JP2010192667A5 - - Google Patents
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- JP2010192667A5 JP2010192667A5 JP2009035291A JP2009035291A JP2010192667A5 JP 2010192667 A5 JP2010192667 A5 JP 2010192667A5 JP 2009035291 A JP2009035291 A JP 2009035291A JP 2009035291 A JP2009035291 A JP 2009035291A JP 2010192667 A5 JP2010192667 A5 JP 2010192667A5
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- 230000010287 polarization Effects 0.000 claims description 36
- 230000003287 optical effect Effects 0.000 claims description 10
- RDYMFSUJUZBWLH-UHFFFAOYSA-N endosulfan Chemical compound C12COS(=O)OCC2C2(Cl)C(Cl)=C(Cl)C1(Cl)C2(Cl)Cl RDYMFSUJUZBWLH-UHFFFAOYSA-N 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 3
- 238000000691 measurement method Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims 4
- 238000005286 illumination Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009035291A JP5448494B2 (ja) | 2009-02-18 | 2009-02-18 | 偏光計測装置、露光装置、及びデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009035291A JP5448494B2 (ja) | 2009-02-18 | 2009-02-18 | 偏光計測装置、露光装置、及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010192667A JP2010192667A (ja) | 2010-09-02 |
| JP2010192667A5 true JP2010192667A5 (enExample) | 2012-04-05 |
| JP5448494B2 JP5448494B2 (ja) | 2014-03-19 |
Family
ID=42818387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009035291A Expired - Fee Related JP5448494B2 (ja) | 2009-02-18 | 2009-02-18 | 偏光計測装置、露光装置、及びデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5448494B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8960909B2 (en) * | 2012-01-20 | 2015-02-24 | Canon Kabushiki Kaisha | Control apparatus and control method |
| WO2018043438A1 (ja) * | 2016-08-29 | 2018-03-08 | 学校法人慶應義塾 | 光学測定装置、光学測定方法、及び応力検査方法 |
| CN112085793B (zh) * | 2020-09-04 | 2022-07-05 | 上海理工大学 | 一种基于组合透镜组的三维成像扫描系统及点云配准方法 |
| CN115616866B (zh) * | 2021-07-16 | 2025-09-30 | 上海微电子装备（集团）股份有限公司 | 硬件同步控制系统及其控制方法、步进扫描投影光刻机 |
| CN116202626B (zh) * | 2022-12-21 | 2025-10-03 | 深圳市泰沃德技术有限公司 | 分时偏振成像方法及系统、工业检测装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4580797B2 (ja) * | 2005-03-28 | 2010-11-17 | 株式会社東芝 | 偏光状態検査方法及び半導体装置の製造方法 |
| JP2007263897A (ja) * | 2006-03-29 | 2007-10-11 | Nikon Corp | 偏光計測装置の校正方法及び装置、偏光計測装置及び該装置を備えた露光装置、並びに位相遅れ量の計測方法及び波長板 |
| JP2009033045A (ja) * | 2007-07-30 | 2009-02-12 | Canon Inc | 調整方法、露光方法、デバイス製造方法及び露光装置 |
-
2009
- 2009-02-18 JP JP2009035291A patent/JP5448494B2/ja not_active Expired - Fee Related
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