JP5597140B2 - プラズマ処理された研磨物品及び同物品の作製方法 - Google Patents
プラズマ処理された研磨物品及び同物品の作製方法 Download PDFInfo
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- JP5597140B2 JP5597140B2 JP2010540733A JP2010540733A JP5597140B2 JP 5597140 B2 JP5597140 B2 JP 5597140B2 JP 2010540733 A JP2010540733 A JP 2010540733A JP 2010540733 A JP2010540733 A JP 2010540733A JP 5597140 B2 JP5597140 B2 JP 5597140B2
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D2203/00—Tool surfaces formed with a pattern
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
- Y10T428/24372—Particulate matter
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
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| US1804507P | 2007-12-31 | 2007-12-31 | |
| US61/018,045 | 2007-12-31 | ||
| US9648408P | 2008-09-12 | 2008-09-12 | |
| US61/096,484 | 2008-09-12 | ||
| PCT/US2008/085843 WO2009088606A2 (en) | 2007-12-31 | 2008-12-08 | Plasma treated abrasive article and method of making same |
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| JP2011507717A JP2011507717A (ja) | 2011-03-10 |
| JP2011507717A5 JP2011507717A5 (enExample) | 2011-09-22 |
| JP5597140B2 true JP5597140B2 (ja) | 2014-10-01 |
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| EP (1) | EP2240298A4 (enExample) |
| JP (1) | JP5597140B2 (enExample) |
| CN (1) | CN101925441B (enExample) |
| WO (1) | WO2009088606A2 (enExample) |
Families Citing this family (37)
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| KR20130014525A (ko) * | 2010-03-03 | 2013-02-07 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노구조화된 표면을 갖는 코팅된 편광기 및 이의 제조 방법 |
| CN102601747B (zh) * | 2011-01-20 | 2015-12-09 | 中芯国际集成电路制造(上海)有限公司 | 一种研磨垫及其制备方法、使用方法 |
| US20130303059A1 (en) * | 2012-05-11 | 2013-11-14 | Cerium Group Limited | Lens surfacing pad |
| WO2014003953A1 (en) | 2012-06-27 | 2014-01-03 | 3M Innovative Properties Company | Abrasive article |
| EP2692821A1 (de) * | 2012-08-02 | 2014-02-05 | Robert Bosch Gmbh | Schleifkorn mit Basiskörper und Aufsatzkörper |
| WO2014022465A1 (en) * | 2012-08-02 | 2014-02-06 | 3M Innovative Properties Company | Abrasive articles with precisely shaped features and method of making thereof |
| EP2692819A1 (de) * | 2012-08-02 | 2014-02-05 | Robert Bosch GmbH | Schleifkorn mit Basisfläche und Erhebungen |
| CN102862128B (zh) | 2012-09-20 | 2015-10-21 | 北京国瑞升科技股份有限公司 | 一种凹凸结构磨料制品及其制备方法 |
| US9440332B2 (en) * | 2012-10-15 | 2016-09-13 | Saint-Gobain Abrasives, Inc. | Abrasive particles having particular shapes and methods of forming such particles |
| JP6186809B2 (ja) * | 2013-03-29 | 2017-08-30 | 株式会社リコー | 研磨ローラ、定着装置、及び画像形成装置 |
| CN105121096B (zh) * | 2013-03-29 | 2018-10-16 | 3M创新有限公司 | 非织造磨料制品及其制备方法 |
| WO2014209567A1 (en) | 2013-06-24 | 2014-12-31 | 3M Innovative Properties Company | Abrasive particles, method of making abrasive particles, and abrasive articles |
| US20160263722A1 (en) * | 2013-10-18 | 2016-09-15 | 3M Innovative Properties Company | Coated abrasive article and method of making the same |
| US9421666B2 (en) * | 2013-11-04 | 2016-08-23 | Applied Materials, Inc. | Printed chemical mechanical polishing pad having abrasives therein |
| US20170008143A1 (en) * | 2014-01-24 | 2017-01-12 | 3M Innovative Properties Company | Abrasive material having a structured surface |
| CN104002252B (zh) * | 2014-05-21 | 2016-06-01 | 华侨大学 | 超细磨料生物高分子柔性抛光膜及其制备方法 |
| JP6611414B2 (ja) * | 2014-05-27 | 2019-11-27 | スリーエム イノベイティブ プロパティズ カンパニー | 塗装表面の仕上げ方法及び研磨材料 |
| US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
