JP5383195B2 - ケイ酸塩の製造方法 - Google Patents
ケイ酸塩の製造方法 Download PDFInfo
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- JP5383195B2 JP5383195B2 JP2008535020A JP2008535020A JP5383195B2 JP 5383195 B2 JP5383195 B2 JP 5383195B2 JP 2008535020 A JP2008535020 A JP 2008535020A JP 2008535020 A JP2008535020 A JP 2008535020A JP 5383195 B2 JP5383195 B2 JP 5383195B2
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- Prior art keywords
- silicate
- range
- framework
- silicon dioxide
- mixture
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- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 title claims description 203
- 238000004519 manufacturing process Methods 0.000 title claims description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 147
- 238000000034 method Methods 0.000 claims description 134
- 239000000203 mixture Substances 0.000 claims description 77
- 238000000926 separation method Methods 0.000 claims description 64
- 239000000377 silicon dioxide Substances 0.000 claims description 63
- 235000012239 silicon dioxide Nutrition 0.000 claims description 57
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 53
- 238000002425 crystallisation Methods 0.000 claims description 43
- 230000008025 crystallization Effects 0.000 claims description 43
- 230000008569 process Effects 0.000 claims description 41
- 238000001035 drying Methods 0.000 claims description 40
- 239000000725 suspension Substances 0.000 claims description 37
- 239000000243 solution Substances 0.000 claims description 36
- -1 tetraalkylammonium compound Chemical group 0.000 claims description 36
- 239000011230 binding agent Substances 0.000 claims description 35
- OSSXLTCIVXOQNK-UHFFFAOYSA-M dimethyl(dipropyl)azanium;hydroxide Chemical compound [OH-].CCC[N+](C)(C)CCC OSSXLTCIVXOQNK-UHFFFAOYSA-M 0.000 claims description 32
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 27
- 238000001354 calcination Methods 0.000 claims description 26
- 238000010304 firing Methods 0.000 claims description 23
- 239000002243 precursor Substances 0.000 claims description 20
- 238000002441 X-ray diffraction Methods 0.000 claims description 18
- 238000005406 washing Methods 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 16
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 14
- 229910052796 boron Inorganic materials 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 239000007864 aqueous solution Substances 0.000 claims description 11
- 238000000465 moulding Methods 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 8
- 238000009835 boiling Methods 0.000 claims description 8
- 229910052718 tin Inorganic materials 0.000 claims description 8
- 239000011135 tin Substances 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 239000010936 titanium Substances 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 150000001450 anions Chemical class 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- 238000004898 kneading Methods 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 5
- 238000010586 diagram Methods 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims 1
- 150000004760 silicates Chemical class 0.000 description 37
- 150000001336 alkenes Chemical class 0.000 description 35
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 30
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 28
- 150000001875 compounds Chemical class 0.000 description 27
- 229910052645 tectosilicate Inorganic materials 0.000 description 25
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 22
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 239000011148 porous material Substances 0.000 description 18
- 150000001335 aliphatic alkanes Chemical class 0.000 description 17
- 150000001345 alkine derivatives Chemical class 0.000 description 15
- 239000000463 material Substances 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- 239000010457 zeolite Substances 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 229910021536 Zeolite Inorganic materials 0.000 description 11
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical group O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 11
- 239000007791 liquid phase Substances 0.000 description 11
- 239000007789 gas Substances 0.000 description 10
- 239000012071 phase Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000007858 starting material Substances 0.000 description 9
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 8
- 239000007921 spray Substances 0.000 description 8
- IAQRGUVFOMOMEM-ONEGZZNKSA-N trans-but-2-ene Chemical compound C\C=C\C IAQRGUVFOMOMEM-ONEGZZNKSA-N 0.000 description 8
- 238000005119 centrifugation Methods 0.000 description 7
- 238000000691 measurement method Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 229940075614 colloidal silicon dioxide Drugs 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000002808 molecular sieve Substances 0.000 description 6
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 6
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 6
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 6
- 238000001694 spray drying Methods 0.000 description 6
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- 241000408939 Atalopedes campestris Species 0.000 description 5
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 239000012459 cleaning agent Substances 0.000 description 5
- 238000007906 compression Methods 0.000 description 5
- 230000006835 compression Effects 0.000 description 5
- 238000005336 cracking Methods 0.000 description 5
- 238000005469 granulation Methods 0.000 description 5
- 230000003179 granulation Effects 0.000 description 5
- 125000005842 heteroatom Chemical group 0.000 description 5
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000001913 cellulose Substances 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 238000001027 hydrothermal synthesis Methods 0.000 description 4
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 4
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000007848 Bronsted acid Substances 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000003991 Rietveld refinement Methods 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000003463 adsorbent Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000000265 homogenisation Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- 125000005372 silanol group Chemical group 0.000 description 3
- XJKVPKYVPCWHFO-UHFFFAOYSA-N silicon;hydrate Chemical compound O.[Si] XJKVPKYVPCWHFO-UHFFFAOYSA-N 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 229910001415 sodium ion Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- QMMOXUPEWRXHJS-HWKANZROSA-N (e)-pent-2-ene Chemical compound CC\C=C\C QMMOXUPEWRXHJS-HWKANZROSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- 238000005004 MAS NMR spectroscopy Methods 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002671 adjuvant Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 150000004645 aluminates Chemical class 0.000 description 2
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 2
- 238000005576 amination reaction Methods 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000005349 anion exchange Methods 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009295 crossflow filtration Methods 0.000 description 2
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- 238000005520 cutting process Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000011026 diafiltration Methods 0.000 description 2
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 235000012438 extruded product Nutrition 0.000 description 2
- 229910001657 ferrierite group Inorganic materials 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000005216 hydrothermal crystallization Methods 0.000 description 2
- 230000033444 hydroxylation Effects 0.000 description 2
- 238000005805 hydroxylation reaction Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 239000001282 iso-butane Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
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- 229910052757 nitrogen Inorganic materials 0.000 description 2
- QMMOXUPEWRXHJS-UHFFFAOYSA-N pentene-2 Natural products CCC=CC QMMOXUPEWRXHJS-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
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- 125000005207 tetraalkylammonium group Chemical group 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- WXHLLJAMBQLULT-UHFFFAOYSA-N 2-[[6-[4-(2-hydroxyethyl)piperazin-1-yl]-2-methylpyrimidin-4-yl]amino]-n-(2-methyl-6-sulfanylphenyl)-1,3-thiazole-5-carboxamide;hydrate Chemical compound O.C=1C(N2CCN(CCO)CC2)=NC(C)=NC=1NC(S1)=NC=C1C(=O)NC1=C(C)C=CC=C1S WXHLLJAMBQLULT-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 238000006237 Beckmann rearrangement reaction Methods 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910021550 Vanadium Chloride Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 238000005882 aldol condensation reaction Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- HPTYUNKZVDYXLP-UHFFFAOYSA-N aluminum;trihydroxy(trihydroxysilyloxy)silane;hydrate Chemical compound O.[Al].[Al].O[Si](O)(O)O[Si](O)(O)O HPTYUNKZVDYXLP-UHFFFAOYSA-N 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 229910001680 bayerite Inorganic materials 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 235000014633 carbohydrates Nutrition 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000004523 catalytic cracking Methods 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
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- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- IAQRGUVFOMOMEM-ARJAWSKDSA-N cis-but-2-ene Chemical compound C\C=C/C IAQRGUVFOMOMEM-ARJAWSKDSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
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- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 229910001649 dickite Inorganic materials 0.000 description 1
- 238000006471 dimerization reaction Methods 0.000 description 1
- XNMQEEKYCVKGBD-UHFFFAOYSA-N dimethylacetylene Natural products CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007336 electrophilic substitution reaction Methods 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
