JP5542523B2

JP5542523B2 - Slit die

Info

Publication number: JP5542523B2
Application number: JP2010114437A
Authority: JP
Inventors: 充孝村田; 孝男大沼; 茂安原
Original assignee: 株式会社ヒラノテクシード
Priority date: 2010-05-18
Filing date: 2010-05-18
Publication date: 2014-07-09
Anticipated expiration: 2030-05-18
Also published as: JP2011240249A

Description

本発明は、基材に塗工液を塗工する塗工装置におけるスリットダイに関する。 The present invention relates to a slit die in a coating apparatus that coats a substrate with a coating liquid.

従来より、液晶パネル、プラズマディスプレイパネル等の基材に塗工液を塗工するスリットダイは、基材上の塗工液の膜厚を均一にする塗工する必要がある。そのため、例えば、スリットダイを形成する第１リップと第２リップに挟まれているシムに関して、シムの両端部から中央部に向かい厚さが厚く、又は、薄くなるスリットダイが提案されている（特許文献１参照）。 Conventionally, a slit die for applying a coating liquid to a substrate such as a liquid crystal panel or a plasma display panel needs to be applied so that the film thickness of the coating solution on the substrate is uniform. Therefore, for example, regarding a shim sandwiched between a first lip and a second lip forming a slit die, a slit die is proposed in which the thickness increases or decreases from both ends of the shim toward the center ( Patent Document 1).

特開２００８−１７８８１８号公報JP 2008-178818 A

しかしながら、上記特許文献１のスリットダイにおいては、シムの厚さを増減させる必要があるため、その加工精度が要求される。特に、シムの厚さはスリット状の吐出口の間隙と同じであるため、その厚さを調整することは非常に手間であるという問題点があった。また、塗工液が変わるたびに厚さが異なるシムを形成することも非常に手間であり、コストアップに繋がるという問題点があった。 However, in the slit die of Patent Document 1, since it is necessary to increase or decrease the thickness of the shim, the processing accuracy is required. In particular, since the thickness of the shim is the same as the gap between the slit-like discharge ports, there is a problem that it is very troublesome to adjust the thickness. In addition, it is very troublesome to form shims having different thicknesses every time the coating solution is changed, leading to an increase in cost.

さらに、最近のリチウム二次電池用の電極においては、液晶パネルやプラズマディスプレイパネルなどの基材に塗工液を塗工するよりも高精度の膜厚分布が要求されている。 Furthermore, in recent electrodes for lithium secondary batteries, a more accurate film thickness distribution is required than when a coating solution is applied to a substrate such as a liquid crystal panel or a plasma display panel.

そこで、本発明は上記問題点に鑑み、基材に塗工液を塗工する場合に、より膜厚の分布を均一にすることができるスリットダイを提供する。 Then, this invention provides the slit die | dye which can make distribution of film thickness more uniform, when coating a coating liquid on a base material in view of the said problem.

