JP5744407B2 - マイクロ構造体の製造方法 - Google Patents

マイクロ構造体の製造方法 Download PDF

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Publication number
JP5744407B2
JP5744407B2 JP2010037922A JP2010037922A JP5744407B2 JP 5744407 B2 JP5744407 B2 JP 5744407B2 JP 2010037922 A JP2010037922 A JP 2010037922A JP 2010037922 A JP2010037922 A JP 2010037922A JP 5744407 B2 JP5744407 B2 JP 5744407B2
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Japan
Prior art keywords
plating layer
microstructure
plating
mold
layer
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Expired - Fee Related
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JP2010037922A
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Japanese (ja)
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JP2011174119A5 (enExample
JP2011174119A (ja
Inventor
豊 ▲瀬▼戸本
豊 ▲瀬▼戸本
手島　隆行
隆行 手島
中村　高士
高士 中村
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Canon Inc
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Canon Inc
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Priority to JP2010037922A priority Critical patent/JP5744407B2/ja
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JP2010037922A 2010-02-23 2010-02-23 マイクロ構造体の製造方法 Expired - Fee Related JP5744407B2 (ja)

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JP2010037922A JP5744407B2 (ja) 2010-02-23 2010-02-23 マイクロ構造体の製造方法

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JP2010037922A JP5744407B2 (ja) 2010-02-23 2010-02-23 マイクロ構造体の製造方法

Publications (3)

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JP2011174119A JP2011174119A (ja) 2011-09-08
JP2011174119A5 JP2011174119A5 (enExample) 2013-04-11
JP5744407B2 true JP5744407B2 (ja) 2015-07-08

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JP2010037922A Expired - Fee Related JP5744407B2 (ja) 2010-02-23 2010-02-23 マイクロ構造体の製造方法

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5627247B2 (ja) * 2010-02-10 2014-11-19 キヤノン株式会社 マイクロ構造体の製造方法および放射線吸収格子
JP5804726B2 (ja) * 2011-02-24 2015-11-04 キヤノン株式会社 微細構造体の製造方法
JP6149343B2 (ja) * 2012-03-26 2017-06-21 コニカミノルタ株式会社 格子および格子ユニットならびにｘ線用撮像装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002313233A (ja) * 2001-04-10 2002-10-25 Sumitomo Metal Mining Co Ltd ダブルテープ式アパチャーグリルの検査方法
ITTO20030167A1 (it) * 2003-03-06 2004-09-07 Fiat Ricerche Procedimento per la realizzazione di emettitori nano-strutturati per sorgenti di luce ad incandescenza.
JP5773624B2 (ja) * 2010-01-08 2015-09-02 キヤノン株式会社 微細構造体の製造方法

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JP2011174119A (ja) 2011-09-08

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