JP5735777B2 - 研磨パッド - Google Patents
研磨パッド Download PDFInfo
- Publication number
- JP5735777B2 JP5735777B2 JP2010230998A JP2010230998A JP5735777B2 JP 5735777 B2 JP5735777 B2 JP 5735777B2 JP 2010230998 A JP2010230998 A JP 2010230998A JP 2010230998 A JP2010230998 A JP 2010230998A JP 5735777 B2 JP5735777 B2 JP 5735777B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing pad
- polishing
- resin
- workpiece
- hardness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005498 polishing Methods 0.000 title claims description 92
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 19
- 229920005989 resin Polymers 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 16
- 229920000647 polyepoxide Polymers 0.000 claims description 12
- 239000003822 epoxy resin Substances 0.000 claims description 11
- 238000002156 mixing Methods 0.000 claims description 8
- 239000002002 slurry Substances 0.000 claims description 8
- 239000006061 abrasive grain Substances 0.000 claims description 6
- 238000000465 moulding Methods 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims 1
- 238000005187 foaming Methods 0.000 description 6
- 239000006260 foam Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- 239000004088 foaming agent Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 102220563888 Glucagon receptor_P66A_mutation Human genes 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
問題を解決する手段として発泡樹脂としてウレタン樹脂を添加し、弾性率低下(内部応力低下)を起こしエポキシ樹脂が有する剛性とウレタン樹脂の柔軟性の両作用を持たせることにより研磨能率を加速させた。
Claims (4)
- 研磨台に直接取り付けられて工作物との間に研磨材を含有するスラリーを供給しながら前記研磨台または工作物を相対的に移動させて前記工作物を研磨する研磨パッドであって、エポキシ樹脂とウレタン樹脂の混合発泡樹脂により形成されて且つエポキシ樹脂とウレタン樹脂との配合割合が重量比で3:7〜99:1の範囲であるとともに成形後の硬度がD硬度18〜65(A硬度60〜100)であることを特徴とする研磨パッド。
- 前記混合発泡樹脂の気孔率が1〜70%であることを特徴とする請求項1記載の研磨パッド。
- 前記混合発泡樹脂に直径0.5〜500μmの砥粒が1〜30%配合されていることを特徴とする請求項1または2記載の研磨パッド。
- 研磨表面に格子状の溝が形成されていることを特徴とする請求項1,2または3記載の研磨パッド。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010230998A JP5735777B2 (ja) | 2010-10-13 | 2010-10-13 | 研磨パッド |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010230998A JP5735777B2 (ja) | 2010-10-13 | 2010-10-13 | 研磨パッド |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012081565A JP2012081565A (ja) | 2012-04-26 |
JP5735777B2 true JP5735777B2 (ja) | 2015-06-17 |
Family
ID=46240979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010230998A Active JP5735777B2 (ja) | 2010-10-13 | 2010-10-13 | 研磨パッド |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5735777B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018122427A (ja) * | 2017-02-03 | 2018-08-09 | 学校法人立命館 | 研磨パッドの製造方法 |
JP2018122426A (ja) * | 2017-02-03 | 2018-08-09 | 学校法人立命館 | 研磨パッドの製造方法 |
JP7091575B2 (ja) * | 2017-03-03 | 2022-06-28 | スピードファム株式会社 | ノッチ部分ポリッシング用パッド及びその製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002154050A (ja) * | 2000-11-20 | 2002-05-28 | Toray Ind Inc | 研磨用パッドおよびそれを用いた研磨装置ならびに研磨方法 |
US7134939B2 (en) * | 2003-09-05 | 2006-11-14 | Fricso Ltd. | Method for reducing wear of mechanically interacting surfaces |
JP2007190613A (ja) * | 2004-02-09 | 2007-08-02 | Bando Chem Ind Ltd | 研磨フィルム及びその製造方法 |
WO2007016498A2 (en) * | 2005-08-02 | 2007-02-08 | Raytech Composites, Inc. | Nonwoven polishing pads for chemical mechanical polishing |
JP5478877B2 (ja) * | 2008-12-26 | 2014-04-23 | ニッタ・ハース株式会社 | 研磨パッド |
-
2010
- 2010-10-13 JP JP2010230998A patent/JP5735777B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2012081565A (ja) | 2012-04-26 |
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