JP5443484B2 - フレキソ印刷版の二次背面露光 - Google Patents
フレキソ印刷版の二次背面露光 Download PDFInfo
- Publication number
- JP5443484B2 JP5443484B2 JP2011521100A JP2011521100A JP5443484B2 JP 5443484 B2 JP5443484 B2 JP 5443484B2 JP 2011521100 A JP2011521100 A JP 2011521100A JP 2011521100 A JP2011521100 A JP 2011521100A JP 5443484 B2 JP5443484 B2 JP 5443484B2
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- flexographic printing
- mask
- plate precursor
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002243 precursor Substances 0.000 claims description 78
- 230000005855 radiation Effects 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 34
- 238000010030 laminating Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 description 70
- 239000010410 layer Substances 0.000 description 37
- 239000000758 substrate Substances 0.000 description 23
- 238000003384 imaging method Methods 0.000 description 20
- 238000010586 diagram Methods 0.000 description 15
- 238000011161 development Methods 0.000 description 13
- 230000007246 mechanism Effects 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000000178 monomer Substances 0.000 description 5
- -1 polyethylene terephthalate Polymers 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 238000002679 ablation Methods 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 230000000717 retained effect Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- PLXMOAALOJOTIY-FPTXNFDTSA-N Aesculin Natural products OC[C@@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)[C@H]1Oc2cc3C=CC(=O)Oc3cc2O PLXMOAALOJOTIY-FPTXNFDTSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 241000270295 Serpentes Species 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000001866 hydroxypropyl methyl cellulose Substances 0.000 description 1
- 235000010979 hydroxypropyl methyl cellulose Nutrition 0.000 description 1
- 229920003088 hydroxypropyl methyl cellulose Polymers 0.000 description 1
- UFVKGYZPFZQRLF-UHFFFAOYSA-N hydroxypropyl methyl cellulose Chemical compound OC1C(O)C(OC)OC(CO)C1OC1C(O)C(O)C(OC2C(C(O)C(OC3C(C(O)C(O)C(CO)O3)O)C(CO)O2)O)C(CO)O1 UFVKGYZPFZQRLF-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001141 propulsive effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000006254 rheological additive Substances 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
Claims (7)
- フレキソ印刷版にレリーフ画像を形成する方法であって、
それぞれハイライト値を有するマスク画像領域を含む画像形成されたマスクを、フレキソ印刷版前駆体の前面に積層する工程、及び
前記マスク画像の対応するマスク画像領域のハイライト値に基づいて、前記フレキソ印刷版前駆体の選択領域を、当該フレキソ印刷版前駆体の背面を通して画像様にアドレス可能な硬化用輻射線に露光する工程、
を含む、フレキソ印刷版上にレリーフ画像を形成する方法。 - 前記選択領域が、ハイライト値閾値以下のハイライト値を有するマスク画像領域を含む、請求項1に記載の方法。
- 前記画像形成されたマスクを通して硬化用輻射線に前記フレキソ印刷版前駆体を露光する工程、
前記フレキソ印刷版前駆体から前記画像形成されたマスクを除去する工程、及び
前記フレキソ印刷版前駆体を現像して、前記フレキソ印刷版を形成するための硬化用輻射線に露光されなかった当該フレキソ印刷版前駆体の部分を除去する工程、
を含み、残存した露光部分がレリーフ画像を形成する、請求項1又は2に記載の方法。 - 選択領域を露光する工程が、複数の個別にアドレス可能な輻射線源により画像様アドレス可能な硬化用輻射線を供給することを含む、請求項1〜3のいずれか一項に記載の方法。
- マスク画像の記憶デジタルデータ表現に基づいて背面露光が実施される、請求項1〜4のいずれか一項に記載の方法。
- フレキソ印刷版にレリーフ画像を形成するためのシステムであって、
フレキソ印刷版前駆体の前面に、それぞれハイライト値を有するマスク画像領域を有するマスク画像を有する画像形成されたマスクを積層するように構成されたラミネーター、
前記画像形成されたマスクを通して硬化用輻射線に前記フレキソ印刷版前駆体を露光するように構成された主露光ユニット、及び
前記マスク画像の対応するマスク画像領域のハイライト値に基づいて、前記フレキソ印刷版前駆体の背面を通して硬化用輻射線に前記フレキソ印刷版前駆体の選択領域を露光するように構成された二次露光ユニット、
を含むシステム。 - 前記二次露光ユニットが、マスク画像の記憶デジタルデータ表現に基づいて、前記マスク画像に対してインデックス付けされている、請求項6に記載のシステム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/183,173 | 2008-07-31 | ||
