JP5717641B2 - 幅広く分布したbブロックを有するabaトリブロックコポリマーを製造する方法 - Google Patents
幅広く分布したbブロックを有するabaトリブロックコポリマーを製造する方法 Download PDFInfo
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- JP5717641B2 JP5717641B2 JP2011535942A JP2011535942A JP5717641B2 JP 5717641 B2 JP5717641 B2 JP 5717641B2 JP 2011535942 A JP2011535942 A JP 2011535942A JP 2011535942 A JP2011535942 A JP 2011535942A JP 5717641 B2 JP5717641 B2 JP 5717641B2
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- block copolymer
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- 238000000034 method Methods 0.000 title claims description 47
- 230000008569 process Effects 0.000 title claims description 18
- 229920000428 triblock copolymer Polymers 0.000 title description 13
- 239000000203 mixture Substances 0.000 claims description 51
- 229920001400 block copolymer Polymers 0.000 claims description 46
- 239000000178 monomer Substances 0.000 claims description 46
- 238000006116 polymerization reaction Methods 0.000 claims description 43
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 40
- 238000009826 distribution Methods 0.000 claims description 40
- 239000003999 initiator Substances 0.000 claims description 30
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 claims description 26
- 125000000524 functional group Chemical group 0.000 claims description 19
- 229920001577 copolymer Polymers 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 12
- -1 fumarate ester Chemical class 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 6
- 239000003054 catalyst Substances 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
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- 239000000565 sealant Substances 0.000 description 6
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- 150000003623 transition metal compounds Chemical class 0.000 description 5
- 150000003624 transition metals Chemical class 0.000 description 5
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 5
- LHZBJSPSWKIJKZ-UHFFFAOYSA-N 4-(2-bromo-2-methylpropanoyl)oxybutyl 2-bromo-2-methylpropanoate Chemical compound CC(C)(Br)C(=O)OCCCCOC(=O)C(C)(C)Br LHZBJSPSWKIJKZ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
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- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 230000002441 reversible effect Effects 0.000 description 3
- 150000003440 styrenes Chemical class 0.000 description 3
- 150000003464 sulfur compounds Chemical class 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N 1-Heptene Chemical compound CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 2
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 2
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 2
