CA2720776C - X-ray generator with polycapillary optic - Google Patents

X-ray generator with polycapillary optic Download PDF

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Publication number
CA2720776C
CA2720776C CA2720776A CA2720776A CA2720776C CA 2720776 C CA2720776 C CA 2720776C CA 2720776 A CA2720776 A CA 2720776A CA 2720776 A CA2720776 A CA 2720776A CA 2720776 C CA2720776 C CA 2720776C
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CA
Canada
Prior art keywords
optic
ray
graded
baez
focusing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CA2720776A
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English (en)
French (fr)
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CA2720776A1 (en
Inventor
Boris Verman
Licai Jiang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Innovative Technologies Inc
Original Assignee
Rigaku Innovative Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of CA2720776A1 publication Critical patent/CA2720776A1/en
Application granted granted Critical
Publication of CA2720776C publication Critical patent/CA2720776C/en
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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CA2720776A 2008-04-11 2009-04-10 X-ray generator with polycapillary optic Active CA2720776C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4414808P 2008-04-11 2008-04-11
US61/044,148 2008-04-11
PCT/US2009/040178 WO2009126868A1 (en) 2008-04-11 2009-04-10 X-ray generator with polycapillary optic

Publications (2)

Publication Number Publication Date
CA2720776A1 CA2720776A1 (en) 2009-10-15
CA2720776C true CA2720776C (en) 2013-07-02

Family

ID=40834348

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2720776A Active CA2720776C (en) 2008-04-11 2009-04-10 X-ray generator with polycapillary optic

Country Status (5)

