JP5902694B2 - マイクロリソグラフィ投影露光装置のミラーのミラー温度測定及び／又は熱作動用の構成体 - Google Patents

マイクロリソグラフィ投影露光装置のミラーのミラー温度測定及び／又は熱作動用の構成体 Download PDF

Info

Publication number
JP5902694B2
JP5902694B2 JP2013530679A JP2013530679A JP5902694B2 JP 5902694 B2 JP5902694 B2 JP 5902694B2 JP 2013530679 A JP2013530679 A JP 2013530679A JP 2013530679 A JP2013530679 A JP 2013530679A JP 5902694 B2 JP5902694 B2 JP 5902694B2
Authority
JP
Japan
Prior art keywords
mirror
access passage
electromagnetic radiation
access
effective surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013530679A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013545272A5 (cg-RX-API-DMAC7.html
JP2013545272A (ja
Inventor
マルクス　ハウフ
ハウフ マルクス
ベール ノーマン
ベール ノーマン
ヴァルター ホルガー
ヴァルター ホルガー
ハルトイェズ ヨアヒム
ハルトイェズ ヨアヒム
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2013545272A publication Critical patent/JP2013545272A/ja
Publication of JP2013545272A5 publication Critical patent/JP2013545272A5/ja
Application granted granted Critical
Publication of JP5902694B2 publication Critical patent/JP5902694B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/07—Arrangements for adjusting the solid angle of collected radiation, e.g. adjusting or orienting field of view, tracking position or encoding angular position
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2013530679A 2010-09-28 2011-09-21 マイクロリソグラフィ投影露光装置のミラーのミラー温度測定及び／又は熱作動用の構成体 Expired - Fee Related JP5902694B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US38707510P 2010-09-28 2010-09-28
DE102010041500.6 2010-09-28
DE102010041500 2010-09-28
US61/387,075 2010-09-28
PCT/EP2011/066415 WO2012041744A1 (en) 2010-09-28 2011-09-21 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2013545272A JP2013545272A (ja) 2013-12-19
JP2013545272A5 JP2013545272A5 (cg-RX-API-DMAC7.html) 2014-11-06
JP5902694B2 true JP5902694B2 (ja) 2016-04-13

Family

ID=45804848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013530679A Expired - Fee Related JP5902694B2 (ja) 2010-09-28 2011-09-21 マイクロリソグラフィ投影露光装置のミラーのミラー温度測定及び／又は熱作動用の構成体

Country Status (4)

Country Link
US (1) US9207541B2 (cg-RX-API-DMAC7.html)
JP (1) JP5902694B2 (cg-RX-API-DMAC7.html)
DE (1) DE102011081259A1 (cg-RX-API-DMAC7.html)
WO (1) WO2012041744A1 (cg-RX-API-DMAC7.html)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010061950A1 (de) * 2010-11-25 2012-05-31 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System
JP6209518B2 (ja) * 2011-09-21 2017-10-04 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のミラーの熱作動用の構成体
US20140196131A1 (en) * 2013-01-07 2014-07-10 Salutron, Inc. User authentication based on a wrist vein pattern
DE102013204427A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102013206981A1 (de) 2013-04-18 2013-12-24 Carl Zeiss Smt Gmbh Facettenspiegel mit im Krümmungsradius einstellbaren Spiegel-Facetten und Verfahren hierzu
DE102014206765A1 (de) * 2014-04-08 2015-10-08 Carl Zeiss Smt Gmbh Spiegelanordnung, Projektionsobjektiv und EUV-Lithographieanlage
DE102014219770A1 (de) * 2014-09-30 2016-03-31 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung
DE102016225701A1 (de) 2016-12-21 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer EUV-Lithographieanlage
SG11201908803XA (en) 2017-04-11 2019-10-30 Asml Netherlands Bv Lithographic apparatus and cooling method
CN107390346A (zh) * 2017-09-19 2017-11-24 北京仿真中心 一种低辐射红外场镜装置
DE102018208653A1 (de) * 2018-05-30 2019-12-05 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System
DE102018212400A1 (de) * 2018-07-25 2020-01-30 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Bestimmen des Erwärmungszustandes eines optischen Elements in einem optischen System für die Mikrolithographie
US10613444B2 (en) * 2018-08-28 2020-04-07 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor apparatus and method of operating the same
DE102018218983A1 (de) 2018-11-07 2018-12-27 Carl Zeiss Smt Gmbh Baugruppe, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102019219289A1 (de) 2019-12-11 2021-06-17 Carl Zeiss Smt Gmbh Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System
DE102020203753A1 (de) * 2020-03-24 2021-09-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102020207750A1 (de) * 2020-06-23 2021-04-01 Carl Zeiss Smt Gmbh Baugruppe in einem optischen System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
EP4086702A1 (en) * 2021-05-03 2022-11-09 ASML Netherlands B.V. Temperature measurement of optical elements in an optical apparatus
DE102023205090A1 (de) * 2023-05-31 2024-12-05 Carl Zeiss Smt Gmbh Berührungslos messender Temperatursensor für einen Spiegel, Projektionsobjektiv und Verfahren zum Messen der Temperatur eines Spiegels

