JP5737983B2 - 露光装置およびデバイス製造方法 - Google Patents

露光装置およびデバイス製造方法 Download PDF

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Publication number
JP5737983B2
JP5737983B2 JP2011024436A JP2011024436A JP5737983B2 JP 5737983 B2 JP5737983 B2 JP 5737983B2 JP 2011024436 A JP2011024436 A JP 2011024436A JP 2011024436 A JP2011024436 A JP 2011024436A JP 5737983 B2 JP5737983 B2 JP 5737983B2
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JP
Japan
Prior art keywords
tube member
ultraviolet light
exposure
optical element
container
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Expired - Fee Related
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JP2011024436A
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English (en)
Japanese (ja)
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JP2011243949A (ja
JP2011243949A5 (enExample
Inventor
貴博 中山
貴博 中山
茂 寺島
茂 寺島
渡辺　豊
豊 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011024436A priority Critical patent/JP5737983B2/ja
Priority to US13/090,410 priority patent/US8665415B2/en
Publication of JP2011243949A publication Critical patent/JP2011243949A/ja
Publication of JP2011243949A5 publication Critical patent/JP2011243949A5/ja
Application granted granted Critical
Publication of JP5737983B2 publication Critical patent/JP5737983B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011024436A 2010-04-23 2011-02-07 露光装置およびデバイス製造方法 Expired - Fee Related JP5737983B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011024436A JP5737983B2 (ja) 2010-04-23 2011-02-07 露光装置およびデバイス製造方法
US13/090,410 US8665415B2 (en) 2010-04-23 2011-04-20 Exposure apparatus and device manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010100357 2010-04-23
JP2010100357 2010-04-23
JP2011024436A JP5737983B2 (ja) 2010-04-23 2011-02-07 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011243949A JP2011243949A (ja) 2011-12-01
JP2011243949A5 JP2011243949A5 (enExample) 2014-03-06
JP5737983B2 true JP5737983B2 (ja) 2015-06-17

Family

ID=44816093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011024436A Expired - Fee Related JP5737983B2 (ja) 2010-04-23 2011-02-07 露光装置およびデバイス製造方法

Country Status (2)

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US (1) US8665415B2 (enExample)
JP (1) JP5737983B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6071325B2 (ja) * 2012-08-21 2017-02-01 キヤノン株式会社 露光装置、露光方法及び物品の製造方法
JP2014053416A (ja) 2012-09-06 2014-03-20 Toshiba Corp Ｅｕｖ露光装置及びクリーニング方法
DE102013109584A1 (de) 2013-09-03 2015-03-05 Krones Ag Verfahren und Vorrichtung zum Sterilisieren von Behältnissen mit Reinigung eines Strahlaustrittsfensters
KR102427325B1 (ko) * 2015-06-03 2022-08-01 삼성전자주식회사 노광 장치 및 노광 장치 세정 방법
US11543757B2 (en) * 2021-04-20 2023-01-03 Kla Corporation System and method for optical-path coupling of light for in-situ photochemical cleaning in projection imaging systems
EP4469860A1 (en) * 2022-01-25 2024-12-04 ASML Netherlands B.V. A pellicle cleaning system

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0494524A (ja) * 1990-08-10 1992-03-26 Fujitsu Ltd 電子線装置の洗浄方法
US6268904B1 (en) * 1997-04-23 2001-07-31 Nikon Corporation Optical exposure apparatus and photo-cleaning method
WO1999063790A1 (en) * 1998-05-29 1999-12-09 Nikon Corporation Laser-excited plasma light source, exposure apparatus and its manufacturing method, and device manufacturing method
US6385290B1 (en) * 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
JP2000088999A (ja) * 1998-09-14 2000-03-31 Nikon Corp Ｘ線装置
US6407385B1 (en) * 1998-12-18 2002-06-18 Nikon Corporation Methods and apparatus for removing particulate foreign matter from the surface of a sample
WO2000074120A1 (en) * 1999-05-28 2000-12-07 Nikon Corporation Exposure method and apparatus
JP3467485B2 (ja) * 2001-07-18 2003-11-17 松下電器産業株式会社 軟ｘ線縮小投影露光装置、軟ｘ線縮小投影露光方法及びパターン形成方法
JP2004014960A (ja) * 2002-06-11 2004-01-15 Sony Corp 露光装置および露光方法
KR20040024516A (ko) * 2002-09-13 2004-03-20 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
JP4510433B2 (ja) * 2003-12-03 2010-07-21 キヤノン株式会社 露光装置及び洗浄方法
JP4584031B2 (ja) * 2004-05-28 2010-11-17 パナソニック株式会社 接合装置及び接合方法
JP2008277585A (ja) * 2007-04-27 2008-11-13 Canon Inc 露光装置の洗浄装置及び露光装置
JP2009079249A (ja) * 2007-09-26 2009-04-16 Fujinon Sano Kk 基板の成膜装置及び成膜方法、並びに光学素子

Also Published As

Publication number Publication date
US8665415B2 (en) 2014-03-04
US20110262866A1 (en) 2011-10-27
JP2011243949A (ja) 2011-12-01

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