JP5823339B2 - フォトマスク用基板、フォトマスク及びパターン転写方法 - Google Patents
フォトマスク用基板、フォトマスク及びパターン転写方法 Download PDFInfo
- Publication number
- JP5823339B2 JP5823339B2 JP2012089394A JP2012089394A JP5823339B2 JP 5823339 B2 JP5823339 B2 JP 5823339B2 JP 2012089394 A JP2012089394 A JP 2012089394A JP 2012089394 A JP2012089394 A JP 2012089394A JP 5823339 B2 JP5823339 B2 JP 5823339B2
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- holding
- main surface
- sides
- points
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Liquid Crystal (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012089394A JP5823339B2 (ja) | 2011-04-12 | 2012-04-10 | フォトマスク用基板、フォトマスク及びパターン転写方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011088504 | 2011-04-12 | ||
JP2011088504 | 2011-04-12 | ||
JP2012089394A JP5823339B2 (ja) | 2011-04-12 | 2012-04-10 | フォトマスク用基板、フォトマスク及びパターン転写方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012230367A JP2012230367A (ja) | 2012-11-22 |
JP5823339B2 true JP5823339B2 (ja) | 2015-11-25 |
Family
ID=46992127
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012089394A Active JP5823339B2 (ja) | 2011-04-12 | 2012-04-10 | フォトマスク用基板、フォトマスク及びパターン転写方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5823339B2 (zh) |
KR (1) | KR101343292B1 (zh) |
CN (1) | CN102736398B (zh) |
TW (1) | TWI506354B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5937409B2 (ja) * | 2011-04-13 | 2016-06-22 | Hoya株式会社 | フォトマスク用基板、フォトマスク、フォトマスクの製造方法、及びパターン転写方法 |
JP6156017B2 (ja) * | 2013-09-26 | 2017-07-05 | 大日本印刷株式会社 | パターン位相差フィルムの製造方法、露光装置及びマスク |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3377006B2 (ja) * | 1992-02-28 | 2003-02-17 | Hoya株式会社 | フォトマスクブランクの検査方法、フォトマスクの製造方法、フォトマスクブランク及びフォトマスクブランク用ガラス基板 |
JP3627805B2 (ja) * | 2001-04-20 | 2005-03-09 | 信越化学工業株式会社 | フォトマスク用ガラス基板及びその製造方法 |
JP3572053B2 (ja) * | 2001-05-31 | 2004-09-29 | 株式会社東芝 | 露光マスクの製造方法、マスク基板情報生成方法、半導体装置の製造方法およびサーバー |
JP4314462B2 (ja) | 2003-07-25 | 2009-08-19 | 信越化学工業株式会社 | フォトマスクブランク用基板の製造方法 |
JP4488822B2 (ja) * | 2004-07-27 | 2010-06-23 | 株式会社東芝 | 露光用マスクの製造方法、露光装置、半導体装置の製造方法およびマスクブランクス製品 |
JP4803576B2 (ja) * | 2004-09-29 | 2011-10-26 | Hoya株式会社 | マスクブランク用基板、マスクブランク、露光用マスク、半導体デバイスの製造方法、及びマスクブランク用基板の製造方法 |
JP5153998B2 (ja) * | 2005-02-25 | 2013-02-27 | Hoya株式会社 | マスクブランク用透明基板の製造方法、マスクブランクの製造方法、露光用マスクの製造方法、及び半導体デバイスの製造方法 |
JP4362732B2 (ja) * | 2005-06-17 | 2009-11-11 | 信越化学工業株式会社 | フォトマスク用大型ガラス基板及びその製造方法、コンピュータ読み取り可能な記録媒体、並びにマザーガラスの露光方法 |
US7239376B2 (en) * | 2005-07-27 | 2007-07-03 | International Business Machines Corporation | Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices |
JP5222660B2 (ja) * | 2008-08-07 | 2013-06-26 | Hoya株式会社 | マスクブランク用基板の製造方法、マスクブランクの製造方法、フォトマスクの製造方法及び半導体デバイスの製造方法 |
JP5073835B2 (ja) * | 2008-11-26 | 2012-11-14 | Hoya株式会社 | マスクブランク用基板 |
-
2012
- 2012-04-10 JP JP2012089394A patent/JP5823339B2/ja active Active
- 2012-04-10 KR KR1020120037357A patent/KR101343292B1/ko active IP Right Grant
- 2012-04-11 CN CN201210105308.3A patent/CN102736398B/zh active Active
- 2012-04-11 TW TW101112853A patent/TWI506354B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR101343292B1 (ko) | 2013-12-18 |
KR20120116353A (ko) | 2012-10-22 |
JP2012230367A (ja) | 2012-11-22 |
CN102736398B (zh) | 2015-08-26 |
TWI506354B (zh) | 2015-11-01 |
TW201250377A (en) | 2012-12-16 |
CN102736398A (zh) | 2012-10-17 |
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