JP5951451B2 - 光照射装置、顕微鏡装置及びレーザ加工装置 - Google Patents

光照射装置、顕微鏡装置及びレーザ加工装置 Download PDF

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Publication number
JP5951451B2
JP5951451B2 JP2012248443A JP2012248443A JP5951451B2 JP 5951451 B2 JP5951451 B2 JP 5951451B2 JP 2012248443 A JP2012248443 A JP 2012248443A JP 2012248443 A JP2012248443 A JP 2012248443A JP 5951451 B2 JP5951451 B2 JP 5951451B2
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Prior art keywords
light
lens
kinoform
irradiation
optical system
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JP2012248443A
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English (en)
Japanese (ja)
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JP2014095863A (ja
JP2014095863A5 (ja
Inventor
優 瀧口
優 瀧口
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Hamamatsu Photonics KK
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Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Priority to JP2012248443A priority Critical patent/JP5951451B2/ja
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Priority to EP13853886.3A priority patent/EP2919055B1/fr
Priority to US14/441,981 priority patent/US9739992B2/en
Priority to PCT/JP2013/078986 priority patent/WO2014073397A1/fr
Priority to FIEP13853886.3T priority patent/FI2919055T3/fi
Priority to KR1020157014545A priority patent/KR102018412B1/ko
Priority to CN201380058988.0A priority patent/CN104781718B/zh
Publication of JP2014095863A publication Critical patent/JP2014095863A/ja
Publication of JP2014095863A5 publication Critical patent/JP2014095863A5/ja
Application granted granted Critical
Publication of JP5951451B2 publication Critical patent/JP5951451B2/ja
Priority to US15/639,801 priority patent/US10295812B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0652—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/0056—Optical details of the image generation based on optical coherence, e.g. phase-contrast arrangements, interference arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/14—Condensers affording illumination for phase-contrast observation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/18—Function characteristic adaptive optics, e.g. wavefront correction
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/50—Phase-only modulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2294—Addressing the hologram to an active spatial light modulator
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
    • G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G03H2001/2252—Location of the holobject
    • G03H2001/2255—Holobject out of Fourier or hologram planes

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Laser Beam Processing (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Holo Graphy (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
JP2012248443A 2012-11-12 2012-11-12 光照射装置、顕微鏡装置及びレーザ加工装置 Active JP5951451B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2012248443A JP5951451B2 (ja) 2012-11-12 2012-11-12 光照射装置、顕微鏡装置及びレーザ加工装置
US14/441,981 US9739992B2 (en) 2012-11-12 2013-10-25 Light irradiation device
PCT/JP2013/078986 WO2014073397A1 (fr) 2012-11-12 2013-10-25 Dispositif d'irradiation lumineuse
FIEP13853886.3T FI2919055T3 (fi) 2012-11-12 2013-10-25 Valosäteilytyslaite
EP13853886.3A EP2919055B1 (fr) 2012-11-12 2013-10-25 Dispositif d'irradiation lumineuse
KR1020157014545A KR102018412B1 (ko) 2012-11-12 2013-10-25 광조사 장치
CN201380058988.0A CN104781718B (zh) 2012-11-12 2013-10-25 光照射装置
US15/639,801 US10295812B2 (en) 2012-11-12 2017-06-30 Light irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012248443A JP5951451B2 (ja) 2012-11-12 2012-11-12 光照射装置、顕微鏡装置及びレーザ加工装置

Related Child Applications (1)

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JP2016114416A Division JP6259491B2 (ja) 2016-06-08 2016-06-08 光照射装置、顕微鏡装置、レーザ加工装置、及び光照射方法

Publications (3)

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JP2014095863A JP2014095863A (ja) 2014-05-22
JP2014095863A5 JP2014095863A5 (ja) 2015-09-10
JP5951451B2 true JP5951451B2 (ja) 2016-07-13

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Country Status (7)

