JP5443484B2 - フレキソ印刷版の二次背面露光 - Google Patents

フレキソ印刷版の二次背面露光 Download PDF

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Publication number
JP5443484B2
JP5443484B2 JP2011521100A JP2011521100A JP5443484B2 JP 5443484 B2 JP5443484 B2 JP 5443484B2 JP 2011521100 A JP2011521100 A JP 2011521100A JP 2011521100 A JP2011521100 A JP 2011521100A JP 5443484 B2 JP5443484 B2 JP 5443484B2
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Japan
Prior art keywords
printing plate
flexographic printing
mask
plate precursor
image
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2011521100A
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English (en)
Japanese (ja)
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JP2011529583A5 (OSRAM
JP2011529583A (ja
Inventor
ロイド ズワルド，グレゴリー
Original Assignee
イーストマン コダック カンパニー
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Publication of JP2011529583A5 publication Critical patent/JP2011529583A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2011521100A 2008-07-31 2009-07-21 フレキソ印刷版の二次背面露光 Expired - Fee Related JP5443484B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/183,173 2008-07-31
US12/183,173 US8034540B2 (en) 2008-07-31 2008-07-31 System and method employing secondary back exposure of flexographic plate
PCT/US2009/004203 WO2010014156A1 (en) 2008-07-31 2009-07-21 Employing secondary back exposure of flexographic plate

Publications (3)

Publication Number Publication Date
JP2011529583A JP2011529583A (ja) 2011-12-08
JP2011529583A5 JP2011529583A5 (OSRAM) 2012-08-23
JP5443484B2 true JP5443484B2 (ja) 2014-03-19

Family

ID=41136710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011521100A Expired - Fee Related JP5443484B2 (ja) 2008-07-31 2009-07-21 フレキソ印刷版の二次背面露光

Country Status (5)

Country Link
US (2) US8034540B2 (OSRAM)
EP (1) EP2313270B1 (OSRAM)
JP (1) JP5443484B2 (OSRAM)
CN (1) CN102112312A (OSRAM)
WO (1) WO2010014156A1 (OSRAM)

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US8520041B2 (en) * 2011-02-21 2013-08-27 Eastman Kodak Company Floor relief for dot improvement
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TWI575330B (zh) * 2012-03-27 2017-03-21 尼康股份有限公司 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法
TWI586552B (zh) 2012-06-11 2017-06-11 柯達公司 用於柔版印刷之客製化柔性母版樣式之製造方法以及使用方法
US20130337386A1 (en) * 2012-06-14 2013-12-19 Dirk De Rauw Processing apparatus for processing a flexographic plate, a method and a computer program product
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US9132622B2 (en) * 2013-03-04 2015-09-15 Uni-Pixel Displays, Inc. Method of printing uniform line widths with angle effect
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US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
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US11007767B2 (en) * 2016-11-28 2021-05-18 Flint Group Germany Gmbh Light exposure device and method for exposing plate-shaped materials to light
CN110622070B (zh) * 2017-03-20 2022-10-04 埃斯科绘图成像有限责任公司 用于在受控制的曝光系统或过程中调整柔性版印刷板的底板的过程和装置
US10457082B2 (en) * 2017-05-09 2019-10-29 Macdermid Graphics Solutions, Llc Flexographic printing plate with improved storage stability
WO2019016376A1 (en) * 2017-07-20 2019-01-24 Esko-Graphics Imaging Gmbh SYSTEM AND METHOD FOR DIRECT CURING OF PHOTOPOLYMER PRINTING PLATES
WO2019110809A1 (de) 2017-12-08 2019-06-13 Flint Group Germany Gmbh Verfahren zur kennzeichnung eines reliefvorläufers zur herstellung einer reliefstruktur
US11724533B2 (en) 2018-04-06 2023-08-15 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
DE212019000246U1 (de) 2018-04-06 2020-11-11 Esko-Graphics Imaging Gmbh System zum Herstellen einer Flexoplatte, Flexoplatte computerlesbares Medium, Flexoplatte-Bearbeitungsmaschine und Lesegerät für eine Verwendung in einem Verfahren zur Herstellung einer Flexoplatte
FR3085304B1 (fr) 2018-08-31 2021-01-08 D Uniflexo Forme imprimante photosensible pour un procede d’impression flexographique comprenant des informations visibles et non imprimables, procede de preparation d’une telle forme imprimante
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Also Published As

Publication number Publication date
US8034540B2 (en) 2011-10-11
WO2010014156A1 (en) 2010-02-04
US20100028815A1 (en) 2010-02-04
JP2011529583A (ja) 2011-12-08
CN102112312A (zh) 2011-06-29
EP2313270A1 (en) 2011-04-27
US20110310371A1 (en) 2011-12-22
EP2313270B1 (en) 2013-01-23

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