JP5531009B2 - ポリキャピラリ光学系を有するx線発生装置 - Google Patents

ポリキャピラリ光学系を有するx線発生装置 Download PDF

Info

Publication number
JP5531009B2
JP5531009B2 JP2011504197A JP2011504197A JP5531009B2 JP 5531009 B2 JP5531009 B2 JP 5531009B2 JP 2011504197 A JP2011504197 A JP 2011504197A JP 2011504197 A JP2011504197 A JP 2011504197A JP 5531009 B2 JP5531009 B2 JP 5531009B2
Authority
JP
Japan
Prior art keywords
optical system
ray
ray generator
generator according
gradient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011504197A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011516892A5 (enExample
JP2011516892A (ja
Inventor
ボリス ヴァーマン、
リカイ ジャン、
Original Assignee
リガク イノベイティブ テクノロジーズ インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by リガク イノベイティブ テクノロジーズ インコーポレイテッド filed Critical リガク イノベイティブ テクノロジーズ インコーポレイテッド
Publication of JP2011516892A publication Critical patent/JP2011516892A/ja
Publication of JP2011516892A5 publication Critical patent/JP2011516892A5/ja
Application granted granted Critical
Publication of JP5531009B2 publication Critical patent/JP5531009B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00Arrangements for handling radiation or particles
    • G21K2201/06Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2011504197A 2008-04-11 2009-04-10 ポリキャピラリ光学系を有するx線発生装置 Active JP5531009B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4414808P 2008-04-11 2008-04-11
US61/044,148 2008-04-11
PCT/US2009/040178 WO2009126868A1 (en) 2008-04-11 2009-04-10 X-ray generator with polycapillary optic

Publications (3)

Publication Number Publication Date
JP2011516892A JP2011516892A (ja) 2011-05-26
JP2011516892A5 JP2011516892A5 (enExample) 2014-04-10
JP5531009B2 true JP5531009B2 (ja) 2014-06-25

Family

ID=40834348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011504197A Active JP5531009B2 (ja) 2008-04-11 2009-04-10 ポリキャピラリ光学系を有するx線発生装置

Country Status (5)

Country Link
US (2) US7933383B2 (enExample)
EP (1) EP2263238B1 (enExample)
JP (1) JP5531009B2 (enExample)
CA (1) CA2720776C (enExample)
WO (1) WO2009126868A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2263238B1 (en) * 2008-04-11 2012-06-20 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic
FR2958858B1 (fr) * 2010-04-15 2012-06-29 Joel Kerjean Dispositif de guidage de photons pour appareil de radiotherapie
US8831175B2 (en) * 2010-05-19 2014-09-09 Eric H. Silver Hybrid X-ray optic apparatus and methods
CN102543243B (zh) * 2010-12-28 2016-07-13 Ge医疗系统环球技术有限公司 集成毛细管式平行x射线聚焦透镜
EP2740127B1 (en) * 2011-08-06 2017-11-29 Rigaku Innovative Technologies, Inc. Nanotube based device for guiding x-ray photons and neutrons
US20130182827A1 (en) * 2011-12-02 2013-07-18 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
JP6016386B2 (ja) * 2012-03-09 2016-10-26 キヤノン株式会社 X線光学装置
JP5964705B2 (ja) * 2012-09-14 2016-08-03 浜松ホトニクス株式会社 ポリキャピラリレンズ
EP2898361A4 (en) 2012-09-24 2016-06-01 Convergent R N R Ltd X-RAY REFLECTIVE LENS ARRANGEMENT
CN202905197U (zh) * 2012-10-09 2013-04-24 北京师范大学 用于聚焦同步辐射光源的光学器件
US20140161233A1 (en) 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
US9846132B2 (en) 2013-10-21 2017-12-19 Kla-Tencor Corporation Small-angle scattering X-ray metrology systems and methods
US9885962B2 (en) * 2013-10-28 2018-02-06 Kla-Tencor Corporation Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲x線集光素子およびその構成体、二重湾曲x線分光素子およびその構成体の製造方法
US11189392B2 (en) * 2015-09-25 2021-11-30 Osaka University X-ray microscope
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
DE112017003580T5 (de) * 2016-07-15 2019-05-09 Rigaku Corporation Röntgeninspektionsvorrichtung, Röntgendünnfilminspektionsverfahren und Verfahren zum Messen einer Rocking-Kurve
JP6857400B2 (ja) * 2018-03-01 2021-04-14 株式会社リガク X線発生装置、及びx線分析装置
US12209978B2 (en) 2020-07-15 2025-01-28 Danmarks Tekniske Universitet Laboratory-based 3D scanning X-ray Laue micro-diffraction system and method (Lab3DμXRD)