- PGMMQIGGQSIEGH-UHFFFAOYSA-N 2-ethenyl-1,3-oxazole Chemical compound C=CC1=NC=CO1 PGMMQIGGQSIEGH-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 150000001336 alkenes Chemical group 0.000 description 2
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(i) oxide Chemical compound [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 2
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
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- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
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- 238000006459 hydrosilylation reaction Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
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- 239000011159 matrix material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 description 2
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- JVPKLOPETWVKQD-UHFFFAOYSA-N 1,2,2-tribromoethenylbenzene Chemical compound BrC(Br)=C(Br)C1=CC=CC=C1 JVPKLOPETWVKQD-UHFFFAOYSA-N 0.000 description 1
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- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
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- WIWZLDGSODDMHJ-UHFFFAOYSA-N 1-ethoxybutyl 2-methylprop-2-enoate Chemical compound CCCC(OCC)OC(=O)C(C)=C WIWZLDGSODDMHJ-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
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- QHVBLSNVXDSMEB-UHFFFAOYSA-N 2-(diethylamino)ethyl prop-2-enoate Chemical compound CCN(CC)CCOC(=O)C=C QHVBLSNVXDSMEB-UHFFFAOYSA-N 0.000 description 1
- BEWCNXNIQCLWHP-UHFFFAOYSA-N 2-(tert-butylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC(C)(C)C BEWCNXNIQCLWHP-UHFFFAOYSA-N 0.000 description 1
- KDAKDBASXBEFFK-UHFFFAOYSA-N 2-(tert-butylamino)ethyl prop-2-enoate Chemical compound CC(C)(C)NCCOC(=O)C=C KDAKDBASXBEFFK-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
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- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
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- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
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- JBENUYBOHNHXIU-UHFFFAOYSA-N 4-ethenyl-9h-carbazole Chemical compound N1C2=CC=CC=C2C2=C1C=CC=C2C=C JBENUYBOHNHXIU-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- ZWAPMFBHEQZLGK-UHFFFAOYSA-N 5-(dimethylamino)-2-methylidenepentanamide Chemical compound CN(C)CCCC(=C)C(N)=O ZWAPMFBHEQZLGK-UHFFFAOYSA-N 0.000 description 1
- LKLNVHRUXQQEII-UHFFFAOYSA-N 5-ethenyl-2,3-dimethylpyridine Chemical compound CC1=CC(C=C)=CN=C1C LKLNVHRUXQQEII-UHFFFAOYSA-N 0.000 description 1
- FLCAEMBIQVZWIF-UHFFFAOYSA-N 6-(dimethylamino)-2-methylhex-2-enamide Chemical compound CN(C)CCCC=C(C)C(N)=O FLCAEMBIQVZWIF-UHFFFAOYSA-N 0.000 description 1