本発明は、第１リップと、第２リップと、前記第１リップに形成された塗工液を溜める液溜め部と、前記液溜め部に設けられ、前記液溜め部に前記塗工液を送液する送液口と、前記第１リップと前記第２リップとの間に挟まれた板状のシムと、前記第１リップと前記第２リップとの間に前記シムを挟むことによって、前記第１リップの先端部と前記第２リップの先端部との間であって、前記液溜め部から連続して形成されたスリット状の吐出口と、を有し、前記シムは、前記液溜め部と前記液吐出口以外の部分にある前記スリットダイの両側部と底部に挟まれた第１シム部と、前記第１シム部と一体であって、前記液溜め部の底部側を覆う第２シム部と、を有し、前記第２シム部の吐出側端部は、前記スリットダイの幅方向における前記送液口に対応する位置に向かうほど前記第１シム部の底部からの高さが変化すると共に、前記第２シム部の吐出側端部は、前記スリットダイの幅方向における前記送液口に対応する位置に向かうほど前記第１シム部の底部からの高さが大きくなっている、ことを特徴とするスリットダイである。また、本発明は、第１リップと、第２リップと、前記第１リップに形成された塗工液を溜める液溜め部と、前記液溜め部に設けられ、前記液溜め部に前記塗工液を送液する送液口と、前記第１リップと前記第２リップとの間に挟まれた板状のシムと、前記第１リップと前記第２リップとの間に前記シムを挟むことによって、前記第１リップの先端部と前記第２リップの先端部との間であって、前記液溜め部から連続して形成されたスリット状の吐出口と、を有し、前記シムは、前記液溜め部と前記液吐出口以外の部分にある前記スリットダイの両側部と底部に挟まれた第１シム部と、前記第１シム部と一体であって、前記液溜め部の底部側を覆う第２シム部と、を有し、前記第２シム部の吐出側端部は、前記スリットダイの幅方向における前記送液口に対応する位置に向かうほど前記第１シム部の底部からの高さが変化すると共に、前記第２シム部の前記吐出側端部が、三角形状である、ことを特徴とするスリットダイである。また、本発明は、第１リップと、第２リップと、前記第１リップに形成された塗工液を溜める液溜め部と、前記液溜め部に設けられ、前記液溜め部に前記塗工液を送液する送液口と、前記第１リップと前記第２リップとの間に挟まれた板状のシムと、前記第１リップと前記第２リップとの間に前記シムを挟むことによって、前記第１リップの先端部と前記第２リップの先端部との間であって、前記液溜め部から連続して形成されたスリット状の吐出口と、を有し、前記シムは、前記液溜め部と前記液吐出口以外の部分にある前記スリットダイの両側部と底部に挟まれた第１シム部と、前記第１シム部と一体であって、前記液溜め部の底部側を覆う第２シム部と、を有し、前記第２シム部の吐出側端部は、前記スリットダイの幅方向における前記送液口に対応する位置に向かうほど前記第１シム部の底部からの高さが変化すると共に、前記第２シム部の前記吐出側端部の最大高さ部分の先端と、前記液溜め部を構成する内壁との最短距離が、前記吐出口の大きさと同じである、ことを特徴とするスリットダイである。また、本発明は、第１リップと、第２リップと、前記第１リップに形成された塗工液を溜める液溜め部と、前記液溜め部に設けられ、前記液溜め部に前記塗工液を送液する送液口と、前記第１リップと前記第２リップとの間に挟まれた板状のシムと、前記第１リップと前記第２リップとの間に前記シムを挟むことによって、前記第１リップの先端部と前記第２リップの先端部との間であって、前記液溜め部から連続して形成されたスリット状の吐出口と、を有し、前記シムは、前記液溜め部と前記液吐出口以外の部分にある前記スリットダイの両側部と底部に挟まれた第１シム部と、前記第１シム部に重ねて配置され、前記液溜め部以外の部分で挟まれるように、前記液溜め部に対応した開口部を有する第２シム部と、を有し、前記第２シム部の前記開口部における吐出口側縁部は、前記スリットダイの幅方向における前記送液口に対応する位置に向かうほど前記第２シム部の底部からの長さが小さくなっている、ことを特徴とするスリットダイである。 The present invention provides a first lip, a second lip, a liquid reservoir portion for storing a coating liquid formed on the first lip, and the liquid reservoir portion, and the coating liquid is provided in the liquid reservoir portion. By sandwiching the shim between the first lip and the second lip, a liquid feeding port for feeding liquid, a plate-like shim sandwiched between the first lip and the second lip, A slit-like discharge port continuously formed from the liquid reservoir between the tip of the first lip and the tip of the second lip, and the shim A first shim portion sandwiched between both side portions and the bottom portion of the slit die at portions other than the reservoir portion and the liquid discharge port, and is integrated with the first shim portion and covers the bottom side of the liquid reservoir portion. A discharge side end portion of the second shim portion in the width direction of the slit die. With height varying from the bottom of the first shim section increases toward the positions corresponding to the discharge-side end portion of the second shim section has a position corresponding to the liquid supply port in the width direction of the slit die The slit die is characterized in that the height from the bottom of the first shim portion increases toward the top. In addition, the present invention provides a first lip, a second lip, a liquid reservoir portion for storing a coating liquid formed on the first lip, the liquid reservoir portion, and the coating portion in the liquid reservoir portion. A liquid feeding port for feeding a liquid, a plate-like shim sandwiched between the first lip and the second lip, and the shim sandwiched between the first lip and the second lip A slit-like discharge port continuously formed from the liquid reservoir portion between the tip portion of the first lip and the tip portion of the second lip, and the shim A first shim portion sandwiched between both side portions and a bottom portion of the slit die in a portion other than the liquid reservoir portion and the liquid discharge port, and a bottom portion side of the liquid reservoir portion, which is integral with the first shim portion. A discharge side end portion of the second shim portion in front of the slit die in the width direction. The height from the bottom part of the first shim part changes toward the position corresponding to the liquid feeding port, and the discharge side end part of the second shim part has a triangular shape. It is a die. In addition, the present invention provides a first lip, a second lip, a liquid reservoir portion for storing a coating liquid formed on the first lip, the liquid reservoir portion, and the coating portion in the liquid reservoir portion. A liquid feeding port for feeding a liquid, a plate-like shim sandwiched between the first lip and the second lip, and the shim sandwiched between the first lip and the second lip A slit-like discharge port continuously formed from the liquid reservoir portion between the tip portion of the first lip and the tip portion of the second lip, and the shim A first shim portion sandwiched between both side portions and a bottom portion of the slit die in a portion other than the liquid reservoir portion and the liquid discharge port, and a bottom portion side of the liquid reservoir portion, which is integral with the first shim portion. A discharge side end portion of the second shim portion in front of the slit die in the width direction. The height from the bottom portion of the first shim portion changes toward the position corresponding to the liquid feeding port, the tip of the maximum height portion of the discharge side end portion of the second shim portion, and the liquid reservoir portion The slit die is characterized in that the shortest distance from the inner wall constituting the same is the same as the size of the discharge port. In addition, the present invention provides a first lip, a second lip, a liquid reservoir portion for storing a coating liquid formed on the first lip, the liquid reservoir portion, and the coating portion in the liquid reservoir portion. A liquid feeding port for feeding a liquid, a plate-like shim sandwiched between the first lip and the second lip, and the shim sandwiched between the first lip and the second lip A slit-like discharge port continuously formed from the liquid reservoir portion between the tip portion of the first lip and the tip portion of the second lip, and the shim A portion other than the liquid reservoir portion and the liquid discharge port, a first shim portion sandwiched between both side portions and a bottom portion of the slit die, and a portion other than the liquid reservoir portion. A second shim portion having an opening corresponding to the liquid reservoir so as to be sandwiched between the second shim and the second shim Discharge port side edge portion of the opening of, wherein the length from the bottom of the more in the width direction of the slit die toward the position corresponding to the liquid feed port and the second shim portion is small, it It is a slit die.