US12/183,173 US8034540B2 (en) | 2008-07-31 | 2008-07-31 | System and method employing secondary back exposure of flexographic plate |
PCT/US2009/004203 WO2010014156A1 (en) | 2008-07-31 | 2009-07-21 | Employing secondary back exposure of flexographic plate |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011529583A JP2011529583A (ja) | 2011-12-08 |
JP2011529583A5 JP2011529583A5 (ja) | 2012-08-23 |
JP5443484B2 true JP5443484B2 (ja) | 2014-03-19 |
Family
ID=41136710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011521100A Expired - Fee Related JP5443484B2 (ja) | 2008-07-31 | 2009-07-21 | フレキソ印刷版の二次背面露光 |
Country Status (5)
Country | Link |
---|---|
US (2) | US8034540B2 (ja) |
EP (1) | EP2313270B1 (ja) |
JP (1) | JP5443484B2 (ja) |
CN (1) | CN102112312A (ja) |
WO (1) | WO2010014156A1 (ja) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI468733B (zh) * | 2010-01-22 | 2015-01-11 | Lg Chemical Ltd | 用於光可定向層中定向處理之感壓黏膜 |
DE102010031527A1 (de) * | 2010-07-19 | 2012-01-19 | Flint Group Germany Gmbh | Verfahren zur Herstellung von Flexodruckformen umfassend die Bestrahlung mit UV-LEDs |
EP2466381B1 (en) * | 2010-12-16 | 2021-05-19 | Xeikon Prepress N.V. | A processing apparatus for processing a flexographic plate, a method and a computer program product |
WO2012115888A1 (en) * | 2011-02-21 | 2012-08-30 | Eastman Kodak Company | Floor relief for dot improvement |
US20120210893A1 (en) * | 2011-02-21 | 2012-08-23 | Tutt Lee W | Floor relief for dot improvement |
US8520041B2 (en) * | 2011-02-21 | 2013-08-27 | Eastman Kodak Company | Floor relief for dot improvement |
US8599232B2 (en) * | 2011-09-21 | 2013-12-03 | Eastman Kodak Company | Integral cushion for flexographic printing plates |
CN105425553B (zh) * | 2011-12-20 | 2018-08-28 | 株式会社尼康 | 基底处理装置、器件制造系统、以及器件制造方法 |
TWI575330B (zh) * | 2012-03-27 | 2017-03-21 | 尼康股份有限公司 | 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法 |
CN104321851B (zh) | 2012-06-11 | 2016-10-12 | 伊斯曼柯达公司 | 制造和使用用于柔印印刷的定制柔印母版图案的方法 |
US20130337386A1 (en) * | 2012-06-14 | 2013-12-19 | Dirk De Rauw | Processing apparatus for processing a flexographic plate, a method and a computer program product |
EP2738606B1 (en) * | 2012-11-28 | 2024-01-31 | XSYS Prepress N.V. | Method and computer program product for processing a flexographic plate. |
US9021951B2 (en) * | 2013-02-13 | 2015-05-05 | Eastman Kodak Company | Forming an image on a flexographic media |
US9132622B2 (en) * | 2013-03-04 | 2015-09-15 | Uni-Pixel Displays, Inc. | Method of printing uniform line widths with angle effect |
US9223201B2 (en) | 2013-06-27 | 2015-12-29 | Uni-Pixel Displays, Inc. | Method of manufacturing a photomask with flexography |
US20150030984A1 (en) * | 2013-07-26 | 2015-01-29 | Uni-Pixel Displays, Inc. | Method of manufacturing a flexographic printing plate for high-resolution printing |
US9063426B2 (en) | 2013-09-25 | 2015-06-23 | Uni-Pixel Displays, Inc. | Method of manufacturing a flexographic printing plate with support structures |
US9937703B2 (en) * | 2013-09-30 | 2018-04-10 | Flint Group Germany Gmbh | Device and method for the in-line production of flexographic printing plates |
US9067402B1 (en) * | 2014-01-31 | 2015-06-30 | Eastman Kodak Company | Forming an image on a flexographic media |
WO2017072588A2 (en) | 2015-10-26 | 2017-05-04 | Esko-Graphics Imaging Gmbh | System and method for controlled exposure of flexographic printing plates |
