JP5590363B2 - 露光装置 - Google Patents
露光装置 Download PDFInfo
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- JP5590363B2 JP5590363B2 JP2013169801A JP2013169801A JP5590363B2 JP 5590363 B2 JP5590363 B2 JP 5590363B2 JP 2013169801 A JP2013169801 A JP 2013169801A JP 2013169801 A JP2013169801 A JP 2013169801A JP 5590363 B2 JP5590363 B2 JP 5590363B2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
Description
なお、上記実施形態では、図23(A)〜図23(C)を用いて、露光済のウエハWを保持する微動ステージWFS1を先にリレーステージDRSTの搬送部材48に受渡し、その後でリレーステージDRSTに保持された微動ステージWFS2をスライドさせて粗動ステージWCS1で保持することとした。しかし、これに限らず、微動ステージWFS2を先にリレーステージDRSTの搬送部材48に受渡し、その後で粗動ステージWCS1に保持された微動ステージWFS1をスライドさせてリレーステージDRSTで保持しても良い。
また、上記実施形態では、計測アーム71A(又は71B)が、メインフレームBDから1つの支持部材72A(又は72B)を介して片持ち状態で支持された場合について説明したが、これに限らず、例えば、X軸方向に離れた2本の吊り下げ部材を含むU字状の吊り下げ部を介して計測アーム71A(又は71B)をメインフレームBDから吊り下げ支持しても良い。この場合、2本の吊り下げ部材の間を微動ステージが移動できるように、その2本の吊り下げ部材の間隔を設定することが望ましい。
なお、上記各実施形態では、計測アーム71A,71Bの内部を進行させて計測ビームを微動ステージのグレーティングRGに下方から照射するエンコーダシステムを用いるものとしたが、これに限らず、計測アームにエンコーダヘッドの光学系(ビームスプリッタ等)を設け、その光学系と光源とを光ファイバで接続し、その光ファイバを介して光源からレーザ光を光学系に伝送する、及び/又は光学系と受光部とを光ファイバで接続し、その光ファイバによりグレーティングRGからの戻り光を光学系から受光部に伝送するエンコーダシステムを用いても良い。
なお、上記実施形態の露光装置で用いられるウエハは、450mmウエハに限られものでなく、それよりサイズの小さいウエハ(300mmウエハなど)でも良い。
Claims (24)
- 液体を介してエネルギビームにより物体を露光する露光装置であって、
少なくとも二次元平面に沿って移動可能な第1移動体と;
前記エネルギビームを射出する射出面を有する光学部材と;
前記第1移動体に移動可能に支持され、前記物体を保持して、少なくとも前記射出面と対向する前記二次元平面に平行な面内で移動可能であり、かつ前記光学部材との間で液体を保持可能な保持部材と;
前記保持部材の計測面に計測ビームを下方から照射するヘッドを有し、前記計測ビームの前記計測面からの光を受光して前記保持部材の位置情報を計測する位置計測系と;
前記保持部材が前記光学部材との間で液体を保持しているとき、前記二次元平面に平行な第1軸方向に関して前記保持部材に所定距離以内に近接し、該近接状態を維持して前記保持部材と共に前記第1軸方向の一側から他側へ移動し、その移動後に前記光学部材との間で前記液体を保持する可動部材と;を備える露光装置。 - 前記可動部材は、前記第1軸方向に関して前記保持部材に所定距離以内に近接した状態で、前記保持部材及び前記第1移動体とともに前記第1軸方向に沿って移動する請求項1に記載の露光装置。
- 前記可動部材は、前記射出面と対向する第1位置と、前記第1位置とは異なる第2位置とを含む範囲内で移動可能である請求項1又は2に記載の露光装置。
- 前記保持部材が、前記射出面と対向するとき、前記可動部材は、前記射出面と対向しない位置に移動可能である請求項1〜3のいずれか一項に記載の露光装置。
- 前記可動部材及び前記保持部材の少なくとも一方を前記射出面と対向する位置に配置して、前記光学部材と前記可動部材及び前記保持部材の少なくとも一方との間に、液体を保持し続ける請求項1〜4のいずれか一項に記載の露光装置。
- 前記第1軸方向に関する前記可動部材と前記保持部材との移動によって、前記光学部材との間での液体の保持を、前記可動部材及び前記保持部材の一方から他方に切り替え可能である請求項1〜5のいずれか一項に記載の露光装置。
- 前記可動部材を移動可能に支持する駆動システムを備える請求項1〜6のいずれか一項に記載の露光装置。
- 前記駆動システムは、前記可動部材を、少なくとも前記第1軸方向に駆動する請求項7に記載の露光装置。
- 前記駆動システムは、前記可動部材を、前記二次元平面に平行な面内で駆動する請求項7又は8に記載の露光装置。
- 前記駆動システムは、前記二次元平面に沿って移動可能で、前記第1移動体に支持された前記保持部材と同一の高さ位置に前記可動部材を支持する第2移動体を備える請求項7〜9のいずれか一項に記載の露光装置。
- 前記第2移動体は、前記可動部材を前記二次元平面内の前記第1軸方向とは直交する方向の一側で片持ち支持する請求項10に記載の露光装置。
- 前記駆動システムは、前記第2移動体を前記二次元平面内の前記第1軸方向とは直交する方向に駆動し、前記可動部材を、前記位置計測系の前記ヘッド介した前記計測ビームの射出部の鉛直上方に位置させる請求項11に記載の露光装置。
- 前記可動部材を前記射出面と対向しない位置に配置した状態で、前記保持部材に保持されている前記物体を露光する請求項8〜12のいずれか一項に記載の露光装置。
- 前記光学部材と前記可動部材及び前記第1移動体の少なくとも一方との間を液体で満たして液浸空間を形成する液浸部材をさらに備える請求項1〜13のいずれか一項に記載の露光装置。
- 前記可動部材の表面は、液体に対して撥液性である請求項1〜14のいずれか一項に記載の露光装置。
- 前記保持部材は、前記物体の表面と、前記物体の周囲に配置される前記保持部材の表面とがほぼ同一面となるように、前記物体を保持する請求項1〜15のいずれか一項に記載の露光装置。