本発明によれば、基材に対する塗工液の膜厚分布を均一にできる。 According to the present invention, the film thickness distribution of the coating liquid with respect to the substrate can be made uniform.

本発明の実施例１の塗工装置の全体図及び一部拡大縦断面図である。It is the whole coating apparatus of Example 1 of this invention, and a partially expanded longitudinal cross-sectional view. 図１におけるＩ−Ｉ線断面図である。It is the II sectional view taken on the line in FIG. スリットダイの分解斜視図である。It is a disassembled perspective view of a slit die. シムの第１の変更例１である。This is a first modification 1 of the shim. シムの第１の変更例１である。This is a first modification 1 of the shim. シムの第１の変更例１である。This is a first modification 1 of the shim. シムの第２の変更例２である。This is a second modification 2 of the shim. シムの第３の変更例２である。This is a third modification 2 of the shim. シムの第４の変更例２である。This is a fourth modification 2 of the shim. 変更例３におけるスリットダイの縦断面図である。It is a longitudinal cross-sectional view of the slit die in the modification 3. 図１０におけるＩＩ−ＩＩ線断面図である。It is the II-II sectional view taken on the line in FIG. 変更例４のスリットダイの縦断面図である。It is a longitudinal cross-sectional view of the slit die of the modification 4. 変更例５のスリットダイの縦断面図である。It is a longitudinal cross-sectional view of the slit die of the modification 5. 変更例６の第１リップとシムの平面図である。It is a top view of the 1st lip and shim of example 6 of a change. 変更例７の第１リップとシムの平面図である。It is a top view of the 1st lip and shim of example 7 of a change. 実施例２のスリットダイの分解斜視図である。It is a disassembled perspective view of the slit die of Example 2. FIG. 第１リップに第１シム部及び第２シム部を組み合わせて平面から見た図である。It is the figure seen from the plane which combined the 1st shim part and the 2nd shim part with the 1st lip. 実施例２のスリットダイの縦断面図である。5 is a longitudinal sectional view of a slit die of Example 2. FIG. 従来の塗工装置を用いて基材に塗工液を塗工した縦断面図である。It is the longitudinal cross-sectional view which applied the coating liquid to the base material using the conventional coating apparatus. 本実施例の塗工装置を用いて基材に塗工液を塗工した縦断面図である。It is the longitudinal cross-sectional view which applied the coating liquid to the base material using the coating apparatus of a present Example.

以下、本発明の一実施例のスリットダイ１０を用いた塗工装置１について図面に基づいて説明する。 Hereinafter, the coating apparatus 1 using the slit die 10 of one Example of this invention is demonstrated based on drawing.

本実施例の塗工装置１は、リチウム二次電池で用いられる電極を製造するものであり、金属箔よりなる長尺状の基材３に塗工液４を塗工する。基材３は、アルミニウム又は銅よりなり、アルミニウムの場合はその厚さが１５〜２０μｍであり、銅の場合は約１０μｍである。また、この基材３の幅は６０ｃｍ〜７０ｃｍであり、この基材３の上に５０μｍの塗工液４を塗工する。 The coating apparatus 1 according to the present embodiment manufactures an electrode used in a lithium secondary battery, and coats a coating liquid 4 on a long base 3 made of a metal foil. The base material 3 consists of aluminum or copper, and the thickness is 15-20 micrometers in the case of aluminum, and is about 10 micrometers in the case of copper. Further, the width of the base material 3 is 60 cm to 70 cm, and a 50 μm coating solution 4 is applied onto the base material 3.

以下、本発明の実施例１の塗工装置１におけるスリットダイ１０について図１〜図３に基づいて説明する。 Hereinafter, the slit die 10 in the coating apparatus 1 of Example 1 of this invention is demonstrated based on FIGS. 1-3.

（１）塗工装置１の構造
塗工装置１の構造について図１〜図３に基づいて説明する。 (1) Structure of coating apparatus 1 The structure of the coating apparatus 1 is demonstrated based on FIGS. 1-3.

塗工装置１は、バックアップロール２に基材３を抱かせて走行させ、このバックアップロール２の横に水平方向に配置されたスリットダイ１０から塗工液４を塗工する。バックアップロール２によって走行する基材３の走行速度Ｖは、Ｖ＝５〜３０ｍ／分であり、好ましくは２０ｍ／分である。 The coating apparatus 1 travels while holding the base material 3 on the backup roll 2 and applies the coating liquid 4 from the slit die 10 disposed in the horizontal direction next to the backup roll 2. The traveling speed V of the base material 3 traveling by the backup roll 2 is V = 5 to 30 m / min, preferably 20 m / min.

