JP5529729B2 - 広帯域顕微鏡法に使用するための浸液を用いる反射屈折顕微鏡対物レンズ - Google Patents

広帯域顕微鏡法に使用するための浸液を用いる反射屈折顕微鏡対物レンズ Download PDF

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Publication number
JP5529729B2
JP5529729B2 JP2010512205A JP2010512205A JP5529729B2 JP 5529729 B2 JP5529729 B2 JP 5529729B2 JP 2010512205 A JP2010512205 A JP 2010512205A JP 2010512205 A JP2010512205 A JP 2010512205A JP 5529729 B2 JP5529729 B2 JP 5529729B2
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Japan
Prior art keywords
objective lens
lens
approximately
design
millimeters
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Expired - Fee Related
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JP2010512205A
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Japanese (ja)
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JP2010529516A (ja
JP2010529516A5 (enExample
Inventor
アームストロング・ジョセフ・ジェイ．
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KLA Corp
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KLA Tencor Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives
    • G02B21/04—Objectives involving mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2010512205A 2007-06-14 2008-06-12 広帯域顕微鏡法に使用するための浸液を用いる反射屈折顕微鏡対物レンズ Expired - Fee Related JP5529729B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/818,448 US7884998B2 (en) 2003-02-21 2007-06-14 Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
US11/818,448 2007-06-14
PCT/US2008/007431 WO2008156690A1 (en) 2007-06-14 2008-06-12 Catadioptric microscope objective employing immersion liquid for use in broad band microscopy

Publications (3)

Publication Number Publication Date
JP2010529516A JP2010529516A (ja) 2010-08-26
JP2010529516A5 JP2010529516A5 (enExample) 2013-09-05
JP5529729B2 true JP5529729B2 (ja) 2014-06-25

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Family Applications (1)

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JP2010512205A Expired - Fee Related JP5529729B2 (ja) 2007-06-14 2008-06-12 広帯域顕微鏡法に使用するための浸液を用いる反射屈折顕微鏡対物レンズ

Country Status (4)

Country Link
US (1) US7884998B2 (enExample)
EP (1) EP2165230A4 (enExample)
JP (1) JP5529729B2 (enExample)
WO (1) WO2008156690A1 (enExample)

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US8781184B2 (en) 2010-02-10 2014-07-15 Tokitae Llc Systems, devices, and methods for detection of malaria
US9044141B2 (en) * 2010-02-10 2015-06-02 Tokitae Llc Systems, devices, and methods including a dark-field reflected-illumination apparatus
CN103167840B (zh) * 2010-10-25 2016-08-10 脱其泰有限责任公司 包含暗场反射照明设备的系统、装置以及方法
JP2013061530A (ja) * 2011-09-14 2013-04-04 Canon Inc 反射屈折光学系及びそれを有する撮像装置
US8908294B2 (en) 2012-05-18 2014-12-09 Canon Kabushiki Kaisha Catadioptric optical system with high numerical aperture
KR101411428B1 (ko) * 2012-07-12 2014-06-24 한국과학기술원 집광식 휴대용 형광 검출 시스템
US9329373B2 (en) * 2013-02-13 2016-05-03 Canon Kabushiki Kaisha Catadioptric optical system with multi-reflection element for high numerical aperture imaging
DE102015118641A1 (de) * 2015-10-30 2017-05-04 Carl Zeiss Microscopy Gmbh Vorrichtung zum optischen Untersuchen einer Probe, Verfahren zum Untersuchen einer Probe und Verfahren zum Versetzen einer Vorrichtung in einen betriebsbereiten Zustand
CN109718689B (zh) * 2019-01-25 2021-07-27 江苏师范大学 一种用于机械旋转式气泡产生器、环保设备
CN109626608B (zh) * 2019-01-25 2021-08-31 江苏师范大学 一种自动化机械旋转式气泡产生器、生化污水净化系统
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Also Published As

Publication number Publication date
EP2165230A4 (en) 2013-03-13
US7884998B2 (en) 2011-02-08
US20080247036A1 (en) 2008-10-09
JP2010529516A (ja) 2010-08-26
WO2008156690A1 (en) 2008-12-24
EP2165230A1 (en) 2010-03-24

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