CN101597301B - 用于后处理来自制备氨基官能有机硅烷的含盐残留物的方法 - Google Patents
用于后处理来自制备氨基官能有机硅烷的含盐残留物的方法 Download PDFInfo
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- CN101597301B CN101597301B CN200910141343.9A CN200910141343A CN101597301B CN 101597301 B CN101597301 B CN 101597301B CN 200910141343 A CN200910141343 A CN 200910141343A CN 101597301 B CN101597301 B CN 101597301B
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- alkyl
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- carbon atom
- straight chain
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- 150000001282 organosilanes Chemical class 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims abstract description 30
- 150000003839 salts Chemical class 0.000 title abstract description 10
- 238000004519 manufacturing process Methods 0.000 title abstract description 4
- 239000012074 organic phase Substances 0.000 claims abstract description 40
- 239000008346 aqueous phase Substances 0.000 claims abstract description 39
- 150000001412 amines Chemical class 0.000 claims abstract description 38
- 239000000203 mixture Substances 0.000 claims abstract description 38
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003960 organic solvent Substances 0.000 claims abstract description 18
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 9
- 239000012071 phase Substances 0.000 claims abstract description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 81
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 60
- 125000000217 alkyl group Chemical group 0.000 claims description 39
- 229910052799 carbon Inorganic materials 0.000 claims description 38
- 239000000243 solution Substances 0.000 claims description 30
- 150000001721 carbon Chemical group 0.000 claims description 29
- 125000003118 aryl group Chemical group 0.000 claims description 20
- -1 ammonium halide Chemical class 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- 150000002431 hydrogen Chemical group 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 19
- 229910052801 chlorine Inorganic materials 0.000 claims description 16
- 238000002360 preparation method Methods 0.000 claims description 15
- 239000003513 alkali Substances 0.000 claims description 14
- 239000012043 crude product Substances 0.000 claims description 14
- 238000004821 distillation Methods 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 11
- 150000002367 halogens Chemical class 0.000 claims description 11
- 239000007791 liquid phase Substances 0.000 claims description 11
- 239000000047 product Substances 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 5
- 230000000717 retained effect Effects 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 4
- 238000013019 agitation Methods 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- 239000003495 polar organic solvent Substances 0.000 abstract 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 24
- 239000000460 chlorine Substances 0.000 description 23
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 13
- 239000007788 liquid Substances 0.000 description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 239000011780 sodium chloride Substances 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 8
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 7
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 7
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 150000003840 hydrochlorides Chemical class 0.000 description 5
- 101710134784 Agnoprotein Proteins 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 229910001961 silver nitrate Inorganic materials 0.000 description 4
- 238000004448 titration Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 229960000583 acetic acid Drugs 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- 238000005194 fractionation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007701 flash-distillation Methods 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 1
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- YFWCTOVRAUWJCK-UHFFFAOYSA-N 3-chloropropyl-diethyl-methoxysilane Chemical compound CC[Si](CC)(OC)CCCCl YFWCTOVRAUWJCK-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- IJAAVDUFBXLLQL-UHFFFAOYSA-N CCO[SiH](CCCCl)OCC Chemical compound CCO[SiH](CCCCl)OCC IJAAVDUFBXLLQL-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- IHTAVMHKEISGKU-UHFFFAOYSA-N N[SiH3].N[SiH3] Chemical compound N[SiH3].N[SiH3] IHTAVMHKEISGKU-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- DPDMMXDBJGCCQC-UHFFFAOYSA-N [Na].[Cl] Chemical compound [Na].[Cl] DPDMMXDBJGCCQC-UHFFFAOYSA-N 0.000 description 1