スリットダイ１０は、金属製の第１リップ１２、金属製の第２リップ１４、ステンレス製の板状のシム１６とより構成されている。 The slit die 10 includes a metal first lip 12, a metal second lip 14, and a stainless steel plate-like shim 16.

第１リップ１２は、平面形状が長方形状であり、上面に液溜め部１８が凹部状に形成され、この液溜め部１８は、図２に示すように第１リップ１２の両側部２０，２２及び底部２４を残して形成されている。液溜め部１８における幅方向の中央部には、塗工液４を送液するための送液口３０が開口している。この液溜め部１８の幅方向の長さが、基材３に塗工液４を塗工するための塗工幅に設定される。第１リップ１２の下面の先端部は、先端部側にいく程細く形成されている。 The first lip 12 has a rectangular planar shape, and a liquid reservoir portion 18 is formed in a concave shape on the upper surface. The liquid reservoir portion 18 has both side portions 20 and 22 of the first lip 12 as shown in FIG. And the bottom 24 is left. A liquid feeding port 30 for feeding the coating liquid 4 is opened at the center in the width direction of the liquid reservoir 18. The length of the liquid reservoir 18 in the width direction is set to a coating width for applying the coating liquid 4 to the substrate 3. The tip of the lower surface of the first lip 12 is formed so as to be narrower toward the tip.

第２リップ１４は、平面形状が長方形状であって第１リップ１２と同じ大きさであり、この第２リップ１４の下面は、平らな面に形成されている。第２リップ１４の上面の先端部は、先端部側にいく程細く形成されている。 The second lip 14 has a rectangular planar shape and the same size as the first lip 12, and the lower surface of the second lip 14 is formed as a flat surface. The tip part of the upper surface of the second lip 14 is formed so as to be narrower toward the tip part side.

第１リップ１２の上面と第２リップ１４の下面とが、板状のシム１６を挟み、液溜め部１８の吐出側にスリット状の吐出口３２を前記液溜め部１８から連続して形成する。 The upper surface of the first lip 12 and the lower surface of the second lip 14 sandwich the plate-like shim 16, and a slit-like discharge port 32 is continuously formed from the liquid reservoir 18 on the discharge side of the liquid reservoir 18. .

（２）シム１６の構造
シム１８の構造について図１〜図３に基づいて説明する。 (2) Structure of Shim 16 The structure of the shim 18 will be described with reference to FIGS.

１枚のシム１６は、第１シム部２６と第２シム部２８とより形成されている。第１シム部２６は、第１リップ１２の両側部２０，２２及び底部２４によって挟まれるシム１６のＵ字状の部分である。第２シム部２８は、第１シム部２６と一体に形成されるものであり、Ｕ字状の第２シム部２８の間、すなわち液溜め部１８の底部側を覆う位置に形成されている。この第２シム部２８の吐出側端部２９は、幅方向における中央部ほどその高さが高くなるように形成され、三角形状に形成されている。ここで高さとは、第１シム部２６の底部から吐出側端部２９までの距離をいい、以下ではこの位置を、「吐出側端部２９の最大高さ位置」という。 One shim 16 is formed by a first shim portion 26 and a second shim portion 28. The first shim portion 26 is a U-shaped portion of the shim 16 that is sandwiched between the side portions 20 and 22 and the bottom portion 24 of the first lip 12. The second shim portion 28 is formed integrally with the first shim portion 26 and is formed at a position that covers the U-shaped second shim portion 28, that is, the bottom side of the liquid reservoir 18. . The discharge side end portion 29 of the second shim portion 28 is formed to have a higher height at the center portion in the width direction, and is formed in a triangular shape. Here, the height refers to the distance from the bottom of the first shim portion 26 to the discharge side end portion 29, and hereinafter this position is referred to as “the maximum height position of the discharge side end portion 29”.

第１リップ１２と第２リップ１４とによってシム１６を挟んで、スリット状の吐出口３２を形成するため、図１の拡大図に示すように、吐出口３２の間隙の寸法ｂは、シム１６の厚みｂと等しく、また、第２シム部２８の吐出側端部２９の最大高さ位置と、液溜め部１８の内壁までの最短距離ａは、前記した吐出口３２の間隙の寸法ｂに等しいように設定されている。 Since the slit 16 is formed by sandwiching the shim 16 between the first lip 12 and the second lip 14, the dimension b of the gap of the discharge port 32 is as shown in the enlarged view of FIG. The maximum height position of the discharge side end portion 29 of the second shim portion 28 and the shortest distance a to the inner wall of the liquid reservoir portion 18 are equal to the gap size b of the discharge port 32 described above. It is set to be equal.

第２シム部２８の吐出側端部２９の傾きθは、図２に示すように、塗工液４の粘度によって決定される。塗工液４は非ニュートン流体であり、この粘度カーブは次の式（１）で表せる。 The inclination θ of the discharge side end portion 29 of the second shim portion 28 is determined by the viscosity of the coating liquid 4 as shown in FIG. The coating liquid 4 is a non-Newtonian fluid, and this viscosity curve can be expressed by the following equation (1).