| US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
| CN113579992A (zh) | 2014-10-17 | 2021-11-02 | 应用材料公司 | 使用加成制造工艺的具复合材料特性的cmp衬垫建构 |
| US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
| US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
| KR101944695B1 (ko) * | 2014-10-28 | 2019-02-01 | 반도 카가쿠 가부시키가이샤 | 연마재 및 연마재의 제조방법 |
| JP6940495B2 (ja) | 2015-10-30 | 2021-09-29 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 所望のゼータ電位を有する研磨用物品を形成するための装置及び方法 |
| US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| GB201622439D0 (en) * | 2016-12-30 | 2017-02-15 | 3M Innovative Properties Co | Abrasive article and method of use |
| GB201622441D0 (en) * | 2016-12-30 | 2017-02-15 | 3M Innovative Properties Co | Abrasive article and method of use |
| US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
| WO2019032286A1 (en) * | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
| EP3924146A4 (en) * | 2019-02-13 | 2022-11-09 | 3M Innovative Properties Company | ABRASIVES WITH PRECISELY SHAPED FEATURES, ABRASIVES MADE THEREOF AND PROCESSES FOR THEIR MANUFACTURE |
| US20210171814A1 (en) * | 2019-12-10 | 2021-06-10 | Saint-Gobain Abrasives, Inc. | Fixed abrasive article |
| TWI768692B (zh) * | 2021-02-01 | 2022-06-21 | 中國砂輪企業股份有限公司 | 化學機械研磨拋光墊修整器及其製造方法 |
| US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
| EP4301551A4 (en) | 2021-03-05 | 2025-01-08 | Saint-Gobain Abrasives, Inc. | GRINDING ARTICLES AND METHODS FOR FORMING THEM |
| US12064850B2 (en) | 2021-12-30 | 2024-08-20 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods for forming same |
| EP4457058A1 (en) | 2021-12-30 | 2024-11-06 | Saint-gobain Abrasives, Inc | Abrasive articles and methods for forming same |
Family Cites Families (57)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4311489A (en) * | 1978-08-04 | 1982-01-19 | Norton Company | Coated abrasive having brittle agglomerates of abrasive grain |
| US5191101A (en) * | 1982-11-22 | 1993-03-02 | Minnesota Mining And Manufacturing Company | Energy polymerizable compositions containing organometallic initiators |
| US4609581A (en) * | 1985-04-15 | 1986-09-02 | Minnesota Mining And Manufacturing Company | Coated abrasive sheet material with loop attachment means |
| US4652275A (en) * | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Erodable agglomerates and abrasive products containing the same |
| US4652274A (en) * | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Coated abrasive product having radiation curable binder |
| US4751138A (en) * | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| US4799939A (en) * | 1987-02-26 | 1989-01-24 | Minnesota Mining And Manufacturing Company | Erodable agglomerates and abrasive products containing the same |
| US4735632A (en) * | 1987-04-02 | 1988-04-05 | Minnesota Mining And Manufacturing Company | Coated abrasive binder containing ternary photoinitiator system |
| US5086086A (en) * | 1987-08-28 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Energy-induced curable compositions |
| US4950696A (en) * | 1987-08-28 | 1990-08-21 | Minnesota Mining And Manufacturing Company | Energy-induced dual curable compositions |
| US5254194A (en) * | 1988-05-13 | 1993-10-19 | Minnesota Mining And Manufacturing Company | Coated abrasive sheet material with loop material for attachment incorporated therein |
| US4985340A (en) * | 1988-06-01 | 1991-01-15 | Minnesota Mining And Manufacturing Company | Energy curable compositions: two component curing agents |
