JP5627573B2 - アミノ官能性オルガノシランの製造からの塩含有残留物の後処理法 - Google Patents
アミノ官能性オルガノシランの製造からの塩含有残留物の後処理法 Download PDFInfo
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- JP5627573B2 JP5627573B2 JP2011512045A JP2011512045A JP5627573B2 JP 5627573 B2 JP5627573 B2 JP 5627573B2 JP 2011512045 A JP2011512045 A JP 2011512045A JP 2011512045 A JP2011512045 A JP 2011512045A JP 5627573 B2 JP5627573 B2 JP 5627573B2
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- 150000001282 organosilanes Chemical class 0.000 title claims description 45
- 150000003839 salts Chemical class 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 63
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 60
- 239000008346 aqueous phase Substances 0.000 claims description 38
- 239000012074 organic phase Substances 0.000 claims description 37
- 239000000203 mixture Substances 0.000 claims description 36
- 239000000243 solution Substances 0.000 claims description 36
- 150000001412 amines Chemical class 0.000 claims description 33
- 125000000217 alkyl group Chemical group 0.000 claims description 30
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 26
- 125000004432 carbon atom Chemical group C* 0.000 claims description 26
- 229910052739 hydrogen Inorganic materials 0.000 claims description 21
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 21
- 125000003118 aryl group Chemical group 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 18
- 239000001257 hydrogen Substances 0.000 claims description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 15
- -1 ammonium halide Chemical class 0.000 claims description 14
- 238000004821 distillation Methods 0.000 claims description 14
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical group OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 claims description 14
- 229910021529 ammonia Inorganic materials 0.000 claims description 13
- 239000012043 crude product Substances 0.000 claims description 12
- 239000003518 caustics Substances 0.000 claims description 11
- 239000000047 product Substances 0.000 claims description 11
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 10
- 239000007791 liquid phase Substances 0.000 claims description 10
- 239000003960 organic solvent Substances 0.000 claims description 9
- 238000002360 preparation method Methods 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000003495 polar organic solvent Substances 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 5
- 239000012071 phase Substances 0.000 claims description 5
- 238000011084 recovery Methods 0.000 claims description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 229910052794 bromium Inorganic materials 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 229910052740 iodine Inorganic materials 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 4
- 238000010626 work up procedure Methods 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims description 3
- 239000002318 adhesion promoter Substances 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 150000004820 halides Chemical class 0.000 claims description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- 239000007983 Tris buffer Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000012805 post-processing Methods 0.000 claims description 2
- 238000007711 solidification Methods 0.000 claims description 2
- 230000008023 solidification Effects 0.000 claims description 2
- 239000003208 petroleum Substances 0.000 claims 1
- 235000011118 potassium hydroxide Nutrition 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 27
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 24
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 13