粘度η＝η_０×γ^{（ｎ−１）} ・・・（１）

但し、η_０は粘度係数であり、γは剪断速度、ｎは、非ニュートン流体の場合には０＜ｎ＜１である。このときに、傾きθは、ｎに反比例する。
Viscosity η = η ₀ × γ ⁽ⁿ⁻¹⁾ (1)

Where η ₀ is the viscosity coefficient, γ is the shear rate, and n is 0 <n <1 for non-Newtonian fluids. At this time, the inclination θ is inversely proportional to n.

具体的に説明すると、η_０＝１０、ｎ＝０．６、ｂ＝０．６ｍｍのときに、式（１）は粘度η＝１０×（γの−０．４乗）で表わされ、塗工厚が１２０μｍで塗工幅が３００ｍｍの場合、θ＝０．２°、ａ＝０．６ｍｍとなる。 More specifically, when η ₀ = 10, n = 0.6, and b = 0.6 mm, the formula (1) is expressed by viscosity η = 10 × (γ to the power −0.4), When the coating thickness is 120 μm and the coating width is 300 mm, θ = 0.2 ° and a = 0.6 mm.

なお、この傾きθとシム厚ｂは、塗工液４の粘度η及び運転条件等によって変化するが、傾きθ＝０．００１〜５．０°、最短距離ａはシム厚ｂの１／２〜５倍の範囲、好ましくはａ＝ｂである。 Although the inclination θ and the shim thickness b vary depending on the viscosity η of the coating liquid 4 and the operating conditions, the inclination θ = 0.001 to 5.0 °, and the shortest distance a is 1/2 of the shim thickness b. A range of ˜5 times, preferably a = b.

（３）塗工方法
上記構成の塗工装置１を用いて基材３に塗工液４を塗工する方法について説明する。 (3) Coating method A method for coating the base material 3 with the coating solution 4 using the coating apparatus 1 having the above-described configuration will be described.

上記したように、バックアップロール２に基材３を抱かせ、スリットダイ１０をその横方向に水平方向に配置して、スリットダイ１０の吐出口３２から塗工液４を塗工する。 As described above, the base material 3 is held on the backup roll 2, the slit die 10 is horizontally disposed in the lateral direction, and the coating liquid 4 is applied from the discharge port 32 of the slit die 10.

塗工液４は、不図示の圧送ポンプによって、液溜め部１８の中央部にある送液口３０から圧入されて、液溜め部１８の中で溜まり、スリット状の吐出口３２から吐出される。この場合に、送液口３０に対応する吐出口３２の中央部付近が最も圧力が高く、従来はこの中央部で、図１９に示すような塗工液４が盛り上がるという問題点があった。しかしながら、本実施例の場合には、この送液口３０が位置する中央部ほど第２シム部の吐出側端部２９が高くなり、送液口３０と対応する第２シム部の中央部における最短距離ａが、吐出口３２の間隙の寸法ｂと同じになっているため、この部分にかかる圧力が低くなり、塗工液４は、図２０に示すように基材３の幅方向において塗工厚さが均一となる。 The coating liquid 4 is press-fitted from a liquid feed port 30 in the center of the liquid reservoir 18 by a pressure feed pump (not shown), collected in the liquid reservoir 18, and discharged from a slit-like discharge port 32. . In this case, the pressure in the vicinity of the central portion of the discharge port 32 corresponding to the liquid supply port 30 is highest, and there has conventionally been a problem that the coating liquid 4 as shown in FIG. However, in the case of the present embodiment, the discharge side end 29 of the second shim portion becomes higher in the central portion where the liquid supply port 30 is located, and in the central portion of the second shim portion corresponding to the liquid supply port 30. Since the shortest distance a is the same as the dimension b of the gap of the discharge port 32, the pressure applied to this portion is reduced, and the coating liquid 4 is applied in the width direction of the substrate 3 as shown in FIG. Work thickness is uniform.

（４）効果
本実施例によれば、塗工装置１によって基材３に塗工液４を塗工した場合に、幅方向の塗工厚が図２０に示すように均一となる。 (4) Effect According to the present embodiment, when the coating liquid 4 is applied to the base material 3 by the coating apparatus 1, the coating thickness in the width direction becomes uniform as shown in FIG.

また、塗工厚を均一にするために、シム１６の第２シム部２８の吐出側端部２９を三角形状に製造するだけでよく、塗工液４の粘度に合わせてシム１６を簡単に製造できる。 Further, in order to make the coating thickness uniform, it is only necessary to manufacture the discharge side end portion 29 of the second shim portion 28 of the shim 16 in a triangular shape, and the shim 16 can be easily adjusted according to the viscosity of the coating liquid 4. Can be manufactured.

（５）変更例１
実施例１の変更例１について図４〜図６に基づいて説明する。 (5) Modification 1
A first modification of the first embodiment will be described with reference to FIGS.

実施例１では、第２シム部２８における吐出側端部２９を三角形状に形成したが、これに代えて、第１の変更例１では、図４に示すように、吐出側端部２９を、凹部状の曲率を設けた三角形状に形成する。 In the first embodiment, the discharge side end portion 29 of the second shim portion 28 is formed in a triangular shape, but instead of this, in the first modified example 1, as shown in FIG. The triangular shape is provided with a concave curvature.

