JP5448494B2 - 偏光計測装置、露光装置、及びデバイス製造方法 - Google Patents

偏光計測装置、露光装置、及びデバイス製造方法 Download PDF

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JP5448494B2
JP5448494B2 JP2009035291A JP2009035291A JP5448494B2 JP 5448494 B2 JP5448494 B2 JP 5448494B2 JP 2009035291 A JP2009035291 A JP 2009035291A JP 2009035291 A JP2009035291 A JP 2009035291A JP 5448494 B2 JP5448494 B2 JP 5448494B2
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polarization
optical system
light
birefringence
unit
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JP2010192667A (ja
JP2010192667A5 (enExample
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真一郎 平井
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Canon Inc
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Canon Inc
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009035291A 2009-02-18 2009-02-18 偏光計測装置、露光装置、及びデバイス製造方法 Expired - Fee Related JP5448494B2 (ja)

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JP2009035291A JP5448494B2 (ja) 2009-02-18 2009-02-18 偏光計測装置、露光装置、及びデバイス製造方法

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JP2009035291A JP5448494B2 (ja) 2009-02-18 2009-02-18 偏光計測装置、露光装置、及びデバイス製造方法

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JP2010192667A JP2010192667A (ja) 2010-09-02
JP2010192667A5 JP2010192667A5 (enExample) 2012-04-05
JP5448494B2 true JP5448494B2 (ja) 2014-03-19

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8960909B2 (en) * 2012-01-20 2015-02-24 Canon Kabushiki Kaisha Control apparatus and control method
WO2018043438A1 (ja) * 2016-08-29 2018-03-08 学校法人慶應義塾 光学測定装置、光学測定方法、及び応力検査方法
CN112085793B (zh) * 2020-09-04 2022-07-05 上海理工大学 一种基于组合透镜组的三维成像扫描系统及点云配准方法
CN115616866B (zh) * 2021-07-16 2025-09-30 上海微电子装备（集团）股份有限公司 硬件同步控制系统及其控制方法、步进扫描投影光刻机
CN116202626B (zh) * 2022-12-21 2025-10-03 深圳市泰沃德技术有限公司 分时偏振成像方法及系统、工业检测装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4580797B2 (ja) * 2005-03-28 2010-11-17 株式会社東芝 偏光状態検査方法及び半導体装置の製造方法
JP2007263897A (ja) * 2006-03-29 2007-10-11 Nikon Corp 偏光計測装置の校正方法及び装置、偏光計測装置及び該装置を備えた露光装置、並びに位相遅れ量の計測方法及び波長板
JP2009033045A (ja) * 2007-07-30 2009-02-12 Canon Inc 調整方法、露光方法、デバイス製造方法及び露光装置

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