- 239000011780 sodium chloride Substances 0.000 description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 9
- 238000004817 gas chromatography Methods 0.000 description 9
- 238000005191 phase separation Methods 0.000 description 9
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 7
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 5
- 229910001961 silver nitrate Inorganic materials 0.000 description 5
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000012482 calibration solution Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 101710134784 Agnoprotein Proteins 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000003918 potentiometric titration Methods 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000004513 sizing Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- AMWXPSAGXBLLEH-UHFFFAOYSA-N 2-dimethoxysilylethanamine Chemical compound CO[SiH](OC)CCN AMWXPSAGXBLLEH-UHFFFAOYSA-N 0.000 description 1
- DYIUKVBALLNLGQ-UHFFFAOYSA-N 2-methyl-3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CC(C)CN DYIUKVBALLNLGQ-UHFFFAOYSA-N 0.000 description 1
- FWTMTMVDOPTMQB-UHFFFAOYSA-N 2-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CC(C)CN FWTMTMVDOPTMQB-UHFFFAOYSA-N 0.000 description 1
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 1
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 1
- UKTWXFKRGWYPJY-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine;3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN.CCO[Si](C)(OCC)CCCN UKTWXFKRGWYPJY-UHFFFAOYSA-N 0.000 description 1
- GLISOBUNKGBQCL-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(C)CCCN GLISOBUNKGBQCL-UHFFFAOYSA-N 0.000 description 1
- MCLXOMWIZZCOCA-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propan-1-amine Chemical compound CO[Si](C)(C)CCCN MCLXOMWIZZCOCA-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- YFWCTOVRAUWJCK-UHFFFAOYSA-N 3-chloropropyl-diethyl-methoxysilane Chemical compound CC[Si](CC)(OC)CCCCl YFWCTOVRAUWJCK-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- QJAQAIYTCWZVPT-UHFFFAOYSA-N 3-chloropropyl-ethoxy-methyl-propylsilane Chemical compound CCC[Si](C)(OCC)CCCCl QJAQAIYTCWZVPT-UHFFFAOYSA-N 0.000 description 1
- YCXLTTZJNXCOML-UHFFFAOYSA-N 3-triethoxysilylpropan-1-amine;hydrochloride Chemical compound Cl.CCO[Si](OCC)(OCC)CCCN YCXLTTZJNXCOML-UHFFFAOYSA-N 0.000 description 1
- PFRLCKFENIXNMM-UHFFFAOYSA-N 3-trimethylsilylpropan-1-amine Chemical compound C[Si](C)(C)CCCN PFRLCKFENIXNMM-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 239000013058 crude material Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002557 mineral fiber Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- FVGHYEZZIBIGIF-UHFFFAOYSA-N n'-(2-aminoethyl)-n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCN(CCN)CCN FVGHYEZZIBIGIF-UHFFFAOYSA-N 0.000 description 1
- MZMDYNBNZQJTRW-UHFFFAOYSA-N n'-(2-aminoethyl)-n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCN(CCN)CCN MZMDYNBNZQJTRW-UHFFFAOYSA-N 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 description 1
- DTPZJXALAREFEY-UHFFFAOYSA-N n-methyl-3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCNC DTPZJXALAREFEY-UHFFFAOYSA-N 0.000 description 1
- DVYVMJLSUSGYMH-UHFFFAOYSA-N n-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CNCCC[Si](OC)(OC)OC DVYVMJLSUSGYMH-UHFFFAOYSA-N 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- ROWWCTUMLAVVQB-UHFFFAOYSA-N triethoxysilylmethanamine Chemical compound CCO[Si](CN)(OCC)OCC ROWWCTUMLAVVQB-UHFFFAOYSA-N 0.000 description 1
- ARKBFSWVHXKMSD-UHFFFAOYSA-N trimethoxysilylmethanamine Chemical compound CO[Si](CN)(OC)OC ARKBFSWVHXKMSD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008002183.0 | 2008-06-03 | ||
