JP5483993B2 - 干渉計 - Google Patents

干渉計 Download PDF

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Publication number
JP5483993B2
JP5483993B2 JP2009241694A JP2009241694A JP5483993B2 JP 5483993 B2 JP5483993 B2 JP 5483993B2 JP 2009241694 A JP2009241694 A JP 2009241694A JP 2009241694 A JP2009241694 A JP 2009241694A JP 5483993 B2 JP5483993 B2 JP 5483993B2
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JP
Japan
Prior art keywords
light
test
optical element
reflected
interference
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Expired - Fee Related
Application number
JP2009241694A
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English (en)
Japanese (ja)
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JP2011089804A (ja
JP2011089804A5 (enExample
Inventor
裕範 古河
徳行 本多
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009241694A priority Critical patent/JP5483993B2/ja
Priority to US12/904,929 priority patent/US8400641B2/en
Publication of JP2011089804A publication Critical patent/JP2011089804A/ja
Publication of JP2011089804A5 publication Critical patent/JP2011089804A5/ja
Application granted granted Critical
Publication of JP5483993B2 publication Critical patent/JP5483993B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Geometry (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2009241694A 2009-10-20 2009-10-20 干渉計 Expired - Fee Related JP5483993B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009241694A JP5483993B2 (ja) 2009-10-20 2009-10-20 干渉計
US12/904,929 US8400641B2 (en) 2009-10-20 2010-10-14 Interferometer for aspherical or spherical surface measurements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009241694A JP5483993B2 (ja) 2009-10-20 2009-10-20 干渉計

Publications (3)

Publication Number Publication Date
JP2011089804A JP2011089804A (ja) 2011-05-06
JP2011089804A5 JP2011089804A5 (enExample) 2012-12-06
JP5483993B2 true JP5483993B2 (ja) 2014-05-07

Family

ID=43879076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009241694A Expired - Fee Related JP5483993B2 (ja) 2009-10-20 2009-10-20 干渉計

Country Status (2)

Country Link
US (1) US8400641B2 (enExample)
JP (1) JP5483993B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011056002A1 (de) * 2011-12-02 2013-06-06 Grintech Gmbh Optisch korrigierende Mikrosonde zur Weißlicht-Interferometrie
JP5955001B2 (ja) * 2012-01-25 2016-07-20 キヤノン株式会社 非球面形状計測方法、形状計測プログラム及び形状計測装置
CN102901462A (zh) * 2012-09-26 2013-01-30 同济大学 一种基于稀疏孔径拼接的平面光学元件检测方法
CN103900693B (zh) * 2014-02-18 2015-11-18 哈尔滨工业大学 一种差分快照式成像光谱仪与成像方法
CN104034279B (zh) 2014-06-14 2016-09-21 中国科学院光电技术研究所 一种利用小孔衍射波面拼接测量面形的检测装置及方法
CN105277338B (zh) * 2014-07-04 2018-10-26 中国科学院长春光学精密机械与物理研究所 大数值孔径移相式双针孔衍射干涉仪及其测试方法
CN105571515A (zh) * 2015-12-25 2016-05-11 中国石油大学(北京) 一种斜入射光反射差法探测样品三维结构的方法
DE102017217371A1 (de) * 2017-09-29 2019-04-04 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
CN110375964B (zh) * 2019-07-18 2021-01-01 浙江大学 一种基于扩展奈波尔-泽尼克模式优化相位恢复的波前误差检测装置及检测方法
CN114942079B (zh) * 2022-05-05 2024-08-30 西安应用光学研究所 菲索干涉型波长计中柱面成像压缩系统的匹配调试方法
CN114942486A (zh) * 2022-06-06 2022-08-26 昆山暨扬光电科技有限公司 一种液晶全息片及制备方法与检测光路及检测方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4743118A (en) * 1985-04-04 1988-05-10 Ricoh Company, Ltd. Method of detecting origin of shear and measuring amount of shear in shearing interferometer systems
JPH05157512A (ja) * 1991-07-19 1993-06-22 Olympus Optical Co Ltd 波面干渉計
JPH0540025A (ja) * 1991-08-07 1993-02-19 Olympus Optical Co Ltd 形状測定装置
JPH08233550A (ja) * 1995-02-24 1996-09-13 Nikon Corp 折り返し干渉装置
US5757493A (en) * 1996-10-16 1998-05-26 Tropel Corporation Interferometer with catadioptric imaging system having expanded range of numerical aperture
JP2000097654A (ja) 1998-09-22 2000-04-07 Nikon Corp 干渉計
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
JP2001349712A (ja) * 2000-04-06 2001-12-21 Nikon Corp 面形状測定装置、波面収差測定装置およびこれらを用いて製造された投影レンズ
US6972849B2 (en) 2001-07-09 2005-12-06 Kuechel Michael Scanning interferometer for aspheric surfaces and wavefronts
JP2003042731A (ja) * 2001-08-01 2003-02-13 Canon Inc 形状計測装置および形状計測方法
WO2003021184A1 (en) * 2001-09-04 2003-03-13 Zygo Corporation Rapid in-situ mastering of an aspheric fizeau
JP4133753B2 (ja) * 2003-11-11 2008-08-13 フジノン株式会社 迂曲面の光波干渉測定方法および迂曲面測定用の干渉計装置
JP4904844B2 (ja) * 2006-02-20 2012-03-28 株式会社ジェイテック 超精密形状測定方法
JP2009281992A (ja) * 2008-05-26 2009-12-03 Canon Inc 測定方法、測定装置及び光学系の製造方法
SG176266A1 (en) * 2009-06-19 2012-01-30 Zygo Corp Equal-path interferometer

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Publication number Publication date
JP2011089804A (ja) 2011-05-06
US20110090510A1 (en) 2011-04-21
US8400641B2 (en) 2013-03-19

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