JP5587173B2 - 押出体および流体処理方法 - Google Patents

押出体および流体処理方法 Download PDF

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Publication number
JP5587173B2
JP5587173B2 JP2010502111A JP2010502111A JP5587173B2 JP 5587173 B2 JP5587173 B2 JP 5587173B2 JP 2010502111 A JP2010502111 A JP 2010502111A JP 2010502111 A JP2010502111 A JP 2010502111A JP 5587173 B2 JP5587173 B2 JP 5587173B2
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JP
Japan
Prior art keywords
cells
flow path
plug
fluid
extrudate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010502111A
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English (en)
Japanese (ja)
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JP2010532244A5 (https=
JP2010532244A (ja
Inventor
カズ，フィリップ
エル ダヌー，ティエリ
エム エフレモフ，アレクサンダー
セ ゲールムール，セリーヌ
ピー マルクス，ガスパル
シュルテス，ケイヤン
エス サザーランド，ジェイムズ
ダブリュ タナー，キャメロン
エフ ジュニア ワイト，ジョン
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Corning Inc
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Corning Inc
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Filing date
Publication date
Priority claimed from EP20070301613 external-priority patent/EP2065347A1/en
Priority claimed from EP20080305041 external-priority patent/EP2098285B1/en
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2010532244A publication Critical patent/JP2010532244A/ja
Publication of JP2010532244A5 publication Critical patent/JP2010532244A5/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/248—Reactors comprising multiple separated flow channels
    • B01J19/2485—Monolithic reactors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0053—Details of the reactor
    • B01J19/0073—Sealings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B11/00—Apparatus or processes for treating or working the shaped or preshaped articles
    • B28B11/003—Apparatus or processes for treating or working the shaped or preshaped articles the shaping of preshaped articles, e.g. by bending
    • B28B11/006—Making hollow articles or partly closed articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B11/00—Apparatus or processes for treating or working the shaped or preshaped articles
    • B28B11/12—Apparatus or processes for treating or working the shaped or preshaped articles for removing parts of the articles by cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
    • C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine
    • C03C3/115—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron
    • C03C3/118—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/22—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions containing two or more distinct frits having different compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B38/00—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof
    • C04B38/0006—Honeycomb structures
    • C04B38/0009—Honeycomb structures characterised by features relating to the cell walls, e.g. wall thickness or distribution of pores in the walls
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F21/00—Constructions of heat-exchange apparatus characterised by the selection of particular materials
    • F28F21/04—Constructions of heat-exchange apparatus characterised by the selection of particular materials of ceramic; of concrete; of natural stone
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F7/00—Elements not covered by group F28F1/00, F28F3/00 or F28F5/00
    • F28F7/02—Blocks traversed by passages for heat-exchange media
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F2255/00—Heat exchanger elements made of materials having special features or resulting from particular manufacturing processes
    • F28F2255/16—Heat exchanger elements made of materials having special features or resulting from particular manufacturing processes extruded
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Catalysts (AREA)
JP2010502111A 2007-03-31 2008-03-31 押出体および流体処理方法 Expired - Fee Related JP5587173B2 (ja)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US92105307P 2007-03-31 2007-03-31
US60/921,053 2007-03-31
EP07301613.1 2007-11-30
EP20070301613 EP2065347A1 (en) 2007-11-30 2007-11-30 Durable frit composition and composites and devices comprised thereof
US1811907P 2007-12-31 2007-12-31
US61/018,119 2007-12-31
US6309008P 2008-01-31 2008-01-31
US61/063,090 2008-01-31
EP08305041.9 2008-02-29
EP20080305041 EP2098285B1 (en) 2008-02-29 2008-02-29 Methods and devices for falling film reactors with integrated heat exchange
PCT/US2008/004174 WO2008121390A1 (en) 2007-03-31 2008-03-31 Extruded body devices and methods for fluid processing

Publications (3)

Publication Number Publication Date
JP2010532244A JP2010532244A (ja) 2010-10-07
JP2010532244A5 JP2010532244A5 (https=) 2012-11-29
JP5587173B2 true JP5587173B2 (ja) 2014-09-10

Family

ID=39598406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010502111A Expired - Fee Related JP5587173B2 (ja) 2007-03-31 2008-03-31 押出体および流体処理方法

Country Status (6)

Country Link
US (1) US8197769B2 (https=)
EP (1) EP2134462A1 (https=)
JP (1) JP5587173B2 (https=)
KR (1) KR101533854B1 (https=)
CN (1) CN101678312A (https=)
WO (1) WO2008121390A1 (https=)