- NUXLDNTZFXDNBA-UHFFFAOYSA-N 6-bromo-2-methyl-4h-1,4-benzoxazin-3-one Chemical compound C1=C(Br)C=C2NC(=O)C(C)OC2=C1 NUXLDNTZFXDNBA-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
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- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/001—Multistage polymerisation processes characterised by a change in reactor conditions without deactivating the intermediate polymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/04—Polymerisation in solution
- C08F2/06—Organic solvent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/26—Removing halogen atoms or halogen-containing groups from the molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J153/00—Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Graft Or Block Polymers (AREA)
- Sealing Material Composition (AREA)
- Polymerization Catalysts (AREA)
- Paints Or Removers (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
アニオン重合の場合、複峰性が生じうる。しかしこれらの重合法は、特定の官能化を生じることができるにすぎない。ATRPについては、系に関する複峰性の分布が記載されている。しかし、これらのポリマーの複峰性はそのつど、一方ではブロックコポリマーの存在により、および他方では未反応のマクロ開始剤の存在により生じる。これらの方法の欠点は、2種類の異なったポリマー組成物の混合物からなる生成物が生じることである。EP1637550には、熱可塑性エラストマー中で使用するためのMMA−nBA−MMAトリブロックコポリマーの合成が記載されている。このような材料はせいぜい全てのブロック中で極めて狭い分子量分布を有していることは、当業者に公知である。Ruzette等(Macromolecules、39、17、第5804〜5814頁、2006)には、それぞれが広く分布したポリマーブロックを有する単峰性に分布したトリブロックコポリマーが記載されている。この結果は、最適ではない試験の実施に起因しており、幅広い分布のブロックコポリマーを製造するために適切に開発された方法ではないことが記載されている。Batt−Coutrot等(Europ.Pol.L.、39、12、第2243〜2252頁、2003)には、純粋なポリ酢酸ビニルからなる、部分的に幅広く分布したBブロックを有するABAトリブロックコポリマーが紹介されている。これらはマクロ開始剤から生じるが、マクロ開始剤は遊離基重合下に再び形成される。WO99/20659には、一方では2.5より小さい全分布を有するポリマーと、他方ではトリブロックコポリマーが示されているが、幅広く分布したトリブロックコポリマーを合成するため、もしくはそのようなポリマー自体についての教示は記載されていない。
開発の新たな段階は、以下に記載するトリブロックコポリマーである。
前記課題は、原子移動ラジカル重合(ATRP)に基づいた新規の重合法の提供により解決された。前記課題は特に、比較的長い時間にわたる開始により、より正確には開始剤の供給により解決された。
数平均分子量Mnもしくは質量平均分子量Mw、および分子量分布の尺度としての多分散性指数D=Mw/Mnは、ゲル透過クロマトグラフィー(GPC)によりテトラヒドロフラン中、PMMA標準液に対して測定される。
攪拌機、温度計、還流冷却器、窒素導入管および滴下漏斗を備えた二重壁容器に、N2雰囲気下でモノマー1a(正確な名称および量の記載は第1表)、酢酸プロピル160mL、酸化銅(I)(量は第1表を参照のこと)およびN,N,N′,N″,N″−ペンタメチルジエチレントリアミン(PMDETA、量は第1表を参照のこと)を装入した。該溶液を80℃で15分間撹拌した。引き続き、同じ温度で一定量の開始剤1(第1表を参照のこと)1,4−ブタンジオール−ジ−(2−ブロモ−2−メチルプロピオネート)(BDBIB、全開始剤を酢酸プロピル52mL中に溶解)を添加した。2分後に、均一な計量供給速度で一定量の開始剤2(第1表を参照のこと)1,4−ブタンジオール−ジ−(2−ブロモ−2−メチルプロピオネート)(BDBIB、酢酸プロピル中に溶解。上記を参照のこと)の添加を開始した。供給は中断することなく、かつ一定の供給速度で時間t1にわたって進行した。開始剤添加の完了後、重合溶液を時間t2の間、重合温度で撹拌し、次いで平均分子量Mnを測定(SECによる)するために試料を取り出し、かつモノマー2aとモノマー3a(正確な名称および量の記載は第1表)からなる混合物を添加した。該混合物をさらに80℃で2時間攪拌し、かつ引き続き3.0gのn−ドデシルメルカプタンの添加により中断した。該溶液をシリカゲルを用いた濾過およびその後の蒸留による揮発性成分の除去により後処理した。平均分子量を最終的にSEC測定により測定した。共重合されたモノマー3aの割合を、1H−NMR測定により定量化した。
比較例1と同様に、モノマー1b、2bおよび3b(正確な名称および量の記載は第1表)を使用した。供給時間はt1であり、ブロックBの後重合はt2であった(正確な時間はそれぞれ第1表に記載)。
比較例1と同様に、モノマー1c、2cおよび3c(正確な名称および量の記載は第1表)を使用した。供給時間はt1であり、ブロックBの後重合はt2であった(正確な時間はそれぞれ第1表に記載)。
比較例1と同様に、モノマー1d、2dおよび3d(正確な名称および量の記載は第1表)を使用した。供給時間はt1であり、ブロックBの後重合はt2であった(正確な時間はそれぞれ第1表に記載)。
