JP5951451B2 - 光照射装置、顕微鏡装置及びレーザ加工装置 - Google Patents
光照射装置、顕微鏡装置及びレーザ加工装置 Download PDFInfo
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- JP5951451B2 JP5951451B2 JP2012248443A JP2012248443A JP5951451B2 JP 5951451 B2 JP5951451 B2 JP 5951451B2 JP 2012248443 A JP2012248443 A JP 2012248443A JP 2012248443 A JP2012248443 A JP 2012248443A JP 5951451 B2 JP5951451 B2 JP 5951451B2
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- Prior art keywords
- light
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- kinoform
- irradiation
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- 238000012545 processing Methods 0.000 title claims description 6
- 230000003287 optical effect Effects 0.000 claims description 107
- 230000002146 bilateral effect Effects 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000004364 calculation method Methods 0.000 description 19
- 230000004048 modification Effects 0.000 description 19
- 238000012986 modification Methods 0.000 description 19
- 238000003384 imaging method Methods 0.000 description 13
- 238000001514 detection method Methods 0.000 description 9
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- 238000010586 diagram Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 5
- 238000005286 illumination Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
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- 230000005684 electric field Effects 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0652—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
- G02B21/0056—Optical details of the image generation based on optical coherence, e.g. phase-contrast arrangements, interference arrangements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/14—Condensers affording illumination for phase-contrast observation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/12—Function characteristic spatial light modulator
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/18—Function characteristic adaptive optics, e.g. wavefront correction
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/50—Phase-only modulation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2294—Addressing the hologram to an active spatial light modulator
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
- G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2249—Holobject properties
- G03H2001/2252—Location of the holobject
- G03H2001/2255—Holobject out of Fourier or hologram planes
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Microscoopes, Condenser (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Laser Beam Processing (AREA)
- Crystallography & Structural Chemistry (AREA)
- Holo Graphy (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012248443A JP5951451B2 (ja) | 2012-11-12 | 2012-11-12 | 光照射装置、顕微鏡装置及びレーザ加工装置 |
US14/441,981 US9739992B2 (en) | 2012-11-12 | 2013-10-25 | Light irradiation device |
PCT/JP2013/078986 WO2014073397A1 (fr) | 2012-11-12 | 2013-10-25 | Dispositif d'irradiation lumineuse |
FIEP13853886.3T FI2919055T3 (fi) | 2012-11-12 | 2013-10-25 | Valosäteilytyslaite |
EP13853886.3A EP2919055B1 (fr) | 2012-11-12 | 2013-10-25 | Dispositif d'irradiation lumineuse |
KR1020157014545A KR102018412B1 (ko) | 2012-11-12 | 2013-10-25 | 광조사 장치 |
CN201380058988.0A CN104781718B (zh) | 2012-11-12 | 2013-10-25 | 光照射装置 |
US15/639,801 US10295812B2 (en) | 2012-11-12 | 2017-06-30 | Light irradiation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012248443A JP5951451B2 (ja) | 2012-11-12 | 2012-11-12 | 光照射装置、顕微鏡装置及びレーザ加工装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016114416A Division JP6259491B2 (ja) | 2016-06-08 | 2016-06-08 | 光照射装置、顕微鏡装置、レーザ加工装置、及び光照射方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014095863A JP2014095863A (ja) | 2014-05-22 |
JP2014095863A5 JP2014095863A5 (ja) | 2015-09-10 |
JP5951451B2 true JP5951451B2 (ja) | 2016-07-13 |
