JP5756507B2 - Substrate support module - Google Patents

Description

  The present invention relates to a substrate support module, and more particularly to a substrate support module capable of preventing damage to a support table for carrying in and out a substrate and extending the life of the support table.

  2. Description of the Related Art Generally, an excimer laser annealing (ELA) apparatus for annealing a substrate is disposed inside a chamber, a substrate support module on which the substrate is placed and supported, and an outside of the chamber. And a laser beam generator for generating a laser beam, a transmission window disposed on one wall of the chamber, for example, an upper wall, for transmitting the laser beam, and outside the chamber and the laser beam generator And a reflection mirror provided between the transmission window and the transmission window. In addition, the substrate support module includes a stage on which the substrate is placed, a lift bar that is disposed so as to penetrate the stage in the up and down direction, and that lifts and lowers the lift bar. Here, the lift bar is generally made of metal.

  On the other hand, in order to carry the substrate onto the stage or carry out the substrate placed on the stage from the stage, the lift pins hold the substrate and move up or down. However, there is a problem that the lift bar damages the substrate while the plurality of metal lift bars are raised or lowered while supporting the substrate.

  Therefore, the entire lift bar was manufactured using a polymer resin. However, the lift bar made of a polymer resin had a problem of causing friction with the stage due to the phenomenon of bending when the substrate was raised and lowered. . For this reason, there has been the complication that the lift bar has to be replaced periodically.

  In general, the lift bar that supports the substrate is fixed so that it cannot move freely. For this reason, if the load or external force applied to the lift bar causes a left-right force or impact to be applied to the lift bar while the lift bar is raised or lowered for substrate loading, the force or impact is transmitted to the lift bar as it is, and the lift bar This causes a problem of bending.

  For example, Patent Document 1 below discloses a lift bar formed from a body that moves the upper head up and down through a susceptor. Here, the lift bar is fixed in a non-movable state. In this case, as described above, if a force or impact in the left-right direction is applied to the lift bar by a load or external force from the substrate, the force or impact is transmitted to the lift bar as it is, and the lift bar is bent. Occur.

Korean Published Patent No. 10-2004-0115542

  The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a substrate support module capable of preventing damage to a support base for carrying in and carrying out a substrate and extending the lifetime.

  Another object of the present invention is to provide a substrate support module that can support a support base freely.

  The substrate support module according to the present invention includes a stage on which a substrate is placed, and at least a part of the substrate support module that vertically penetrates the stage. First and second lower rotating members that are carried in and out of the stage, and are arranged so as to face each other with the support base sandwiched inside the stage, and rotate while supporting the support base And a first rotating mechanism and a second rotating mechanism that are arranged to oppose each other with a supporting table interposed between the lower rotating mechanism and the upper side of the lower rotating mechanism. A first upper rotation mechanism having a rotation member.

  Further, in the substrate support module according to the present invention, the support base includes a lower body made of metal and an upper body that is attached to an upper portion of the lower body and supports the substrate, and the upper body is made of a polymer material. Manufactured.

  Furthermore, the substrate support module according to the present invention is disposed in the stage so as to be opposed to each other with the support table interposed between the lower rotation mechanism and the first upper rotation mechanism. A second upper rotating mechanism having third and fourth upper rotating members that rotate while supporting.

  Furthermore, in the substrate support module according to the present invention, the first and second upper rotating members of the first upper rotating mechanism and the third and fourth rotating members of the second upper rotating mechanism are respectively It is smaller than the first and second lower rotating members of the lower rotating mechanism.

  Furthermore, in the substrate support module according to the present invention, the first and second lower rotating members of the lower rotating mechanism, the first and second upper rotating members of the first upper rotating mechanism, and the second upper rotating member. Each of the third and fourth rotating members of the rotating mechanism is a bearing.

  Furthermore, the substrate support module according to the present invention has one end connected to one of the first and second lower rotating members, and one of the first and second lower rotating members. A first idler mechanism is further provided that allows a gap to be generated and allows free movement.

  Furthermore, in the board support module according to the present invention, the first idler mechanism includes a spring having one end connected to one of the first and second lower rotating members.