電磁攪拌機、温度計、還流冷却器、窒素導入管および滴下漏斗を備えた二重壁容器に、N2雰囲気下でモノマー1e(正確な名称および量の記載は第2表)、酢酸プロピル125mL、酸化銅(I)0.5gおよびN,N,N′,N″,N″−ペンタメチルジエチレントリアミン(PMDETA)1.3gを装入した。該溶液を80℃で15分間撹拌した。引き続き、同じ温度で酢酸プロピル25mL中に溶解した開始剤1,4−ブタンジオール−ジ−(2−ブロモ−2−メチルプロピオネート)(BDBIB、量は第2表を参照のこと)を添加した。3時間の重合時間後に、平均分子量Mnを測定(SECによる)するために試料を取り出し、かつモノマー2eとモノマー3e(正確な名称および量の記載は第2表)からなる混合物を添加した。該混合物を少なくとも95%の予測される反応率に達するまで重合し、かつn−ドデシルメルカプタン2.1gの添加により中断した。該溶液をシリカゲルを用いた濾過およびその後の蒸留による揮発性成分の除去により後処理した。平均分子量を最終的にSEC測定により測定した。
比較例1と同様に、モノマー1f、2fおよび3f(正確な名称および量の記載は第2表)を使用した。
比較例2と同様に、モノマー2g、3gおよび4g(正確な名称および量の記載は第2表)を使用した。
Claims (17)
- 連続的に実施される原子移動ラジカル重合(ATRP)によりブロックコポリマーを製造する方法において、二官能性の開始剤の第一の部分を反応の開始時に重合溶液に添加し、かつその後、60分〜6時間の時間t1にわたって前記開始剤の第二の割合を計量供給することによって第二の割合を連続的に添加し、かつ組成ABA、ACBCAまたはCABACのブロックコポリマーが、全体で1.8より大きい多分散性指数を有する分子量分布を有することを特徴とする、ブロックコポリマーの製造方法。
- 請求項1記載のブロックコポリマーの製造方法であって、前記コポリマーが組成ABAを有し、ブロックAが、単峰性の分子量分布を有するコポリマーであり、ブロックBが、1.8より大きい多分散性指数を有する単峰性の分子量分布を有するコポリマーであり、前記ブロックAおよびブロックBのモノマーは、(メタ)アクリレートまたは(メタ)アクリレートの混合物を含むことを特徴とする、請求項1記載のブロックコポリマーの製造方法。
- 請求項1記載のブロックコポリマーの製造方法であって、前記コポリマーが組成ACBCAまたはCABACを有し、ブロックAおよびブロックCがそれぞれ1.6未満の多分散性指数を有する単峰性の分子量分布を有するコポリマーブロックであり、前記ブロックA、ブロックBおよびブロックCのモノマーは(メタ)アクリレートまたは(メタ)アクリレートの混合物を含み、かつブロックC中の(メタ)アクリレートまたは(メタ)アクリレートの混合物は、付加的な官能基を有していないことを特徴とする、請求項1記載のブロックコポリマーの製造方法。
- ブロックBが、1.8より大きい多分散性指数を有する単峰性の分子量分布を有するコポリマーであることを特徴とする、請求項3記載のブロックコポリマーの製造方法。
- 開始剤を2つのバッチにして添加し、その際、第一の開始剤バッチは、全開始剤量の10質量%〜60質量%であり、かつ重合の開始時に回分式で添加され、かつ第二の開始剤バッチを、第一の開始剤バッチの添加の直後に一定の供給速度で系に計量供給することを特徴とする、請求項1から4までのいずれか1項記載のブロックコポリマーの製造方法。
- 第一の開始剤バッチが、全開始剤量の20質量%〜40質量%であることを特徴とする、請求項5記載のブロックコポリマーの製造方法。
- 第二の開始剤バッチの供給を、重合溶液にモノマー混合物AもしくはCを添加する少なくとも60分前に終了することを特徴とする、請求項5または6記載のブロックコポリマーの製造方法。
- 第二の開始剤バッチの供給を、重合溶液にモノマー混合物AもしくはCを添加する少なくとも90分前に終了することを特徴とする、請求項7記載のブロックコポリマーの製造方法。
- ブロックコポリマーの個々のブロックAが、少なくとも1および最大で4の官能基を有する組成を有していることを特徴とする、請求項1から8までのいずれか1項記載のブロックコポリマーの製造方法。
- ブロックコポリマーの個々のブロックAが、少なくとも1および最大で2の官能基を有する組成を有していることを特徴とする、請求項9記載のブロックコポリマーの製造方法。
- ブロックAに、不飽和のラジカル重合可能な基、およびヒドロキシ基、アミン基、アリル基、シリル基もしくはエポキシ基から選択される第二の官能基を有するモノマーを共重合することを特徴とする、請求項9または10記載のブロックコポリマーの製造方法。
- 個々のブロックAが、ABAブロックコポリマーの全質量のそれぞれ25%未満であることを特徴とする、請求項2記載のブロックコポリマーの製造方法。
- 個々のブロックAが、ABAブロックコポリマーの全質量のそれぞれ10%未満であることを特徴とする、請求項2記載のブロックコポリマーの製造方法。
- 1つ、または複数のブロックが、さらにビニルエステル、ビニルエーテル、フマル酸エステル、マレイン酸エステル、スチレン、アクリロニトリル、またはその他の、ATRP重合可能なモノマーを含有していることを特徴とする、請求項1記載のブロックコポリマーの製造方法。
- ブロックコポリマーが、5000g/モル〜100000g/モルの数平均分子量を有していることを特徴とする、請求項1記載のブロックコポリマーの製造方法。
- ブロックコポリマーが、7500g/モル〜50000g/モルの数平均分子量を有していることを特徴とする、請求項15記載のブロックコポリマーの製造方法。
- 重合後に、メルカプタンまたはチオール基を有する化合物を添加することによりATRP触媒を沈殿させ、かつ濾過により重合溶液から分離することを特徴とする、請求項1記載のブロックコポリマーの製造方法。
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DE102008043669A DE102008043669A1 (de) | 2008-11-12 | 2008-11-12 | Verfahren zur Herstellung von ABA-Triblockcopolymeren mit einem breit verteilten B-Block |