US10732507B2 (en) | 2015-10-26 | 2020-08-04 | Esko-Graphics Imaging Gmbh | Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof |
WO2018096144A1 (de) * | 2016-11-28 | 2018-05-31 | Flint Group Germany Gmbh | Belichtungsvorrichtung und verfahren zur belichtung von plattenförmigen materialien |
DK3583470T3 (da) | 2017-03-20 | 2022-10-03 | Esko Graphics Imaging Gmbh | Fremgangsmåde og indretning til at justere gulvet af en flexografisk trykplade i et system eller en proces med kontrolleret belysning |
US10457082B2 (en) * | 2017-05-09 | 2019-10-29 | Macdermid Graphics Solutions, Llc | Flexographic printing plate with improved storage stability |
EP3655822B1 (en) * | 2017-07-20 | 2022-06-22 | Esko-Graphics Imaging GmbH | System and process for direct curing of photopolymer printing plates |
CN111448518B (zh) | 2017-12-08 | 2023-08-01 | 恩熙思德国有限公司 | 识别用于制造凸版结构的凸版前体的方法 |
CN112204463B (zh) * | 2018-04-06 | 2024-04-30 | 埃斯科绘图成像有限责任公司 | 用于利用工作流程信息持久标记柔性印刷板的方法和利用其标记的板 |
US11724533B2 (en) | 2018-04-06 | 2023-08-15 | Esko-Graphics Imaging Gmbh | System and process for persistent marking of flexo plates and plates marked therewith |
FR3085304B1 (fr) | 2018-08-31 | 2021-01-08 | D Uniflexo | Forme imprimante photosensible pour un procede d’impression flexographique comprenant des informations visibles et non imprimables, procede de preparation d’une telle forme imprimante |
EP3877810B1 (en) * | 2019-02-01 | 2023-08-16 | Esko-Graphics Imaging GmbH | System and process for persistent marking of flexo plates and plates marked therewith |
CN114730141B (zh) * | 2019-10-07 | 2023-09-15 | 埃斯科绘图成像有限责任公司 | 用于柔印版的持久标记的系统和方法以及利用其标记的版 |
NL2028207B1 (en) | 2021-05-12 | 2022-11-30 | Flint Group Germany Gmbh | A relief precursor with vegetable oils as plasticizers suitable for printing plates |
NL2028208B1 (en) | 2021-05-12 | 2022-11-30 | Flint Group Germany Gmbh | Flexographic printing element precursor with high melt flow index |
CN113635657B (zh) * | 2021-08-19 | 2022-11-04 | 上海出版印刷高等专科学校 | 一种采用led光源的柔性版制版组合曝光方法 |
NL2031541B1 (en) | 2022-04-08 | 2023-11-03 | Xsys Prepress N V | Method for imaging a mask layer and associated imaging system |
NL2031806B1 (en) | 2022-05-09 | 2023-11-16 | Xsys Prepress N V | Method, control module and system for imaging a mask layer |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5137701A (ja) * | 1974-09-26 | 1976-03-30 | Asahi Chemical Ind | Shinkinainsatsubannosakuseihoho |
CA1062541A (en) * | 1974-09-26 | 1979-09-18 | Tadashi Kawamoto | Printing plate and method for forming the same |
US4668607A (en) * | 1985-03-26 | 1987-05-26 | E. I. Du Pont De Nemours And Company | Multilevel imaging of photopolymer relief layer for the preparation of casting molds |
GB8714177D0 (en) * | 1987-06-17 | 1987-07-22 | Grace W R Ltd | Printing plate manufacture |
DE4007248A1 (de) * | 1990-03-08 | 1991-09-12 | Du Pont Deutschland | Verfahren zur herstellung flexographischer druckformen |
DE4225829A1 (de) * | 1992-08-05 | 1994-02-10 | Hoechst Ag | Vorbehandlungseinrichtung für bildmäßig zu belichtende Druckformen |
US6110644A (en) * | 1995-10-24 | 2000-08-29 | Agfa-Gevaert, N.V. | Method for making a lithographic printing plate involving on press development |
US5750315A (en) * | 1996-08-13 | 1998-05-12 | Macdermid Imaging Technology, Inc. | Compressible printing plates and manufacturing process therefor |
US5812342A (en) * | 1996-11-27 | 1998-09-22 | Magnecomp Corporation | Reduced mass load beam with improved stiffness properties |
