JP5418768B2 - 露光装置、調整方法及びデバイスの製造方法 - Google Patents

露光装置、調整方法及びデバイスの製造方法 Download PDF

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Publication number
JP5418768B2
JP5418768B2 JP2009152852A JP2009152852A JP5418768B2 JP 5418768 B2 JP5418768 B2 JP 5418768B2 JP 2009152852 A JP2009152852 A JP 2009152852A JP 2009152852 A JP2009152852 A JP 2009152852A JP 5418768 B2 JP5418768 B2 JP 5418768B2
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adjustment
optical system
characteristic value
optical
optical element
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Japanese (ja)
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JP2011009575A5 (enExample
JP2011009575A (ja
Inventor
隆平 宮代
勇治 品野
容三 深川
諭史 久保
義巳 高野
俊幸 吉原
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Canon Inc
Tokyo University of Agriculture and Technology NUC
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Canon Inc
Tokyo University of Agriculture and Technology NUC
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  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009152852A 2009-06-26 2009-06-26 露光装置、調整方法及びデバイスの製造方法 Expired - Fee Related JP5418768B2 (ja)

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JP2009152852A JP5418768B2 (ja) 2009-06-26 2009-06-26 露光装置、調整方法及びデバイスの製造方法

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JP2011009575A JP2011009575A (ja) 2011-01-13
JP2011009575A5 JP2011009575A5 (enExample) 2012-08-16
JP5418768B2 true JP5418768B2 (ja) 2014-02-19

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JP5969848B2 (ja) * 2012-07-19 2016-08-17 キヤノン株式会社 露光装置、調整対象の調整量を求める方法、プログラム及びデバイスの製造方法

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* Cited by examiner, † Cited by third party
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JP4689081B2 (ja) * 2001-06-06 2011-05-25 キヤノン株式会社 露光装置、調整方法、およびデバイス製造方法
JP4574198B2 (ja) * 2004-03-17 2010-11-04 キヤノン株式会社 露光装置、その調整方法及びデバイス製造方法
JP5213406B2 (ja) * 2007-10-05 2013-06-19 キヤノン株式会社 調整方法、露光装置、およびデバイス製造方法
JP5105474B2 (ja) * 2007-10-19 2012-12-26 国立大学法人東京農工大学 露光装置及びデバイス製造方法
JP5006762B2 (ja) * 2007-11-05 2012-08-22 キヤノン株式会社 露光装置及びデバイス製造方法

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