| DE200810002183 DE102008002183A1 (de) | 2008-06-03 | 2008-06-03 | Verfahren zur Aufarbeitung salzhaltiger Rückstände aus der Herstellung von aminofunktionellen Organosilanen |
| PCT/EP2009/054649 WO2009146972A1 (de) | 2008-06-03 | 2009-04-20 | Verfahren zur aufarbeitung salzhaltiger rückstände aus der herstellung von aminofunktionellen organosilanen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011521989A JP2011521989A (ja) | 2011-07-28 |
| JP2011521989A5 JP2011521989A5 (enExample) | 2012-03-22 |
| JP5627573B2 true JP5627573B2 (ja) | 2014-11-19 |
Family
ID=40790770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011512045A Expired - Fee Related JP5627573B2 (ja) | 2008-06-03 | 2009-04-20 | アミノ官能性オルガノシランの製造からの塩含有残留物の後処理法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9079926B2 (enExample) |
| EP (1) | EP2285813B1 (enExample) |
| JP (1) | JP5627573B2 (enExample) |
| KR (1) | KR101588914B1 (enExample) |
| CN (1) | CN101597301B (enExample) |
| DE (1) | DE102008002183A1 (enExample) |
| ES (1) | ES2524348T3 (enExample) |
| WO (1) | WO2009146972A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008002181A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur wässrigen Aufarbeitung eines Ammoniumhalogenide und/oder organische Aminhydrohalogenide enthaltenden aminofunktionellen Organosilans |
| CN105273231A (zh) * | 2014-07-12 | 2016-01-27 | 卢桂才 | 氨基类硅烷沥青水泥防水桥联剂及其防水产品和应用 |
| DE102015225883A1 (de) | 2015-12-18 | 2017-06-22 | Evonik Degussa Gmbh | Bis(alkylalkoxysilyl)amin-reiche Zusammensetzungen, ein Verfahren zur deren Herstellung und deren Verwendung |
| DE102015225879A1 (de) | 2015-12-18 | 2017-06-22 | Evonik Degussa Gmbh | Tris-(alkylalkoxysilyl)amin-reiche Zusammensetzungen, deren Herstellung und deren Verwendung |
| DE102016215256A1 (de) | 2016-08-16 | 2018-02-22 | Evonik Degussa Gmbh | Bis- und Tris(organosilyl)amine enthaltende Zusammensetzungen, deren Herstellung und deren Verwendung |
| DE102016215260A1 (de) | 2016-08-16 | 2018-02-22 | Evonik Degussa Gmbh | Verwendung einer (Alkylalkoxysily)amin-, Bis-(alkylalkoxysilyl)amin und/oder Tris-(alkylalkoxysilyl)amin-enthaltenden Zusammensetzung |
| CN108250232B (zh) * | 2018-02-09 | 2021-03-16 | 浙江博瑞电子科技有限公司 | 一种双（二乙基）氨基硅烷的精制方法 |
| US11131919B2 (en) * | 2018-06-22 | 2021-09-28 | International Business Machines Corporation | Extreme ultraviolet (EUV) mask stack processing |
| CN116332980A (zh) * | 2023-04-06 | 2023-06-27 | 合肥安德科铭半导体科技有限公司 | 一种制备低氯含量的氨基硅烷的方法 |
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| DE2753124A1 (de) | 1977-11-29 | 1979-06-07 | Dynamit Nobel Ag | Verfahren zur herstellung von aminoalkylsilanen |
| US4498538A (en) | 1983-06-21 | 1985-02-12 | Union Oil Company Of California | Method for maintaining the permeability of fines-containing formations |
| US4580633A (en) | 1983-12-21 | 1986-04-08 | Union Oil Company Of California | Increasing the flow of fluids through a permeable formation |
| US4526996A (en) * | 1984-06-19 | 1985-07-02 | Union Carbide Corporation | Process for the preparation of N-substituted aminoalkylsilanes |
| DE4130643A1 (de) | 1991-09-14 | 1993-03-18 | Degussa | Verfahren zur reinigung von alkoxysilanen |
| EP0702017B1 (de) | 1994-09-14 | 2001-11-14 | Degussa AG | Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen |
| DE19516386A1 (de) | 1995-05-04 | 1996-11-07 | Huels Chemische Werke Ag | Verfahren zur Herstellung von an chlorfunktionellen Organosilanen armen bzw. freien aminofunktionellen Organosilanen |
| US5760019A (en) * | 1996-07-12 | 1998-06-02 | The Research Foundation Of State University Of New York | Silanol enzyme inhibitors |
| DE19652642A1 (de) | 1996-12-18 | 1998-06-25 | Degussa | Kontinuierliches Verfahren zur Herstellung von gamma-Aminopropyltrialkoxysilanen |
