JP5575339B2 - 電子顕微鏡用試料キャリア - Google Patents
電子顕微鏡用試料キャリア Download PDFInfo
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- JP5575339B2 JP5575339B2 JP2014003083A JP2014003083A JP5575339B2 JP 5575339 B2 JP5575339 B2 JP 5575339B2 JP 2014003083 A JP2014003083 A JP 2014003083A JP 2014003083 A JP2014003083 A JP 2014003083A JP 5575339 B2 JP5575339 B2 JP 5575339B2
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- sample
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- metal foil
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- 239000011888 foil Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 238000010894 electron beam technology Methods 0.000 claims description 15
- 238000007689 inspection Methods 0.000 claims description 8
- 238000010884 ion-beam technique Methods 0.000 claims description 7
- 238000003384 imaging method Methods 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 5
- 229910052790 beryllium Inorganic materials 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 230000007423 decrease Effects 0.000 claims description 2
- 238000000608 laser ablation Methods 0.000 claims description 2
- 230000000717 retained effect Effects 0.000 claims 1
- 239000007787 solid Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000010949 copper Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000000313 electron-beam-induced deposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 238000001888 ion beam-induced deposition Methods 0.000 description 2
- 241001272720 Medialuna californiensis Species 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001803 electron scattering Methods 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2204—Specimen supports therefor; Sample conveying means therefore
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/201—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated for mounting multiple objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Description
− 集束イオンビーム鏡筒を備える装置の排気された試料チャンバ内において、試料から該試料の一部を掘り出し、前記試料の一部を金属ホイルで構成される試料キャリアの載置位置に接合する段階、
− 前記装置の排気された試料チャンバ内に前記試料の一部を保持したまま、前記試料の一部を薄くして薄片を生成する段階、及び、
− 前記薄片を電子ビームで検査する段階、
を有し、
前記試料キャリアの載置位置は、前記試料キャリアの前記金属ホイルの厚さが減少する部分と接する、ことを特徴とする。
12 金属ホイル
14 歯
16 傾斜端部
18 試料
20 識別印
200 ビーム
201 検出器
202 立体角
203 角度
Claims (11)
- 電子顕微鏡内で試料を保持する試料キャリアであって、
当該試料キャリアは金属ホイルを有し、試料を取り付けるための前記金属ホイルの側面と接する少なくとも1つの載置位置を有し、
前記載置位置が、当該試料キャリアの前記金属ホイルの厚さが減少する部分と接することを特徴とする試料キャリア。 - 前記金属ホイルの厚さの減少は、前記ホイルの先細り部分によって実現される、請求項1に記載の試料キャリア。
- 前記金属ホイルは少なくとも20μmの厚さを有し、かつ、厚さの減少した部分は最大でも10μmの厚さしか有しない、請求項1又は2に記載の試料キャリア。
- 前記金属が、Mo、Ti、Be、又はCuである、請求項1乃至3のうちのいずれか一項に記載の試料キャリア。
- 前記試料キャリアの平坦部に対する先細り部分の先細り角は、45°未満であり、具体的には30°未満であり、より具体的には20°未満である、請求項2乃至4のうちのいずれか一項に記載の試料キャリア。
- 前記先細り部分は前記金属のレーザーアブレーションによって形成される、請求項2に記載の試料キャリア。
- 均一な密度を有する、請求項1乃至6のうちのいずれか一項に記載の試料キャリア。
- 前記金属ホイルの境界を超えて延びるカーボンホイルを有する、請求項2に記載の試料キャリア。
- 電子顕微鏡内での検査のために試料を調製する方法であって:
− 集束イオンビーム鏡筒を備える装置の排気された試料チャンバ内において、試料から該試料の一部を掘り出し、前記試料の一部を金属ホイルで構成される試料キャリアの載置位置に接合する段階;
− 前記装置の排気された試料チャンバ内に前記試料の一部を保持したまま、前記試料の一部を薄くして薄片を生成する段階;及び、
− 前記薄片を電子ビームで検査する段階;
を有し、
当該試料キャリアは請求項1乃至8のうちのいずれか一項に記載の試料キャリアで、かつ、
前記試料の一部が前記試料から掘り出されるとき、前記試料の一部は、薄くされて薄片となるまで前記装置の排気されたチャンバ内に保持される、
ことを特徴とする方法。 - 前記電子ビームによる検査は、断層撮像による像を取得する段階を含む、請求項9に記載の方法。
- 前記電子ビームによる検査は、透過電子の検出及び/又はX線の検出を含む、請求項9又は10に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP13151244.4 | 2013-01-15 | ||
EP13151244.4A EP2755226B1 (en) | 2013-01-15 | 2013-01-15 | Sample carrier for an electron microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014137995A JP2014137995A (ja) | 2014-07-28 |
JP5575339B2 true JP5575339B2 (ja) | 2014-08-20 |
Family
ID=47563216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014003083A Active JP5575339B2 (ja) | 2013-01-15 | 2014-01-10 | 電子顕微鏡用試料キャリア |
