JP5452849B2 - 少なくとも１つのゲッターを備えた密閉超小型部品 - Google Patents

少なくとも１つのゲッターを備えた密閉超小型部品 Download PDF

Info

Publication number
JP5452849B2
JP5452849B2 JP2007183638A JP2007183638A JP5452849B2 JP 5452849 B2 JP5452849 B2 JP 5452849B2 JP 2007183638 A JP2007183638 A JP 2007183638A JP 2007183638 A JP2007183638 A JP 2007183638A JP 5452849 B2 JP5452849 B2 JP 5452849B2
Authority
JP
Japan
Prior art keywords
getter material
cavity
cover
electrode
plug
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2007183638A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008072091A (ja
JP2008072091A5 (enExample
Inventor
ジャン−ルイ・ポルナン
シャルロット・ジロ
フランソワ・バルラ
Original Assignee
コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ filed Critical コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ
Publication of JP2008072091A publication Critical patent/JP2008072091A/ja
Publication of JP2008072091A5 publication Critical patent/JP2008072091A5/ja
Application granted granted Critical
Publication of JP5452849B2 publication Critical patent/JP5452849B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261—Processes for packaging MEMS devices
    • B81C1/00277—Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS
    • B81C1/00285—Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS using materials for controlling the level of pressure, contaminants or moisture inside of the package, e.g. getters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/01—Packaging MEMS
    • B81C2203/0136—Growing or depositing of a covering layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/01—Packaging MEMS
    • B81C2203/0145—Hermetically sealing an opening in the lid

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
JP2007183638A 2006-07-13 2007-07-12 少なくとも１つのゲッターを備えた密閉超小型部品 Active JP5452849B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0652978 2006-07-13
FR0652978A FR2903678B1 (fr) 2006-07-13 2006-07-13 Microcomposant encapsule equipe d'au moins un getter

Publications (3)

Publication Number Publication Date
JP2008072091A JP2008072091A (ja) 2008-03-27
JP2008072091A5 JP2008072091A5 (enExample) 2014-01-09
JP5452849B2 true JP5452849B2 (ja) 2014-03-26

Family

ID=37776793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007183638A Active JP5452849B2 (ja) 2006-07-13 2007-07-12 少なくとも１つのゲッターを備えた密閉超小型部品

Country Status (5)

Country Link
US (1) US7786561B2 (enExample)
EP (1) EP1878693B1 (enExample)
JP (1) JP5452849B2 (enExample)
DE (1) DE602007002230D1 (enExample)
FR (1) FR2903678B1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8159056B1 (en) * 2008-01-15 2012-04-17 Rf Micro Devices, Inc. Package for an electronic device
US8481365B2 (en) * 2008-05-28 2013-07-09 Nxp B.V. MEMS devices
FR2933390B1 (fr) * 2008-07-01 2010-09-03 Commissariat Energie Atomique Procede d'encapsulation d'un dispositif microelectronique par un materiau getter
JP5343969B2 (ja) * 2008-07-25 2013-11-13 日本電気株式会社 封止パッケージ、プリント回路基板、電子機器及び封止パッケージの製造方法
FR2940588B1 (fr) * 2008-12-19 2011-01-07 St Microelectronics Grenoble Ensemble multicomposant blinde a montage en surface
DE102009004724A1 (de) * 2009-01-15 2010-07-22 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines optoelektronischen Bauteils und optoelektronisches Bauteil
FR2947812B1 (fr) 2009-07-07 2012-02-10 Commissariat Energie Atomique Cavite etanche et procede de realisation d'une telle cavite etanche
EP2470938B1 (en) * 2009-08-24 2017-09-27 Cavendish Kinetics Inc. Fabrication of a floating rocker mems device for light modulation
FR2950972A1 (fr) * 2009-10-02 2011-04-08 Commissariat Energie Atomique Procede et cellule de mesure de la concentration globale en ions d'un fluide corporel
US8748206B2 (en) * 2010-11-23 2014-06-10 Honeywell International Inc. Systems and methods for a four-layer chip-scale MEMS device
US9171964B2 (en) * 2010-11-23 2015-10-27 Honeywell International Inc. Systems and methods for a three-layer chip-scale MEMS device
FR2976436B1 (fr) * 2011-06-09 2013-07-05 Commissariat Energie Atomique Dispositif d'imagerie infrarouge a blindage integre contre des rayonnements infrarouges parasites et procede de fabrication du dispositif.
FR2980034B1 (fr) * 2011-09-08 2014-07-04 Commissariat Energie Atomique Procede de realisation d'une structure a cavite fermee hermetiquement et sous atmosphere controlee
FR2981198B1 (fr) * 2011-10-11 2014-04-04 Commissariat Energie Atomique Structure d'encapsulation de dispositif electronique et procede de realisation d'une telle structure
FR2981059A1 (fr) * 2011-10-11 2013-04-12 Commissariat Energie Atomique Procede d'encapsulation de micro-dispositif par report de capot et depot de getter a travers le capot
FR2982073B1 (fr) * 2011-10-28 2014-10-10 Commissariat Energie Atomique Structure d'encapsulation hermetique d'un dispositif et d'un composant electronique
JP5576542B1 (ja) * 2013-08-09 2014-08-20 太陽誘電株式会社 回路モジュール及び回路モジュールの製造方法
US9718672B2 (en) * 2015-05-27 2017-08-01 Globalfoundries Singapore Pte. Ltd. Electronic devices including substantially hermetically sealed cavities and getter films with Kelvin measurement arrangement for evaluating the getter films and methods for fabricating the same
US9567208B1 (en) * 2015-11-06 2017-02-14 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor device and method for fabricating the same
DE102017210459A1 (de) * 2017-06-22 2018-12-27 Robert Bosch Gmbh Mikromechanische Vorrichtung mit einer ersten Kaverne und einer zweiten Kaverne
JP7247730B2 (ja) * 2019-04-23 2023-03-29 三菱電機株式会社 電子モジュール
CN111792621B (zh) * 2020-07-06 2024-04-16 中国科学院上海微系统与信息技术研究所 一种圆片级薄膜封装方法及封装器件
CN116022720A (zh) * 2021-10-27 2023-04-28 上海新微技术研发中心有限公司 复合吸气剂薄膜结构

