JP5408565B2 - 表面増強赤外吸収センサー材料 - Google Patents
表面増強赤外吸収センサー材料 Download PDFInfo
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- JP5408565B2 JP5408565B2 JP2008228904A JP2008228904A JP5408565B2 JP 5408565 B2 JP5408565 B2 JP 5408565B2 JP 2008228904 A JP2008228904 A JP 2008228904A JP 2008228904 A JP2008228904 A JP 2008228904A JP 5408565 B2 JP5408565 B2 JP 5408565B2
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- sensor material
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- 239000000463 material Substances 0.000 title claims description 53
- 238000010521 absorption reaction Methods 0.000 title claims description 41
- 239000010931 gold Substances 0.000 claims description 48
- 239000002184 metal Substances 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000010409 thin film Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 17
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010408 film Substances 0.000 description 49
- 238000000034 method Methods 0.000 description 38
- 230000000694 effects Effects 0.000 description 29
- 239000002105 nanoparticle Substances 0.000 description 27
- 239000002245 particle Substances 0.000 description 25
- 238000001179 sorption measurement Methods 0.000 description 18
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 230000035945 sensitivity Effects 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 238000011065 in-situ storage Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000005259 measurement Methods 0.000 description 10
- 238000012544 monitoring process Methods 0.000 description 9
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 230000005684 electric field Effects 0.000 description 8
- 238000004415 surface enhanced infrared absorption spectroscopy Methods 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 6
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical group CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- QJAOYSPHSNGHNC-UHFFFAOYSA-N octadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCCCS QJAOYSPHSNGHNC-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 238000005325 percolation Methods 0.000 description 4
- LNVWRBNPXCUYJI-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazol-4-amine Chemical compound CC1=NNC(C)=C1N LNVWRBNPXCUYJI-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 3
- 229910003771 Gold(I) chloride Inorganic materials 0.000 description 3
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000031018 biological processes and functions Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000002082 metal nanoparticle Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000002336 sorption--desorption measurement Methods 0.000 description 2
- 238000012916 structural analysis Methods 0.000 description 2
- 239000012756 surface treatment agent Substances 0.000 description 2
- 230000036962 time dependent Effects 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- TUGGFUSCPLPUFY-UHFFFAOYSA-N 3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCN.CCO[Si](OCC)(OCC)CCCN TUGGFUSCPLPUFY-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- 230000005653 Brownian motion process Effects 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005537 brownian motion Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- MZGNSEAPZQGJRB-UHFFFAOYSA-N dimethyldithiocarbamic acid Chemical compound CN(C)C(S)=S MZGNSEAPZQGJRB-UHFFFAOYSA-N 0.000 description 1
- 238000003411 electrode reaction Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000001506 fluorescence spectroscopy Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
- G01N21/554—Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
- G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Molecular Biology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Physical Vapour Deposition (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Description
第3に、上記第1または第2の発明において、前記複数の金属ナノ薄膜の隣接するもの同士の平均間隔が7nm以下である表面増強赤外吸収センサー材料を、
第4に、上記第3の発明において、前記平均間隔が3nm以上である表面増強赤外吸収センサー材料を、
第5に、上記第1から第4の何れかの発明において、前記複数の金属ナノ薄膜は金から成る表面増強赤外吸収センサー材料を、
提供する。
