JP5513221B2 - 保護層形成用組成物およびそれを用いた感光性平版印刷版 - Google Patents

保護層形成用組成物およびそれを用いた感光性平版印刷版 Download PDF

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Publication number
JP5513221B2
JP5513221B2 JP2010085134A JP2010085134A JP5513221B2 JP 5513221 B2 JP5513221 B2 JP 5513221B2 JP 2010085134 A JP2010085134 A JP 2010085134A JP 2010085134 A JP2010085134 A JP 2010085134A JP 5513221 B2 JP5513221 B2 JP 5513221B2
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Japan
Prior art keywords
protective layer
lithographic printing
forming composition
printing plate
acid
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Expired - Fee Related
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JP2010085134A
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Japanese (ja)
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JP2011215476A5 (ru
JP2011215476A (ja
Inventor
直哉 佐藤
淳 尾崎
雅郎 中塚
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Okamoto Chem Ind Co Ltd
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Okamoto Chem Ind Co Ltd
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Priority to JP2010085134A priority Critical patent/JP5513221B2/ja
Publication of JP2011215476A publication Critical patent/JP2011215476A/ja
Publication of JP2011215476A5 publication Critical patent/JP2011215476A5/ja
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Expired - Fee Related legal-status Critical Current
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2010085134A 2010-04-01 2010-04-01 保護層形成用組成物およびそれを用いた感光性平版印刷版 Expired - Fee Related JP5513221B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010085134A JP5513221B2 (ja) 2010-04-01 2010-04-01 保護層形成用組成物およびそれを用いた感光性平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010085134A JP5513221B2 (ja) 2010-04-01 2010-04-01 保護層形成用組成物およびそれを用いた感光性平版印刷版

Publications (3)

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JP2011215476A JP2011215476A (ja) 2011-10-27
JP2011215476A5 JP2011215476A5 (ru) 2012-12-13
JP5513221B2 true JP5513221B2 (ja) 2014-06-04

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ID=44945235

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JP2010085134A Expired - Fee Related JP5513221B2 (ja) 2010-04-01 2010-04-01 保護層形成用組成物およびそれを用いた感光性平版印刷版

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JP (1) JP5513221B2 (ru)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL3361725T3 (pl) 2011-06-23 2020-07-13 Huawei Technologies Co., Ltd. Urządzenie do dekodowania przesunięcia, urządzenie do kodowania przesunięcia, urządzenie do filtrowania obrazu i struktura danych
KR101847365B1 (ko) 2012-04-13 2018-04-09 미쓰비시덴키 가부시키가이샤 화상 부호화 장치, 화상 복호 장치, 화상 부호화 방법, 화상 복호 방법 및 기록 매체
JP6254816B2 (ja) 2013-10-18 2017-12-27 日本酢ビ・ポバール株式会社 ポリビニルアルコール系樹脂の製造方法およびそれにより得られたポリビニルアルコール系樹脂
US20160259243A1 (en) 2015-03-03 2016-09-08 Eastman Kodak Company Negative-working lithographic printing plate precursor

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Publication number Publication date
JP2011215476A (ja) 2011-10-27

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