  Furthermore, in the substrate support module according to the present invention, a first lower rotating member of the lower rotating mechanism, a first upper rotating member of the first upper rotating mechanism, and a third of the second upper rotating mechanism. The upper rotating member rotates in contact with one surface of the support base, the second lower rotating member of the lower rotating mechanism, the second upper rotating member of the first upper rotating mechanism, and the second The fourth upper rotating member of the upper rotating mechanism rotates in a state in contact with the other surface of the support base.

  Furthermore, the substrate support module according to the present invention further includes a second idler mechanism connected to the lower part of the supporter to support the supporter and allowing the supporter to move with a gap.

  Furthermore, in the substrate support module according to the present invention, the second idler mechanism includes a fixed block into which a lower part of the support base is fitted, and an idler member that is connected to the lower part of the fixed block and moves the fixed block. Prepare.

  Furthermore, in the substrate support module according to the present invention, the fixed block is opposed to the first block and the first block disposed so as to be in contact with one surface of the lower part of the support base, A second block disposed so as to be in contact with the other surface of the support; and the floating member is coupled to a lower portion of either the first block or the second block. .

  Furthermore, in the board support module according to the present invention, the floating member of the second floating mechanism is inserted into the lower portion of the fixed block, and is disposed so that at least a part protrudes below the fixed block. With a ball.

  The support base which concerns on embodiment of this invention is equipped with the upper body made from a polymeric material attached to the upper part of a metal lower body and a lower body. For this reason, when carrying in and carrying out a board | substrate with a metal lower body, it can suppress that a support stand bends by the load of a board | substrate as much as possible, and the upper body directly contacted with a board | substrate is made from a polymer material. By manufacturing, it is possible to suppress as much as possible the generation of scratches or particles on the substrate upon contact with the substrate.

  In addition, when the support table is lifted or processed for loading a substrate, when a horizontal force or impact is applied to the support table due to a load or external force applied by the substrate, the support table is supported. The rotation mechanism and the support unit are not fixed and can be moved freely. Therefore, the impact transmitted to the support base can be reduced, and the support base can be prevented from being bent or damaged.

FIG. 1 is a block diagram showing a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a three-dimensional view showing a stage and a support base of the substrate support module according to the embodiment of the present invention. FIG. 3 is a three-dimensional view showing a support base according to the embodiment of the present invention. FIG. 4 is a cross-sectional view for explaining the lower rotation mechanism, the first and second upper rotation mechanisms, the first idle mechanism, and the support unit according to the embodiment of the present invention. FIG. 5 is a diagram illustrating a state in which the substrate is moved up and down by the substrate support module according to the embodiment of the present invention. FIG. 6 is a diagram illustrating a state in which the substrate moves up and down by the substrate support module according to the embodiment of the present invention.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described below, and can be realized in different ways. These embodiments merely complete the disclosure of the present invention and are invented by those having ordinary knowledge. It is provided to fully inform you of the range.

  FIG. 1 is a block diagram showing a substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is a three-dimensional view showing a stage and a support base of a substrate support module according to an embodiment of the present invention, and FIG. FIG. 4 is a three-dimensional view showing a support base according to an embodiment of the present invention, and FIG. 4 is a lower rotation mechanism, first and second upper rotation mechanisms, and a first idler mechanism according to an embodiment of the present invention. It is sectional drawing for demonstrating a support unit.

  A substrate processing apparatus according to an embodiment of the present invention is an annealing apparatus that crystallizes an amorphous film formed on a substrate, for example, an annealing (ELA) apparatus using excimer laser light. As shown in FIG. 1, this substrate processing apparatus includes a chamber 100 having an internal space for processing a substrate S, and a substrate support module that is disposed inside the chamber 100 and on which the substrate S is placed and supported. 400, a laser beam generator 300 that is disposed outside the chamber 100 and generates a laser beam, a transmission window 110 that is disposed on one wall of the chamber 100, for example, an upper wall and transmits the laser beam, and a chamber 100, and a reflecting mirror 200 provided between the laser beam generator and the transmission window 110.

  Here, the chamber 100, the laser beam generator 300, the transmission window 110, and the reflecting mirror 200 are almost the same as the structure and structure of an ordinary excimer laser beam annealing (ELA) apparatus. I ’ll skip the explanation.

