JP5734629B2 - ポジ型感光性樹脂組成物及び永久レジスト - Google Patents

ポジ型感光性樹脂組成物及び永久レジスト Download PDF

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Publication number
JP5734629B2
JP5734629B2 JP2010262741A JP2010262741A JP5734629B2 JP 5734629 B2 JP5734629 B2 JP 5734629B2 JP 2010262741 A JP2010262741 A JP 2010262741A JP 2010262741 A JP2010262741 A JP 2010262741A JP 5734629 B2 JP5734629 B2 JP 5734629B2
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Japan
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group
compound
general formula
carbon atoms
resin composition
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JP2010262741A
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English (en)
Japanese (ja)
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JP2012113161A (ja
Inventor
森田　博
博 森田
宏美 竹之内
宏美 竹之内
純 小林
純 小林
仁一 尾見
仁一 尾見
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Adeka Corp
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Adeka Corp
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Priority to JP2010262741A priority Critical patent/JP5734629B2/ja
Priority to TW100139831A priority patent/TW201232182A/zh
Priority to CN201110378382.8A priority patent/CN102566279B/zh
Publication of JP2012113161A publication Critical patent/JP2012113161A/ja
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  • Materials For Photolithography (AREA)
  • Silicon Polymers (AREA)
JP2010262741A 2010-11-25 2010-11-25 ポジ型感光性樹脂組成物及び永久レジスト Expired - Fee Related JP5734629B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010262741A JP5734629B2 (ja) 2010-11-25 2010-11-25 ポジ型感光性樹脂組成物及び永久レジスト
TW100139831A TW201232182A (en) 2010-11-25 2011-11-01 Positive photosensitive resin composition and permanent resist
CN201110378382.8A CN102566279B (zh) 2010-11-25 2011-11-24 正型感光性树脂组合物及永久抗蚀剂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010262741A JP5734629B2 (ja) 2010-11-25 2010-11-25 ポジ型感光性樹脂組成物及び永久レジスト

Publications (2)

Publication Number Publication Date
JP2012113161A JP2012113161A (ja) 2012-06-14
JP5734629B2 true JP5734629B2 (ja) 2015-06-17

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JP2010262741A Expired - Fee Related JP5734629B2 (ja) 2010-11-25 2010-11-25 ポジ型感光性樹脂組成物及び永久レジスト

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JP (1) JP5734629B2 (zh)
CN (1) CN102566279B (zh)
TW (1) TW201232182A (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5647012B2 (ja) * 2011-01-14 2014-12-24 株式会社Adeka ケイ素含有硬化性樹脂組成物
JP6371666B2 (ja) * 2014-10-10 2018-08-08 株式会社カネカ ポジ型感光性組成物
KR102369818B1 (ko) * 2015-01-13 2022-03-04 주식회사 동진쎄미켐 포지티브형 감광성 실록산 수지 조성물
TWI704416B (zh) * 2015-08-05 2020-09-11 日商住友化學股份有限公司 感光性樹脂組成物、圖型、噴墨用隔壁及顯示裝置
TWI665519B (zh) * 2016-06-30 2019-07-11 奇美實業股份有限公司 正型感光性樹脂組成物及其應用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
JPH03260653A (ja) * 1990-03-12 1991-11-20 Nippon Telegr & Teleph Corp <Ntt> パターン形成方法及び感光性樹脂組成物
WO2006003990A1 (ja) * 2004-07-02 2006-01-12 Nippon Kayaku Kabushiki Kaisha 光導波路用感光性樹脂組成物及びその硬化物からなる光導波路
JP4784283B2 (ja) * 2004-11-26 2011-10-05 東レ株式会社 ポジ型感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子
JP2007193318A (ja) * 2005-12-21 2007-08-02 Toray Ind Inc 感光性シロキサン組成物、それから形成された硬化膜および硬化膜を有する素子
EP2216682B1 (en) * 2007-11-13 2013-07-17 Adeka Corporation Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
JP2010039051A (ja) * 2008-08-01 2010-02-18 Sekisui Chem Co Ltd 感光性組成物及びパターン膜の製造方法
JP4960330B2 (ja) * 2008-10-21 2012-06-27 株式会社Ａｄｅｋａ ポジ型感光性組成物及び永久レジスト

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Publication number Publication date
CN102566279A (zh) 2012-07-11
JP2012113161A (ja) 2012-06-14
CN102566279B (zh) 2016-04-27
TW201232182A (en) 2012-08-01

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