JP5814958B2 - テンプレート作製方法、テンプレート検査方法、及びテンプレート材料 - Google Patents
テンプレート作製方法、テンプレート検査方法、及びテンプレート材料 Download PDFInfo
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- JP5814958B2 JP5814958B2 JP2013032318A JP2013032318A JP5814958B2 JP 5814958 B2 JP5814958 B2 JP 5814958B2 JP 2013032318 A JP2013032318 A JP 2013032318A JP 2013032318 A JP2013032318 A JP 2013032318A JP 5814958 B2 JP5814958 B2 JP 5814958B2
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- template
- resin
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- pattern
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
- B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/18—Homopolymers or copolymers of nitriles
- C08L33/20—Homopolymers or copolymers of acrylonitrile
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L47/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Description
110 液状樹脂
120 コピーテンプレート
130 拡大コピーテンプレート
141、142 欠陥
143 拡大欠陥
Claims (8)
- 第1凹凸パターンを有する第1テンプレートに樹脂を塗布し、
前記樹脂を硬化し、
硬化した前記樹脂を前記第1テンプレートから剥離して前記第1凹凸パターンに対応する第2凹凸パターンを有する第2テンプレートを作製し、
前記第2テンプレートを拡大させ、
前記樹脂は、液状シリコン樹脂、第1熱可塑性樹脂、環状構造を含まない第2熱可塑性樹脂、及び発泡成分を有し、
前記第2テンプレートに対し加熱、加圧又は光照射を行い、前記第2テンプレート中において発泡を起こした状態で前記第2テンプレートを引き延ばすことで拡大させることを特徴とするテンプレート作製方法。 - 第1凹凸パターンを有する第1テンプレートに樹脂を塗布し、
前記樹脂を硬化し、
硬化した前記樹脂を前記第1テンプレートから剥離して前記第1凹凸パターンに対応する第2凹凸パターンを有する第2テンプレートを作製し、
前記第2テンプレートを拡大させるテンプレート作製方法。 - 前記樹脂は、液状シリコン樹脂、第1熱可塑性樹脂、及び環状構造を含まない第2熱可塑性樹脂を有することを特徴とする請求項2に記載のテンプレート作製方法。
- 前記第2テンプレートを加熱した状態で引き延ばすことで拡大させることを特徴とする請求項3に記載のテンプレート作製方法。
- 前記第2テンプレートに有機溶媒を吸収させた状態で引き延ばすことで拡大させることを特徴とする請求項3に記載のテンプレート作製方法。
- 前記樹脂は発泡成分をさらに有し、
前記第2テンプレートに対し加熱、加圧又は光照射を行い、前記第2テンプレート中において発泡を起こすことで、前記第2テンプレートを拡大させることを特徴とする請求項3に記載のテンプレート作製方法。 - 前記第2テンプレートに気体を注入し膨張させることで、前記第2テンプレートを拡大させることを特徴とする請求項3に記載のテンプレート作製方法。
- 請求項1乃至7のいずれかに記載の方法により拡大された前記第2凹凸パターンのサイズと、前記第1凹凸パターンのサイズとを比較して拡大率を求め、
拡大された前記第2テンプレートを検査して欠陥を検出し、
前記第2テンプレート上の前記欠陥の位置及び前記拡大率に基づいて、前記第1テンプレート上の欠陥の位置を算出することを特徴とするテンプレート検査方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013032318A JP5814958B2 (ja) | 2013-02-21 | 2013-02-21 | テンプレート作製方法、テンプレート検査方法、及びテンプレート材料 |
US14/013,769 US20140235739A1 (en) | 2013-02-21 | 2013-08-29 | Method for producing template, method for checking template, and template material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013032318A JP5814958B2 (ja) | 2013-02-21 | 2013-02-21 | テンプレート作製方法、テンプレート検査方法、及びテンプレート材料 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014162016A JP2014162016A (ja) | 2014-09-08 |
JP5814958B2 true JP5814958B2 (ja) | 2015-11-17 |
Family
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JP2013032318A Expired - Fee Related JP5814958B2 (ja) | 2013-02-21 | 2013-02-21 | テンプレート作製方法、テンプレート検査方法、及びテンプレート材料 |
Country Status (2)
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US (1) | US20140235739A1 (ja) |
JP (1) | JP5814958B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6497107B2 (ja) * | 2015-02-13 | 2019-04-10 | 大日本印刷株式会社 | ナノインプリントリソグラフィ用のテンプレートの検査方法、欠陥修正方法および製造方法 |
JP2017166919A (ja) | 2016-03-15 | 2017-09-21 | 東芝メモリ株式会社 | テンプレートの欠陥検査方法 |
EP3388216A1 (en) * | 2017-04-14 | 2018-10-17 | Valeo Iluminacion | Component with custom design for a lighting device and method for producing thereof |
Family Cites Families (13)
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GB792114A (en) * | 1955-07-18 | 1958-03-19 | Stichting Reactor Centrum | Improvements in or relating to nuclear reactors |
SE508968C2 (sv) * | 1996-12-19 | 1998-11-23 | Ericsson Telefon Ab L M | Förfarande för att göra elastiska kulor |
US8999492B2 (en) * | 2008-02-05 | 2015-04-07 | Micron Technology, Inc. | Method to produce nanometer-sized features with directed assembly of block copolymers |
US20100072671A1 (en) * | 2008-09-25 | 2010-03-25 | Molecular Imprints, Inc. | Nano-imprint lithography template fabrication and treatment |
JP4679620B2 (ja) * | 2008-09-25 | 2011-04-27 | 株式会社東芝 | テンプレート検査方法および欠陥検査装置 |
GB0818556D0 (en) * | 2008-10-09 | 2008-11-19 | Cambridge Entpr Ltd | Method of production of a holographic sensor |
CN101477304B (zh) * | 2008-11-04 | 2011-08-17 | 南京大学 | 在复杂形状表面复制高分辨率纳米结构的压印方法 |
US8053377B2 (en) * | 2009-10-01 | 2011-11-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Low stress photo-sensitive resin with sponge-like structure and devices manufactured employing same |
US9168679B2 (en) * | 2010-07-16 | 2015-10-27 | Northwestern University | Programmable soft lithography: solvent-assisted nanoscale embossing |
KR101730577B1 (ko) * | 2010-08-06 | 2017-04-26 | 소켄 케미칼 앤드 엔지니어링 캄파니, 리미티드 | 나노 임프린트용 수지제 몰드 |
KR101354742B1 (ko) * | 2011-06-30 | 2014-01-22 | 가부시끼가이샤 도시바 | 템플릿 기판 및 그 제조 방법 |
FR2977974B1 (fr) * | 2011-07-13 | 2014-03-07 | Soitec Silicon On Insulator | Procede de mesure de defauts dans un substrat de silicium |
JP5806692B2 (ja) * | 2013-02-21 | 2015-11-10 | 株式会社東芝 | リソグラフィ原版検査方法 |
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2013
- 2013-02-21 JP JP2013032318A patent/JP5814958B2/ja not_active Expired - Fee Related
- 2013-08-29 US US14/013,769 patent/US20140235739A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
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JP2014162016A (ja) | 2014-09-08 |
US20140235739A1 (en) | 2014-08-21 |
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