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TW200948748A (en) * 2008-02-29 2009-12-01 Corning Inc Method for sealing cells in extruded monoliths and devices resulting
ES2353471T3 (es) * 2008-02-29 2011-03-02 Corning Incorporated Procedimientos y dispositivos para reactores de película descendente con intercambio de calor integrado.
EP2193839B1 (en) 2008-11-28 2019-03-13 Corning Incorporated Devices for microreactor fluid distribution
US8475729B2 (en) * 2008-11-30 2013-07-02 Corning Incorporated Methods for forming honeycomb minireactors and systems
WO2010099449A2 (en) 2009-02-28 2010-09-02 Corning Incorporated Honeycomb body reactor optimized channel sizing
US8277743B1 (en) * 2009-04-08 2012-10-02 Errcive, Inc. Substrate fabrication
TW201109078A (en) * 2009-04-30 2011-03-16 Corning Inc Minireactor array
WO2010141366A2 (en) * 2009-05-31 2010-12-09 Corning Incorporated Pressure resistant honeycomb reactor
WO2010141368A2 (en) 2009-05-31 2010-12-09 Corning Incorporated Honeycomb reactor or heat exchanger mixer
US8263006B2 (en) * 2009-05-31 2012-09-11 Corning Incorporated Reactor with upper and lower manifold structures
US8815183B2 (en) 2009-08-31 2014-08-26 Corning Incorporated Zoned monolithic reactor and associated methods
US9138696B2 (en) 2009-11-30 2015-09-22 Corning Incorporated Honeycomb body u-bend mixers
CN102686304B (zh) * 2009-11-30 2016-01-13 康宁股份有限公司 具有槽形胞间孔的蜂窝状本体装置
FR2955039B1 (fr) * 2010-01-11 2012-10-19 Commissariat Energie Atomique Dispositif formant reacteur chimique a efficacite amelioree integrant un circuit d'echange thermique
US9415357B2 (en) 2010-02-28 2016-08-16 Corning Incorporated Honeycomb body interdigitated mixers and methods for producing
FR2957529B1 (fr) * 2010-03-19 2012-04-06 Saint Gobain Ct Recherches Structure filtrante comprenant un materiau de bouchage ameliore
WO2011153047A1 (en) * 2010-05-31 2011-12-08 Corning Incorporated Honeycomb-body-based fluidic interconnectors and methods
US9833932B1 (en) 2010-06-30 2017-12-05 Charles E. Ramberg Layered structures
US10041747B2 (en) 2010-09-22 2018-08-07 Raytheon Company Heat exchanger with a glass body
FR2971592B1 (fr) 2011-02-14 2016-12-23 Commissariat Energie Atomique Procede de fabrication ameliore d'un reflecteur, de preference pour le domaine de l'energie solaire
US9364814B2 (en) 2011-11-29 2016-06-14 Corning Incorporated Extruded body devices including sheet material hole masking
US9132578B2 (en) * 2011-11-29 2015-09-15 Corning Incorporated Apparatus and method for skinning articles
TWI577006B (zh) * 2011-11-29 2017-04-01 半導體能源研究所股份有限公司 密封體、發光裝置、電子裝置及照明設備
US9670809B2 (en) 2011-11-29 2017-06-06 Corning Incorporated Apparatus and method for skinning articles
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US10611051B2 (en) 2013-10-15 2020-04-07 Corning Incorporated Systems and methods for skinning articles
US9239296B2 (en) 2014-03-18 2016-01-19 Corning Incorporated Skinning of ceramic honeycomb bodies
JP2015157730A (ja) * 2014-02-24 2015-09-03 日本碍子株式会社 ハニカム構造体
US20170219302A1 (en) * 2014-07-29 2017-08-03 Kyocera Corporation Heat exchanger
CN105413395B (zh) * 2015-09-21 2017-10-31 中石化节能环保工程科技有限公司 气体吸收降膜反应器
US10527362B2 (en) * 2015-09-21 2020-01-07 Lockheed Martin Corporation Integrated multi-chamber heat exchanger
US10371462B2 (en) 2015-09-21 2019-08-06 Lockheed Martin Corporation Integrated multi-chamber heat exchanger
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CN106492718B (zh) * 2016-10-31 2019-07-30 山东豪迈化工技术有限公司 一种芯片型微反应通道及微反应器
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Also Published As

Publication number Publication date
WO2008121390A1 (en) 2008-10-09
EP2134462A1 (en) 2009-12-23
KR20100016153A (ko) 2010-02-12
KR101533854B1 (ko) 2015-07-03
US20100143215A1 (en) 2010-06-10
US8197769B2 (en) 2012-06-12
JP2010532244A (ja) 2010-10-07
CN101678312A (zh) 2010-03-24

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