JP5415420B2 - 発光分光法により低圧ガスを分析するためのシステム - Google Patents
発光分光法により低圧ガスを分析するためのシステム Download PDFInfo
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- JP5415420B2 JP5415420B2 JP2010522284A JP2010522284A JP5415420B2 JP 5415420 B2 JP5415420 B2 JP 5415420B2 JP 2010522284 A JP2010522284 A JP 2010522284A JP 2010522284 A JP2010522284 A JP 2010522284A JP 5415420 B2 JP5415420 B2 JP 5415420B2
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- 238000004993 emission spectroscopy Methods 0.000 title description 9
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- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Drying Of Semiconductors (AREA)
Description
円筒状ボリュームを画成する導電性壁部と、少なくとも1つの中央貫通穴を有するディスクとを有するカソードと、
穴の実質的に中央に配置されるアノードと、
電場、および電場に対して直交する磁場の作用の組合せにより円筒状ボリューム中で生成されるプラズマのプラズマ発生源と
を備えるガス・イオン化デバイスと、
プラズマにより発せられる光放射を集めるためのシステムと、
円筒状ボリュームのコンダクタンスよりも低いコンダクタンスを有し、イオン化デバイスとコレクタ・システムとの間に配置される、アノードと同軸の円筒状空洞部と、
放射スペクトルの展開を分析するための光学分光器を備える、イオン化されたガスの分析デバイスと
を備える。
Claims (10)
- 二次真空のオーダの圧力下においてガスを分析するためのガス分析システムにおいて、 ガス・イオン化デバイスを含み、前記ガス・イオン化デバイスは、
円筒状ボリュームを画成する導電性壁部と、少なくとも1つの中央貫通穴を有するディスクとを有するカソードと、
前記穴の実質的に中央に配置されるアノードと、
電場、および前記電場に対して直交する磁場の作用の組合せにより前記円筒状ボリューム中で生成されるプラズマのプラズマ発生源とを備え、前記ガス分析システムはさらに、
前記プラズマにより発せられる光放射を集める集光システムと、
前記円筒状ボリュームのコンダクタンスよりも低いコンダクタンスを有し、前記ガス・イオン化デバイスと前記集光システムとの間に配置される、前記アノードと同軸の円筒状空洞部と、
放射スペクトルの展開を分析するための光学分光器を備える、イオン化されたガスの分析デバイスとを備える、ガス分析システム。 - 前記カソードは、横断中央穴を囲む周囲横断穴を備える有孔ディスクを備える、請求項1に記載のシステム。
- 前記空洞部の直径dは、前記円筒状ボリュームの直径Dよりも小さく、前記直径dは、
分析されるべきガスの圧力に応じて調節され得る、請求項1または2のいずれか1項に記載のシステム。 - 前記アノードは、前記カソードの前記ディスクの前記中央穴内に挿入される誘電性材料から作製されたマウントによって、前記カソードから絶縁される、請求項1乃至3のいずれか1項に記載のシステム。
- 調整デバイスをさらに備え、前記調整デバイスにより、分析されるべきガスの圧力の変動に応じて、前記アノードの供給電圧を制御することが可能となる、請求項4に記載のシステム。
- 前記集光システムは、少なくとも1つの収束レンズを備え、それにより、光軸および前記電極の軸は、同一になる、請求項1乃至5のいずれか1項に記載のシステム。
- 前記円筒状ボリュームの対向側の前記空洞部の端部が、前記プラズマにより発せられる前記光放射に対して透過性である窓によって遮られる、請求項1乃至6のいずれか1項に記載のシステム。
- 前記円筒状ボリュームの対向側の前記空洞部の前記端部は、前記プラズマにより発せられる前記光放射に対して透過性であるレンズによって遮られる、請求項1乃至5のいずれか1項に記載のシステム。
- 前記空洞部は、前記光放射の経路が同一方向となるように、ポンプ移動されるガスの流れとは逆側に、前記円筒状ボリュームの端部上に配設される、請求項1乃至8のいずれか1項に記載のシステム。
- 発光分光器とコンピュータとを備えるイオン化ガス分析デバイスを備え、請求項1乃至9のいずれか1項に記載のガス分析システムに接続される、二次真空内に保持されるガスを収容する少なくとも1つのエンクロージャを含むプラズマ・ベース半導体製造機械であって、前記発光分光器およびコンピュータは、コンパクトな一体型制御システムを構築するために共有ケーシング内に配置され、ガス分析結果に応じて当該機械と連係作動するように当該機械に接続されることを特徴とする、プラズマ・ベース半導体製造機械。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0757203A FR2920539B1 (fr) | 2007-08-27 | 2007-08-27 | Systeme d'analyse de gaz a basse pression par spectroscopie d'emission optique |
FR0757203 | 2007-08-27 | ||
PCT/EP2008/059614 WO2009027156A1 (fr) | 2007-08-27 | 2008-07-22 | Systeme d'analyse de gaz a basse pression par spectroscopie d'emission optique |
Publications (2)
Publication Number | Publication Date |
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JP2010537211A JP2010537211A (ja) | 2010-12-02 |
JP5415420B2 true JP5415420B2 (ja) | 2014-02-12 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2010522284A Active JP5415420B2 (ja) | 2007-08-27 | 2008-07-22 | 発光分光法により低圧ガスを分析するためのシステム |
Country Status (6)
Country | Link |
---|---|
US (1) | US8462335B2 (ja) |
EP (1) | EP2195643B1 (ja) |
JP (1) | JP5415420B2 (ja) |
KR (1) | KR101441167B1 (ja) |
FR (1) | FR2920539B1 (ja) |
WO (1) | WO2009027156A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019082893A1 (ja) | 2017-10-24 | 2019-05-02 | 株式会社マルナカ | ガス分析器 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2993659B1 (fr) | 2012-07-23 | 2014-08-08 | Adixen Vacuum Products | Procede et installation de detection pour le controle d'etancheite d'emballages de produits scelles |