US5813342A (en) | 1997-03-27 | 1998-09-29 | Macdermid Imaging Technology, Incorporated | Method and assembly for producing printing plates |
US5850789A (en) * | 1997-07-22 | 1998-12-22 | E. I. Du Pont De Nemours And Company | Method and apparatus for mounting printing plates |
US6855482B2 (en) * | 2002-04-09 | 2005-02-15 | Day International, Inc. | Liquid transfer articles and method for producing the same using digital imaging photopolymerization |
BR0203428C1 (pt) * | 2002-08-29 | 2004-07-06 | Eudes Dantas | Canhão fotopolimerizador digital |
US7126724B2 (en) * | 2003-03-11 | 2006-10-24 | Kodak Graphic Communications Canada Company | Flexographic printing |
US8142987B2 (en) * | 2004-04-10 | 2012-03-27 | Eastman Kodak Company | Method of producing a relief image for printing |
US7279254B2 (en) * | 2005-05-16 | 2007-10-09 | Eastman Kodak Company | Method of making an article bearing a relief image using a removable film |
DE102005031057A1 (de) * | 2005-07-02 | 2007-01-04 | Punch Graphix Prepress Germany Gmbh | Verfahren zur Belichtung von Flexodruckplatten |
US8053168B2 (en) * | 2006-12-19 | 2011-11-08 | Palo Alto Research Center Incorporated | Printing plate and system using heat-decomposable polymers |
-
2008
- 2008-07-31 US US12/183,173 patent/US8034540B2/en not_active Expired - Fee Related
-
2009
- 2009-07-21 CN CN2009801298689A patent/CN102112312A/zh active Pending
- 2009-07-21 JP JP2011521100A patent/JP5443484B2/ja not_active Expired - Fee Related
- 2009-07-21 EP EP09788958A patent/EP2313270B1/en not_active Not-in-force
- 2009-07-21 WO PCT/US2009/004203 patent/WO2010014156A1/en active Application Filing
-
2011
- 2011-09-01 US US13/223,340 patent/US20110310371A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2011529583A (ja) | 2011-12-08 |
EP2313270B1 (en) | 2013-01-23 |
CN102112312A (zh) | 2011-06-29 |
US8034540B2 (en) | 2011-10-11 |
WO2010014156A1 (en) | 2010-02-04 |
US20110310371A1 (en) | 2011-12-22 |
EP2313270A1 (en) | 2011-04-27 |
US20100028815A1 (en) | 2010-02-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5443484B2 (ja) | フレキソ印刷版の二次背面露光 | |
US8153347B2 (en) | Flexographic element and method of imaging | |
US8524442B1 (en) | Integrated membrane lamination and UV exposure system and method of the same | |
US9298092B2 (en) | Method for improving print performance in flexographic printing plates | |
JP7242771B2 (ja) | 一体化したバリヤー層を有するデジタルイメージング可能なフレキソ印刷プレート | |
EP3449313B1 (en) | Method of making relief image printing elements | |
JP4420923B2 (ja) | 凸版印刷用感光性積層印刷原版および凸版印刷版の製造方法 | |
US20220373879A1 (en) | Thermal imaging film having particulate-treated protective topcoat | |
JP2006003706A (ja) | 感光性樹脂積層体 | |
JP3750805B2 (ja) | 感光性印刷原版 | |
JP3750806B2 (ja) | 感光性印刷用原版 | |
JP2005003979A (ja) | 感光性樹脂積層体 | |
JP2004317964A (ja) | 感光性樹脂積層体 | |
JP3741278B2 (ja) | 感光性印刷用刷版 | |
JP2005017504A (ja) | 感光性樹脂積層体 | |
JP2005017503A (ja) | Irアブレーション用積層体 | |
JP2004053678A (ja) | Irアブレーション用積層体 | |
US20110073235A1 (en) | Process For Making Flexographic Plates | |
JP2004126464A (ja) | 感光性樹脂積層体 | |
JP2005003978A (ja) | Irアブレーション用積層体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120704 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120704 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131111 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20131119 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131219 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |