JP5386229B2 - 電子銃 - Google Patents
電子銃 Download PDFInfo
- Publication number
- JP5386229B2 JP5386229B2 JP2009123684A JP2009123684A JP5386229B2 JP 5386229 B2 JP5386229 B2 JP 5386229B2 JP 2009123684 A JP2009123684 A JP 2009123684A JP 2009123684 A JP2009123684 A JP 2009123684A JP 5386229 B2 JP5386229 B2 JP 5386229B2
- Authority
- JP
- Japan
- Prior art keywords
- electron gun
- electron
- field emission
- electron beam
- extraction electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000605 extraction Methods 0.000 claims description 52
- 238000010894 electron beam technology Methods 0.000 claims description 51
- 238000010438 heat treatment Methods 0.000 claims description 6
- 230000007246 mechanism Effects 0.000 claims description 2
- 238000009413 insulation Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 description 21
- 238000007654 immersion Methods 0.000 description 19
- 230000004075 alteration Effects 0.000 description 12
- 230000001133 acceleration Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000009471 action Effects 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000593 degrading effect Effects 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
- H01J2237/06341—Field emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/065—Source emittance characteristics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
Description
Rとrの関係より、電界強度FがほとんどRに関係なく、Vとrのみに依存することがわかる。この非対称性から、電子源先端部分の電場強度は電子源先端径などの電子源構造によりほぼ決まり、引出電極の位置や構造にはほとんど依存しないことが分かった。よって、引出電極が円筒形であっても電界放出は起こり、本発明はこの現象を用いている。
102 電子源保持部
103,104 Butler電極
105 引出電源
106 加速電源
107,204,614 陽極
108 接地部
109 引出電極絞り
110,203,303,403,503,603 引出電極
207 磁路
209 永久磁石
210,617,710 ヒータ
310 引出電極最小開口部内径
410 磁路下面
604 第二陽極
610,611,612,613 中間電極
615 ブリーダー抵抗
616 V2電源
703 引出電極(シールド兼)
711 散乱電子
Claims (7)
- 電子線を陰極から引き出し、引き出された電子線を収束する電界放出型電子銃において、
レンズ磁界中に陰極が配置されるように、電子銃を構成する真空容器の内側に磁場レンズを備え、陰極から電子を引き出すための引出電極を、絞り構造のない円筒形で構成したことを特徴とする電界放出型電子銃。 - 請求項1の電界放出型電子銃において、前記磁場レンズは、永久磁石によって構成されることを特徴とする電界放出電子銃。
- 請求項1の電界放出型電子銃において、前記陰極の位置を、電子線と平行な方向に移動する移動機構を備えたことを特徴とする電界放出型電子銃。
- 請求項1の電界放出型電子銃において、電子線を加速する陽極を加熱する加熱手段を備えたことを特徴とする電界放出型電子銃。
- 請求項1の電界放出型電子銃において、前記引出電極を加熱する加熱手段を備えたことを特徴とする電界放出型電子銃。
- 請求項5の電界放出型電子銃において、ヒータおよび引出電極と永久磁石磁路および永久磁石との間に熱絶縁構造を設けたことを特徴とする電界放出型電子銃。
- 電子線により試料を加工,検査する電子線装置において、請求項1の電界放出型電子銃を搭載した電子線装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009123684A JP5386229B2 (ja) | 2009-05-22 | 2009-05-22 | 電子銃 |
DE112010002063.9T DE112010002063B4 (de) | 2009-05-22 | 2010-04-14 | Feldemissions-Elektronenkanone und Elektronenstrahlvorrichtung mit einer solchen Feldemissions-Elektronenkanone |
US13/322,025 US8669535B2 (en) | 2009-05-22 | 2010-04-14 | Electron gun |
PCT/JP2010/002684 WO2010134259A1 (ja) | 2009-05-22 | 2010-04-14 | 電子銃 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009123684A JP5386229B2 (ja) | 2009-05-22 | 2009-05-22 | 電子銃 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013126253A Division JP2013225521A (ja) | 2013-06-17 | 2013-06-17 | 電子銃 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010272381A JP2010272381A (ja) | 2010-12-02 |
JP5386229B2 true JP5386229B2 (ja) | 2014-01-15 |
Family
ID=43125952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009123684A Expired - Fee Related JP5386229B2 (ja) | 2009-05-22 | 2009-05-22 | 電子銃 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8669535B2 (ja) |
JP (1) | JP5386229B2 (ja) |