US9427821B2 (en) * | 2013-03-15 | 2016-08-30 | Agilent Technologies, Inc. | Integrated magnetron plasma torch, and related methods |
JP6480211B2 (ja) * | 2014-02-28 | 2019-03-06 | アークレイ株式会社 | プラズマ発生用チップ、プラズマ発生装置およびプラズマ分光分析方法 |
JP6656931B2 (ja) * | 2015-01-13 | 2020-03-04 | アークレイ株式会社 | プラズマ分光分析方法およびプラズマ分光分析装置 |
EA201991461A1 (ru) | 2016-12-14 | 2019-12-30 | Майкл Смит | Способы и устройства для оценки содержания материалов |
US11927571B2 (en) | 2016-12-14 | 2024-03-12 | Michael P. Smith | Methods and devices for evaluating the contents of materials |
WO2020146859A1 (en) | 2019-01-13 | 2020-07-16 | Michael Smith | Analysis of release-resistant water in materials and related devices and methods |
CN110398075A (zh) * | 2019-08-15 | 2019-11-01 | 中国科学院电工研究所 | 槽式太阳能集热管真空性能测量装置 |
US11976992B2 (en) | 2019-09-20 | 2024-05-07 | Inficon ag | Vacuum-tight electrical feedthrough |
CN114088690B (zh) * | 2021-11-09 | 2023-07-21 | 哈尔滨工业大学 | 一种开放环境下气体杂质的分析检测装置及方法 |
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US2457781A (en) * | 1948-01-02 | 1948-12-28 | Sylvania Electric Prod | Ray counter |
CH431131A (de) * | 1966-02-02 | 1967-02-28 | Balzers Patent Beteilig Ag | Kaltkathodenionisationsmanometer |
JPH06120169A (ja) | 1992-10-07 | 1994-04-28 | Hitachi Ltd | プラズマ生成装置 |
JP4086979B2 (ja) | 1998-10-16 | 2008-05-14 | 俊夫 後藤 | プラズマ処理装置における炭素原子ラジカル測定用炭素原子光発生装置 |
US6366346B1 (en) * | 1998-11-19 | 2002-04-02 | Applied Materials, Inc. | Method and apparatus for optical detection of effluent composition |
JP3709552B2 (ja) * | 1999-09-03 | 2005-10-26 | 株式会社日立製作所 | プラズマ処理装置及びプラズマ処理方法 |
JP4024494B2 (ja) * | 2001-03-29 | 2007-12-19 | 大陽日酸株式会社 | ガス中の窒素測定方法及び装置 |
DE10151080C1 (de) * | 2001-10-10 | 2002-12-05 | Xtreme Tech Gmbh | Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung |
DE10215469B4 (de) | 2002-04-05 | 2005-03-17 | Xtreme Technologies Gmbh | Anordnung zur Unterdrückung von Teilchenemission bei einer Strahlungserzeugung auf Basis eines heißen Plasmas |
US6975393B2 (en) * | 2003-03-11 | 2005-12-13 | Verity Instruments, Inc. | Method and apparatus for implementing an afterglow emission spectroscopy monitor |
FR2887072A1 (fr) * | 2005-06-08 | 2006-12-15 | Alcatel Sa | Systeme spectographique ameliore avec source plasma |
GB2441582A (en) * | 2006-09-01 | 2008-03-12 | Gencoa Ltd | Process monitoring and control |
-
2007
- 2007-08-27 FR FR0757203A patent/FR2920539B1/fr not_active Expired - Fee Related
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2008
- 2008-07-22 EP EP08775286.1A patent/EP2195643B1/fr active Active
- 2008-07-22 JP JP2010522284A patent/JP5415420B2/ja active Active
- 2008-07-22 KR KR1020107004574A patent/KR101441167B1/ko active IP Right Grant
- 2008-07-22 WO PCT/EP2008/059614 patent/WO2009027156A1/fr active Application Filing
- 2008-07-22 US US12/733,371 patent/US8462335B2/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019082893A1 (ja) | 2017-10-24 | 2019-05-02 | 株式会社マルナカ | ガス分析器 |
JPWO2019082893A1 (ja) * | 2017-10-24 | 2021-03-18 | 株式会社 マルナカ | ガス分析器 |
JP7178666B2 (ja) | 2017-10-24 | 2022-11-28 | 株式会社 マルナカ | ガス分析器 |
Also Published As
Publication number | Publication date |
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US8462335B2 (en) | 2013-06-11 |
EP2195643B1 (fr) | 2018-07-04 |
EP2195643A1 (fr) | 2010-06-16 |
JP2010537211A (ja) | 2010-12-02 |
FR2920539B1 (fr) | 2010-05-28 |
US20100277724A1 (en) | 2010-11-04 |
FR2920539A1 (fr) | 2009-03-06 |
KR20100067649A (ko) | 2010-06-21 |
KR101441167B1 (ko) | 2014-09-17 |
WO2009027156A1 (fr) | 2009-03-05 |
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