第２の変更例１では、図５に示すように、吐出側端部２９を、凸状の曲率（円弧状）に形成する。 In the second modification example 1, as shown in FIG. 5, the discharge side end portion 29 is formed to have a convex curvature (arc shape).

第３の変更例１では、図６に示すように、吐出側端部２９を、階段状に形成する。 In the third modification example 1, as shown in FIG. 6, the discharge side end portion 29 is formed in a stepped shape.

何れの変更例１でも、中央部の第２シム部２８の高さが最も高くなるようにすればよい。 In any of the first modification examples, the height of the second shim portion 28 at the center may be the highest.

（６）変更例２
実施例１の変更例２について図７〜図９に基づいて説明する。 (6) Modification 2
A second modification of the first embodiment will be described with reference to FIGS.

実施例１では、送液口３０が中央部に形成したが、これに代えて、第１の変更例２では、図７に示すように、第１の変更例２では、送液口３０が液溜め部１８の右端部近傍に形成されているので、第２シム部２８における吐出側端部２９の最大高さ位置を、その右端部近傍に設ける。 In the first embodiment, the liquid feeding port 30 is formed in the central portion. Instead of this, in the first modified example 2, as shown in FIG. Since it is formed near the right end of the liquid reservoir 18, the maximum height position of the discharge side end 29 in the second shim 28 is provided near the right end.

第２の変更例２では、図８に示すように、送液口３０が左端部近傍に形成されているので、吐出側端部２９の最大高さ位置を、その左端部近傍に設ける。 In the second modification example 2, as shown in FIG. 8, since the liquid feeding port 30 is formed in the vicinity of the left end portion, the maximum height position of the discharge side end portion 29 is provided in the vicinity of the left end portion.

第２の変更例２では、送液口３０が２個形成されているので、図９に示すように、各送液口３０に対応する位置に、第２シム部２８における吐出側端部２９の最大高さ位置をぞれぞれ形成する。なお、３個以上の送液口３０についても同様に、各送液口３０に対応する位置に、第２シム部２８における吐出側端部２９の最大高さ位置をそれぞれ形成する。 In the second modification example 2, since two liquid feeding ports 30 are formed, the discharge side end portion 29 in the second shim portion 28 is located at a position corresponding to each liquid feeding port 30 as shown in FIG. The maximum height position of each is formed. Similarly, the maximum height position of the discharge side end portion 29 in the second shim portion 28 is formed at a position corresponding to each liquid supply port 30 for the three or more liquid supply ports 30 as well.

（７）変更例３
実施例１の変更例３について図１０と図１１に基づいて説明する。 (7) Modification 3
A third modification of the first embodiment will be described with reference to FIGS.

実施例１では、１枚のシム１６によって第１シム部２６と第２シム部２８を設けたが、１枚のシム１６では、第２シム部２８の吐出側端部２９の最も高い位置と液溜め部１８の内壁との最短距離ａを精度よく製作できない場合がある。 In the first embodiment, the first shim portion 26 and the second shim portion 28 are provided by one shim 16. However, in the single shim 16, the discharge side end portion 29 of the second shim portion 28 has the highest position. In some cases, the shortest distance “a” from the inner wall of the liquid reservoir 18 cannot be manufactured with high accuracy.

変更例３では、図１０及び図１１に示すように、２枚のシム１６，１６を重ね、第１のシム１６と第２のシム１６の最大高さ位置の高さを若干ずらし、前記最短距離ａの誤差を緩和させて、更に微妙な塗工液４の膜厚分布を調整する。 In the third modification, as shown in FIGS. 10 and 11, two shims 16 and 16 are overlapped, the heights of the maximum height positions of the first shim 16 and the second shim 16 are slightly shifted, and the shortest The error of the distance a is relaxed, and the film thickness distribution of the coating liquid 4 is adjusted more delicately.

（８）変更例４
実施例１の変更例４について図１２に基づいて説明する。 (8) Modification 4
A fourth modification of the first embodiment will be described with reference to FIG.

変更例３では、２枚のシム１６，１６を重ねて隙間の誤差を緩和させたが、変更例４では、図１２に示すように、第２シム部２８の吐出側端部２９の最大高さ位置における縁部の厚さ方向について傾斜面を形成し、この傾斜面の角度により膜厚分布を調整する。 In the modified example 3, the two shims 16 and 16 are overlapped to alleviate the gap error. However, in the modified example 4, as shown in FIG. 12, the maximum height of the discharge side end portion 29 of the second shim portion 28 is increased. An inclined surface is formed in the thickness direction of the edge at the vertical position, and the film thickness distribution is adjusted by the angle of the inclined surface.

（９）変更例５
実施例１の変更例５について図１３に基づいて説明する。 (9) Modification 5
A fifth modification of the first embodiment will be described with reference to FIG.

実施例１では、第１リップ１２のみに液溜め部１８が設けていたが、変更例５では、図１３に示すように、第２リップ１４にも液溜め部１８と送液口３０を設ける。 In the first embodiment, the liquid reservoir 18 is provided only on the first lip 12. However, in the fifth modification, as shown in FIG. 13, the liquid reservoir 18 and the liquid supply port 30 are also provided on the second lip 14. .