  Referring to FIGS. 1 to 4, a substrate support module 400 has a substrate S placed thereon and a stage 410 that can be moved horizontally in the process direction, and is inserted so as to penetrate the stage 410 in the vertical direction. By moving up and down, the support table 470 that carries in and out the substrate S and the stage 410 are arranged so as to face each other with the support table 470 interposed therebetween, and rotate while supporting the support table 470. A lower rotating mechanism 440 having first and second lower rotating members 440a and 440b that are arranged inside the stage 410 and on the upper side of the lower rotating mechanism 440 so as to face each other with a support base 470 interposed therebetween, A first upper rotating mechanism 420 having first and second upper rotating members 420a and 420b rotating while supporting the support base 470; and an inner and lower rotating mechanism of the stage 410 40 and the first upper rotating mechanism 420 are arranged so as to face each other with the support base 470 interposed therebetween, and third and fourth upper rotation members 430a that rotate while supporting the support base 470, And a second upper rotation mechanism 430 having 430b. Further, the substrate support module 400 is connected to one of the first and second lower rotating members 440b constituting the lower rotating mechanism 440, and one of the lower rotating members (of the 440a and 440b). The first floating mechanism 480 that gives a degree of freedom so that either one of them can freely move, and is connected to the lower part of the support base 470 to support the support base 470, so that the support base 470 can freely move. It further includes a support unit 450 having a second idler mechanism 453 that gives a degree of freedom, and a lift plate 460 that lifts and lowers the support base 470. Further, although not shown, the substrate support module 400 further includes a first driving unit that horizontally moves or moves the stage 410 and a second driving unit that moves the lifting plate 460 up and down.

  The stage 410 is means for placing or fixing the substrate S, which is an object to be processed, and the stage 410 according to the embodiment of the present invention is a rectangular plate. However, the shape of the stage 410 is not limited to this, and may be manufactured in various shapes corresponding to the substrate. The stage 410 is provided with a vacuum suction channel 411 and a gas vent channel 412. However, in the embodiment of the present invention, the vacuum suction channel 411 is formed in the central portion, and a lattice-like gas vent channel is formed in a region excluding the central portion. 412 is provided. Here, the vacuum suction channel 411 is connected to a vacuum pump (not shown) provided outside, and suction input is generated in the vacuum suction channel 411 by the pumping force of the pump, so that the substrate S is placed on the stage. Adsorbed and placed. Note that the gas vent channel 412 plays a role of flowing out a gas, for example, air, remaining between the substrate S and the stage 410 when the substrate S is placed on the stage 410.

  The vacuum suction channel 411 has been described above as an example of means for fixing the substrate on the stage 410. However, the present invention is not limited to this, and various means can be used as long as the substrate S can be supported and fixed on the stage 410. For example, the stage 410 is an electrostatic chuck. Also good.

  A positioning pin 490 may be disposed on the periphery of the stage 410 so as to protrude above the stage 410.

  The support table 470 is a plate or bar that carries the substrate S onto the stage 410 or carries the substrate S placed on the stage 410 out of the stage, and has a rectangular cross section. Such a support base 470 is inserted so that at least a part thereof penetrates the stage 410 in the vertical direction, and moves up and down inside the stage 410.

  Further, as shown in FIG. 3, the support base 470 according to the embodiment of the present invention includes a lower body 471 and an upper body 472 on which the substrate S is supported. That is, the support base 470 is attached so that the upper body 472 protrudes above the lower body 471. Here, the lower body 471 is manufactured from a metal having excellent rigidity so that the substrate S can be supported when the substrate S is carried in and out. Further, as described above, the upper body 472 is a portion that is in direct contact with the substrate S, and is manufactured from a polymer material in order to suppress damage such as scratches to the substrate S as much as possible. . At this time, the lower body 471 needs to have rigidity enough to support the weight of the substrate S, and the upper body 472 needs to be easily brought into contact with the substrate S and supported. There is no need to increase it unnecessarily. Therefore, it is preferable that the upper body 472 is made smaller than the lower body 471. The lower body 471 is rigid enough to support the substrate S and is easily inserted into the stage 410 from the outside. More preferably, it is manufactured to a size that can be raised and lowered.

  For this reason, when carrying in and carrying out the board | substrate S by the metal lower body 471, it can prevent that the support stand 470 of this invention bends with the load of the board | substrate S, and it contacts with the board | substrate S directly. By manufacturing the upper body 472 from a polymer material, it is possible to minimize the occurrence of scratches or particles on the substrate S when contacting the substrate S.

