JP5473350B2 - 照明光学系、露光装置及びデバイスの製造方法 - Google Patents

照明光学系、露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP5473350B2
JP5473350B2 JP2009031964A JP2009031964A JP5473350B2 JP 5473350 B2 JP5473350 B2 JP 5473350B2 JP 2009031964 A JP2009031964 A JP 2009031964A JP 2009031964 A JP2009031964 A JP 2009031964A JP 5473350 B2 JP5473350 B2 JP 5473350B2
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JP
Japan
Prior art keywords
adjustment unit
adjustment
distribution
light
optical system
Prior art date
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Expired - Fee Related
Application number
JP2009031964A
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English (en)
Japanese (ja)
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JP2010192471A5 (enExample
JP2010192471A (ja
Inventor
賢 箕田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009031964A priority Critical patent/JP5473350B2/ja
Priority to US12/685,309 priority patent/US8854605B2/en
Publication of JP2010192471A publication Critical patent/JP2010192471A/ja
Publication of JP2010192471A5 publication Critical patent/JP2010192471A5/ja
Application granted granted Critical
Publication of JP5473350B2 publication Critical patent/JP5473350B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2009031964A 2009-02-13 2009-02-13 照明光学系、露光装置及びデバイスの製造方法 Expired - Fee Related JP5473350B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009031964A JP5473350B2 (ja) 2009-02-13 2009-02-13 照明光学系、露光装置及びデバイスの製造方法
US12/685,309 US8854605B2 (en) 2009-02-13 2010-01-11 Illumination optical system, exposure apparatus, and device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009031964A JP5473350B2 (ja) 2009-02-13 2009-02-13 照明光学系、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2010192471A JP2010192471A (ja) 2010-09-02
JP2010192471A5 JP2010192471A5 (enExample) 2012-03-22
JP5473350B2 true JP5473350B2 (ja) 2014-04-16

Family

ID=42559627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009031964A Expired - Fee Related JP5473350B2 (ja) 2009-02-13 2009-02-13 照明光学系、露光装置及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US8854605B2 (enExample)
JP (1) JP5473350B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5554753B2 (ja) * 2011-06-29 2014-07-23 株式会社日立ハイテクノロジーズ 露光方法及びその装置
JP2014165460A (ja) * 2013-02-27 2014-09-08 Toshiba Corp 半導体製造装置および半導体装置の製造方法
DE102013204466A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Messung einer optischen Symmetrieeigenschaft an einer Projektionsbelichtungsanlage
US9575412B2 (en) * 2014-03-31 2017-02-21 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for reducing pole imbalance by adjusting exposure intensity
US10274979B1 (en) * 2018-05-22 2019-04-30 Capital One Services, Llc Preventing image or video capture of input data provided to a transaction device
US10438010B1 (en) 2018-12-19 2019-10-08 Capital One Services, Llc Obfuscation of input data provided to a transaction device

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0624180B2 (ja) * 1986-04-02 1994-03-30 株式会社日立製作所 投影露光方法及びその装置
JPH0922869A (ja) * 1995-07-07 1997-01-21 Nikon Corp 露光装置
JP3101613B2 (ja) * 1998-01-30 2000-10-23 キヤノン株式会社 照明光学装置及び投影露光装置
JP2000082655A (ja) 1998-09-04 2000-03-21 Canon Inc スリット機構、露光装置およびデバイス製造方法
TW546699B (en) * 2000-02-25 2003-08-11 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution
TW498408B (en) * 2000-07-05 2002-08-11 Asm Lithography Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4923370B2 (ja) * 2001-09-18 2012-04-25 株式会社ニコン 照明光学系、露光装置、及びマイクロデバイスの製造方法
JP4366948B2 (ja) * 2003-02-14 2009-11-18 株式会社ニコン 照明光学装置、露光装置および露光方法
JP5159027B2 (ja) 2004-06-04 2013-03-06 キヤノン株式会社 照明光学系及び露光装置
US8605257B2 (en) * 2004-06-04 2013-12-10 Carl Zeiss Smt Gmbh Projection system with compensation of intensity variations and compensation element therefor
JP2006054328A (ja) * 2004-08-12 2006-02-23 Nikon Corp 照明光学装置、露光装置及びマイクロデバイスの製造方法
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
EP2126636B1 (en) * 2007-01-30 2012-06-13 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
JP4310349B2 (ja) * 2007-04-20 2009-08-05 キヤノン株式会社 露光装置及びデバイス製造方法
JP2008270564A (ja) * 2007-04-20 2008-11-06 Canon Inc 露光装置及びデバイス製造方法
KR101960153B1 (ko) * 2008-12-24 2019-03-19 가부시키가이샤 니콘 조명 광학계, 노광 장치 및 디바이스의 제조 방법

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Publication number Publication date
US20100208223A1 (en) 2010-08-19
JP2010192471A (ja) 2010-09-02
US8854605B2 (en) 2014-10-07

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