- LTRPLRHNXPTOIN-UHFFFAOYSA-N [diethoxy(methyl)silyl]methanamine Chemical compound CCO[Si](C)(CN)OCC LTRPLRHNXPTOIN-UHFFFAOYSA-N 0.000 description 1
- KIUCLRQNNKHLDB-UHFFFAOYSA-N [dimethoxy(methyl)silyl]methanamine Chemical compound CO[Si](C)(CN)OC KIUCLRQNNKHLDB-UHFFFAOYSA-N 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 125000005055 alkyl alkoxy group Chemical group 0.000 description 1
- 239000003708 ampul Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002557 mineral fiber Substances 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000009955 starching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- ROWWCTUMLAVVQB-UHFFFAOYSA-N triethoxysilylmethanamine Chemical compound CCO[Si](CN)(OCC)OCC ROWWCTUMLAVVQB-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- ARKBFSWVHXKMSD-UHFFFAOYSA-N trimethoxysilylmethanamine Chemical compound CO[Si](CN)(OC)OC ARKBFSWVHXKMSD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008002183.0 | 2008-06-03 | ||
| DE200810002183 DE102008002183A1 (de) | 2008-06-03 | 2008-06-03 | Verfahren zur Aufarbeitung salzhaltiger Rückstände aus der Herstellung von aminofunktionellen Organosilanen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101597301A CN101597301A (zh) | 2009-12-09 |
| CN101597301B true CN101597301B (zh) | 2015-07-01 |
Family
ID=40790770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910141343.9A Expired - Fee Related CN101597301B (zh) | 2008-06-03 | 2009-06-02 | 用于后处理来自制备氨基官能有机硅烷的含盐残留物的方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9079926B2 (enExample) |
| EP (1) | EP2285813B1 (enExample) |
| JP (1) | JP5627573B2 (enExample) |
| KR (1) | KR101588914B1 (enExample) |
| CN (1) | CN101597301B (enExample) |
| DE (1) | DE102008002183A1 (enExample) |
| ES (1) | ES2524348T3 (enExample) |
| WO (1) | WO2009146972A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008002181A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur wässrigen Aufarbeitung eines Ammoniumhalogenide und/oder organische Aminhydrohalogenide enthaltenden aminofunktionellen Organosilans |
| CN105273231A (zh) * | 2014-07-12 | 2016-01-27 | 卢桂才 | 氨基类硅烷沥青水泥防水桥联剂及其防水产品和应用 |
| DE102015225883A1 (de) | 2015-12-18 | 2017-06-22 | Evonik Degussa Gmbh | Bis(alkylalkoxysilyl)amin-reiche Zusammensetzungen, ein Verfahren zur deren Herstellung und deren Verwendung |
| DE102015225879A1 (de) | 2015-12-18 | 2017-06-22 | Evonik Degussa Gmbh | Tris-(alkylalkoxysilyl)amin-reiche Zusammensetzungen, deren Herstellung und deren Verwendung |
| DE102016215256A1 (de) | 2016-08-16 | 2018-02-22 | Evonik Degussa Gmbh | Bis- und Tris(organosilyl)amine enthaltende Zusammensetzungen, deren Herstellung und deren Verwendung |
| DE102016215260A1 (de) | 2016-08-16 | 2018-02-22 | Evonik Degussa Gmbh | Verwendung einer (Alkylalkoxysily)amin-, Bis-(alkylalkoxysilyl)amin und/oder Tris-(alkylalkoxysilyl)amin-enthaltenden Zusammensetzung |
| CN108250232B (zh) * | 2018-02-09 | 2021-03-16 | 浙江博瑞电子科技有限公司 | 一种双（二乙基）氨基硅烷的精制方法 |
| US11131919B2 (en) * | 2018-06-22 | 2021-09-28 | International Business Machines Corporation | Extreme ultraviolet (EUV) mask stack processing |
| CN116332980A (zh) * | 2023-04-06 | 2023-06-27 | 合肥安德科铭半导体科技有限公司 | 一种制备低氯含量的氨基硅烷的方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5260470A (en) * | 1991-09-14 | 1993-11-09 | Degussa Aktiengesellschaft | Method of purifying alkoxysilanes |
| EP1111002B1 (de) * | 1999-12-22 | 2007-10-10 | Degussa GmbH | Organosilan- und/oder Organosiloxan-haltige Mittel für gefülltes Polyamid |
| CN101184766A (zh) * | 2005-05-26 | 2008-05-21 | 罗狄亚化学公司 | 在两相介质中制备有机硅化合物的方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE544556A (enExample) | 1955-01-21 | |||
| JPS5112608B2 (enExample) * | 1973-05-29 | 1976-04-21 | ||
| DE2749316C2 (de) | 1977-11-04 | 1979-05-03 | Dynamit Nobel Ag, 5210 Troisdorf | Verfahren zur Herstellung von yAminopropylalkoxisilanen |
| DE2753124A1 (de) | 1977-11-29 | 1979-06-07 | Dynamit Nobel Ag | Verfahren zur herstellung von aminoalkylsilanen |
| US4498538A (en) | 1983-06-21 | 1985-02-12 | Union Oil Company Of California | Method for maintaining the permeability of fines-containing formations |
| US4580633A (en) | 1983-12-21 | 1986-04-08 | Union Oil Company Of California | Increasing the flow of fluids through a permeable formation |