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- 239000003000 extruded plastic Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 229910001679 gibbsite Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052621 halloysite Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- KWLMIXQRALPRBC-UHFFFAOYSA-L hectorite Chemical compound [Li+].[OH-].[OH-].[Na+].[Mg+2].O1[Si]2([O-])O[Si]1([O-])O[Si]([O-])(O1)O[Si]1([O-])O2 KWLMIXQRALPRBC-UHFFFAOYSA-L 0.000 description 1
- 229910000271 hectorite Inorganic materials 0.000 description 1
- 230000002363 herbicidal effect Effects 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 1
- RPESBQCJGHJMTK-UHFFFAOYSA-I pentachlorovanadium Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[V+5] RPESBQCJGHJMTK-UHFFFAOYSA-I 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 229920001592 potato starch Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
- C01B37/02—Crystalline silica-polymorphs, e.g. silicalites dealuminated aluminosilicate zeolites
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Description
(1)二酸化ケイ素及び/又は二酸化ケイ素前駆体を、R1R2R3R4N+(R1及びR2はメチルであり、R3及びR4は両方ともn−プロピルである)を含む少なくとも1種のテトラアルキルアンモニウム化合物、及び少なくとも1種の塩基を含む水溶液と混合し;
(2)(1)で得られたコロイド溶液を、選択された圧力におけるコロイド溶液の沸点より高い温度から大気圧における180℃の範囲の温度に加熱して少なくとも1種のケイ酸塩を含む懸濁液を得ることを含む、少なくともケイ素及び酸素を含むケイ酸塩の製造方法であって、
(1)において、少なくともケイ素及び酸素を含むケイ酸塩が、結晶化補助剤として添加される方法に関する。
−(3)に従い分離してもよく、
−(4)に従い洗浄してもよく、及び/又は(5)に従い乾燥してもよい。
(i)テトラアルキル水酸化アンモニウム(DMDPAH)、二酸化ケイ素、水、結晶化補助剤としてのケイ酸塩を含むコロイド溶液が製造され、
(ii)テトラアルキル水酸化アンモニウム、二酸化ケイ素、水、結晶化補助剤としてのケイ酸塩を含むコロイド溶液が、前述した好ましい範囲において、SiO2:テトラアルキル水酸化アンモニウム:水の質量比、例えば、1:(0.4〜2):(4〜8):(0.001〜0.05)を有するように、(i)により得られたコロイド溶液の水分含有量が調整される、前記方法にも関する。
(3)(2)により得られた懸濁液から少なくとも1種のケイ酸塩を分離することを含む前記方法にも関する。
(4)(3)により得られたケイ酸塩を洗浄及び/又は
(5)乾燥することを含む、前記方法にも関する。
− b=10.72(1)Å
− c=17.51(1)Å
− β=115.7(1)°
リートフェルト解析は、R.A.Young(editor),The リートフェルト Method,Oxford University Press,1995,Oxford,in particular in chapter 7:Analytical profile fitting of X−ray powder diffraction profiles in リートフェルト analysis,pages111−131に開示されている。
(6)(2)で得られたケイ酸塩を焼成し、及び
−(3)に従い分離してもよく、及び
−(4)に従い洗浄してもよく、及び/又は(5)に従い乾燥し、フレームワークケイ酸塩を得ることを含む、前記方法にも関する。
− b=8.72(1)Å
− c=17.17(1)Å
− β=114.2(1)°
29−Si MAS NMR分光法によれば、層状ケイ酸塩に典型的なシラノール基の特徴であり、本発明の前述した層状ケイ酸塩の場合に見られた、約104ppmにおける低磁場信号は、本発明のフレームワークケイ酸塩の場合には存在しない。
(II)混合物を混練する。
(b)ペレッティング(pelleting)、すなわち、環状及び/又は回転運動による圧縮;
(c)焼結、すなわち、成形される材料を熱処理にかける;
(d)熱間等静圧圧縮成形。
(II)混合物を混練し;
(III)混練された混合物を成形し、少なくとも1種の成形体を得る。
本発明においては、好ましくは、工程(III)に、少なくとも1回の乾燥工程が続く。この少なくとも1回の乾燥工程は、一般的に80〜160℃の範囲、好ましくは90〜145℃、特に好ましくは100℃〜130℃の温度で、一般的に6時間以上、例えば6〜24時間で実施される。しかし、乾燥される材料の水分含有量に依存し、より短い乾燥時間、例えば、1、2、3、4又は5時間も可能である。
(II)混合物を混練し;
(III)混練された混合物を成形し、少なくとも1種の成形体を得;
(IV)少なくとも1種の成形体を乾燥する。
(II)混合物を混練し;
(III)混練された混合物を成形し、少なくとも1種の成形体を得;
(IV)少なくとも1種の成形体を乾燥し、
(V)少なくとも1種の乾燥された成形体を焼成する。
−オレフィン及び二酸化炭素の分離のため、例えば、ポリエチレン又はポリプロピレンの精製のため、
−又は、例えば、メタノール及びアンモニアから、又は合成ガス及びアンモニア由来のメチルアミン及び/又はジメチルアミンの製造のためのアミノ化(好ましくは少ない割合のトリメチルアミンが製造される)のための触媒として、
−又は、例えば、テトラヒドロフランからポリテトラヒドロフランの製造等の重合のため、
−又はベンゼンからフェノールの製造等のヒドロキシル化触媒として、
−又は一般的に6員環を有する芳香族との反応のため、
−又はシクロヘキサノンのシクロヘキサノンオキシムへの変換のため、
−又はシクロヘキサノンオキシムのカプロラクタムへの変換等のベックマン転位にも用いることができる。
図1は、実施例1により得られた、構造RUB−39の乾燥した層状ケイ酸塩のX線回折図を示す。粉末X線回折図は、単色のCuKα1照射を用いたSiemens D−5000において記録し、優越方位を回避するためにキャピラリー試料保持器を用いた。Braun社製の位置敏感型検出器を用いて、8〜96°(2θ)の範囲で0.0678°の間隔で回折データを収集した。粉末ダイアグラムの指標付けは、powder−X(Treor90は、(URL http://www.ch.iucr.org/sincris−top/logiciel/)により自由に利用できる、公有のプログラムである)により実施されるドメインプログラムTreor90を用いて実施した。図において、°における角度2シータは横軸に沿って示され、強度は縦軸に沿って描かれる。
