JP5604371B2 - 液処理装置および液処理方法 - Google Patents

液処理装置および液処理方法 Download PDF

Info

Publication number
JP5604371B2
JP5604371B2 JP2011129241A JP2011129241A JP5604371B2 JP 5604371 B2 JP5604371 B2 JP 5604371B2 JP 2011129241 A JP2011129241 A JP 2011129241A JP 2011129241 A JP2011129241 A JP 2011129241A JP 5604371 B2 JP5604371 B2 JP 5604371B2
Authority
JP
Japan
Prior art keywords
nozzle
substrate
liquid
cover mechanism
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011129241A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012256745A5 (enExample
JP2012256745A (ja
Inventor
藤 規 宏 伊
浦 一 博 相
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2011129241A priority Critical patent/JP5604371B2/ja
Priority to KR1020120046818A priority patent/KR101694568B1/ko
Priority to US13/490,799 priority patent/US9064908B2/en
Publication of JP2012256745A publication Critical patent/JP2012256745A/ja
Publication of JP2012256745A5 publication Critical patent/JP2012256745A5/ja
Application granted granted Critical
Publication of JP5604371B2 publication Critical patent/JP5604371B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
JP2011129241A 2011-06-09 2011-06-09 液処理装置および液処理方法 Active JP5604371B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011129241A JP5604371B2 (ja) 2011-06-09 2011-06-09 液処理装置および液処理方法
KR1020120046818A KR101694568B1 (ko) 2011-06-09 2012-05-03 액처리 장치 및 액처리 방법
US13/490,799 US9064908B2 (en) 2011-06-09 2012-06-07 Substrate liquid processing apparatus, liquid processing method, and storage medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011129241A JP5604371B2 (ja) 2011-06-09 2011-06-09 液処理装置および液処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014168678A Division JP5855721B2 (ja) 2014-08-21 2014-08-21 液処理装置および液処理方法

Publications (3)

Publication Number Publication Date
JP2012256745A JP2012256745A (ja) 2012-12-27
JP2012256745A5 JP2012256745A5 (enExample) 2013-07-25
JP5604371B2 true JP5604371B2 (ja) 2014-10-08

Family

ID=47292100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011129241A Active JP5604371B2 (ja) 2011-06-09 2011-06-09 液処理装置および液処理方法

Country Status (3)

Country Link
US (1) US9064908B2 (enExample)
JP (1) JP5604371B2 (enExample)
KR (1) KR101694568B1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160027800A (ko) * 2014-09-02 2016-03-10 주식회사 제우스 기판 액처리 방법 및 장치
KR20170007988A (ko) * 2015-07-13 2017-01-23 주식회사 제우스 기판 액처리 장치 및 방법

