP 5952784B2
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JP
Japan
Prior art keywords
light
shielding layer
light shielding
display device
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013144015A
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English (en)
Japanese (ja)
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JP2015018048A5 (enExample
JP2015018048A (ja
Inventor
康 浅岡
康 浅岡
昇平 勝田
昇平 勝田
前田　強
強 前田
豪 鎌田
豪 鎌田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP2013144015A priority Critical patent/JP5952784B2/ja
Priority to PCT/JP2014/067513 priority patent/WO2015005176A1/ja
Priority to US14/902,606 priority patent/US10067272B2/en
Publication of JP2015018048A publication Critical patent/JP2015018048A/ja
Publication of JP2015018048A5 publication Critical patent/JP2015018048A5/ja
Application granted granted Critical
Publication of JP5952784B2 publication Critical patent/JP5952784B2/ja
Priority to US16/041,857 priority patent/US10288781B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0294—Diffusing elements; Afocal elements characterized by the use adapted to provide an additional optical effect, e.g. anti-reflection or filter
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0226—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0231—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having microprismatic or micropyramidal shape
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0257—Diffusing elements; Afocal elements characterised by the diffusing properties creating an anisotropic diffusion characteristic, i.e. distributing output differently in two perpendicular axes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
JP2013144015A 2013-07-09 2013-07-09 表示装置および表示装置の製造方法 Expired - Fee Related JP5952784B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013144015A JP5952784B2 (ja) 2013-07-09 2013-07-09 表示装置および表示装置の製造方法
PCT/JP2014/067513 WO2015005176A1 (ja) 2013-07-09 2014-07-01 表示装置、光拡散部材
US14/902,606 US10067272B2 (en) 2013-07-09 2014-07-01 Display device and light-diffusing member
US16/041,857 US10288781B2 (en) 2013-07-09 2018-07-23 Display device and light-diffusing member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013144015A JP5952784B2 (ja) 2013-07-09 2013-07-09 表示装置および表示装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016113293A Division JP2016197239A (ja) 2016-06-07 2016-06-07 表示装置、光拡散部材

Publications (3)

Publication Number Publication Date
JP2015018048A JP2015018048A (ja) 2015-01-29
JP2015018048A5 JP2015018048A5 (enExample) 2016-01-07
JP5952784B2 true JP5952784B2 (ja) 2016-07-13

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013144015A Expired - Fee Related JP5952784B2 (ja) 2013-07-09 2013-07-09 表示装置および表示装置の製造方法

Country Status (3)

Country Link
US (2) US10067272B2 (enExample)
JP (1) JP5952784B2 (enExample)
WO (1) WO2015005176A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5826676B2 (ja) * 2012-03-06 2015-12-02 株式会社ジャパンディスプレイ 表示装置
JP5952784B2 (ja) 2013-07-09 2016-07-13 シャープ株式会社 表示装置および表示装置の製造方法
CN104820309B (zh) * 2015-05-19 2018-04-17 京东方科技集团股份有限公司 一种光学组件及其制造方法、偏光片
CN105319776B (zh) * 2015-12-10 2018-09-14 武汉华星光电技术有限公司 光纤散射层制造方法、液晶显示面板及电子设备
JP2016197239A (ja) * 2016-06-07 2016-11-24 シャープ株式会社 表示装置、光拡散部材
JP7240619B2 (ja) * 2017-08-31 2023-03-16 大日本印刷株式会社 パネル付き表示装置、内外装部材、移動体及びパネル
JP2023081951A (ja) * 2017-08-31 2023-06-13 大日本印刷株式会社 パネル付き表示装置、内外装部材、移動体及びパネル
WO2019044847A1 (ja) * 2017-08-31 2019-03-07 大日本印刷株式会社 パネル付き表示装置、内外装部材、移動体及びパネル、加飾シート、加飾シート付き表示装置、パネル付き表示装置
JP2018036652A (ja) * 2017-09-19 2018-03-08 シャープ株式会社 表示装置
US10935832B2 (en) * 2018-01-08 2021-03-02 Au Optronics Corporation Optical film and display device having the same
TWI671546B (zh) * 2018-01-08 2019-09-11 友達光電股份有限公司 光學膜片及顯示模組

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000162595A (ja) * 1998-11-30 2000-06-16 Kyocera Corp 液晶表示装置
JP3815221B2 (ja) 2001-01-11 2006-08-30 セイコーエプソン株式会社 照明装置、表示装置、並びに電子機器
US6644832B2 (en) 2000-12-25 2003-11-11 Seiko Epson Corporation Illumination device and manufacturing method therefor, display device, and electronic instrument
JP5277931B2 (ja) 2008-12-16 2013-08-28 大日本印刷株式会社 光学シート、及び映像表示装置
WO2012086424A1 (ja) * 2010-12-24 2012-06-28 シャープ株式会社 光拡散部材およびその製造方法、表示装置
CN102778711B (zh) * 2011-05-13 2015-03-11 夏普株式会社 光扩散部件和显示装置
CN103907053B (zh) 2011-10-28 2017-05-03 夏普株式会社 液晶显示装置
JP5952784B2 (ja) 2013-07-09 2016-07-13 シャープ株式会社 表示装置および表示装置の製造方法

Also Published As

Publication number Publication date
US10288781B2 (en) 2019-05-14
WO2015005176A1 (ja) 2015-01-15
US10067272B2 (en) 2018-09-04
US20160202541A1 (en) 2016-07-14
JP2015018048A (ja) 2015-01-29
US20180348412A1 (en) 2018-12-06

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