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5497008A (en) 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
US5175755A (en) 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5192869A (en) 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
EP0723272B1 (en) * 1994-07-08 2001-04-25 Muradin Abubekirovich Kumakhov Method of guiding beams of neutral and charged particles and a device for implementing said method
US5570408A (en) 1995-02-28 1996-10-29 X-Ray Optical Systems, Inc. High intensity, small diameter x-ray beam, capillary optic system
US5604353A (en) 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
US5745547A (en) 1995-08-04 1998-04-28 X-Ray Optical Systems, Inc. Multiple channel optic
US6041099A (en) 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
GB9815968D0 (en) 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
US6333966B1 (en) * 1998-08-18 2001-12-25 Neil Charles Schoen Laser accelerator femtosecond X-ray source
WO2000060610A1 (en) * 1999-04-01 2000-10-12 Mamea Imaging Ab Method and apparatus for simplified alignment in x-ray imaging
US6704389B1 (en) 1999-07-16 2004-03-09 X-Ray Optical Systems, Inc. Support device for a polycapillary optic
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6697454B1 (en) 2000-06-29 2004-02-24 X-Ray Optical Systems, Inc. X-ray analytical techniques applied to combinatorial library screening
DE10112928C1 (de) 2001-03-12 2002-08-22 Ifg Inst Fuer Geraetebau Gmbh Kapillaroptisches Element bestehend aus Kanäle bildenden Kapillaren und Verfahren zu dessen Herstellung
ES2271277T3 (es) 2001-06-19 2007-04-16 X-Ray Optical Systems, Inc. Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida.
WO2003012797A1 (en) 2001-07-27 2003-02-13 X-Ray Optical Systems, Inc. Methods and devices for aligning and determining the focusing characteristics of x-ray optics
WO2003049510A2 (en) 2001-12-04 2003-06-12 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
US7382856B2 (en) 2001-12-04 2008-06-03 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
US6781060B2 (en) 2002-07-26 2004-08-24 X-Ray Optical Systems Incorporated Electrical connector, a cable sleeve, and a method for fabricating an electrical connection
US7372880B2 (en) * 2002-12-20 2008-05-13 Alnair Labs Corporation Optical pulse lasers
JP2007501503A (ja) 2003-08-04 2007-01-25 エックス−レイ オプティカル システムズ インコーポレーテッド 管電力調節および遠隔較正を使用して出力安定性が向上したx線源アセンブリ
US7023955B2 (en) 2003-08-12 2006-04-04 X-Ray Optical System, Inc. X-ray fluorescence system with apertured mask for analyzing patterned surfaces
US7991116B2 (en) * 2005-08-04 2011-08-02 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
WO2008097345A2 (en) 2006-08-10 2008-08-14 X-Ray Optical Systems, Inc. Wide parallel beam diffraction imaging method and system
JP4860418B2 (ja) * 2006-10-10 2012-01-25 株式会社リガク X線光学系
EP2263238B1 (en) * 2008-04-11 2012-06-20 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic

Also Published As

Publication number Publication date
CA2720776C (en) 2013-07-02
US7933383B2 (en) 2011-04-26
CA2720776A1 (en) 2009-10-15
WO2009126868A1 (en) 2009-10-15
EP2263238A1 (en) 2010-12-22
US20110280530A1 (en) 2011-11-17
EP2263238B1 (en) 2012-06-20
JP2011516892A (ja) 2011-05-26
US20090279670A1 (en) 2009-11-12

Similar Documents

Publication Publication Date Title
JP5531009B2 (ja) ポリキャピラリ光学系を有するx線発生装置
JP4860418B2 (ja) X線光学系
JP3721305B2 (ja) 単一隅カークパトリック・バエズのビーム調整光学素子組立体
JP4391019B2 (ja) 並列カークパトリック・バエズ光学素子を備えた、x線方向付けシステム、x線反射システム及びx線光学素子
US6249566B1 (en) Apparatus for x-ray analysis
JP2007011403A (ja) 徐々に変化する原子面を有する二重に湾曲した光学素子
JP2011516892A5 (enExample)
JP2004506193A (ja) X線測定および試験複合システム
JP2005530168A (ja) X線用光学装置
JP2013210377A (ja) ビーム調整システム
WO1992008235A1 (en) Device for controlling beams of particles, x-ray and gamma quanta and uses thereof
JPH10339798A (ja) X線集光用ミラー
US20210247334A1 (en) X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles
JP3830908B2 (ja) 高光度の平行ビーム生成装置
US9831626B2 (en) Broadband light source and optical inspector having the same
JP6430208B2 (ja) X線照射装置
EP2304739B1 (en) High intensity x-ray beam system
US20120281813A1 (en) Confocal Double Crystal Monochromator
JPH06300897A (ja) X線光学装置
JPH05288899A (ja) X線光学系
CN115931928A (zh) 一种基于椭圆弯晶的x射线吸收谱仪
JP2010025740A (ja) X線集光装置
Naletto et al. Design of a high-flux low-energy synchrotron radiation monochromator
JP2015014491A (ja) X線集光装置およびx線装置
JP2009250910A (ja) X線集光装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120213

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130618

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130723

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20131022

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20131029

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131120

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20131217

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20140224

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140325

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140421

R150 Certificate of patent or registration of utility model

Ref document number: 5531009

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250