（１０）変更例６
実施例１の変更例６について図１４に基づいて説明する。 (10) Modification 6
A sixth modification of the first embodiment will be described with reference to FIG.

実施例１では、液溜め部１８の上端部は、基材３の走行方向と平行であったが、変更例６では、図１４に示すように、液溜め部１４の上端部がＶ字型である場合、図１４（ｂ）に示すように、本実施例のシム１６を適用する。 In Example 1, the upper end of the liquid reservoir 18 was parallel to the traveling direction of the base material 3, but in the modified example 6, the upper end of the liquid reservoir 14 is V-shaped as shown in FIG. If so, the shim 16 of this embodiment is applied as shown in FIG.

（１１）変更例７
実施例１の変更例７について図１５に基づいて説明する。 (11) Modification example 7
A seventh modification of the first embodiment will be described with reference to FIG.

実施例１では、液溜め部１８の上端部が基材３と平行であったが、変更例７では、図１５（ａ）に示すように、液溜め部１４の上端部がＶ字型である場合、図１５（ｂ）に示すように、シム１６における第２シム部２８の吐出側端部２９について、中央部ほど低くなるＶ字状に形成して、膜厚を調整する。 In Example 1, the upper end of the liquid reservoir 18 was parallel to the base material 3, but in Modified Example 7, the upper end of the liquid reservoir 14 was V-shaped as shown in FIG. In some cases, as shown in FIG. 15B, the discharge side end portion 29 of the second shim portion 28 in the shim 16 is formed in a V-shape that becomes lower toward the center portion, and the film thickness is adjusted.

次に、本発明の実施例２の塗工装置１について、図１６〜図１８に基づいて説明する。 Next, the coating apparatus 1 of Example 2 of this invention is demonstrated based on FIGS.

本実施例と実施例１の異なる点は、シム１６に関して、第１シム部２６と第２シム部２８とが分離して、重ねて配置されている点にある。 The difference between the present embodiment and the first embodiment is that the first shim portion 26 and the second shim portion 28 are separated and overlapped with respect to the shim 16.

第１シム部２６は、第１リップ１２の左側部２０と右側部２２と底部２４とからＵ字状に形成されている。 The first shim portion 26 is formed in a U shape from the left side portion 20, the right side portion 22, and the bottom portion 24 of the first lip 12.

第２シム部２８は、第１リップ１２の上面とほぼ同じ形状である長方形状をなし、その中央部に液溜め部１８とほぼ同じ大きさの開口部３４が開口し、この開口部３４の吐出側縁部３６は、Ｖ字状に形成され、送液口３０が位置する中央部に対応する中央の位置に向かうほど、第２シム部２８の底部からの長さが小さくなるように形成されている。 The second shim portion 28 has a rectangular shape that is substantially the same shape as the upper surface of the first lip 12, and an opening portion 34 that is substantially the same size as the liquid reservoir portion 18 is opened at the center thereof. The discharge side edge portion 36 is formed in a V shape and is formed such that the length from the bottom portion of the second shim portion 28 decreases toward the center position corresponding to the center portion where the liquid feeding port 30 is located. Has been.

本実施例の塗工装置１であっても、送液口３０から送られる塗工液４について、送液口３０付近が最も圧力が高くなるが、その部分に対応する第２シム部２８の吐出側縁部３６が最も下方まで突出しているため、その圧力を抑えることができる。そのため、吐出口３２から吐出した塗工液４を基材３に塗工した場合に、図２０に示すように、基材３の幅方向において塗工液４を均一な膜厚で塗工できる。 Even in the coating apparatus 1 of the present embodiment, the pressure in the vicinity of the liquid feeding port 30 is the highest for the coating liquid 4 fed from the liquid feeding port 30, but the second shim portion 28 corresponding to that portion Since the discharge side edge part 36 protrudes to the lowest part, the pressure can be suppressed. Therefore, when the coating liquid 4 discharged from the discharge port 32 is applied to the base material 3, the coating liquid 4 can be applied with a uniform film thickness in the width direction of the base material 3, as shown in FIG. .

なお、本実施例においても、送液口３０が左端部近傍、右端部近傍にある場合、その位置に対応して開口部３４の吐出側縁部３６の最も低い位置を決定すればよい。 Also in this embodiment, when the liquid supply port 30 is in the vicinity of the left end portion and in the vicinity of the right end portion, the lowest position of the discharge side edge portion 36 of the opening 34 may be determined corresponding to the position.

Example of change

本発明は上記各実施例に限らず、その主旨を逸脱しない限り種々に変更することができる。 The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist thereof.

上記実施例では、リチウム二次電池用電極のコーティングについて説明したが、これに限らず光学フィルム用粘着コーティングや、光学フィルム機能性膜コーティングに本実施例の塗工装置１を適用してもよい。 In the above embodiment, the coating of the electrode for the lithium secondary battery has been described. However, the present invention is not limited to this, and the coating apparatus 1 of the present embodiment may be applied to an optical film adhesive coating or an optical film functional film coating. .

また、本実施例では、スリットダイ１０をバックアップロール２の横方向に配置したが、これに限らず真下、真上、斜め上、斜め下に配置してもよい。 In the present embodiment, the slit die 10 is arranged in the lateral direction of the backup roll 2. However, the present invention is not limited to this, and the slit die 10 may be arranged directly below, directly above, diagonally above, or diagonally below.