  In addition, as shown in FIG. 2, it is preferable that a plurality of the support bases 470 described above are provided and spaced apart from each other at equal intervals. In the embodiment of the present invention, as shown in FIG. 1, a plurality of support bases 470 are disposed at the center portion and both peripheral portions of the stage 410. However, the present invention is not limited to this, and support bases 470 may be disposed on both peripheral edges of the stage 410, and lift pins (not shown) may be disposed in the central portion. A support base 470 may be disposed on the periphery, and a lift pin (not shown) may be disposed on the periphery.

  Referring to FIG. 4, the lower rotating mechanism 440 includes a first lower rotating member 440 a and a second lower rotating member 440 b that are arranged to face each other with the support base 470 interposed therebetween and are rotatable. Here, the first lower rotation member 440a is in contact with one surface of the support base 470, and the second lower rotation member 440b is in contact with the other surface of the support base 470, and the support base 470 is raised or The first and second rotating members 420a and 420b are rotated clockwise or counterclockwise by the descending operation. The first and second lower rotating members 440b according to the embodiment of the present invention are bearings, but the present invention is not limited to this, and is in contact with one surface and the other surface of the support base. As long as it can be rotated, various means can be used, for example, a ball.

  The first idler mechanism 480 is connected to one of the first lower rotating member 440a and the second lower rotating member 440b constituting the lower rotating mechanism 440, and any one of the lower rotating mechanisms 480 is rotated when the support base 470 is moved up and down. The member (any one of 440a and 440b) is allowed to move by creating a gap and giving a degree of freedom. Hereinafter, an example in which the first idler mechanism 480 is connected to the first lower rotating member 440a will be described.

  The first idler mechanism 480 is inside the stage 410 and behind the first lower rotating member 440a (the direction opposite to the second lower rotating member 440b is the front, and the opposite direction is called the rear). And a first support block 481 having one end connected to the first lower rotation member 440a, and disposed behind the first support block 481 and away from the first support block 481. A second support block 482, a connecting member 483 disposed so that one end is inserted into the first support block 481 and the other end is inserted into the second support block 482, and a connecting member And an elastic member 484 having one end fixed to the first support block 481 and the other end fixed to the inside of the second support block 482.

  Each of the first support block 481 and the second support block 482 is provided with receiving grooves 485 and 486 that can receive the connecting member 483. Further, as described above, the elastic member 484 is disposed so as to wind around the outer peripheral surface of the connecting member 483, but is disposed outside the first support block 481, and one end thereof is the first. The other end is fixed to the inner wall of the second support block 482, and a spring is used as the elastic member 484 in the embodiment of the present invention. Of course, the elastic member 484 is not limited to a spring, and various means can be used as long as it has an elastic force. For this reason, if a force or an impact in the left-right direction is applied to the support table 470 by a load or an external force by the substrate S while the support table 470 is raised or lowered, the first lower rotating member 440a is the first idler mechanism. It moves by a predetermined distance in the left-right direction due to the gap 480 and the elastic force. For this reason, the impact transmitted to the support base 470 can be reduced, and the support base 470 can be prevented from being bent or damaged.

  As described above, the first idler mechanism 480 is connected to the first lower rotating member 440a. However, the present invention is not limited to this and may be connected to the second lower rotating member 440b. Good.

  Fixed upper rotation mechanisms 420 and 430 are disposed above the lower rotation mechanism 440, and the upper rotation mechanisms 420 and 430 are provided in two rows in the vertical direction. That is, the upper rotation mechanisms 420 and 430 include a first upper rotation mechanism 420 disposed on the relatively upper side and a second upper rotation mechanism 430 disposed on the lower side.

  The first upper rotating member 420a and the second upper rotating member 420b are disposed in the stage 410 and on the upper side of the lower rotating member 440 so as to face each other with the support 470 interposed therebetween. With. The first and second upper rotating members 420 a and 420 b may be supported and fixed at least partially connected to the inside of the stage 410. Here, the first upper rotating member 420a is in contact with one surface of the support base 470, and the second upper rotating member 420b is in contact with the other surface of the support base 470, and the support base 470 is moved up or down. Thus, the first and second upper rotating members 20a and 420b rotate in the clockwise direction or the counterclockwise direction.

