JP5836203B2 - 光触媒材料による土壌汚染水の処理方法 - Google Patents
光触媒材料による土壌汚染水の処理方法 Download PDFInfo
- Publication number
- JP5836203B2 JP5836203B2 JP2012134856A JP2012134856A JP5836203B2 JP 5836203 B2 JP5836203 B2 JP 5836203B2 JP 2012134856 A JP2012134856 A JP 2012134856A JP 2012134856 A JP2012134856 A JP 2012134856A JP 5836203 B2 JP5836203 B2 JP 5836203B2
- Authority
- JP
- Japan
- Prior art keywords
- contaminated water
- soil contaminated
- titanium
- treatment
- volatile organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 122
- 239000002689 soil Substances 0.000 title claims description 120
- 238000000034 method Methods 0.000 title claims description 108
- 239000000463 material Substances 0.000 title claims description 102
- 230000001699 photocatalysis Effects 0.000 title claims description 75
- 238000011282 treatment Methods 0.000 title claims description 74
- 229910001385 heavy metal Inorganic materials 0.000 claims description 107
- 239000012855 volatile organic compound Substances 0.000 claims description 75
- 239000012071 phase Substances 0.000 claims description 53
- 239000010936 titanium Substances 0.000 claims description 52
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 50
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 47
- 229910052719 titanium Inorganic materials 0.000 claims description 47
- 239000011941 photocatalyst Substances 0.000 claims description 46
- 239000007791 liquid phase Substances 0.000 claims description 45
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 43
- 239000007788 liquid Substances 0.000 claims description 32
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 28
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 25
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 24
- 238000000926 separation method Methods 0.000 claims description 21
- 238000007254 oxidation reaction Methods 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 230000003647 oxidation Effects 0.000 claims description 18
- 238000007743 anodising Methods 0.000 claims description 17
- 238000002360 preparation method Methods 0.000 claims description 16
- 238000001179 sorption measurement Methods 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 11
- 230000009920 chelation Effects 0.000 claims description 8
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 7
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 239000007789 gas Substances 0.000 description 53
- 150000002500 ions Chemical class 0.000 description 17
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 14
- 239000003673 groundwater Substances 0.000 description 14
- 238000004880 explosion Methods 0.000 description 13
- 229910001873 dinitrogen Inorganic materials 0.000 description 12
- 239000008151 electrolyte solution Substances 0.000 description 12
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000000354 decomposition reaction Methods 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000010419 fine particle Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 150000007524 organic acids Chemical class 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 238000011109 contamination Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 239000011259 mixed solution Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 238000005121 nitriding Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 238000002048 anodisation reaction Methods 0.000 description 3
- 229910052785 arsenic Inorganic materials 0.000 description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052793 cadmium Inorganic materials 0.000 description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 3
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 239000002360 explosive Substances 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000013032 photocatalytic reaction Methods 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 238000006479 redox reaction Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- 238000007751 thermal spraying Methods 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical group ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000006557 surface reaction Methods 0.000 description 2
- -1 trichloroethylene, tetrachloroethylene, dichloropropane Chemical class 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910000883 Ti6Al4V Inorganic materials 0.000 description 1
- CUPCBVUMRUSXIU-UHFFFAOYSA-N [Fe].OOO Chemical compound [Fe].OOO CUPCBVUMRUSXIU-UHFFFAOYSA-N 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000010842 industrial wastewater Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910021519 iron(III) oxide-hydroxide Inorganic materials 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Physical Water Treatments (AREA)
- Removal Of Specific Substances (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Catalysts (AREA)
- Treating Waste Gases (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012134856A JP5836203B2 (ja) | 2012-06-14 | 2012-06-14 | 光触媒材料による土壌汚染水の処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012134856A JP5836203B2 (ja) | 2012-06-14 | 2012-06-14 | 光触媒材料による土壌汚染水の処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013255906A JP2013255906A (ja) | 2013-12-26 |
| JP2013255906A5 JP2013255906A5 (enExample) | 2015-04-23 |
| JP5836203B2 true JP5836203B2 (ja) | 2015-12-24 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012134856A Expired - Fee Related JP5836203B2 (ja) | 2012-06-14 | 2012-06-14 | 光触媒材料による土壌汚染水の処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5836203B2 (enExample) |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05329330A (ja) * | 1992-06-01 | 1993-12-14 | Kurita Water Ind Ltd | 揮発性有機ハロゲン化合物の処理方法 |
| JP3359667B2 (ja) * | 1992-10-12 | 2002-12-24 | 日本無機株式会社 | 液中重金属イオン除去用光触媒及び液中重金属イオン除去装置 |
| JP3214978B2 (ja) * | 1994-05-16 | 2001-10-02 | オルガノ株式会社 | 有機塩素化合物汚染地下水の浄化処理設備 |
| JP4006774B2 (ja) * | 1997-02-28 | 2007-11-14 | 株式会社エクォス・リサーチ | 空気浄化装置 |
| JPH1157392A (ja) * | 1997-08-15 | 1999-03-02 | Babcock Hitachi Kk | 排ガス処理方法および装置 |
| JP2000005562A (ja) * | 1998-06-19 | 2000-01-11 | Nec Environment Eng Ltd | 有機塩素化合物の処理方法 |
| JP3499782B2 (ja) * | 1999-10-26 | 2004-02-23 | 東京瓦斯株式会社 | 水中微量有機化合物の除去方法と装置 |
| JP2002096058A (ja) * | 2000-09-22 | 2002-04-02 | Sumitomo Metal Mining Co Ltd | 揮発性汚染物質の浄化処理装置 |
| JP4824185B2 (ja) * | 2001-03-21 | 2011-11-30 | Adeka総合設備株式会社 | トリクロロエタンの分解除去方法 |
| JP2003047952A (ja) * | 2001-08-07 | 2003-02-18 | Azuma Engineering:Kk | 地下水浄化装置及び地下水浄化方法 |
| JP2003181448A (ja) * | 2001-12-21 | 2003-07-02 | Fujita Corp | Voc汚染水の処理方法及び処理装置 |
| JP4447213B2 (ja) * | 2002-12-09 | 2010-04-07 | 富士通マイクロエレクトロニクス株式会社 | 流体浄化装置 |
| US20050109710A1 (en) * | 2003-11-26 | 2005-05-26 | Yukuaki Mitarai | Contamination purification system |
| JP3858058B2 (ja) * | 2004-02-27 | 2006-12-13 | 奈良県 | 陽極電解酸化処理によるアナターゼ型酸化チタン皮膜の製造方法 |
| JP4788220B2 (ja) * | 2005-07-29 | 2011-10-05 | 三菱マテリアル株式会社 | 排水処理システム |
| JP4823192B2 (ja) * | 2007-10-05 | 2011-11-24 | 太平洋セメント株式会社 | 排水処理方法 |
| JP2010069449A (ja) * | 2008-09-22 | 2010-04-02 | Nagaoka Univ Of Technology | 液中重金属イオン除去用光触媒 |
-
2012
- 2012-06-14 JP JP2012134856A patent/JP5836203B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013255906A (ja) | 2013-12-26 |
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