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2588970B1 (fr) 1985-10-23 1988-01-15 Reosc Miroir allege a face reflechissante non plane, notamment miroir de telescope
US5660472A (en) * 1994-12-19 1997-08-26 Applied Materials, Inc. Method and apparatus for measuring substrate temperatures
DE19827602A1 (de) 1998-06-20 1999-12-23 Zeiss Carl Fa Verfahren zur Korrektur nicht-rotationssymmetrischer Bildfehler
DE10220324A1 (de) 2002-04-29 2003-11-13 Zeiss Carl Smt Ag Projektionsverfahren mit Pupillenfilterung und Projektionsobjektiv hierfür
US6880942B2 (en) * 2002-06-20 2005-04-19 Nikon Corporation Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
US20050099611A1 (en) * 2002-06-20 2005-05-12 Nikon Corporation Minimizing thermal distortion effects on EUV mirror
US20040051984A1 (en) 2002-06-25 2004-03-18 Nikon Corporation Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments
JP2004029314A (ja) * 2002-06-25 2004-01-29 Nikon Corp 光学素子冷却装置、光学素子冷却方法及び露光装置
JP4333090B2 (ja) * 2002-07-03 2009-09-16 株式会社ニコン ミラー冷却装置及び露光装置
JP4018564B2 (ja) 2003-03-14 2007-12-05 キヤノン株式会社 光学系、及びそれを用いた露光装置、デバイスの製造方法
JP2004327529A (ja) 2003-04-22 2004-11-18 Canon Inc 露光装置
JP2004354655A (ja) 2003-05-29 2004-12-16 Dainippon Printing Co Ltd 露光用反射鏡及び基板の露光装置
JP2005024818A (ja) * 2003-07-01 2005-01-27 Nikon Corp 光学素子冷却装置及び露光装置
JP2005055553A (ja) 2003-08-08 2005-03-03 Nikon Corp ミラー、温度調整機構付きミラー及び露光装置
JP4262031B2 (ja) 2003-08-19 2009-05-13 キヤノン株式会社 露光装置及びデバイスの製造方法
JP2005083862A (ja) 2003-09-08 2005-03-31 Canon Inc 光学薄膜およびこれを用いたミラー
JP2005109158A (ja) * 2003-09-30 2005-04-21 Canon Inc 冷却装置及び方法、それを有する露光装置、デバイスの製造方法
JP2005140999A (ja) 2003-11-06 2005-06-02 Nikon Corp 光学系、光学系の調整方法、露光装置、および露光方法
JP4228883B2 (ja) * 2003-11-13 2009-02-25 パナソニック株式会社 誘導加熱調理器
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
DE10359102A1 (de) 2003-12-17 2005-07-21 Carl Zeiss Smt Ag Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
JP2008129099A (ja) 2006-11-17 2008-06-05 Funai Electric Co Ltd デフォーマブルミラー
JP5524067B2 (ja) 2007-10-09 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子の温度制御装置
WO2009152959A1 (en) 2008-06-17 2009-12-23 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element
US20100033704A1 (en) * 2008-08-11 2010-02-11 Masayuki Shiraishi Deformable mirror, mirror apparatus, and exposure apparatus
DE102009045193A1 (de) 2009-09-30 2011-04-14 Carl Zeiss Smt Gmbh Optische Anordnung in einem optischen System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102009045171A1 (de) 2009-09-30 2010-10-07 Carl Zeiss Smt Ag Vorrichtung zur wenigstens annähernd kontaktlosen bzw. mechanisch entkoppelten Kühlung eines thermisch belasteten Elements
JP5785419B2 (ja) 2010-04-07 2015-09-30 エーエスエムエル ネザーランズ ビー．ブイ． 光学要素を冷却する方法、リソグラフィ装置、およびデバイスを製造する方法

Also Published As

Publication number Publication date
US9207541B2 (en) 2015-12-08
DE102011081259A1 (de) 2012-03-29
WO2012041744A1 (en) 2012-04-05
US20130176544A1 (en) 2013-07-11
JP2013545272A (ja) 2013-12-19

Similar Documents

Publication Publication Date Title
JP5902694B2 (ja) マイクロリソグラフィ投影露光装置のミラーのミラー温度測定及び／又は熱作動用の構成体
JP6209518B2 (ja) マイクロリソグラフィ投影露光装置のミラーの熱作動用の構成体
JP6483626B2 (ja) 特にマイクロリソグラフィー投影露光装置内のミラーの熱作動用装置
JP6318200B2 (ja) 光学素子の温度制御装置
US20150168674A1 (en) Mirror arrangement for an euv projection exposure apparatus, method for operating the same, and euv projection exposure apparatus
JP6400183B2 (ja) 加熱放射に影響を及ぼすコーティングを有する光学素子及び光学装置
CN116324621A (zh) 光学系统与操作光学系统的方法
JP5732257B2 (ja) リソグラフィ装置、デバイス製造方法およびコンピュータ読取可能媒体
JP5530525B2 (ja) 光学システムの、特にマイクロリソグラフィ投影露光装置の光学構成体
CN117859100A (zh) 加热设备及用于加热光学元件的方法
CN102763016A (zh) 形状稳定的镜像模块及稳定反射元件的方法
US8647797B2 (en) Methos and device for keeping mask dimensions constant
CN112020674A (zh) 用于辐射束的反射光学元件
US20220260924A1 (en) Projection exposure apparatus for semiconductor lithography
TWI494706B (zh) 包含光學校正結構的半導體微影投射曝光裝置
JP4305003B2 (ja) Ｅｕｖ光学系及びｅｕｖ露光装置
KR102836063B1 (ko) 반도체 리소그래피용 투영 노광 장치
CN117377912A (zh) 光学设备中的光学元件的温度测量
JP5098306B2 (ja) 露光装置、デバイス製造方法、及び露光方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140919

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140919

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20150826

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150901

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20151127

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151222

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160301

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160310

R150 Certificate of patent or registration of utility model

Ref document number: 5902694

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees