JP5915837B2 - 圧電素子の製造方法、液体噴射ヘッドの製造方法及び液体噴射装置の製造方法 - Google Patents
圧電素子の製造方法、液体噴射ヘッドの製造方法及び液体噴射装置の製造方法 Download PDFInfo
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- JP5915837B2 JP5915837B2 JP2011235471A JP2011235471A JP5915837B2 JP 5915837 B2 JP5915837 B2 JP 5915837B2 JP 2011235471 A JP2011235471 A JP 2011235471A JP 2011235471 A JP2011235471 A JP 2011235471A JP 5915837 B2 JP5915837 B2 JP 5915837B2
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- liquid ejecting
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 20
- 238000004544 sputter deposition Methods 0.000 claims description 18
- 238000007740 vapor deposition Methods 0.000 claims description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 39
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- 229910052797 bismuth Inorganic materials 0.000 description 12
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 10
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- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 9
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- 229910002113 barium titanate Inorganic materials 0.000 description 7
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 7
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
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- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 4
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- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical group [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
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- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 3
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- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
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- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- 238000000018 DNA microarray Methods 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
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- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- UTBYQPSPFXHANA-UHFFFAOYSA-N [K].[Na].[Li] Chemical compound [K].[Na].[Li] UTBYQPSPFXHANA-UHFFFAOYSA-N 0.000 description 1
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- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- SGLXWMAOOWXVAM-UHFFFAOYSA-L manganese(2+);octanoate Chemical compound [Mn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O SGLXWMAOOWXVAM-UHFFFAOYSA-L 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
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- 239000012495 reaction gas Substances 0.000 description 1
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- 229910052715 tantalum Inorganic materials 0.000 description 1
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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| Application Number | Priority Date | Filing Date | Title |
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| JP2011235471A JP5915837B2 (ja) | 2011-10-26 | 2011-10-26 | 圧電素子の製造方法、液体噴射ヘッドの製造方法及び液体噴射装置の製造方法 |
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| JP2011235471A JP5915837B2 (ja) | 2011-10-26 | 2011-10-26 | 圧電素子の製造方法、液体噴射ヘッドの製造方法及び液体噴射装置の製造方法 |
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| JP2013091272A JP2013091272A (ja) | 2013-05-16 |
| JP2013091272A5 JP2013091272A5 (enrdf_load_stackoverflow) | 2014-12-11 |
| JP5915837B2 true JP5915837B2 (ja) | 2016-05-11 |
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| JP2011235471A Active JP5915837B2 (ja) | 2011-10-26 | 2011-10-26 | 圧電素子の製造方法、液体噴射ヘッドの製造方法及び液体噴射装置の製造方法 |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9136460B2 (en) * | 2014-01-29 | 2015-09-15 | Canon Kabushiki Kaisha | Piezoelectric element, method for manufacturing piezoelectric element, and electronic apparatus |
| JP6379808B2 (ja) * | 2014-07-30 | 2018-08-29 | セイコーエプソン株式会社 | 圧電素子の製造方法、液体吐出ヘッドの製造方法、および液体吐出装置の製造方法 |
| US9776405B2 (en) | 2014-10-08 | 2017-10-03 | Rohm Co., Ltd. | Inkjet apparatus and manufacturing method of inkjet apparatus |
| US20230264474A1 (en) * | 2020-07-14 | 2023-08-24 | Rohm Co., Ltd. | Inkjet print head and manufacturing method therefor |
| JP2023044120A (ja) | 2021-09-17 | 2023-03-30 | キヤノン株式会社 | 流路部材および液体吐出ヘッド |
| JP2023079433A (ja) | 2021-11-29 | 2023-06-08 | キヤノン株式会社 | 液体吐出ヘッド |
| JP2023148382A (ja) | 2022-03-30 | 2023-10-13 | キヤノン株式会社 | 液体吐出ヘッド用基板および液体吐出ヘッド用基板の製造方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4497312B2 (ja) * | 2004-10-19 | 2010-07-07 | セイコーエプソン株式会社 | 強誘電体メモリの製造方法 |
| JP2009054785A (ja) * | 2007-08-27 | 2009-03-12 | Seiko Epson Corp | 圧電素子およびその製造方法、アクチュエータ、液体噴射ヘッド、並びに、強誘電体メモリ |
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