JP5911323B2 - ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム - Google Patents

ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム Download PDF

Info

Publication number
JP5911323B2
JP5911323B2 JP2012022976A JP2012022976A JP5911323B2 JP 5911323 B2 JP5911323 B2 JP 5911323B2 JP 2012022976 A JP2012022976 A JP 2012022976A JP 2012022976 A JP2012022976 A JP 2012022976A JP 5911323 B2 JP5911323 B2 JP 5911323B2
Authority
JP
Japan
Prior art keywords
target
radiation
diamond substrate
target structure
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012022976A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013160637A5 (fr
JP2013160637A (ja
Inventor
孝夫 小倉
孝夫 小倉
塚本　健夫
健夫 塚本
美樹 田村
美樹 田村
野村　一郎
一郎 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012022976A priority Critical patent/JP5911323B2/ja
Priority to PCT/JP2013/051683 priority patent/WO2013118593A1/fr
Publication of JP2013160637A publication Critical patent/JP2013160637A/ja
Publication of JP2013160637A5 publication Critical patent/JP2013160637A5/ja
Application granted granted Critical
Publication of JP5911323B2 publication Critical patent/JP5911323B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H01J35/186—Windows used as targets or X-ray converters

Landscapes

  • X-Ray Techniques (AREA)
  • Physical Vapour Deposition (AREA)
JP2012022976A 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム Active JP5911323B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012022976A JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム
PCT/JP2013/051683 WO2013118593A1 (fr) 2012-02-06 2013-01-21 Structure cible et générateur de rayonnement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012022976A JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム

Publications (3)

Publication Number Publication Date
JP2013160637A JP2013160637A (ja) 2013-08-19
JP2013160637A5 JP2013160637A5 (fr) 2015-03-19
JP5911323B2 true JP5911323B2 (ja) 2016-04-27

Family

ID=47846104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012022976A Active JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム

Country Status (2)

Country Link
JP (1) JP5911323B2 (fr)
WO (1) WO2013118593A1 (fr)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10416099B2 (en) 2013-09-19 2019-09-17 Sigray, Inc. Method of performing X-ray spectroscopy and X-ray absorption spectrometer system
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
FR3012663B1 (fr) * 2013-10-25 2015-12-04 Thales Sa Generateur de rayons x a capteur de flux integre
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
JP6335729B2 (ja) * 2013-12-06 2018-05-30 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるｘ線発生管
JP6594479B2 (ja) * 2013-12-06 2019-10-23 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるｘ線発生管
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
JP6381269B2 (ja) * 2014-04-21 2018-08-29 キヤノン株式会社 ターゲットおよび前記ターゲットを備えるｘ線発生管、ｘ線発生装置、ｘ線撮影システム
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
US10989822B2 (en) 2018-06-04 2021-04-27 Sigray, Inc. Wavelength dispersive x-ray spectrometer
WO2020023408A1 (fr) 2018-07-26 2020-01-30 Sigray, Inc. Source de réflexion de rayons x à haute luminosité
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
DE112019004433T5 (de) 2018-09-04 2021-05-20 Sigray, Inc. System und verfahren für röntgenstrahlfluoreszenz mit filterung
WO2020051221A2 (fr) 2018-09-07 2020-03-12 Sigray, Inc. Système et procédé d'analyse de rayons x sélectionnable en profondeur
WO2021011209A1 (fr) 2019-07-15 2021-01-21 Sigray, Inc. Source de rayons x avec anode tournante à pression atmosphérique
JP7097480B1 (ja) 2021-06-24 2022-07-07 浜松ホトニクス株式会社 Ｘ線管、ｘ線発生装置、及び窓部材の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997000756A2 (fr) * 1995-06-20 1997-01-09 Valentinas Snitka Procede et appareil de polissage de diamants
JP2000306533A (ja) * 1999-02-19 2000-11-02 Toshiba Corp 透過放射型ｘ線管およびその製造方法
DE19934987B4 (de) * 1999-07-26 2004-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Röntgenanode und ihre Verwendung
US20080075229A1 (en) * 2006-09-27 2008-03-27 Nanometrics Incorporated Generation of Monochromatic and Collimated X-Ray Beams
JP5645449B2 (ja) * 2010-04-14 2014-12-24 キヤノン株式会社 Ｘ線源及びｘ線撮影装置

Also Published As

Publication number Publication date
WO2013118593A1 (fr) 2013-08-15
JP2013160637A (ja) 2013-08-19

Similar Documents

Publication Publication Date Title
JP5911323B2 (ja) ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム
JP6207246B2 (ja) 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
JP5854707B2 (ja) 透過型ｘ線発生管及び透過型ｘ線発生装置
US20140112450A1 (en) X-ray emitting target and x-ray emitting device
EP2751827B1 (fr) Générateur de rayons x et appareil d'imagerie à rayons x
TWI307110B (en) Method and apparatus for controlling electron beam current
JP5670111B2 (ja) Ｘ線発生用ターゲット、ｘ線発生装置、及びｘ線発生用ターゲットの製造方法
JP5875297B2 (ja) 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム
JP5871529B2 (ja) 透過型ｘ線発生装置及びそれを用いたｘ線撮影装置
JP6061692B2 (ja) 放射線発生管及び放射線発生装置及びそれらを用いた放射線撮影装置
JP6140983B2 (ja) 透過型ターゲット、ｘ線発生ターゲット、ｘ線発生管、ｘ線ｘ線発生装置、並びに、ｘ線ｘ線撮影装置
US20210151273A1 (en) Multi-pixel x-ray source with tungsten-diamond transmission target
US9431206B2 (en) X-ray generation tube, X-ray generation device including the X-ray generation tube, and X-ray imaging system
WO2009021015A2 (fr) Faisceaux de rayons x très collimatés et temporairement variables
US9484178B2 (en) Target and X-ray generating tube including the same, X-ray generating apparatus, X-ray imaging system
JP2013051165A (ja) 透過型ｘ線発生装置
JP2014032903A (ja) 放射線放出ターゲット、放射線発生ユニット及び放射線撮影システム
JP2019519900A (ja) Ｘ線の生成に使用するためのカソードアセンブリ
US20140126701A1 (en) X-ray emitting target and x-ray emitting device
JP6153314B2 (ja) Ｘ線透過型ターゲット及びその製造方法
JP6381756B2 (ja) 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
JP2017139238A (ja) 透過型ターゲットおよび該透過型ターゲットの製造方法、ならびに、放射線発生管、並びに、該放射線発生管を備えた放射線発生装置、並びに、該放射線発生装置を備えた放射線撮影装置
JP2014203674A (ja) Ｘ線発生装置及びそれを用いたｘ線撮影装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150128

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150128

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151020

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151211

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160301

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160329

R151 Written notification of patent or utility model registration

Ref document number: 5911323

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151