  In addition, the second upper rotating mechanism 430 is disposed in the stage 410 so as to face each other with the support base 470 interposed between the lower rotating mechanism 440 and the first upper rotating mechanism 420. The upper rotating member 430a and the fourth upper rotating member 430b may be provided, and the third and fourth upper rotating members 430a and 430b may be supported and fixed at least partially connected to the inside of the stage 410. The third upper rotating member 430a is in contact with one surface of the support base 470, and the fourth upper rotating member 430b is in contact with the other surface of the support base 470. The third and fourth upper rotating members 430a and 430b rotate clockwise or counterclockwise.

  As described above, the first and second upper rotating mechanisms 420 and 430 are disposed on the upper side of the lower rotating mechanism 440, and the first and second upper rotating mechanisms 420 and 430 are adjacent to the upper surface of the stage 410. It is preferable to be provided. More preferably, the first and second upper rotating mechanisms 420 and 430 are disposed at the uppermost end in the stage 410.

  Each of the first to fourth rotating members 420a, 420b, 430a, and 430b is smaller than the first and second lower rotating members 440a and 440b, and a bearing is used in the embodiment of the present invention. Of course, the first to fourth rotating members 420a, 420b, 430a, 430b are not limited to bearings, and may be various means as long as they can rotate while being in contact with the support base 470, For example, a ball can be used.

  Further, as described above, between the first lower rotating member 440a and the second lower rotating member 440b, between the third upper rotating member 430a and the fourth upper rotating member 430b, and the first upper rotating member. A support base 470 is disposed so as to pass between the member 420a and the second upper rotating member 420b. Therefore, between the first lower rotating member 440a and the second lower rotating member 440b, between the third upper rotating member 430a and the fourth upper rotating member 430b, and between the first upper rotating member 420a and the first upper rotating member 430b. Preferably, the two upper rotating members 420b are disposed on a certain vertical line. In other words, when the space between the rotating members facing each other in each rotating mechanism (the space through which the support passes) is defined as “center”, the center of the lower rotating mechanism 440, the center of the second upper rotating mechanism 430, and The center of the first upper rotation mechanism is disposed so as to be located on a certain vertical line.

  Each of the lower rotation mechanism 440, the first upper rotation mechanism 420, and the second upper rotation mechanism 430 described above is provided with respect to one support base 470 in the extending direction of the support base 470. It is lined up along. That is, they are arranged apart from each other along the support base 470 extending in a direction corresponding to the width direction of the stage 410.

  The support unit 450 engages the second floating mechanism 470 that supports the lower portion of the support base 470 and creates a gap to give the support base a degree of freedom, and the second floating mechanism 470 and the lifting plate 453. And a coupling member 454 to be provided.

  Here, the second floating mechanism 453 is connected to the lower part of the support base 470, supports and fixes the lower part of the support base 470, and is disposed on the lifting plate 460. Referring to FIGS. 1 and 4, the second floating mechanism 453 includes a fixed block 451 in which a lower portion of the support base 470 is fitted, and a floating member 452 that is connected to the fixed block 451 and floats the fixed block 451. Is provided.

  Here, the fixed block 451 is opposed to the first block 451a disposed so as to be in contact with one surface of the lower portion of the support base 470, and is opposed to the first block 451a. The second block 451b disposed so as to be in contact with the surface of the first block 451b, and disposed so as to penetrate at least a part of the first block 451a and the second block 451b, the first block 451a. And a consolidating member 451c for consolidating the second block 451b. In the embodiment of the present invention, the second block 451b is manufactured to extend from the lower end of the support base 470 to the lower side thereof, and the first block 451a is opposed to the upper side portion of the second block 451b. It is arranged as follows. A support base 470 is inserted between the first block 451a and the second block 451b.

  The floating member 452 is connected to the lower part of the second block 451b. The floating member 452 according to the embodiment of the present invention may be, for example, a ball plunger with a ball 451b. That is, at least a part of the floating member 452 according to the embodiment of the present invention is inserted into the fixed block 451, preferably the body 452b and the body 452b that fit into the second fixed block 451b, and at least a part of the body 452b. A ball 452a that protrudes to the outside of the lower side and contacts at least one surface with the elevating plate 460 and can be rotated or moved is provided.

