JP5949411B2 - 補正回路、駆動回路、発光装置、および電流パルス波形の補正方法 - Google Patents

補正回路、駆動回路、発光装置、および電流パルス波形の補正方法 Download PDF

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JP5949411B2
JP5949411B2 JP2012222460A JP2012222460A JP5949411B2 JP 5949411 B2 JP5949411 B2 JP 5949411B2 JP 2012222460 A JP2012222460 A JP 2012222460A JP 2012222460 A JP2012222460 A JP 2012222460A JP 5949411 B2 JP5949411 B2 JP 5949411B2
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pulse
time constant
peak value
current
waveform
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JP2014075492A (ja
JP2014075492A5 (enExample
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前田 修
修 前田
大尾 桂久
桂久 大尾
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Sony Corp
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Sony Corp
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Priority to CN201310446673.5A priority patent/CN103715602B/zh
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0428Electrical excitation ; Circuits therefor for applying pulses to the laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068Stabilisation of laser output parameters
    • H01S5/06804Stabilisation of laser output parameters by monitoring an external parameter, e.g. temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068Stabilisation of laser output parameters
    • H01S5/06808Stabilisation of laser output parameters by monitoring the electrical laser parameters, e.g. voltage or current
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068Stabilisation of laser output parameters
    • H01S5/06812Stabilisation of laser output parameters by monitoring or fixing the threshold current or other specific points of the L-I or V-I characteristics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0233Mounting configuration of laser chips
    • H01S5/02345Wire-bonding
    • HELECTRICITY
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    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/024Arrangements for thermal management
    • H01S5/02469Passive cooling, e.g. where heat is removed by the housing as a whole or by a heat pipe without any active cooling element like a TEC
    • HELECTRICITY
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    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0617Arrangements for controlling the laser output parameters, e.g. by operating on the active medium using memorised or pre-programmed laser characteristics
    • HELECTRICITY
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    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06226Modulation at ultra-high frequencies
    • HELECTRICITY
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    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • H01S5/18313Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation by oxidizing at least one of the DBR layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • H01S5/18391Aperiodic structuring to influence the near- or far-field distribution
    • HELECTRICITY
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    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • H01S5/18394Apertures, e.g. defined by the shape of the upper electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42Arrays of surface emitting lasers
    • H01S5/423Arrays of surface emitting lasers having a vertical cavity

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
JP2012222460A 2012-10-04 2012-10-04 補正回路、駆動回路、発光装置、および電流パルス波形の補正方法 Active JP5949411B2 (ja)

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JP2012222460A JP5949411B2 (ja) 2012-10-04 2012-10-04 補正回路、駆動回路、発光装置、および電流パルス波形の補正方法
US14/030,345 US9136670B2 (en) 2012-10-04 2013-09-18 Correction circuit, drive circuit, light emission unit, and method of correcting current pulse waveform
CN201310446673.5A CN103715602B (zh) 2012-10-04 2013-09-25 校正电路、驱动电路、发光单元和电流脉冲波形校正方法

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JP2012222460A JP5949411B2 (ja) 2012-10-04 2012-10-04 補正回路、駆動回路、発光装置、および電流パルス波形の補正方法

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JP2014075492A JP2014075492A (ja) 2014-04-24
JP2014075492A5 JP2014075492A5 (enExample) 2015-04-09
JP5949411B2 true JP5949411B2 (ja) 2016-07-06

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WO2016096647A1 (en) * 2014-12-19 2016-06-23 Koninklijke Philips N.V. Laser sensor module
JP6918014B2 (ja) * 2016-11-28 2021-08-11 ソニーセミコンダクタソリューションズ株式会社 駆動装置および発光装置
WO2020100572A1 (ja) * 2018-11-16 2020-05-22 ソニーセミコンダクタソリューションズ株式会社 面発光レーザの駆動方法および面発光レーザ装置
JP7739899B2 (ja) * 2021-09-27 2025-09-17 富士フイルムビジネスイノベーション株式会社 発光装置および検出装置
DE102021130538A1 (de) * 2021-11-22 2023-05-25 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Verfahren zur überwachung der übergangstemperatur und optoelektronische vorrichtung
CN114356131B (zh) * 2021-12-20 2024-06-04 深圳市汇顶科技股份有限公司 驱动电路及相关电子装置
WO2023198866A1 (en) * 2022-04-14 2023-10-19 Ams-Osram International Gmbh Transition temperature monitoring method and optoelectronic laser device

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JPS5378795A (en) * 1976-12-23 1978-07-12 Fujitsu Ltd Driver circuit of luminous element
JPS55137740A (en) * 1979-04-16 1980-10-27 Nippon Telegr & Teleph Corp <Ntt> Light analogue signal modulation system
JPS58225679A (ja) * 1982-06-23 1983-12-27 Nec Corp 半導体レ−ザ
JPH0821746B2 (ja) * 1986-12-08 1996-03-04 株式会社リコー 半導体レ−ザ駆動回路
JPH0330376A (ja) * 1989-06-27 1991-02-08 Sony Corp 発光ダイオード駆動回路
JP3293968B2 (ja) * 1993-08-24 2002-06-17 株式会社東芝 半導体レーザ装置
US7850083B2 (en) * 1999-12-24 2010-12-14 Jorge Sanchez-Olea Digital control system for an electro-optical device
DE10063707A1 (de) * 2000-12-20 2002-07-04 Heidelberger Druckmasch Ag Verfahren zur thermischen Stabilisierung einer Laserdiode in einem Recorder
US6807206B2 (en) * 2001-04-16 2004-10-19 The Furukawa Electric Co., Ltd. Semiconductor laser device and drive control method for a semiconductor laser device
JP3908971B2 (ja) * 2001-10-11 2007-04-25 浜松ホトニクス株式会社 発光素子駆動回路
JP2007158092A (ja) * 2005-12-06 2007-06-21 Sony Corp レーザ発光装置およびレーザ駆動方法
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JP2008306118A (ja) 2007-06-11 2008-12-18 Sony Corp 面発光型半導体レーザ
JP4341708B2 (ja) * 2007-08-13 2009-10-07 オムロン株式会社 半導体レーザ駆動装置、半導体レーザ駆動方法、光送信装置、光配線モジュール、および電子機器
JP5659476B2 (ja) * 2009-09-25 2015-01-28 ソニー株式会社 補正回路、駆動回路および発光装置
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JP5717402B2 (ja) * 2010-11-04 2015-05-13 キヤノン株式会社 画像形成装置
JP5791282B2 (ja) * 2011-01-20 2015-10-07 キヤノン株式会社 画像形成装置

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CN103715602A (zh) 2014-04-09
JP2014075492A (ja) 2014-04-24
US20140105234A1 (en) 2014-04-17
CN103715602B (zh) 2017-11-24
US9136670B2 (en) 2015-09-15

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