JP5900823B2 - 液晶表示装置 - Google Patents
液晶表示装置 Download PDFInfo
- Publication number
- JP5900823B2 JP5900823B2 JP2013111356A JP2013111356A JP5900823B2 JP 5900823 B2 JP5900823 B2 JP 5900823B2 JP 2013111356 A JP2013111356 A JP 2013111356A JP 2013111356 A JP2013111356 A JP 2013111356A JP 5900823 B2 JP5900823 B2 JP 5900823B2
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- JP
- Japan
- Prior art keywords
- insulating film
- substrate
- film
- interlayer insulating
- organic interlayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 38
- 239000010408 film Substances 0.000 claims description 212
- 239000000758 substrate Substances 0.000 claims description 67
- 239000011229 interlayer Substances 0.000 claims description 66
- 239000010410 layer Substances 0.000 claims description 47
- 230000001681 protective effect Effects 0.000 claims description 43
- 239000003566 sealing material Substances 0.000 claims description 27
- 239000010409 thin film Substances 0.000 claims description 22
- 238000007789 sealing Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 description 40
- 238000005530 etching Methods 0.000 description 37
- 229910021417 amorphous silicon Inorganic materials 0.000 description 33
- 239000004065 semiconductor Substances 0.000 description 28
- 238000004519 manufacturing process Methods 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 18
- 238000000206 photolithography Methods 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 229910010272 inorganic material Inorganic materials 0.000 description 7
- 239000011147 inorganic material Substances 0.000 description 7
- 238000001312 dry etching Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 229910004205 SiNX Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
Description
2 TFT基板
3 カラーフィルタ基板
4 液晶層
5 画素部
6 G/D変換部
7 シール部
8 端子部
9 アモルファス・シリコン(a−Si)膜
10、33 ゲート絶縁膜
11 ソース電極
12、35 保護絶縁膜
13、13−1、13−2、36、36−1 有機層間絶縁膜
14、41 ドレイン配線
15、34 ゲート配線
16、42 共通電極
17 半導体接続層
18、37 シール材
21、31、51 ガラス基板
22、40 レジスト膜
23 n+a−Si膜
24 ソース配線
25、39 開口部
26 透明導電膜
32 ポリシリコン半導体層
38 無機層間絶縁膜
52 ブラックマトリクス(BM)
53 色画素
54 平坦化膜
55 配向膜
Claims (1)
- 逆スタガ構造を有する薄膜トランジスタが形成された画素部と前記画素部周辺に配置されたシール部を備えた第1の基板と、前記第1の基板に対向する第2の基板と、前記第1の基板と前記第2の基板との間に充填された液晶層とを有し、前記第1の基板と前記第2の基板が前記シール部に設けられたシール材により接着された液晶表示装置であって、
前記第1の基板は少なくともSiNx からなる保護絶縁膜及び有機層間絶縁膜と、前記シール部の外側に配置された端子部とを備え、
前記シール部は、前記薄膜トランジスタのゲート電極に接続されたゲート配線と、前記ゲート配線上に形成されたSiNx からなるゲート絶縁膜と、前記画素部の前記薄膜トランジスタのチャネル領域となる薄膜と同層に前記ゲート絶縁膜上に形成された薄膜と、前記保護絶縁膜と、前記有機層間絶縁膜とからなり、前記有機層間絶縁膜、前記保護絶縁膜及び前記薄膜の一部に前記ゲート絶縁膜が露出した開口部を有し、
前記シール部の前記シール材は、前記第1基板上において前記開口部を通して前記ゲート絶縁膜のみと接して配置され、
前記端子部には、前記保護絶縁膜及び前記有機層間絶縁膜が無いことを特徴とする液晶表示装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013111356A JP5900823B2 (ja) | 2013-05-27 | 2013-05-27 | 液晶表示装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013111356A JP5900823B2 (ja) | 2013-05-27 | 2013-05-27 | 液晶表示装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008077894A Division JP5505757B2 (ja) | 2008-03-25 | 2008-03-25 | 液晶表示装置の製造方法および液晶表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013190816A JP2013190816A (ja) | 2013-09-26 |
JP5900823B2 true JP5900823B2 (ja) | 2016-04-06 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013111356A Active JP5900823B2 (ja) | 2013-05-27 | 2013-05-27 | 液晶表示装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5900823B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102167133B1 (ko) * | 2013-12-18 | 2020-10-16 | 엘지디스플레이 주식회사 | 금속 필름을 이용한 면 봉지 방식의 유기발광 다이오드 표시장치 |
JP6454250B2 (ja) | 2015-09-18 | 2019-01-16 | 株式会社ジャパンディスプレイ | 半導体装置及びその製造方法 |
JP6695726B2 (ja) * | 2016-04-07 | 2020-05-20 | 株式会社ジャパンディスプレイ | 表示装置、表示装置の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3299869B2 (ja) * | 1995-09-27 | 2002-07-08 | シャープ株式会社 | 液晶表示装置とその製造方法 |
JP3512665B2 (ja) * | 1999-03-03 | 2004-03-31 | Nec液晶テクノロジー株式会社 | カラー液晶パネル及びその製造方法 |
JP3939140B2 (ja) * | 2001-12-03 | 2007-07-04 | 株式会社日立製作所 | 液晶表示装置 |
JP2007304452A (ja) * | 2006-05-15 | 2007-11-22 | Hitachi Displays Ltd | 液晶表示装置 |
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- 2013-05-27 JP JP2013111356A patent/JP5900823B2/ja active Active
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