先ず、本発明の実施の形態に係る表面増強赤外吸収(SEIRA)センサー材料について述べる。
本実施形態のSEIRAセンサー材料は、誘電体基板上に金属ナノ薄膜が吸着されてなり、前記金属ナノ薄膜は、前記基板上に2次元充填率0.7以上1未満で扁平かつ分断された島状に配置され、隣接する島状部間の平均間隔が7nm以下であることを特徴とするものである。
本実施形態のSEIRAセンサー材料の製造方法は、溶液中に分散した金属ナノ粒子を基板表面に吸着させ、あるいは吸着した金属ナノ粒子を溶液中で成長させることにより製膜し、前記基板の金属ナノ薄膜が配置されている側とは反対側の面から赤外光を照射し、前記基板から染み出したエバネッセント波を検出して表面増強赤外吸収シグナルをその場モニターしながら、表面増強赤外吸収活性度を調整することにより、前記金属ナノ薄膜を扁平かつ分断された島状に成長させることを特徴とするものである。
また、上記では、無電解メッキ法を用いたが、電解メッキ法を用いてもよい。
本発明では、この手法の実施例として、シリコン表面に無電解メッキにより成長させた不連続なAuナノ薄膜の例を示す。まず、自然酸化膜で覆われたATR用のシリコン単結晶を用意し、その上にシランカップリング剤のアミノプロピルトリエトキシシラン((aminopropyl)triethoxysilane)(略称APTES)をコートして表面改質を行った。
その後、図3の液体フローセルにシリコン単結晶をマウントし、フローセルにクエン酸還元法で作製したAuコロイド溶液を流し込んだ。
このフローセルはテフロン(登録商標)で作製したセルにポリプロピレン(PP)を材料としたチューブとフィッティング及びバルブを組み合わせて作製し、その上に半球型Si-ATR結晶をマウントした。Si−ATRとフローセルとはカルレッツ(登録商標)またはバイトンOリング(登録商標)により、密着させ溶液の漏れを防止している。本実施例では、一回反射ATR法を用いたが、多重反射ATR法を用いたセルを用いても良い。
また、誘電体基板上に形成されるナノ薄膜材料構造は、金属に限らず、増強効果を示すものであれば、あらゆる材料が適用可能である。
Claims (5)
- 平均の大きさが200nm以下の複数の金属ナノ薄膜が誘電体基板上に2次元充填率0.7以上1未満で扁平且つ互いに分断された島状に配置され、系全体の導電性が発現していない、表面増強赤外吸収センサー材料。
- 前記複数の金属ナノ薄膜の平均の大きさが50nm以上である、請求項1に記載の表面増強赤外吸収センサー材料。
- 前記複数の金属ナノ薄膜の隣接するもの同士の平均間隔が7nm以下である、請求項1または2に記載の表面増強赤外吸収センサー材料。
- 前記平均間隔が3nm以上である、請求項3に記載の表面増強赤外吸収センサー材料。
- 前記複数の金属ナノ薄膜は金から成る、請求項1から4の何れかに記載の表面増強赤外吸収センサー材料。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2008228904A JP5408565B2 (ja) | 2007-09-07 | 2008-09-05 | 表面増強赤外吸収センサー材料 |
Applications Claiming Priority (3)
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JP2007233049 | 2007-09-07 | ||
JP2007233049 | 2007-09-07 | ||
JP2008228904A JP5408565B2 (ja) | 2007-09-07 | 2008-09-05 | 表面増強赤外吸収センサー材料 |
Related Child Applications (1)
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JP2012144529A Division JP5476574B2 (ja) | 2007-09-07 | 2012-06-27 | 表面増強赤外吸収センサーの製造方法 |
Publications (2)
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JP2009080109A JP2009080109A (ja) | 2009-04-16 |
JP5408565B2 true JP5408565B2 (ja) | 2014-02-05 |
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JP2008228904A Expired - Fee Related JP5408565B2 (ja) | 2007-09-07 | 2008-09-05 | 表面増強赤外吸収センサー材料 |
JP2012144529A Expired - Fee Related JP5476574B2 (ja) | 2007-09-07 | 2012-06-27 | 表面増強赤外吸収センサーの製造方法 |
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Country Status (4)
Country | Link |
---|---|
US (1) | US8193499B2 (ja) |
EP (1) | EP2199777A4 (ja) |
JP (2) | JP5408565B2 (ja) |
WO (1) | WO2009031662A1 (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011050165A2 (en) * | 2009-10-21 | 2011-04-28 | Stc.Unm | Plasmonic detectors |
JP5971789B2 (ja) * | 2010-08-31 | 2016-08-17 | 国立研究開発法人物質・材料研究機構 | ファイバー用プローブの作製方法 |
JP5604334B2 (ja) * | 2011-02-28 | 2014-10-08 | 出光興産株式会社 | 吸着性化合物の分析方法 |
DE102012004582B4 (de) | 2012-03-09 | 2014-02-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Sensorsubstrat für die oberflächenverstärkte Spektroskopie |
CN102621093A (zh) * | 2012-03-31 | 2012-08-01 | 上海大学 | 光谱研究金属及合金之缓蚀剂的作用及其择优化表面技术 |
JP6146898B2 (ja) | 2012-06-29 | 2017-06-14 | 国立研究開発法人物質・材料研究機構 | 表面増強ラマン分光分析用(sers)基板、その製造方法、それを用いたバイオセンサおよびそれを用いたマイクロ流路デバイス |
JP6124327B2 (ja) * | 2012-11-26 | 2017-05-10 | 国立研究開発法人物質・材料研究機構 | 金属検出センサー並びに金属検出方法及び装置 |
JP6396012B2 (ja) * | 2013-10-31 | 2018-09-26 | 富士電機株式会社 | 光増強素子 |
KR20150054179A (ko) | 2013-11-11 | 2015-05-20 | 삼성전자주식회사 | 레이저 유도 초음파 발생장치 및 그 제조방법 |
US9823188B1 (en) * | 2014-09-09 | 2017-11-21 | University Of South Florida | Systems and methods for detecting the presence of a contaminant |
CN104707992A (zh) * | 2014-12-01 | 2015-06-17 | 中国科学院合肥物质科学研究院 | 一种超结构Au/Ag@Al2O3@Ag纳米球阵列的制备方法及其SERS性能 |
WO2017010411A1 (ja) | 2015-07-13 | 2017-01-19 | 国立研究開発法人理化学研究所 | 赤外分光法のための構造体およびそれを用いる赤外分光法 |
EP3365861A4 (en) | 2015-10-19 | 2019-04-24 | Merit Medical Systems, Inc. | SYSTEMS AND METHOD FOR PRODUCING MEDICAL DEVICES |
CN110268250B (zh) * | 2017-01-31 | 2022-03-04 | 惠普发展公司,有限责任合伙企业 | 表面增强红外吸收台 |
CN108254353B (zh) * | 2017-12-29 | 2019-04-16 | 重庆大学 | 石墨烯金属共形纳米探针增强拉曼红外双光谱器件及制备方法 |
CN111060469A (zh) * | 2019-12-31 | 2020-04-24 | 深圳大学 | 一种生物检测芯片、生物传感器及其制备方法、用途 |
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