また、バックアップロール２に対し、本実施例のスリットダイ１０を複数配置してもよい。 In addition, a plurality of slit dies 10 of this embodiment may be arranged for the backup roll 2.

また、走行する基材３の表面と裏面にそれぞれ１対のスリットダイ１０，１０を配置し、両面塗工を行ってもよい。 Alternatively, a pair of slit dies 10 and 10 may be disposed on the front and back surfaces of the traveling base material 3 to perform double-side coating.

１塗工装置
２バックアップロール
１０スリットダイ
１２第１リップ
１４第２リップ
１６シム
１８液溜め部
２６第１シム部
２８第２シム部
３０送液口
３２吐出口
３４開口部 DESCRIPTION OF SYMBOLS 1 Coating apparatus 2 Backup roll 10 Slit die 12 1st lip 14 2nd lip 16 Shim 18 Liquid storage part 26 1st shim part 28 2nd shim part 30 Liquid supply port 32 Discharge port 34 Opening part

Claims

The first lip,
The second lip,
A liquid reservoir for storing the coating liquid formed on the first lip;
A liquid feed port provided in the liquid reservoir, and for feeding the coating liquid to the liquid reservoir;
A plate-like shim sandwiched between the first lip and the second lip;
By sandwiching the shim between the first lip and the second lip, it is between the tip of the first lip and the tip of the second lip and continuously from the liquid reservoir. A formed slit-shaped discharge port;
Have
The shim is
A first shim portion sandwiched between both side portions and a bottom portion of the slit die in a portion other than the liquid reservoir portion and the liquid discharge port;
A second shim portion integral with the first shim portion and covering the bottom side of the liquid reservoir;
Have
The discharge side end portion of the second shim portion changes in height from the bottom portion of the first shim portion toward the position corresponding to the liquid feeding port in the width direction of the slit die , and the second shim portion. The discharge side end of the portion has a height from the bottom of the first shim portion that increases toward the position corresponding to the liquid feeding port in the width direction of the slit die,
A slit die characterized by that.

The first lip,
The second lip,
A liquid reservoir for storing the coating liquid formed on the first lip;
A liquid feed port provided in the liquid reservoir, and for feeding the coating liquid to the liquid reservoir;
A plate-like shim sandwiched between the first lip and the second lip;
By sandwiching the shim between the first lip and the second lip, it is between the tip of the first lip and the tip of the second lip and continuously from the liquid reservoir. A formed slit-shaped discharge port;
Have
The shim is
A first shim portion sandwiched between both side portions and a bottom portion of the slit die in a portion other than the liquid reservoir portion and the liquid discharge port;
A second shim portion integral with the first shim portion and covering the bottom side of the liquid reservoir;
Have
The discharge side end portion of the second shim portion changes in height from the bottom portion of the first shim portion toward the position corresponding to the liquid feeding port in the width direction of the slit die , and the second shim portion. The discharge side end of the part is triangular.
A slit die characterized by that.

The first lip,
The second lip,
A liquid reservoir for storing the coating liquid formed on the first lip;
A liquid feed port provided in the liquid reservoir, and for feeding the coating liquid to the liquid reservoir;
A plate-like shim sandwiched between the first lip and the second lip;
By sandwiching the shim between the first lip and the second lip, it is between the tip of the first lip and the tip of the second lip and continuously from the liquid reservoir. A formed slit-shaped discharge port;
Have
The shim is
A first shim portion sandwiched between both side portions and a bottom portion of the slit die in a portion other than the liquid reservoir portion and the liquid discharge port;
A second shim portion integral with the first shim portion and covering the bottom side of the liquid reservoir;
Have
The discharge side end portion of the second shim portion changes in height from the bottom portion of the first shim portion toward the position corresponding to the liquid feeding port in the width direction of the slit die , and the second shim portion. The shortest distance between the tip of the maximum height portion of the discharge side end portion of the portion and the inner wall constituting the liquid reservoir is the same as the size of the discharge port.
A slit die characterized by that.

The first lip,
The second lip,
A liquid reservoir for storing the coating liquid formed on the first lip;
A liquid feed port provided in the liquid reservoir, and for feeding the coating liquid to the liquid reservoir;
A plate-like shim sandwiched between the first lip and the second lip;
By sandwiching the shim between the first lip and the second lip, it is between the tip of the first lip and the tip of the second lip and continuously from the liquid reservoir. A formed slit-shaped discharge port;
Have
The shim is
A first shim portion sandwiched between both side portions and a bottom portion of the slit die in a portion other than the liquid reservoir portion and the liquid discharge port;
A second shim portion disposed on the first shim portion and having an opening corresponding to the liquid reservoir portion so as to be sandwiched between portions other than the liquid reservoir portion;
Have
The length of the second shim portion from the bottom of the second shim portion decreases toward the position corresponding to the liquid feeding port in the width direction of the slit die. Yes,
A slit die characterized by that.

The liquid feeding port is provided at the center in the width direction of the slit die,
The slit die according to claim 4 .

The discharge port side edge portion of the second shim portion is triangular.
The slit die according to claim 4 .