  For this reason, when the support table 470 is lifted or lowered, if the horizontal force or impact is applied to the support table 470 by the load or external force of the substrate S, the support table 470 and the fixed block 451 are free from the clearance between the floating member 452 and the free block. Driven by the degree. More specifically, if a lateral force or impact is applied to the support base 470, the ball 452b of the floating member 452 is moved along the curved surface while supporting the lifting plate 460 from above, thereby The second block 451b is entangled. At this time, since the support base 470 is inserted between the second block 451b and the first block 451a, the support base 470 is supported by the second block 451b and the first block 451a. In the state, it is idled by the second block 451b. For this reason, the impact transmitted to the support base 470 can be reduced, and the support base 470 can be prevented from being bent or damaged.

  In the above, the ball plunger has been described as an example of the floating member 452 of the second floating mechanism 452. However, the floating member 452 is not limited to this, and various means can be used as long as the floating member 452 is connected to the lower portion of the fixed block 451 and can move freely. For example, a spherical ball connected to the fixed block 451, a hemispherical structure, or an elastic spring may be used.

  5 and 6 are views showing a state in which the substrate is raised and lowered by the substrate support module according to the embodiment of the present invention.

  Hereinafter, based on FIG. 1 thru | or FIG. 6, operation | movement of the substrate processing apparatus which concerns on embodiment of this invention is demonstrated. Here, for convenience of explanation, operations of the lower rotation mechanism 440 connected to any one of the plurality of support bases 470 and the first and second upper rotation mechanisms 420 and 430 will be described. To do.

  A substrate S on which an amorphous film, for example, an amorphous silicon film is formed is prepared, and the substrate S is carried into the chamber 100 using a robot arm (not shown) and placed on the stage 410. To do. For this purpose, a robot arm for supporting the substrate S is disposed on the upper side of the stage 410, and the support base 470 is lifted by using the elevating plate 460. As shown in FIG. Causes at least the upper body 472 to protrude above the stage 410. At this time, the lower rotating mechanism 440 and the first and second upper rotating mechanisms 420 and 430 are rotated by the force by which the support base 470 is raised. More specifically, the first lower rotating member 440a on the left side with respect to the support base 470 is rotated counterclockwise by the force of the support base 470 ascending, and the second lower rotation member 440a on the right side with respect to the support base 470 as a reference. The lower rotating member 440b rotates in the clockwise direction. Also, the first and third upper rotating members 420a and 430a disposed on the upper side of the lower rotating mechanism 440 on the left side with respect to the support base 470 rotate counterclockwise, and the support base 470 is used as a reference. The second and fourth upper rotating members 420b and 430b on the right side rotate in the clockwise direction.

  When the support base 470 is lifted so as to protrude above the stage 410, the robot arm is lowered to place (or carry in) the substrate on the support base 470.

  Next, the support base 470 is lowered using the elevating plate 460, and the support base 470 is accommodated inside the stage 410 without protruding above the stage 410 as shown in FIG. At this time, the lower rotating mechanism 440 and the first and second upper rotating mechanisms 420 and 430 are rotated by the force by which the support base 470 is lowered. More specifically, the first lower rotating member 440a on the left side with respect to the support base 470 is rotated clockwise by the downward force of the support base 470, and the second on the right side with respect to the support base 470. The lower rotating member 440b rotates counterclockwise. Also, the first and third upper rotating members 420a and 430a disposed on the upper side of the lower rotating mechanism 440 on the left side with respect to the support base 470 rotate clockwise, and the right side with respect to the support base 470 The second and fourth upper rotating members 420b and 430b in the counterclockwise direction rotate in the counterclockwise direction.

  If the support base 470 is lowered so as to fit inside the stage 410 without protruding above the stage 410, the substrate S placed on the support base 470 is placed on the stage 410.

  As described above, in order to load the substrate S, a force or an impact in the left-right direction may be applied to the support table 470 due to a load or an external force applied by the substrate S while the support table 470 is raised or lowered. At this time, the first lower rotating member 440a is idled by the first idler mechanism 480, and the second idler mechanism 453 supporting the support base 470 is also idled without being fixed. For this reason, the impact transmitted to the support base 470 can be reduced, and the support base 470 can be prevented from being bent or damaged.