- 前記射出面と対向する前記可動部材の第1面は、前記二次元平面とほぼ平行である請求項1〜16のいずれか一項に記載の露光装置。
- 前記可動部材は、プレートである請求項1〜17のいずれか一項に記載の露光装置。
- 前記可動部材は、前記光学部材の光学特性を計測する計測部材の少なくとも一部を有する請求項1〜18のいずれか一項に記載の露光装置。
- 前記計測部材は、少なくとも一部が、前記光学部材との位置関係が一定の部材に配置されている請求項19に記載の露光装置。
- 前記計測面には、グレーティングが形成され、
前記ヘッドは、前記計測ビームの前記グレーティングからの回折光を受光する請求項1〜20のいずれか一項に記載の露光装置。 - 前記計測部は、前記ヘッドの少なくとも一部が設けられた前記第1軸方向に延びるアーム部材を有し、
前記第1移動体は、前記アーム部材の一部をその内部に配置できる空間部を有する請求項1〜21のいずれか一項に記載の露光装置。 - 前記アーム部材は、前記第1軸方向の一側を固定端として片持ち支持された片持ち梁状の部材であり、該部材の自由端近傍から前記計測ビームを前記計測面に照射する請求項22に記載の露光装置。
- 請求項1〜23のいずれか一項に記載の露光装置を用いて物体を露光することと;
露光された物体を現像することと;を含むデバイス製造方法。
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JP2013169801A JP5590363B2 (ja) | 2008-12-19 | 2013-08-19 | 露光装置 |
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US13909208P | 2008-12-19 | 2008-12-19 | |
US61/139,092 | 2008-12-19 | ||
JP2009122337 | 2009-05-20 | ||
JP2009122337 | 2009-05-20 | ||
US12/640,299 US8760629B2 (en) | 2008-12-19 | 2009-12-17 | Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body |
US12/640,299 | 2009-12-17 | ||
JP2013169801A JP5590363B2 (ja) | 2008-12-19 | 2013-08-19 | 露光装置 |
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JP (3) | JP5348618B2 (ja) |
KR (1) | KR101634839B1 (ja) |
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US20110096306A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
US20110102761A1 (en) * | 2009-09-28 | 2011-05-05 | Nikon Corporation | Stage apparatus, exposure apparatus, and device fabricating method |
US20110096318A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
US20110096312A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
US20110128523A1 (en) * | 2009-11-19 | 2011-06-02 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
US20110123913A1 (en) * | 2009-11-19 | 2011-05-26 | Nikon Corporation | Exposure apparatus, exposing method, and device fabricating method |
US8488106B2 (en) * | 2009-12-28 | 2013-07-16 | Nikon Corporation | Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method |
TWI421649B (zh) * | 2010-08-19 | 2014-01-01 | Kintec Prec Machinery Co Ltd | Exposure machine light source device and its exposure method |
US20120064460A1 (en) * | 2010-09-07 | 2012-03-15 | Nikon Corporation | Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method |
US9207549B2 (en) | 2011-12-29 | 2015-12-08 | Nikon Corporation | Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement |
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US20180088473A1 (en) | 2018-03-29 |
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US20100157274A1 (en) | 2010-06-24 |
US10254662B2 (en) | 2019-04-09 |
TW201033752A (en) | 2010-09-16 |
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TWI457716B (zh) | 2014-10-21 |
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