JP5419336B2 - 感応センサ及びその製造方法 - Google Patents
感応センサ及びその製造方法 Download PDFInfo
- Publication number
- JP5419336B2 JP5419336B2 JP2007245113A JP2007245113A JP5419336B2 JP 5419336 B2 JP5419336 B2 JP 5419336B2 JP 2007245113 A JP2007245113 A JP 2007245113A JP 2007245113 A JP2007245113 A JP 2007245113A JP 5419336 B2 JP5419336 B2 JP 5419336B2
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- Prior art keywords
- pair
- thin film
- base
- counter electrodes
- sensitive
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- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000010409 thin film Substances 0.000 claims description 150
- 239000010408 film Substances 0.000 claims description 57
- 239000000463 material Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 61
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 239000012528 membrane Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007245113A JP5419336B2 (ja) | 2007-09-21 | 2007-09-21 | 感応センサ及びその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007245113A JP5419336B2 (ja) | 2007-09-21 | 2007-09-21 | 感応センサ及びその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009074977A JP2009074977A (ja) | 2009-04-09 |
JP2009074977A5 JP2009074977A5 (enrdf_load_stackoverflow) | 2010-06-03 |
JP5419336B2 true JP5419336B2 (ja) | 2014-02-19 |
Family
ID=40610081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007245113A Active JP5419336B2 (ja) | 2007-09-21 | 2007-09-21 | 感応センサ及びその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5419336B2 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20210262967A1 (en) * | 2018-06-08 | 2021-08-26 | Omron Corporation | Micro-hotplate and mems gas sensor |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010084916A1 (ja) * | 2009-01-21 | 2010-07-29 | 北陸電気工業株式会社 | ガスセンサ用基体及びその製造方法 |
JP5252742B2 (ja) * | 2010-01-28 | 2013-07-31 | フィガロ技研株式会社 | ガスセンサ |
JP5630821B2 (ja) * | 2010-11-05 | 2014-11-26 | フィガロ技研株式会社 | ガスセンサ |
JP2023184338A (ja) * | 2022-06-17 | 2023-12-28 | 日清紡マイクロデバイス株式会社 | ガスセンサ |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5391696U (enrdf_load_stackoverflow) * | 1976-12-27 | 1978-07-26 | ||
JPS61112260U (enrdf_load_stackoverflow) * | 1984-12-27 | 1986-07-16 | ||
JPS6214048A (ja) * | 1985-07-11 | 1987-01-22 | Figaro Eng Inc | 排ガスセンサ |
JPH0324450A (ja) * | 1989-06-21 | 1991-02-01 | Brother Ind Ltd | セラミックス湿度・ガスセンサー |
JP2005003472A (ja) * | 2003-06-11 | 2005-01-06 | Osaka Gas Co Ltd | 薄膜ガスセンサの製造方法 |
-
2007
- 2007-09-21 JP JP2007245113A patent/JP5419336B2/ja active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20210262967A1 (en) * | 2018-06-08 | 2021-08-26 | Omron Corporation | Micro-hotplate and mems gas sensor |
Also Published As
Publication number | Publication date |
---|---|
JP2009074977A (ja) | 2009-04-09 |
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