| US4903440A (en) * | 1988-11-23 | 1990-02-27 | Minnesota Mining And Manufacturing Company | Abrasive product having binder comprising an aminoplast resin |
| JPH0393694A (ja) * | 1989-09-06 | 1991-04-18 | Sumitomo Electric Ind Ltd | 砥粒の製造方法 |
| US5152917B1 (en) * | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
| US5378251A (en) * | 1991-02-06 | 1995-01-03 | Minnesota Mining And Manufacturing Company | Abrasive articles and methods of making and using same |
| US5236472A (en) * | 1991-02-22 | 1993-08-17 | Minnesota Mining And Manufacturing Company | Abrasive product having a binder comprising an aminoplast binder |
| US5437754A (en) * | 1992-01-13 | 1995-08-01 | Minnesota Mining And Manufacturing Company | Abrasive article having precise lateral spacing between abrasive composite members |
| US5354797A (en) * | 1992-08-31 | 1994-10-11 | E. I. Du Pont De Nemours And Company | Coating composition of hydroxy functional acrylic polymer, polyol and polyisocyanate crosslinking agent |
| US5286782A (en) * | 1992-08-31 | 1994-02-15 | E. I. Du Pont De Nemours And Company | Coating composition of an acrylic polymer, polyol and polyisocyanate crosslinking agent |
| US5435816A (en) * | 1993-01-14 | 1995-07-25 | Minnesota Mining And Manufacturing Company | Method of making an abrasive article |
| DE69326774T2 (de) * | 1993-06-02 | 2000-06-21 | Dai Nippon Printing Co., Ltd. | Schleifband und verfahren zu dessen herstellung |
| RU2124978C1 (ru) * | 1993-09-13 | 1999-01-20 | Миннесота Майнинг Энд Мэнюфекчуринг Компани | Абразивное изделие, способ его производства, способ его использования для чистовой обработки и рабочий инструмент для его производства |
| JPH0788773A (ja) | 1993-09-21 | 1995-04-04 | Y A Shii Kk | 研磨ラッピングテープ及びその表面処理方法 |
| JPH0796468A (ja) * | 1993-09-27 | 1995-04-11 | Dainippon Printing Co Ltd | 研磨テープ及びその製造方法 |
| US5454844A (en) * | 1993-10-29 | 1995-10-03 | Minnesota Mining And Manufacturing Company | Abrasive article, a process of making same, and a method of using same to finish a workpiece surface |
| US5505747A (en) * | 1994-01-13 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Method of making an abrasive article |
| EP0745020B1 (en) * | 1994-02-22 | 1999-07-28 | Minnesota Mining And Manufacturing Company | Abrasive article, a method of making same, and a method of using same for finishing |
| US5958794A (en) * | 1995-09-22 | 1999-09-28 | Minnesota Mining And Manufacturing Company | Method of modifying an exposed surface of a semiconductor wafer |
| US5975987A (en) * | 1995-10-05 | 1999-11-02 | 3M Innovative Properties Company | Method and apparatus for knurling a workpiece, method of molding an article with such workpiece, and such molded article |
| US5888594A (en) * | 1996-11-05 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Process for depositing a carbon-rich coating on a moving substrate |
| US5948166A (en) * | 1996-11-05 | 1999-09-07 | 3M Innovative Properties Company | Process and apparatus for depositing a carbon-rich coating on a moving substrate |
| US5863306A (en) * | 1997-01-07 | 1999-01-26 | Norton Company | Production of patterned abrasive surfaces |
| US5833724A (en) * | 1997-01-07 | 1998-11-10 | Norton Company | Structured abrasives with adhered functional powders |
| US5851247A (en) * | 1997-02-24 | 1998-12-22 | Minnesota Mining & Manufacturing Company | Structured abrasive article adapted to abrade a mild steel workpiece |
| DK1054916T3 (da) * | 1998-02-06 | 2006-03-06 | Du Pont | Reaktive siliciumoligomerer og coatingsammensætninger fremstillet deraf |