Country Status (4)
Country | Link |
---|---|
US (1) | US9159531B2 (ja) |
EP (1) | EP2755226B1 (ja) |
JP (1) | JP5575339B2 (ja) |
CN (1) | CN103928279B (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9449785B2 (en) | 2013-11-11 | 2016-09-20 | Howard Hughes Medical Institute | Workpiece transport and positioning apparatus |
US9281163B2 (en) * | 2014-04-14 | 2016-03-08 | Fei Company | High capacity TEM grid |
CN108550512A (zh) * | 2018-04-16 | 2018-09-18 | 华东师范大学 | 一种用于透射电子显微镜样品杆多电极的制备方法 |
CN108717130B (zh) * | 2018-05-08 | 2020-09-25 | 清华大学 | 用于固定afm探针的检测装置、铜片及检测方法 |
CN110672881A (zh) * | 2019-09-30 | 2020-01-10 | 上海华力集成电路制造有限公司 | 金属栅结构及其制造方法 |
CN114464516A (zh) * | 2020-10-21 | 2022-05-10 | 长鑫存储技术有限公司 | 栅格 |
EP4068333A1 (en) | 2021-03-31 | 2022-10-05 | FEI Company | Sample carrier for use in a charged particle microscope, and a method of using such a sample carrier in a charged particle microscope |
CN114088496B (zh) * | 2021-11-25 | 2023-06-20 | 内蒙古工业大学 | 一种制备透射电镜粉末样品的装置 |
Family Cites Families (17)
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KR940007963A (ko) * | 1992-09-03 | 1994-04-28 | 오오가 노리오 | 판그물 및 투과형 전자현미경용 시료의 연마방법 |
JP2001015056A (ja) * | 1999-04-28 | 2001-01-19 | Canon Inc | 試料ホルダーおよび該試料ホルダーに用いるスペーサー |
CN1879188B (zh) * | 2003-11-11 | 2010-12-08 | 全域探测器公司 | 在聚焦离子束显微镜中进行快速样品制备的方法和装置 |
US7315023B2 (en) | 2004-07-22 | 2008-01-01 | Omniprobe, Inc. | Method of preparing a sample for examination in a TEM |
JP4570980B2 (ja) * | 2005-02-21 | 2010-10-27 | エスアイアイ・ナノテクノロジー株式会社 | 試料台及び試料加工方法 |
EP1863066A1 (en) | 2006-05-29 | 2007-12-05 | FEI Company | Sample carrier and sample holder |
EP1953789A1 (en) * | 2007-02-05 | 2008-08-06 | FEI Company | Method for thinning a sample and sample carrier for performing said method |
US8080791B2 (en) | 2008-12-12 | 2011-12-20 | Fei Company | X-ray detector for electron microscope |
DE102009001587A1 (de) | 2009-01-06 | 2010-07-08 | Carl Zeiss Nts Gmbh | Verfahren zur Einstellung eines Betriebsparameters eines Teilchenstrahlgeräts sowie Probenhalter zur Durchführung des Verfahrens |
JP2010230417A (ja) * | 2009-03-26 | 2010-10-14 | Jeol Ltd | 試料の検査装置及び検査方法 |
EP2278306A1 (en) * | 2009-07-13 | 2011-01-26 | Fei Company | Method for inspecting a sample |
EP2316565A1 (en) * | 2009-10-26 | 2011-05-04 | Fei Company | A micro-reactor for observing particles in a fluid |
JP2011243483A (ja) * | 2010-05-20 | 2011-12-01 | Jeol Ltd | 試料保持体、検査装置、及び検査方法 |
DE102010032894B4 (de) * | 2010-07-30 | 2013-08-22 | Carl Zeiss Microscopy Gmbh | Tem-Lamelle, Verfahren zu ihrer Herstellung und Vorrichtung zum Ausführen des Verfahrens |
US9207196B2 (en) * | 2010-11-17 | 2015-12-08 | Vanderbilt University | Transmission electron microscopy for imaging live cells |
US9196457B2 (en) * | 2011-05-24 | 2015-11-24 | The Trustees Of The University Of Pennsylvania | Flow cells for electron microscope imaging with multiple flow streams |
US9733164B2 (en) * | 2012-06-11 | 2017-08-15 | Fei Company | Lamella creation method and device using fixed-angle beam and rotating sample stage |
-
2013
- 2013-01-15 EP EP13151244.4A patent/EP2755226B1/en active Active
-
2014
- 2014-01-10 JP JP2014003083A patent/JP5575339B2/ja active Active
- 2014-01-14 US US14/154,753 patent/US9159531B2/en active Active
- 2014-01-15 CN CN201410016917.0A patent/CN103928279B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
US20140197311A1 (en) | 2014-07-17 |
JP2014137995A (ja) | 2014-07-28 |
CN103928279A (zh) | 2014-07-16 |
CN103928279B (zh) | 2016-04-06 |
EP2755226A1 (en) | 2014-07-16 |
EP2755226B1 (en) | 2016-06-29 |
US9159531B2 (en) | 2015-10-13 |
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