  When the substrate is loaded, the laser beam is emitted by using the laser beam generator while moving the stage 410 in the process progress direction, that is, in the horizontal direction. Thereby, the laser beam is irradiated onto the substrate S through the reflecting mirror 200 and the transmission window 110, and at this time, the amorphous silicon film formed on the substrate S is heated and crystallized by the laser beam. . Thereby, a crystalline silicon film is formed.

  When the processing process of the substrate S is completed through the above process, the processes of FIGS. 6 and 5 are performed in the reverse order, and the substrate S is unloaded from the stage 410.

  As described above, the substrate support module according to the embodiment of the present invention is applied to the annealing apparatus that heat-treats the substrate using the excimer laser. However, the present invention is not limited to this, and various substrate processing apparatuses to which various substrate support modules for carrying in and out the substrate S are applied, such as various thin film deposition apparatuses, etching apparatuses, patterning apparatuses, and the like. Applicable to the device.

420 First upper rotation mechanism 430 Second upper rotation mechanism 440 Lower rotation mechanism 480 First idle mechanism 453 Second idle mechanism

Claims (11)

A stage on which the substrate is placed;
At least a part of the substrate is arranged so as to penetrate the stage in the vertical direction, and the substrate is loaded onto the stage by moving up and down, or the substrate placed on the stage is unloaded from the stage. A support base to perform,
A lower rotation mechanism having first and second lower rotation members that are arranged inside the stage so as to face each other with a support table interposed therebetween and rotate while supporting the support table;
A first and second upper rotating member disposed inside the stage and on the upper side of the lower rotating mechanism so as to face each other with a supporting table interposed therebetween, and rotating while supporting the supporting table. An upper rotation mechanism;
One end is connected to any one of the first and second lower rotating members, and a gap is created in any of the first and second lower rotating members, thereby allowing the first to rotate. The floating mechanism of
A substrate support module comprising: The support base includes a lower body made of metal and an upper body that is attached to an upper part of the lower body and supports the substrate,
The substrate support module according to claim 1, wherein the upper body is manufactured from a polymer material.   The third and fourth are disposed inside the stage and opposed to each other with the support table sandwiched between the lower rotation mechanism and the first upper rotation mechanism, and rotate while supporting the support table. The substrate support module according to claim 1, further comprising a second upper rotation mechanism having an upper rotation member.   The first and second upper rotation members of the first upper rotation mechanism and the third and fourth rotation members of the second upper rotation mechanism are respectively the first and second lower rotations of the lower rotation mechanism. The board | substrate support module of Claim 3 small compared with a member.   The first and second lower rotating members of the lower rotating mechanism, the first and second upper rotating members of the first upper rotating mechanism, and the third and fourth rotating members of the second upper rotating mechanism. The substrate support module according to claim 4, wherein each is a bearing. 2. The substrate support module according to claim 1 , wherein the first idler mechanism includes a spring having one end connected to one of the first and second lower rotating members.   The first lower rotating member of the lower rotating mechanism, the first upper rotating member of the first upper rotating mechanism, and the third upper rotating member of the second upper rotating mechanism are one surface of the support base A second lower rotating member of the lower rotating mechanism, a second upper rotating member of the first upper rotating mechanism, and a fourth upper rotating member of the second upper rotating mechanism, The substrate support module according to claim 3, which rotates in a state in contact with the other surface of the support base.   2. The substrate support module according to claim 1, further comprising a second idler mechanism connected to a lower part of the supporter to support the supporter and allowing the supporter to move freely with a gap. 3. The second idle mechanism is:
The substrate support module according to claim 8 , further comprising: a fixed block into which a lower portion of the support base is fitted, and a floating member connected to the lower portion of the fixed block to move the fixed block. The fixed block is opposed to the first block arranged to be in contact with one surface of the lower portion of the support base and the first block, and is in contact with the other surface of the support base. A second block arranged as follows:
The substrate support module according to claim 9 , wherein the floating member is coupled to a lower portion of one of the first block and the second block. It said idler member of the second idler mechanism, the are inserted into the lower portion of the fixed block, substrate according to claim 9 or 10 comprising at least a part of which is disposed so as to protrude on the lower side of the fixed block ball Support module.

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