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5496966B2 (ja) * 2011-08-05 2014-05-21 東京エレクトロン株式会社 液処理装置
US20140026926A1 (en) * 2012-07-30 2014-01-30 Lam Research Ag Method and apparatus for liquid treatment of wafer-shaped articles
US9966282B2 (en) * 2014-09-30 2018-05-08 Shibaura Mechatronics Corporation Substrate processing apparatus and substrate processing method
TWI661479B (zh) 2015-02-12 2019-06-01 日商思可林集團股份有限公司 基板處理裝置、基板處理系統以及基板處理方法
JP6426499B2 (ja) * 2015-02-27 2018-11-21 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、基板処理システムおよび基板処理方法
JP6748524B2 (ja) * 2015-09-30 2020-09-02 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
US9964863B1 (en) * 2016-12-20 2018-05-08 Applied Materials, Inc. Post exposure processing apparatus
CN108695214B (zh) * 2018-05-21 2020-09-04 新昌县皇骐电子科技有限公司 一种晶圆的湿法刻蚀装置
US11139183B2 (en) * 2018-05-24 2021-10-05 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for dry wafer transport
JP7253955B2 (ja) * 2019-03-28 2023-04-07 東京エレクトロン株式会社 基板処理装置および基板処理方法
JP7509657B2 (ja) * 2020-10-29 2024-07-02 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
KR102616061B1 (ko) * 2021-08-24 2023-12-20 (주)디바이스이엔지 바울 조립체를 포함하는 기판 처리장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1133467A (ja) * 1997-07-22 1999-02-09 Dainippon Screen Mfg Co Ltd 飛散防止カップの洗浄方法及び塗布装置
KR100735876B1 (ko) * 1999-07-30 2007-07-06 동경 엘렉트론 주식회사 기판처리방법 및 기판처리장치
JP3643954B2 (ja) * 2001-08-29 2005-04-27 東京エレクトロン株式会社 洗浄処理装置
JP2003163147A (ja) * 2001-11-27 2003-06-06 Hitachi Electronics Eng Co Ltd 基板液処理装置
JP2004266212A (ja) * 2003-03-04 2004-09-24 Tadahiro Omi 基板の処理システム
JP4191009B2 (ja) * 2003-11-05 2008-12-03 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP4504884B2 (ja) 2005-07-26 2010-07-14 大日本スクリーン製造株式会社 基板処理装置
JP5090089B2 (ja) * 2006-10-19 2012-12-05 大日本スクリーン製造株式会社 基板処理装置
JP2008183532A (ja) * 2007-01-31 2008-08-14 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
US8501025B2 (en) * 2010-03-31 2013-08-06 Dainippon Screen Mfg. Co., Ltd. Substrate treatment apparatus and substrate treatment method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160027800A (ko) * 2014-09-02 2016-03-10 주식회사 제우스 기판 액처리 방법 및 장치
KR101927478B1 (ko) 2014-09-02 2018-12-10 주식회사 제우스 기판 액처리 방법 및 장치
KR20170007988A (ko) * 2015-07-13 2017-01-23 주식회사 제우스 기판 액처리 장치 및 방법
CN107078083A (zh) * 2015-07-13 2017-08-18 杰宜斯科技有限公司 基板液处理装置及基板液处理方法
KR101880232B1 (ko) * 2015-07-13 2018-07-19 주식회사 제우스 기판 액처리 장치 및 방법

Also Published As

Publication number Publication date
US9064908B2 (en) 2015-06-23
KR20120137222A (ko) 2012-12-20
JP2012256745A (ja) 2012-12-27
US20120312336A1 (en) 2012-12-13
KR101694568B1 (ko) 2017-01-17

Similar Documents

Publication Publication Date Title
JP5604371B2 (ja) 液処理装置および液処理方法
JP5606992B2 (ja) 液処理装置および液処理方法
KR101925173B1 (ko) 기판 처리 장치 및 히터 세정 방법
JP5951444B2 (ja) 基板処理装置および基板処理方法
JP6017262B2 (ja) 基板処理装置および基板処理方法
US9105671B2 (en) Liquid processing apparatus and liquid processing method
JP5496966B2 (ja) 液処理装置
JP7138539B2 (ja) 基板処理装置及び基板処理方法
JP6329428B2 (ja) 基板処理装置、基板処理装置の付着物除去方法、及び記憶媒体
JP5602691B2 (ja) 液処理装置および天板洗浄方法
KR101678268B1 (ko) 액처리 장치 및 액처리 방법
JP5855721B2 (ja) 液処理装置および液処理方法
JP5964372B2 (ja) 液処理装置および液処理方法
JP5420596B2 (ja) 液処理装置および液処理方法
JP5420597B2 (ja) 液処理装置および液処理方法
JP5795396B2 (ja) 液処理装置
JP5602690B2 (ja) 液処理装置および液処理方法
JP2013201236A (ja) 基板処理装置およびヒータ洗浄方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130610

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130610

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140312

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140516

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140704

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140725

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140825

R150 Certificate of patent or registration of utility model

Ref document number: 5604371

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250