PCT/EP2009/062927 WO2010054893A1 (de) | 2008-11-12 | 2009-10-06 | Verfahren zur herstellung von aba-triblockcopolymeren mit einem breit verteilten b-block. |
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EP (1) | EP2344558B1 (ja) |
JP (1) | JP5717641B2 (ja) |
CN (1) | CN102209736B (ja) |
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BR (1) | BRPI0922044A2 (ja) |
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US20130131204A1 (en) * | 2010-08-03 | 2013-05-23 | Paulus Jacobus Fennis | Process for preparing polymer polyols |
US20150005466A1 (en) * | 2013-07-01 | 2015-01-01 | E I Du Pont De Nemours And Company | Ab block copolymer dispersants having an ink vehicle soluble block |
FI126972B (en) * | 2014-04-11 | 2017-08-31 | Kemira Oyj | Water soluble crosslinked block copolymers |
US9587062B2 (en) | 2014-12-15 | 2017-03-07 | Henkel IP & Holding GmbH and Henkel AG & Co. KGaA | Photocrosslinkable block copolymers for hot-melt adhesives |
CN108417836B (zh) * | 2018-01-31 | 2021-05-04 | 闽南师范大学 | 一种锂离子电池的电极粘结剂及其制备方法 |
WO2019208386A1 (ja) * | 2018-04-27 | 2019-10-31 | 東亞合成株式会社 | 硬化性樹脂組成物、並びに、ブロック共重合体及びその製造方法 |
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US5807937A (en) | 1995-11-15 | 1998-09-15 | Carnegie Mellon University | Processes based on atom (or group) transfer radical polymerization and novel (co) polymers having useful structures and properties |
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TW593347B (en) | 1997-03-11 | 2004-06-21 | Univ Carnegie Mellon | Improvements in atom or group transfer radical polymerization |
US6482900B1 (en) | 1997-09-22 | 2002-11-19 | Kaneka Corporation | Polymer, process for producing the polymer, and curable composition containing the polymer |
US6143848A (en) | 1997-10-23 | 2000-11-07 | The B.F.Goodrich Company | End-functionalized polymers by controlled free-radical polymerization process and polymers made therefrom |
EP1085027B1 (en) | 1998-03-27 | 2004-11-03 | Kaneka Corporation | Polymer and process for producing polymer |
DE69933945T2 (de) | 1998-09-02 | 2007-09-13 | Kaneka Corp. | Polymer, verfahren zu seiner herstellung und zusammensetzung |
EP1637550B1 (en) | 1999-03-23 | 2017-09-20 | Carnegie Mellon University | Catalytic processes for the controlled polymerization of free radically (co) polymerizable monomers and functional polymeric systems prepared thereby |
TWI291472B (en) * | 1999-03-23 | 2007-12-21 | Univ Carnegie Mellon | Catalytic processes for the controlled polymerization of free radically (co)polymerizable monomers and functional polymeric systems prepared thereby |
JP4447753B2 (ja) * | 2000-08-11 | 2010-04-07 | 株式会社カネカ | ブロック共重合体を含有する硬化性組成物 |
JP2002338625A (ja) * | 2001-05-14 | 2002-11-27 | Kanegafuchi Chem Ind Co Ltd | ブロック共重合体 |
