JP5612297B2 - 直接アドレス指定可能アレイへの自己集合化材料を用いた化学的ピニング - Google Patents

直接アドレス指定可能アレイへの自己集合化材料を用いた化学的ピニング Download PDF

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Publication number
JP5612297B2
JP5612297B2 JP2009264096A JP2009264096A JP5612297B2 JP 5612297 B2 JP5612297 B2 JP 5612297B2 JP 2009264096 A JP2009264096 A JP 2009264096A JP 2009264096 A JP2009264096 A JP 2009264096A JP 5612297 B2 JP5612297 B2 JP 5612297B2
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Prior art keywords
self
pattern
period
brush layer
substrate
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JP2009264096A
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Japanese (ja)
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JP2010123239A (ja
JP2010123239A5 (enExample
Inventor
シャオ シュアイガン
シャオ シュアイガン
ヤン シャオミン
ヤン シャオミン
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Seagate Technology LLC
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Seagate Technology LLC
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • B05D1/322—Removable films used as masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
    • G11B5/596—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following for track following on disks
    • G11B5/59633—Servo formatting
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/743—Patterned record carriers, wherein the magnetic recording layer is patterned into magnetic isolated data islands, e.g. discrete tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/743—Patterned record carriers, wherein the magnetic recording layer is patterned into magnetic isolated data islands, e.g. discrete tracks
    • G11B5/746—Bit Patterned record carriers, wherein each magnetic isolated data island corresponds to a bit
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/82—Disk carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0147—Film patterning
    • B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Magnetic Record Carriers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP2009264096A 2008-11-19 2009-11-19 直接アドレス指定可能アレイへの自己集合化材料を用いた化学的ピニング Expired - Fee Related JP5612297B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/273,791 2008-11-19
US12/273,791 US8993060B2 (en) 2008-11-19 2008-11-19 Chemical pinning to direct addressable array using self-assembling materials

Publications (3)

Publication Number Publication Date
JP2010123239A JP2010123239A (ja) 2010-06-03
JP2010123239A5 JP2010123239A5 (enExample) 2013-01-10
JP5612297B2 true JP5612297B2 (ja) 2014-10-22

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JP2009264096A Expired - Fee Related JP5612297B2 (ja) 2008-11-19 2009-11-19 直接アドレス指定可能アレイへの自己集合化材料を用いた化学的ピニング

Country Status (3)

Country Link
US (2) US8993060B2 (enExample)
JP (1) JP5612297B2 (enExample)
CN (1) CN101913554B (enExample)

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WO2009079241A2 (en) * 2007-12-07 2009-06-25 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
US8993060B2 (en) * 2008-11-19 2015-03-31 Seagate Technology Llc Chemical pinning to direct addressable array using self-assembling materials
US8673541B2 (en) * 2010-10-29 2014-03-18 Seagate Technology Llc Block copolymer assembly methods and patterns formed thereby
US20120135159A1 (en) * 2010-11-30 2012-05-31 Seagate Technology Llc System and method for imprint-guided block copolymer nano-patterning
US9469525B2 (en) 2011-01-31 2016-10-18 Seagate Technology Llc Modified surface for block copolymer self-assembly
US20120196094A1 (en) 2011-01-31 2012-08-02 Seagate Technology Llc Hybrid-guided block copolymer assembly
US20120273999A1 (en) 2011-04-29 2012-11-01 Seagate Technology, Llc Method for patterning a stack
JP5558444B2 (ja) * 2011-09-16 2014-07-23 株式会社東芝 モールドの製造方法
JP5575170B2 (ja) 2012-03-22 2014-08-20 株式会社東芝 スタンパおよび磁気ディスク
US8911846B2 (en) * 2012-10-05 2014-12-16 Seagate Technology Llc Block copolymer assembly
US8926851B2 (en) 2012-11-18 2015-01-06 HGST Netherlands B.V. Method for making a film of uniformly arranged core-shell nanoparticles on a substrate
US9638995B2 (en) * 2013-03-12 2017-05-02 Seagate Technology Llc Method of sheared guiding patterns
JP5904981B2 (ja) * 2013-09-09 2016-04-20 株式会社東芝 パターン形成方法、磁気記録媒体の製造方法、及び磁気記録媒体
US9275676B2 (en) 2014-02-28 2016-03-01 Seagate Technology Llc Skew compensation in a patterned medium
US9489974B2 (en) 2014-04-11 2016-11-08 Seagate Technology Llc Method of fabricating a BPM template using hierarchical BCP density patterns
JP2016051487A (ja) * 2014-08-29 2016-04-11 株式会社東芝 磁気記録媒体、磁気記録媒体の製造方法、磁気記録再生装置
JP6267143B2 (ja) * 2015-03-05 2018-01-24 東京エレクトロン株式会社 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム
US9269384B1 (en) 2015-05-29 2016-02-23 Seagate Technology Llc Template misalignment and eccentricity error compensation for a patterned medium
US10529366B2 (en) 2017-04-11 2020-01-07 Seagate Technology Llc Sidewall guided directed self assembly data storage medium
US11008481B1 (en) * 2017-05-31 2021-05-18 Seagate Technology Llc Polymer brush reflow for directed self-assembly of block copolymer thin films
CN113753849A (zh) * 2020-06-03 2021-12-07 芯恩（青岛）集成电路有限公司 嵌段共聚物定向自组装刻蚀方法

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US8673541B2 (en) * 2010-10-29 2014-03-18 Seagate Technology Llc Block copolymer assembly methods and patterns formed thereby

Also Published As

Publication number Publication date
JP2010123239A (ja) 2010-06-03
US9269388B2 (en) 2016-02-23
CN101913554A (zh) 2010-12-15
US20150206549A1 (en) 2015-07-23
US20100124638A1 (en) 2010-05-20
US8993060B2 (en) 2015-03-31
CN101913554B (zh) 2014-02-12

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