Country Link
US (2) US7933383B2 (enExample)
EP (1) EP2263238B1 (enExample)
JP (1) JP5531009B2 (enExample)
CA (1) CA2720776C (enExample)
WO (1) WO2009126868A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5531009B2 (ja) * 2008-04-11 2014-06-25 リガク イノベイティブ テクノロジーズ インコーポレイテッド ポリキャピラリ光学系を有するｘ線発生装置
FR2958858B1 (fr) * 2010-04-15 2012-06-29 Joel Kerjean Dispositif de guidage de photons pour appareil de radiotherapie
US8831175B2 (en) * 2010-05-19 2014-09-09 Eric H. Silver Hybrid X-ray optic apparatus and methods
CN102543243B (zh) * 2010-12-28 2016-07-13 Ge医疗系统环球技术有限公司 集成毛细管式平行x射线聚焦透镜
JP6175436B2 (ja) * 2011-08-06 2017-08-02 リガク イノベイティブ テクノロジーズ インコーポレイテッド Ｘ線光子及び中性子を導くナノチューブ素材の装置
CN103137233A (zh) * 2011-12-02 2013-06-05 佳能株式会社 X射线波导和x射线波导系统
JP6016386B2 (ja) * 2012-03-09 2016-10-26 キヤノン株式会社 Ｘ線光学装置
JP5964705B2 (ja) * 2012-09-14 2016-08-03 浜松ホトニクス株式会社 ポリキャピラリレンズ
EP2898361A4 (en) * 2012-09-24 2016-06-01 Convergent R N R Ltd X-RAY REFLECTIVE LENS ARRANGEMENT
CN202905197U (zh) * 2012-10-09 2013-04-24 北京师范大学 用于聚焦同步辐射光源的光学器件
US20140161233A1 (en) * 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
US9846132B2 (en) 2013-10-21 2017-12-19 Kla-Tencor Corporation Small-angle scattering X-ray metrology systems and methods
US9885962B2 (en) 2013-10-28 2018-02-06 Kla-Tencor Corporation Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US11189392B2 (en) * 2015-09-25 2021-11-30 Osaka University X-ray microscope
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
CN109313145A (zh) * 2016-07-15 2019-02-05 株式会社理学 X射线检测设备、x射线薄膜检测方法和测量摇摆曲线的方法
JP6857400B2 (ja) * 2018-03-01 2021-04-14 株式会社リガク Ｘ線発生装置、及びｘ線分析装置
US12209978B2 (en) 2020-07-15 2025-01-28 Danmarks Tekniske Universitet Laboratory-based 3D scanning X-ray Laue micro-diffraction system and method (Lab3DμXRD)
CN119738425B (zh) * 2024-12-13 2026-02-17 北京师范大学 一种组合镀膜毛细管x光单色聚焦透镜的分析系统及焦斑大小调节方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5175755A (en) 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5192869A (en) 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US5497008A (en) 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
DE69427152T2 (de) 1994-07-08 2001-11-22 Muradin Abubekirovic Kumachov Verfahren zur führung von neutral- und ladungsträgerstrahlen und eine vorrichtung zur durchführung des verfahrens
US5570408A (en) 1995-02-28 1996-10-29 X-Ray Optical Systems, Inc. High intensity, small diameter x-ray beam, capillary optic system
US5604353A (en) 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
US5745547A (en) 1995-08-04 1998-04-28 X-Ray Optical Systems, Inc. Multiple channel optic
US6041099A (en) 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
GB9815968D0 (en) 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
US6333966B1 (en) 1998-08-18 2001-12-25 Neil Charles Schoen Laser accelerator femtosecond X-ray source
EP1173856B1 (en) * 1999-04-01 2005-12-28 Sectra Mamea AB Method and apparatus for simplified alignment in x-ray imaging
US6704389B1 (en) 1999-07-16 2004-03-09 X-Ray Optical Systems, Inc. Support device for a polycapillary optic
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6697454B1 (en) 2000-06-29 2004-02-24 X-Ray Optical Systems, Inc. X-ray analytical techniques applied to combinatorial library screening
DE10112928C1 (de) 2001-03-12 2002-08-22 Ifg Inst Fuer Geraetebau Gmbh Kapillaroptisches Element bestehend aus Kanäle bildenden Kapillaren und Verfahren zu dessen Herstellung
JP2005512020A (ja) 2001-06-19 2005-04-28 エックス−レイ オプティカル システムズ インコーポレーテッド Ｘ線蛍光分光システム及びｘ線蛍光分光方法
WO2003012797A1 (en) 2001-07-27 2003-02-13 X-Ray Optical Systems, Inc. Methods and devices for aligning and determining the focusing characteristics of x-ray optics
US7382856B2 (en) 2001-12-04 2008-06-03 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
AU2002363962A1 (en) 2001-12-04 2003-06-17 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
US6781060B2 (en) 2002-07-26 2004-08-24 X-Ray Optical Systems Incorporated Electrical connector, a cable sleeve, and a method for fabricating an electrical connection
AU2003299854A1 (en) * 2002-12-20 2004-07-22 Alnaire Laboratories Corporation Optical pulse lasers
JP2007501503A (ja) 2003-08-04 2007-01-25 エックス−レイ オプティカル システムズ インコーポレーテッド 管電力調節および遠隔較正を使用して出力安定性が向上したｘ線源アセンブリ
US7023955B2 (en) 2003-08-12 2006-04-04 X-Ray Optical System, Inc. X-ray fluorescence system with apertured mask for analyzing patterned surfaces
US7991116B2 (en) 2005-08-04 2011-08-02 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
WO2008097345A2 (en) 2006-08-10 2008-08-14 X-Ray Optical Systems, Inc. Wide parallel beam diffraction imaging method and system
JP4860418B2 (ja) * 2006-10-10 2012-01-25 株式会社リガク Ｘ線光学系
JP5531009B2 (ja) * 2008-04-11 2014-06-25 リガク イノベイティブ テクノロジーズ インコーポレイテッド ポリキャピラリ光学系を有するｘ線発生装置

Also Published As

Publication number Publication date
CA2720776A1 (en) 2009-10-15
JP2011516892A (ja) 2011-05-26
EP2263238B1 (en) 2012-06-20
US7933383B2 (en) 2011-04-26
JP5531009B2 (ja) 2014-06-25
EP2263238A1 (en) 2010-12-22
US20090279670A1 (en) 2009-11-12
US20110280530A1 (en) 2011-11-17
WO2009126868A1 (en) 2009-10-15

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