EP1475397A1 (en) | 2002-02-13 | 2004-11-10 | Kaneka Corporation | Block copolymer |
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EP1433799A3 (en) * | 2002-12-23 | 2004-07-14 | Ucb, S.A. | Star shaped acrylic block copolymer |
JP2004203917A (ja) * | 2002-12-24 | 2004-07-22 | Mitsubishi Chemicals Corp | ミクロ相分離構造を形成するブロックポリマーおよびそれを用いた化粧料 |
DE10350786A1 (de) | 2003-10-29 | 2005-06-02 | Röhm GmbH & Co. KG | Mischungen zur Herstellung von Reaktivschmelzklebstoffen sowie daraus erhältliche Reaktivschmelzklebstoffe |
DE102005045458A1 (de) * | 2005-09-22 | 2007-03-29 | Röhm Gmbh | Verfahren zur Herstellung von ABA-Triblockcopolymeren auf (Meth)acrylatbasis |
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DE102006035726A1 (de) | 2006-07-28 | 2008-01-31 | Evonik Röhm Gmbh | Verfahren zur Herstellung von ABA-Triblockcopolymeren auf (Meth)acrylatbasis |
DE102006037352A1 (de) | 2006-08-09 | 2008-02-14 | Evonik Röhm Gmbh | Verfahren zur Herstellung von säureterminierten ATRP-Produkten |
DE102006037350A1 (de) * | 2006-08-09 | 2008-02-14 | Evonik Röhm Gmbh | Verfahren zur Herstellung von halogenfreien ATRP-Produkten |
DE102006037351A1 (de) | 2006-08-09 | 2008-02-14 | Evonik Röhm Gmbh | Verfahren zur Herstellung von hydroxytelecheler ATRP-Produkten |
DE102006048154A1 (de) | 2006-10-10 | 2008-04-17 | Evonik Röhm Gmbh | Verfahren zur Herstellung von silyltelechelen Polymeren |
DE102008002016A1 (de) | 2008-05-28 | 2009-12-03 | Evonik Röhm Gmbh | Verfahren zur Herstellung von silyl-funktionalisierten ABA-Triblockcopolymeren auf (Meth)acrylatbasis |
DE102008043662A1 (de) * | 2008-11-12 | 2010-05-20 | Evonik Röhm Gmbh | Verfahren zur Herstellung von Telechelen mit breiter Molekulargewichtsverteilung |
DE102008043668A1 (de) * | 2008-11-12 | 2010-05-20 | Evonik Röhm Gmbh | Verfahren zur Herstellung von ABA-Triblockcopolymeren mit einem bimodalen B-Block |
DE102008043674A1 (de) * | 2008-11-12 | 2010-05-20 | Evonik Röhm Gmbh | Verfahren zur Herstellung von Telechelen mit einer bimodalen Molekulkargewichtsverteilung |
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- 2009-10-06 CN CN200980144196.9A patent/CN102209736B/zh not_active Expired - Fee Related
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- 2009-10-06 WO PCT/EP2009/062927 patent/WO2010054893A1/de active Application Filing
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CN102209736B (zh) | 2014-10-29 |
CN102209736A (zh) | 2011-10-05 |
EP2344558A1 (de) | 2011-07-20 |
DE102008043669A1 (de) | 2010-05-20 |
WO2010054893A1 (de) | 2010-05-20 |
AU2009315872A1 (en) | 2010-05-20 |
JP2012508308A (ja) | 2012-04-05 |
BRPI0922044A2 (pt) | 2015-12-22 |
US20110282007A1 (en) | 2011-11-17 |
US8829117B2 (en) | 2014-09-09 |
EP2344558B1 (de) | 2013-07-03 |
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