DE (1) | DE112010002063B4 (ja) |
WO (1) | WO2010134259A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6095338B2 (ja) * | 2012-11-28 | 2017-03-15 | 株式会社日立製作所 | 電子銃および荷電粒子線装置 |
JP6340165B2 (ja) * | 2013-04-25 | 2018-06-06 | 株式会社日立ハイテクノロジーズ | 電子銃、荷電粒子銃およびそれらを用いた荷電粒子線装置 |
US9799484B2 (en) | 2014-12-09 | 2017-10-24 | Hermes Microvision, Inc. | Charged particle source |
US11227740B2 (en) | 2017-09-07 | 2022-01-18 | Hitachi High-Tech Corporation | Electron gun and electron beam application device |
JP6916074B2 (ja) * | 2017-09-20 | 2021-08-11 | 浜松ホトニクス株式会社 | 電子放出管、電子照射装置及び電子放出管の製造方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2417179A1 (fr) | 1978-02-08 | 1979-09-07 | Hitachi Ltd | Canon electronique a emission de champ |
JPH0654643B2 (ja) | 1987-09-14 | 1994-07-20 | 日本電子株式会社 | 電界放射型電子銃用レンズ |
JP2775071B2 (ja) | 1989-02-22 | 1998-07-09 | 日本電信電話株式会社 | 荷電粒子ビーム発生装置 |
US5155412A (en) | 1991-05-28 | 1992-10-13 | International Business Machines Corporation | Method for selectively scaling a field emission electron gun and device formed thereby |
KR970005769B1 (ko) * | 1992-08-27 | 1997-04-19 | 가부시끼가이샤 도시바 | 자계 계침형 전자총 |
JP2835265B2 (ja) | 1992-08-27 | 1998-12-14 | 株式会社東芝 | 磁界界浸型電子銃及び磁界界浸型電子銃操作方法 |
JP3325982B2 (ja) * | 1993-12-27 | 2002-09-17 | 株式会社東芝 | 磁界界浸型電子銃 |
JP3431765B2 (ja) * | 1995-08-25 | 2003-07-28 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 電子供給装置及び表示装置 |
JP2000003689A (ja) | 1998-06-12 | 2000-01-07 | Toshiba Corp | 電子銃とそれを用いた露光装置 |
JP2000090866A (ja) | 1998-09-17 | 2000-03-31 | Toshiba Corp | 電子銃、電子銃による電子ビーム発生方法及び電子銃を用いた露光装置 |
US6392333B1 (en) | 1999-03-05 | 2002-05-21 | Applied Materials, Inc. | Electron gun having magnetic collimator |
JP2000285839A (ja) | 1999-03-30 | 2000-10-13 | Toshiba Corp | 電子銃とそれを用いた露光装置および露光方法 |
JP2002134051A (ja) * | 2000-10-20 | 2002-05-10 | Seiko Instruments Inc | 電磁界重畳型レンズ及びこれを用いた電子線装置 |
WO2002049065A1 (fr) * | 2000-12-12 | 2002-06-20 | Ebara Corporation | Dispositif a faisceau d'electrons et procede de production de dispositifs a semi-conducteur utilisant ledit dispositif a faisceau d'electrons |
JP4227646B2 (ja) * | 2004-06-16 | 2009-02-18 | 株式会社日立ハイテクノロジーズ | 電子線源および電子線応用装置 |
JP2006210254A (ja) | 2005-01-31 | 2006-08-10 | Fujitsu Ltd | 磁場レンズ |
JP2006324119A (ja) * | 2005-05-19 | 2006-11-30 | Hitachi Ltd | 電子銃 |
EP1760762B1 (en) | 2005-09-06 | 2012-02-01 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Device and method for selecting an emission area of an emission pattern |
JP2008140623A (ja) | 2006-11-30 | 2008-06-19 | Japan Science & Technology Agency | 電子線源装置 |
JP5099756B2 (ja) * | 2007-06-18 | 2012-12-19 | Jfeエンジニアリング株式会社 | 電子線発生装置およびその制御方法 |
JP2009087593A (ja) * | 2007-09-28 | 2009-04-23 | Hitachi High-Technologies Corp | 電界放射電子銃 |
-
2009
- 2009-05-22 JP JP2009123684A patent/JP5386229B2/ja not_active Expired - Fee Related
-
2010
- 2010-04-14 US US13/322,025 patent/US8669535B2/en not_active Expired - Fee Related
- 2010-04-14 WO PCT/JP2010/002684 patent/WO2010134259A1/ja active Application Filing
- 2010-04-14 DE DE112010002063.9T patent/DE112010002063B4/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE112010002063T5 (de) | 2012-07-19 |
US20120062094A1 (en) | 2012-03-15 |
US8669535B2 (en) | 2014-03-11 |
WO2010134259A1 (ja) | 2010-11-25 |
DE112010002063B4 (de) | 2018-10-04 |
JP2010272381A (ja) | 2010-12-02 |
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