JP5453615B2 - フォトレジスト用反射防止膜組成物 - Google Patents

フォトレジスト用反射防止膜組成物 Download PDF

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Publication number
JP5453615B2
JP5453615B2 JP2009523369A JP2009523369A JP5453615B2 JP 5453615 B2 JP5453615 B2 JP 5453615B2 JP 2009523369 A JP2009523369 A JP 2009523369A JP 2009523369 A JP2009523369 A JP 2009523369A JP 5453615 B2 JP5453615 B2 JP 5453615B2
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Japan
Prior art keywords
polymer
photoresist
substituted
propylene
composition
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JP2009523369A
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English (en)
Japanese (ja)
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JP2010500607A5 (enExample
JP2010500607A (ja
Inventor
ウー・ヘンペン
シャン・ツォン
ツァン・ホン
シャン・ジャンフイ
ユィン・ジャン
ヤオ・フイロン
ルー・ピン−フン
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Merck Performance Materials IP Japan GK
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AZ Electronic Materials IP Japan Co Ltd
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Publication date
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Publication of JP2010500607A publication Critical patent/JP2010500607A/ja
Publication of JP2010500607A5 publication Critical patent/JP2010500607A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/952—Utilizing antireflective layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyesters Or Polycarbonates (AREA)
JP2009523369A 2006-08-10 2007-08-07 フォトレジスト用反射防止膜組成物 Active JP5453615B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/502,706 US7638262B2 (en) 2006-08-10 2006-08-10 Antireflective composition for photoresists
US11/502,706 2006-08-10
PCT/IB2007/002340 WO2008017954A2 (en) 2006-08-10 2007-08-07 Antireflective composition for photoresists

Publications (3)

Publication Number Publication Date
JP2010500607A JP2010500607A (ja) 2010-01-07
JP2010500607A5 JP2010500607A5 (enExample) 2011-09-29
JP5453615B2 true JP5453615B2 (ja) 2014-03-26

Family

ID=38740457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009523369A Active JP5453615B2 (ja) 2006-08-10 2007-08-07 フォトレジスト用反射防止膜組成物

Country Status (8)

Country Link
US (1) US7638262B2 (enExample)
EP (1) EP2052293B1 (enExample)
JP (1) JP5453615B2 (enExample)
KR (1) KR101441705B1 (enExample)
CN (1) CN101501572A (enExample)
MY (1) MY145421A (enExample)
TW (1) TWI417668B (enExample)
WO (1) WO2008017954A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11307495B2 (en) 2016-01-26 2022-04-19 Adeka Corporation Thermal acid generator and resist composition using same

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US7824844B2 (en) * 2007-01-19 2010-11-02 Az Electronic Materials Usa Corp. Solvent mixtures for antireflective coating compositions for photoresists
US20080286689A1 (en) * 2007-05-14 2008-11-20 Hong Zhuang Antireflective Coating Compositions
US20090035704A1 (en) * 2007-08-03 2009-02-05 Hong Zhuang Underlayer Coating Composition Based on a Crosslinkable Polymer
US8039201B2 (en) * 2007-11-21 2011-10-18 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
US8435721B2 (en) * 2008-02-21 2013-05-07 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and forming method of resist pattern using the same
US8329387B2 (en) 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8221965B2 (en) * 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
KR100997502B1 (ko) * 2008-08-26 2010-11-30 금호석유화학 주식회사 개환된 프탈릭 언하이드라이드를 포함하는 유기 반사 방지막 조성물과 이의 제조방법
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
US8551686B2 (en) * 2009-10-30 2013-10-08 Az Electronic Materials Usa Corp. Antireflective composition for photoresists
US8507192B2 (en) 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
US8465902B2 (en) 2011-02-08 2013-06-18 Az Electronic Materials Usa Corp. Underlayer coating composition and processes thereof
KR102115442B1 (ko) 2012-04-23 2020-05-28 브레우어 사이언스 인코포레이션 감광성의 현상제-가용성 하부 반사-방지 코팅 재료
US9170494B2 (en) 2012-06-19 2015-10-27 Az Electronic Materials (Luxembourg) S.A.R.L. Antireflective compositions and methods of using same
KR102011446B1 (ko) 2013-02-26 2019-10-14 삼성전자주식회사 반도체 소자의 박막 패턴 형성 방법
KR101982103B1 (ko) 2015-08-31 2019-05-27 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 오버코팅된 포토레지스트와 함께 사용하기 위한 코팅 조성물
KR102487404B1 (ko) * 2017-07-26 2023-01-12 에스케이이노베이션 주식회사 바닥반사 방지막 형성용 중합체 및 이를 포함하는 바닥반사 방지막 형성용 조성물
KR102288386B1 (ko) 2018-09-06 2021-08-10 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법
DE102020131427B4 (de) * 2020-05-21 2024-03-28 Taiwan Semiconductor Manufacturing Co., Ltd. Photoresistzusammensetzung und Herstellungsverfahren von Photoresiststruktur
KR102675074B1 (ko) * 2020-11-20 2024-06-12 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법
CN116814119A (zh) * 2023-07-03 2023-09-29 长鑫存储技术有限公司 底部抗反射涂层组合物、图案形成方法

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US5935760A (en) * 1997-10-20 1999-08-10 Brewer Science Inc. Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
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TW200533692A (en) * 2003-11-06 2005-10-16 Showa Denko Kk Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11307495B2 (en) 2016-01-26 2022-04-19 Adeka Corporation Thermal acid generator and resist composition using same
US11754920B2 (en) 2016-01-26 2023-09-12 Adeka Corporation Thermal acid generator and resist composition using same

Also Published As

Publication number Publication date
KR101441705B1 (ko) 2014-09-18
CN101501572A (zh) 2009-08-05
US20080038659A1 (en) 2008-02-14
EP2052293B1 (en) 2013-03-13
TWI417668B (zh) 2013-12-01
MY145421A (en) 2012-02-15
KR20090038020A (ko) 2009-04-17
WO2008017954A3 (en) 2008-04-10
EP2052293A2 (en) 2009-04-29
WO2008017954A2 (en) 2008-02-14
TW200811602A (en) 2008-03-01
JP2010500607A (ja) 2010-01-07
US7638262B2 (en) 2009-12-29

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