| US4526996A (en) * | 1984-06-19 | 1985-07-02 | Union Carbide Corporation | Process for the preparation of N-substituted aminoalkylsilanes |
| EP0702017B1 (de) | 1994-09-14 | 2001-11-14 | Degussa AG | Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen |
| DE19516386A1 (de) | 1995-05-04 | 1996-11-07 | Huels Chemische Werke Ag | Verfahren zur Herstellung von an chlorfunktionellen Organosilanen armen bzw. freien aminofunktionellen Organosilanen |
| US5760019A (en) * | 1996-07-12 | 1998-06-02 | The Research Foundation Of State University Of New York | Silanol enzyme inhibitors |
| DE19652642A1 (de) | 1996-12-18 | 1998-06-25 | Degussa | Kontinuierliches Verfahren zur Herstellung von gamma-Aminopropyltrialkoxysilanen |
| DE19849196A1 (de) | 1998-10-26 | 2000-04-27 | Degussa | Verfahren zur Neutralisation und Minderung von Resthalogengehalten in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen |
| ATE284406T1 (de) | 1998-11-06 | 2004-12-15 | Degussa | Verfahren zur herstellung von chloridarmen oder chloridfreien alkoxysilanen |
| DE10058620A1 (de) | 2000-11-25 | 2002-05-29 | Degussa | Verfahren zur Herstellung von Aminoalkylsilanen |
| DE10126669A1 (de) | 2001-06-01 | 2002-12-05 | Degussa | Verfahren zur Spaltung von cyclischen Organosilanen bei der Herstellung von aminofunktionellen Organoalkoxysilanen |
| DE10140563A1 (de) | 2001-08-18 | 2003-02-27 | Degussa | Verfahren zur Herstellung von aminofunktionellen Organosilanen |
| DE10143568C2 (de) | 2001-09-05 | 2003-07-03 | Degussa | Verfahren zur Behandlung von Aminosilanverfärbungen |
| DE10146087A1 (de) | 2001-09-19 | 2003-04-03 | Degussa | Verfahren zur Herstellung von Aminoalkylsilanen |
| US6963006B2 (en) * | 2003-01-15 | 2005-11-08 | Air Products And Chemicals, Inc. | Process for the production and purification of bis(tertiary-butylamino)silane |
| US20040177957A1 (en) | 2003-03-10 | 2004-09-16 | Kalfayan Leonard J. | Organosilicon containing compositions for enhancing hydrocarbon production and method of using the same |
| DE10353063B4 (de) * | 2003-11-13 | 2006-03-02 | Wacker-Chemie Gmbh | Verfahren zur Herstellung von (N-Organylaminoorganyl)- und (N,N-Diorganylaminoorganyl)triorganylsilanen sowie (N-Cyclohexylaminomethyl)trimethoxysilan und [N,N-Bis-(N',N'-dimethylaminopropyl)aminomethyl]triorganylsilan erhältliche mittels dieses Verfahrens |
| EA012088B1 (ru) | 2004-06-17 | 2009-08-28 | Статойлгидро Аса | Обработка скважин |
| AU2005254781C1 (en) | 2004-06-17 | 2009-12-03 | Equinor Energy As | Well treatment |
| DE102004060627A1 (de) * | 2004-12-16 | 2006-07-06 | Wacker Chemie Ag | Verfahren zur kontinuierlichen Herstellung von Amino-Gruppen tragenden Silicium-Verbindungen |
| DE102008002182A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Alkylaminoalkylalkoxysilanen |
| DE102008002181A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur wässrigen Aufarbeitung eines Ammoniumhalogenide und/oder organische Aminhydrohalogenide enthaltenden aminofunktionellen Organosilans |
-
2008
- 2008-06-03 DE DE200810002183 patent/DE102008002183A1/de not_active Withdrawn
-
2009
- 2009-04-20 JP JP2011512045A patent/JP5627573B2/ja not_active Expired - Fee Related
- 2009-04-20 KR KR1020107027076A patent/KR101588914B1/ko not_active Expired - Fee Related
- 2009-04-20 ES ES09757355.4T patent/ES2524348T3/es active Active
- 2009-04-20 EP EP09757355.4A patent/EP2285813B1/de not_active Not-in-force
- 2009-04-20 US US12/995,871 patent/US9079926B2/en not_active Expired - Fee Related
- 2009-04-20 WO PCT/EP2009/054649 patent/WO2009146972A1/de not_active Ceased
- 2009-06-02 CN CN200910141343.9A patent/CN101597301B/zh not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5260470A (en) * | 1991-09-14 | 1993-11-09 | Degussa Aktiengesellschaft | Method of purifying alkoxysilanes |
| EP1111002B1 (de) * | 1999-12-22 | 2007-10-10 | Degussa GmbH | Organosilan- und/oder Organosiloxan-haltige Mittel für gefülltes Polyamid |
| CN101184766A (zh) * | 2005-05-26 | 2008-05-21 | 罗狄亚化学公司 | 在两相介质中制备有机硅化合物的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102008002183A1 (de) | 2009-12-10 |
| EP2285813B1 (de) | 2014-09-24 |
| ES2524348T3 (es) | 2014-12-05 |
| KR101588914B1 (ko) | 2016-01-26 |
| JP5627573B2 (ja) | 2014-11-19 |
| JP2011521989A (ja) | 2011-07-28 |
| US9079926B2 (en) | 2015-07-14 |
| WO2009146972A1 (de) | 2009-12-10 |
| CN101597301A (zh) | 2009-12-09 |
| KR20110014174A (ko) | 2011-02-10 |
| US20110146535A1 (en) | 2011-06-23 |
| EP2285813A1 (de) | 2011-02-23 |
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