| US6139594A (en) * | 1998-04-13 | 2000-10-31 | 3M Innovative Properties Company | Abrasive article with tie coat and method |
| US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
| DE60023675T2 (de) * | 1999-03-17 | 2006-09-07 | E.I. Dupont De Nemours And Co., Wilmington | Klarlackzusammensetzung mit hohem feststoffgehalt |
| US6293980B2 (en) * | 1999-12-20 | 2001-09-25 | Norton Company | Production of layered engineered abrasive surfaces |
| WO2001053040A1 (en) * | 2000-01-19 | 2001-07-26 | Rodel Holdings, Inc. | Printing of polishing pads |
| JP2001334473A (ja) | 2000-05-30 | 2001-12-04 | Nihon Micro Coating Co Ltd | 研磨シート及びその製造方法 |
| GB0024672D0 (en) * | 2000-10-09 | 2000-11-22 | Cromptons Leisure Machines Ltd | A prize vending machine |
| US20030022604A1 (en) * | 2001-05-07 | 2003-01-30 | 3M Innovative Properties Company | Abrasive product and method of making and using the same |
| US20030017797A1 (en) * | 2001-03-28 | 2003-01-23 | Kendall Philip E. | Dual cured abrasive articles |
| US20020142601A1 (en) * | 2001-03-30 | 2002-10-03 | Boyd John M. | Method for planarizing a surface of a semiconductor wafer with a fixed abrasive material |
| US6451076B1 (en) * | 2001-06-21 | 2002-09-17 | Saint-Gobain Abrasives Technology Company | Engineered abrasives |
| US6599177B2 (en) * | 2001-06-25 | 2003-07-29 | Saint-Gobain Abrasives Technology Company | Coated abrasives with indicia |
| US7887889B2 (en) * | 2001-12-14 | 2011-02-15 | 3M Innovative Properties Company | Plasma fluorination treatment of porous materials |
| US6846232B2 (en) * | 2001-12-28 | 2005-01-25 | 3M Innovative Properties Company | Backing and abrasive product made with the backing and method of making and using the backing and abrasive product |
| JP4039214B2 (ja) | 2002-11-05 | 2008-01-30 | Jsr株式会社 | 研磨パッド |
| US7160178B2 (en) * | 2003-08-07 | 2007-01-09 | 3M Innovative Properties Company | In situ activation of a three-dimensional fixed abrasive article |
| US20050064805A1 (en) * | 2003-09-23 | 2005-03-24 | 3M Innovative Properties Company | Structured abrasive article |
| US7195360B2 (en) * | 2004-12-28 | 2007-03-27 | 3M Innovative Properties Company | Prismatic retroreflective article and method |
| US7594845B2 (en) * | 2005-10-20 | 2009-09-29 | 3M Innovative Properties Company | Abrasive article and method of modifying the surface of a workpiece |
| US7410413B2 (en) * | 2006-04-27 | 2008-08-12 | 3M Innovative Properties Company | Structured abrasive article and method of making and using the same |
| US8038750B2 (en) * | 2007-07-13 | 2011-10-18 | 3M Innovative Properties Company | Structured abrasive with overlayer, and method of making and using the same |
-
2008
- 2008-12-08 JP JP2010540733A patent/JP5597140B2/ja not_active Expired - Fee Related
- 2008-12-08 EP EP20080870190 patent/EP2240298A4/en not_active Withdrawn
- 2008-12-08 CN CN2008801252939A patent/CN101925441B/zh not_active Expired - Fee Related
- 2008-12-08 US US12/742,349 patent/US8444458B2/en not_active Expired - Fee Related
- 2008-12-08 WO PCT/US2008/085843 patent/WO2009088606A2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US8444458B2 (en) | 2013-05-21 |
| US20100255254A1 (en) | 2010-10-07 |
| WO2009088606A3 (en) | 2009-10-01 |
| WO2009088606A2 (en) | 2009-07-16 |
| EP2240298A2 (en) | 2010-10-20 |
| EP2240298A4 (en) | 2014-04-30 |
| CN101925441A (zh) | 2010-12-22 |
| JP2011507717A (ja) | 2011-03-10 |
| CN101925441B (zh) | 2013-08-14 |
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