Family
ID=50684507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012248443A Active JP5951451B2 (ja) | 2012-11-12 | 2012-11-12 | 光照射装置、顕微鏡装置及びレーザ加工装置 |
Country Status (7)
Country | Link |
---|---|
US (2) | US9739992B2 (fr) |
EP (1) | EP2919055B1 (fr) |
JP (1) | JP5951451B2 (fr) |
KR (1) | KR102018412B1 (fr) |
CN (1) | CN104781718B (fr) |
FI (1) | FI2919055T3 (fr) |
WO (1) | WO2014073397A1 (fr) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5951451B2 (ja) | 2012-11-12 | 2016-07-13 | 浜松ホトニクス株式会社 | 光照射装置、顕微鏡装置及びレーザ加工装置 |
GB2529808B (en) * | 2014-08-26 | 2018-07-25 | M Solv Ltd | Apparatus and methods for performing laser ablation on a substrate |
JP6259491B2 (ja) * | 2016-06-08 | 2018-01-10 | 浜松ホトニクス株式会社 | 光照射装置、顕微鏡装置、レーザ加工装置、及び光照射方法 |
US11802965B2 (en) * | 2016-11-30 | 2023-10-31 | Blackmore Sensors & Analytics Llc | Method and system for doppler detection and doppler correction of optical chirped range detection |
JP6596527B2 (ja) | 2018-03-09 | 2019-10-23 | 浜松ホトニクス株式会社 | 空間光変調器、光変調装置、及び空間光変調器の駆動方法 |
EP3912156A1 (fr) * | 2019-01-18 | 2021-11-24 | Dolby Laboratories Licensing Corporation | Détermination de front d'onde d'atténuation pour une réduction de bruit |
CN110303244B (zh) * | 2019-07-25 | 2020-11-27 | 中国工程物理研究院激光聚变研究中心 | 一种快速制备表面周期结构方法 |
CN110543090B (zh) * | 2019-08-16 | 2022-01-28 | 北京钛极科技有限公司 | 一种光学加工系统及光学加工方法 |
JP7111678B2 (ja) * | 2019-09-30 | 2022-08-02 | 浜松ホトニクス株式会社 | 光変調装置、及び空間光変調器の駆動方法 |
DE102020123785A1 (de) | 2020-09-11 | 2022-03-17 | Trumpf Laser- Und Systemtechnik Gmbh | Verfahren zum Bearbeiten eines Materials |
JP7090135B2 (ja) * | 2020-10-23 | 2022-06-23 | 浜松ホトニクス株式会社 | レーザ装置 |
CN113608353A (zh) * | 2021-07-14 | 2021-11-05 | 上海大学 | 一种基于阵列光源的全息近眼显示系统及眼瞳箱扩展方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11326860A (ja) * | 1998-05-18 | 1999-11-26 | Olympus Optical Co Ltd | 波面変換素子及びそれを用いたレーザ走査装置 |
JP4597675B2 (ja) * | 2002-08-24 | 2010-12-15 | マスクレス・リソグラフィー・インコーポレーテッド | 連続直接書込み光リソグラフィ |
JP2004335639A (ja) * | 2003-05-06 | 2004-11-25 | Fuji Photo Film Co Ltd | 投影露光装置 |
JP4664031B2 (ja) * | 2004-08-31 | 2011-04-06 | 浜松ホトニクス株式会社 | 光パターン形成方法および装置、ならびに光ピンセット装置 |
US8125713B2 (en) * | 2006-06-19 | 2012-02-28 | Danmarks Tekniske Universitet | Light beam generation |
GB2448132B (en) * | 2007-03-30 | 2012-10-10 | Light Blue Optics Ltd | Optical Systems |
EP2193400B1 (fr) * | 2007-09-17 | 2014-12-10 | Danmarks Tekniske Universitet | Convertisseur de faisceau electromagnetique |
JP5180021B2 (ja) * | 2008-10-01 | 2013-04-10 | 浜松ホトニクス株式会社 | レーザ加工装置およびレーザ加工方法 |
JP5775265B2 (ja) * | 2009-08-03 | 2015-09-09 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体装置の製造方法 |
JP5951451B2 (ja) | 2012-11-12 | 2016-07-13 | 浜松ホトニクス株式会社 | 光照射装置、顕微鏡装置及びレーザ加工装置 |
-
2012
- 2012-11-12 JP JP2012248443A patent/JP5951451B2/ja active Active
-
2013
- 2013-10-25 CN CN201380058988.0A patent/CN104781718B/zh active Active
- 2013-10-25 KR KR1020157014545A patent/KR102018412B1/ko active IP Right Grant
- 2013-10-25 FI FIEP13853886.3T patent/FI2919055T3/fi active
- 2013-10-25 WO PCT/JP2013/078986 patent/WO2014073397A1/fr active Application Filing
- 2013-10-25 EP EP13853886.3A patent/EP2919055B1/fr active Active
- 2013-10-25 US US14/441,981 patent/US9739992B2/en active Active
-
2017
- 2017-06-30 US US15/639,801 patent/US10295812B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP2919055A4 (fr) | 2016-07-20 |
EP2919055B1 (fr) | 2023-11-01 |
JP2014095863A (ja) | 2014-05-22 |
FI2919055T3 (fi) | 2024-01-18 |
KR102018412B1 (ko) | 2019-09-04 |
KR20150085823A (ko) | 2015-07-24 |
WO2014073397A1 (fr) | 2014-05-15 |
CN104781718A (zh) | 2015-07-15 |
US20150316758A1 (en) | 2015-11-05 |
US20170307865A1 (en) | 2017-10-26 |
US9739992B2 (en) | 2017-08-22 |
EP2919055A1 (fr) | 2015-09-16 |
CN104781718B (zh) | 2017-12-22 |
US10295812B2 (en) | 2019-05-21 |
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