Country Link
US (2) US9739992B2 (fr)
EP (1) EP2919055B1 (fr)
JP (1) JP5951451B2 (fr)
KR (1) KR102018412B1 (fr)
CN (1) CN104781718B (fr)
FI (1) FI2919055T3 (fr)
WO (1) WO2014073397A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5951451B2 (ja) 2012-11-12 2016-07-13 浜松ホトニクス株式会社 光照射装置、顕微鏡装置及びレーザ加工装置
GB2529808B (en) * 2014-08-26 2018-07-25 M Solv Ltd Apparatus and methods for performing laser ablation on a substrate
JP6259491B2 (ja) * 2016-06-08 2018-01-10 浜松ホトニクス株式会社 光照射装置、顕微鏡装置、レーザ加工装置、及び光照射方法
US11802965B2 (en) * 2016-11-30 2023-10-31 Blackmore Sensors & Analytics Llc Method and system for doppler detection and doppler correction of optical chirped range detection
JP6596527B2 (ja) 2018-03-09 2019-10-23 浜松ホトニクス株式会社 空間光変調器、光変調装置、及び空間光変調器の駆動方法
EP3912156A1 (fr) * 2019-01-18 2021-11-24 Dolby Laboratories Licensing Corporation Détermination de front d'onde d'atténuation pour une réduction de bruit
CN110303244B (zh) * 2019-07-25 2020-11-27 中国工程物理研究院激光聚变研究中心 一种快速制备表面周期结构方法
CN110543090B (zh) * 2019-08-16 2022-01-28 北京钛极科技有限公司 一种光学加工系统及光学加工方法
JP7111678B2 (ja) * 2019-09-30 2022-08-02 浜松ホトニクス株式会社 光変調装置、及び空間光変調器の駆動方法
DE102020123785A1 (de) 2020-09-11 2022-03-17 Trumpf Laser- Und Systemtechnik Gmbh Verfahren zum Bearbeiten eines Materials
JP7090135B2 (ja) * 2020-10-23 2022-06-23 浜松ホトニクス株式会社 レーザ装置
CN113608353A (zh) * 2021-07-14 2021-11-05 上海大学 一种基于阵列光源的全息近眼显示系统及眼瞳箱扩展方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11326860A (ja) * 1998-05-18 1999-11-26 Olympus Optical Co Ltd 波面変換素子及びそれを用いたレーザ走査装置
JP4597675B2 (ja) * 2002-08-24 2010-12-15 マスクレス・リソグラフィー・インコーポレーテッド 連続直接書込み光リソグラフィ
JP2004335639A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置
JP4664031B2 (ja) * 2004-08-31 2011-04-06 浜松ホトニクス株式会社 光パターン形成方法および装置、ならびに光ピンセット装置
US8125713B2 (en) * 2006-06-19 2012-02-28 Danmarks Tekniske Universitet Light beam generation
GB2448132B (en) * 2007-03-30 2012-10-10 Light Blue Optics Ltd Optical Systems
EP2193400B1 (fr) * 2007-09-17 2014-12-10 Danmarks Tekniske Universitet Convertisseur de faisceau electromagnetique
JP5180021B2 (ja) * 2008-10-01 2013-04-10 浜松ホトニクス株式会社 レーザ加工装置およびレーザ加工方法
JP5775265B2 (ja) * 2009-08-03 2015-09-09 浜松ホトニクス株式会社 レーザ加工方法及び半導体装置の製造方法
JP5951451B2 (ja) 2012-11-12 2016-07-13 浜松ホトニクス株式会社 光照射装置、顕微鏡装置及びレーザ加工装置

Also Published As

Publication number Publication date
EP2919055A4 (fr) 2016-07-20
EP2919055B1 (fr) 2023-11-01
JP2014095863A (ja) 2014-05-22
FI2919055T3 (fi) 2024-01-18
KR102018412B1 (ko) 2019-09-04
KR20150085823A (ko) 2015-07-24
WO2014073397A1 (fr) 2014-05-15
CN104781718A (zh) 2015-07-15
US20150316758A1 (en) 2015-11-05
US20170307865A1 (en) 2017-10-26
US9739992B2 (en) 2017-08-22
EP2919055A1 (fr) 2015-09-16
CN104781718B (zh) 2017-12-22
US10295812B2 (en) 2019-05-21

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