JP5911323B2 - ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム - Google Patents

ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム Download PDF

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Publication number
JP5911323B2
JP5911323B2 JP2012022976A JP2012022976A JP5911323B2 JP 5911323 B2 JP5911323 B2 JP 5911323B2 JP 2012022976 A JP2012022976 A JP 2012022976A JP 2012022976 A JP2012022976 A JP 2012022976A JP 5911323 B2 JP5911323 B2 JP 5911323B2
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Prior art keywords
target
radiation
diamond substrate
target structure
layer
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English (en)
Japanese (ja)
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JP2013160637A5 (de
JP2013160637A (ja
Inventor
孝夫 小倉
孝夫 小倉
塚本　健夫
健夫 塚本
美樹 田村
美樹 田村
野村　一郎
一郎 野村
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012022976A priority Critical patent/JP5911323B2/ja
Priority to PCT/JP2013/051683 priority patent/WO2013118593A1/en
Publication of JP2013160637A publication Critical patent/JP2013160637A/ja
Publication of JP2013160637A5 publication Critical patent/JP2013160637A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H01J35/186—Windows used as targets or X-ray converters

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  • X-Ray Techniques (AREA)
  • Physical Vapour Deposition (AREA)
JP2012022976A 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム Active JP5911323B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012022976A JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム
PCT/JP2013/051683 WO2013118593A1 (en) 2012-02-06 2013-01-21 Target structure and radiation generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012022976A JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム

Publications (3)

Publication Number Publication Date
JP2013160637A JP2013160637A (ja) 2013-08-19
JP2013160637A5 JP2013160637A5 (de) 2015-03-19
JP5911323B2 true JP5911323B2 (ja) 2016-04-27

Family

ID=47846104

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JP2012022976A Active JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム

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JP (1) JP5911323B2 (de)
WO (1) WO2013118593A1 (de)

Families Citing this family (27)

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Publication number Priority date Publication date Assignee Title
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10416099B2 (en) 2013-09-19 2019-09-17 Sigray, Inc. Method of performing X-ray spectroscopy and X-ray absorption spectrometer system
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
FR3012663B1 (fr) 2013-10-25 2015-12-04 Thales Sa Generateur de rayons x a capteur de flux integre
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6594479B2 (ja) * 2013-12-06 2019-10-23 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるｘ線発生管
JP6335729B2 (ja) * 2013-12-06 2018-05-30 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるｘ線発生管
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
JP6381269B2 (ja) * 2014-04-21 2018-08-29 キヤノン株式会社 ターゲットおよび前記ターゲットを備えるｘ線発生管、ｘ線発生装置、ｘ線撮影システム
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
JP7117452B2 (ja) 2018-07-26 2022-08-12 シグレイ、インコーポレイテッド 高輝度反射型ｘ線源
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
WO2020051061A1 (en) 2018-09-04 2020-03-12 Sigray, Inc. System and method for x-ray fluorescence with filtering
DE112019004478T5 (de) 2018-09-07 2021-07-08 Sigray, Inc. System und verfahren zur röntgenanalyse mit wählbarer tiefe
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
JP7097480B1 (ja) 2021-06-24 2022-07-07 浜松ホトニクス株式会社 Ｘ線管、ｘ線発生装置、及び窓部材の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997000756A2 (en) * 1995-06-20 1997-01-09 Valentinas Snitka A diamond polishing method and apparatus
JP2000306533A (ja) * 1999-02-19 2000-11-02 Toshiba Corp 透過放射型ｘ線管およびその製造方法
DE19934987B4 (de) * 1999-07-26 2004-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Röntgenanode und ihre Verwendung
US20080075229A1 (en) * 2006-09-27 2008-03-27 Nanometrics Incorporated Generation of Monochromatic and Collimated X-Ray Beams
JP5645449B2 (ja) * 2010-04-14 2014-12-24 キヤノン株式会社 Ｘ線源及びｘ線撮影装置

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WO2013118593A1 (en) 2013-08-15
JP2013160637A (ja) 2013-08-19

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