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3324395B2 (ja) * 1995-10-31 2002-09-17 富士電機株式会社 電界型真空管とそれを用いた圧力センサ、加速度センサおよびそれらの製造方法
JPH09148467A (ja) * 1995-11-24 1997-06-06 Murata Mfg Co Ltd 動作素子の真空封止の構造およびその製造方法
JP3716501B2 (ja) * 1996-07-04 2005-11-16 双葉電子工業株式会社 真空気密容器の製造方法
EP1108677B1 (fr) * 1999-12-15 2006-09-27 Asulab S.A. Procédé d'encapsulation hermétique in situ de microsystèmes
IT1318937B1 (it) 2000-09-27 2003-09-19 Getters Spa Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti
US6992375B2 (en) * 2000-11-30 2006-01-31 Texas Instruments Incorporated Anchor for device package
JP3991689B2 (ja) * 2002-01-28 2007-10-17 松下電器産業株式会社 ガス放電型表示パネル
JP3853234B2 (ja) * 2002-03-05 2006-12-06 三菱電機株式会社 赤外線検出器
US20030183916A1 (en) * 2002-03-27 2003-10-02 John Heck Packaging microelectromechanical systems
US7429495B2 (en) * 2002-08-07 2008-09-30 Chang-Feng Wan System and method of fabricating micro cavities
US20050250253A1 (en) * 2002-10-23 2005-11-10 Cheung Kin P Processes for hermetically packaging wafer level microscopic structures
ITMI20030069A1 (it) 2003-01-17 2004-07-18 Getters Spa Dispositivi micromeccanici o microoptoelettronici con deposito di materiale getter e riscaldatore integrato.
ITMI20032209A1 (it) * 2003-11-14 2005-05-15 Getters Spa Processo per la produzione di dispositivi che richiedono per il loro funzionamento un materiale getter non evaporabile.
FR2864341B1 (fr) * 2003-12-19 2006-03-24 Commissariat Energie Atomique Microcomposant a cavite hermetique comportant un bouchon et procede de fabrication d'un tel microcomposant
JP2006088088A (ja) * 2004-09-27 2006-04-06 Nissan Motor Co Ltd ガス吸着素子とこれを用いた赤外線センサ
US8043880B2 (en) * 2005-07-28 2011-10-25 Hewlett-Packard Development, L.P. Microelectronic device
JP5139673B2 (ja) * 2005-12-22 2013-02-06 セイコーインスツル株式会社 三次元配線及びその製造方法、力学量センサ及びその製造方法

Also Published As

Publication number Publication date
US7786561B2 (en) 2010-08-31
DE602007002230D1 (de) 2009-10-15
US20080049386A1 (en) 2008-02-28
JP2008072091A (ja) 2008-03-27
FR2903678A1 (fr) 2008-01-18
EP1878693A1 (fr) 2008-01-16
EP1878693B1 (fr) 2009-09-02
FR2903678B1 (fr) 2008-10-24

Similar Documents

Publication Publication Date Title
JP5452849B2 (ja) 少なくとも１つのゲッターを備えた密閉超小型部品
KR100611134B1 (ko) 마이크로일렉트로닉, 마이크로옵토일렉트로닉 또는마이크로메카니칼 소자용 지지부
JP2008072091A5 (enExample)
JP4473138B2 (ja) ピラー支持されたキャップを使用するｍｅｍｓデバイスのカプセル化
US6936494B2 (en) Processes for hermetically packaging wafer level microscopic structures
US20080164542A1 (en) Methods and systems for wafer level packaging of mems structures
JP6250812B2 (ja) 密封された空洞内にマイクロ電子デバイスをパッケージングすると共に、専用の孔により空洞の雰囲気を制御するための方法
US20050250253A1 (en) Processes for hermetically packaging wafer level microscopic structures
TW200951062A (en) System and method of encapsulation
US20110053321A1 (en) Method of fabricating and encapsulating mems devices
JP4831931B2 (ja) マイクロエレクトロニクス、マイクロオプトエレクトロニクスまたはマイクロメカニクスのデバイスを製造するための気体吸収物質の集積堆積物を有する支持体
JP5815224B2 (ja) ２つの活性化温度を有するゲッタ及びこのゲッタを備える構造
US20080213539A1 (en) Thin Film Getter Protection
US20050189621A1 (en) Processes for hermetically packaging wafer level microscopic structures
JP2013102144A (ja) 電子デバイスをカプセル化する構造体およびこのような構造体を作る方法
JP2013056413A (ja) 制御された雰囲気下で気密封止された空胴を有する構造を作製する方法
US8921953B2 (en) Method for MEMS device fabrication and device formed
US9005353B2 (en) Getter structure including a gas-permeable material description
CN113086939A (zh) 微机电系统装置、其制法与使用其的整合式微机电系统
CN120229681A (zh) 一种真空封装结构体及其封装方法
HK1073336B (en) Support for microelectronic, microoptoelectronic or micromechanical devices
HK1076539B (en) Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100702

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110622

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110628

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110928

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20111003

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20111028

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20111102

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111226

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120207

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20120507

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20120510

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120802

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130514

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130814

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130819

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20131114

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20131203

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140106

R150 Certificate of patent or registration of utility model

Ref document number: 5452849

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250