| DE19849196A1 (de) | 1998-10-26 | 2000-04-27 | Degussa | Verfahren zur Neutralisation und Minderung von Resthalogengehalten in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen |
| ATE284406T1 (de) | 1998-11-06 | 2004-12-15 | Degussa | Verfahren zur herstellung von chloridarmen oder chloridfreien alkoxysilanen |
| DE19961972A1 (de) * | 1999-12-22 | 2001-06-28 | Degussa | Organosilan- und/oder Organosiloxan-haltige Mittel für gefülltes Polyamid |
| DE10058620A1 (de) | 2000-11-25 | 2002-05-29 | Degussa | Verfahren zur Herstellung von Aminoalkylsilanen |
| DE10126669A1 (de) | 2001-06-01 | 2002-12-05 | Degussa | Verfahren zur Spaltung von cyclischen Organosilanen bei der Herstellung von aminofunktionellen Organoalkoxysilanen |
| DE10140563A1 (de) | 2001-08-18 | 2003-02-27 | Degussa | Verfahren zur Herstellung von aminofunktionellen Organosilanen |
| DE10143568C2 (de) | 2001-09-05 | 2003-07-03 | Degussa | Verfahren zur Behandlung von Aminosilanverfärbungen |
| DE10146087A1 (de) | 2001-09-19 | 2003-04-03 | Degussa | Verfahren zur Herstellung von Aminoalkylsilanen |
| US6963006B2 (en) * | 2003-01-15 | 2005-11-08 | Air Products And Chemicals, Inc. | Process for the production and purification of bis(tertiary-butylamino)silane |
| US20040177957A1 (en) | 2003-03-10 | 2004-09-16 | Kalfayan Leonard J. | Organosilicon containing compositions for enhancing hydrocarbon production and method of using the same |
| DE10353063B4 (de) * | 2003-11-13 | 2006-03-02 | Wacker-Chemie Gmbh | Verfahren zur Herstellung von (N-Organylaminoorganyl)- und (N,N-Diorganylaminoorganyl)triorganylsilanen sowie (N-Cyclohexylaminomethyl)trimethoxysilan und [N,N-Bis-(N',N'-dimethylaminopropyl)aminomethyl]triorganylsilan erhältliche mittels dieses Verfahrens |
| EA012088B1 (ru) | 2004-06-17 | 2009-08-28 | Статойлгидро Аса | Обработка скважин |
| AU2005254781C1 (en) | 2004-06-17 | 2009-12-03 | Equinor Energy As | Well treatment |
| DE102004060627A1 (de) * | 2004-12-16 | 2006-07-06 | Wacker Chemie Ag | Verfahren zur kontinuierlichen Herstellung von Amino-Gruppen tragenden Silicium-Verbindungen |
| FR2886296B1 (fr) * | 2005-05-26 | 2007-07-20 | Rhodia Chimie Sa | Procede de preparation de composes organosiliciques en milieu biphasique |
| DE102008002182A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Alkylaminoalkylalkoxysilanen |
| DE102008002181A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur wässrigen Aufarbeitung eines Ammoniumhalogenide und/oder organische Aminhydrohalogenide enthaltenden aminofunktionellen Organosilans |
-
2008
- 2008-06-03 DE DE200810002183 patent/DE102008002183A1/de not_active Withdrawn
-
2009
- 2009-04-20 JP JP2011512045A patent/JP5627573B2/ja not_active Expired - Fee Related
- 2009-04-20 KR KR1020107027076A patent/KR101588914B1/ko not_active Expired - Fee Related
- 2009-04-20 ES ES09757355.4T patent/ES2524348T3/es active Active
- 2009-04-20 EP EP09757355.4A patent/EP2285813B1/de not_active Not-in-force
- 2009-04-20 US US12/995,871 patent/US9079926B2/en not_active Expired - Fee Related
- 2009-04-20 WO PCT/EP2009/054649 patent/WO2009146972A1/de not_active Ceased
- 2009-06-02 CN CN200910141343.9A patent/CN101597301B/zh not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| DE102008002183A1 (de) | 2009-12-10 |
| EP2285813B1 (de) | 2014-09-24 |
| ES2524348T3 (es) | 2014-12-05 |
| KR101588914B1 (ko) | 2016-01-26 |
| JP2011521989A (ja) | 2011-07-28 |
| US9079926B2 (en) | 2015-07-14 |
| WO2009146972A1 (de) | 2009-12-10 |
| CN101597301A (zh) | 2009-12-09 |
| KR20110014174A (ko) | 2011-02-10 |
| US20110146535A1 (en) | 2011-06-23 |
| EP2285813A1 (de) | 2011-02-23 |
| CN101597301B (zh) | 2015-07-01 |
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