実施例1:構造タイプRUB−39の層状ケイ酸塩の製造
Aerosil 200(熱分解シリカ、1.22モル、97.7g)を、ジメチルジプロピル水酸化アンモニウム(716.9g、0.81モル、16.7質量%水溶液、Sachem製)を用いてビーカー内で撹拌した。次いで、ケイ酸塩の種晶(構造RUB−39を有するゼオライト;2.0g)を加えた。形成されたゾルを1時間撹拌し、次いで、減圧下、70℃で、ロータリーエバポレータ中で510gまで濃縮した。次いで、ゾルを3個のオートクレーブビーカー(LAB1(166g)、LAB2(154g)及びLAB3(154g))に分けた。
Aerosil 200(熱分解シリカ、0.34モル、20.4g)を、ジメチルジプロピル水酸化アンモニウム(149.6g、0.17モル、16.7質量%水溶液、Sachem製)を用いてビーカー内で撹拌した。次いで、ケイ酸塩の種晶(構造RUB−39を有するゼオライト;0.4g)を加えた。形成されたゾルを2時間撹拌し、濃縮せず、オートクレーブビーカー(LAB1)に導入した。
除去後、LAB1から白色の懸濁液が得られた。遠心により、懸濁液からそれぞれの白色沈殿を分離し、水で洗浄した。次いで、乾燥を120℃で24時間実施した。白色粉末が得られた。
Aerosil 200(熱分解シリカ、3.4モル、204g)を、ジメチルジプロピル水酸化アンモニウム(1496.0g、1.7モル、16.7質量%水溶液、Sachem製)を用いてビーカー内で撹拌した。次いで、ケイ酸塩の種晶(構造RUB−39を有するゼオライト;4.0g)を加えた。形成されたゾルを2時間撹拌し、濃縮せず、オートクレーブビーカー(LAB1)に導入した。
Cab−o−Sil M7D(熱分解シリカ、1.08モル、65.1g)を、ジメチルジプロピル水酸化アンモニウム(477.9g、0.54モル、16.7質量%水溶液、Sachem製)を用いてビーカー内で撹拌した。シリカの種晶を加えなかった。形成されたゾルを、減圧下、70℃で、ロータリーエバポレータ中で340gまで濃縮し、次いで2個のオートクレーブビーカー(LAB1及びLAB2)に等量に分けた。
実施例3により得られた、乾燥した、構造RUB−39のケイ酸塩粉末の試料(16.5g)を、空気の存在下にin situXRDカメラ内で1℃/分の速度で段階的に500℃の温度にした。温度に依存し、約225℃からRUB−39のRUB−41への変化を示す、図4に示すディフラクトグラムが得られた。
0.066gのNaAlO2を、10.6gのDMDPAHと混合した。0.05gのNaOH及び0.5gの構造タイプRUB−39のケイ酸塩の種晶をこの混合物に加えた。撹拌した後、均質なゲルが得られ、1.44gのAerosil 200(発熱製シリカ)を混合した。次いで、混合物を70℃で濃縮し、約
SiO2:0.5DMDPAH:1/30NaAlO2:0.05NaOH:8H2O
のモル比を有する混合物を得た。
SiO2:0.5DMDPAH:1/30NaAlO2:0.05NaCl:8H2O
の熱水的に結晶化される混合物のモル組成に影響を及ぼす量で用いる、同様の方法で実験を繰り返した。
以下の表に従い、結晶化補助剤としてRUB−39結晶を用いた、B−RUB−39についての製造の実験を実施した。全ての場合、基本的にZSM−5−相を含まないB−RUB−39が得られた。
40mgの、実施例5のRUB−41、及びシリカライト及びフェリエライトを、クロマトグラフ瓶中の、トランス−2−ブテン及び1−ブテンを含む、1.1mLのシクロヘキサン溶液に加えた。溶液は、各ブテンを約0.5質量%含む。ブテンの漏れを回避するため、瓶を完全に満たした。一晩かけて平衡化した後、上清をGCに注入した。分析を、それぞれ、RUB−41、ケイ酸塩及びフェリエライトを含まない同一の瓶中の同一の溶液の分析と比較した。因子αの分離は、以下の式に従って決定した。
以下の結果が得られた。
Claims (19)
- 以下の(1)、(2)、(6)
(1)二酸化ケイ素及び/又は二酸化ケイ素前駆体を、R1R2R3R4N+(R1及びR2はメチルであり、R3及びR4は両方ともn−プロピルである)を含む少なくとも1種のテトラアルキルアンモニウム化合物、及び少なくとも1種の塩基を含む水溶液と混合すること;
(2)(1)で得られたコロイド溶液を、選択された圧力下におけるコロイド溶液の沸点より高い温度から大気圧における180℃までの範囲の温度に加熱して少なくとも1種の層状ケイ酸塩を含む懸濁液を得ること、
(6)(2)で得られた層状ケイ酸塩を焼成して、フレームワークケイ酸塩を得ること
を含む、少なくともケイ素及び酸素を含むフレームワークケイ酸塩の製造方法において、(2)で得られた懸濁液から分離した後に得られた少なくともケイ素及び酸素を含む層状ケイ酸塩を、(1)において結晶化補助剤として添加し、その際、(1)で得られたコロイド溶液を、(2)により、12時間〜260時間の範囲の間加熱することを特徴とする方法。 - (1)において、層状ケイ酸塩を、二酸化ケイ素及び/又は二酸化ケイ素前駆体中に存在する二酸化ケイ素に基づいて0.1〜5質量%の量で添加することを特徴とする、請求項1記載の方法。
- (1)により形成された混合物を、(2)の加熱前に濃縮することを特徴とする、請求項1又は2記載の方法。
- R1R2R3R4N+を含む少なくとも1種のテトラアルキルアンモニウム化合物が、塩基性アニオンを含有することを特徴とする、請求項1から3までのいずれか1項記載の方法。
- 前記塩基性アニオンが、水酸化物イオンである、請求項4記載の方法。
- (1)で用いられる水溶液が、ジメチルジプロピル水酸化アンモニウム(DMDPAH)を含有することを特徴とする、請求項1から5までのいずれか1項記載の方法。
- (1)で得られたコロイド溶液が、SiO2、DMDPAH及び水を、SiO2:DMDPAH:水の質量比において1:(0.4〜10):(4〜12)である範囲で含有することを特徴とする、請求項1から6までのいずれか1項記載の方法。
- (1)で得られたコロイド溶液が、SiO2、DMDPAH及び水を、SiO2:DMDPAH:水の質量比において1:(0.4〜2):(4〜8)である範囲で含有することを特徴とする、請求項1から7までのいずれか1項記載の方法。
- (1)で得られたコロイド溶液が、SiO2、DMDPAH及び水を、SiO2:DMDPAH:水の質量比において1:(0.45〜0.55):(8〜12)である範囲で含有することを特徴とする、請求項1から7までのいずれか1項記載の方法。
- (1)により得られたコロイド溶液を、場合により請求項3に定義されたように濃縮した後で、オートクレーブ内で(2)に従い100〜180℃の温度に加熱することを特徴とする、請求項1から9までのいずれか1項記載の方法。
- (1)において非晶質二酸化ケイ素を使用することを特徴とする、請求項1から10までのいずれか1項記載の方法。
- (1)において付加的にアルミニウム、ホウ素、鉄、チタン、スズ、ゲルマニウム、ジルコニウム、バナジウム、及び/又はニオブの原料を使用する、請求項1から11までのいずれか1項記載の方法。
- 更に、
(3)(2)で得られた懸濁液から少なくとも1種の層状ケイ酸塩を分離すること
を含む、請求項1から12までのいずれか1項記載の方法。 - 更に、(3)で得られた層状ケイ酸塩を
(4)洗浄すること
及び/又は
(5)乾燥させること
を含む、請求項13記載の方法。 - (4)に従い、層状ケイ酸塩を水で洗浄し、及び/又は(5)に従い、室温ないし150℃の範囲の温度で乾燥させる、請求項14記載の方法。
- 更に、
(6)(2)で得られ、かつ
− (3)に従い分離され、かつ
− (4)に従い洗浄された、かつ/又は(5)に従い乾燥された、
層状ケイ酸塩を焼成して、フレームワークケイ酸塩を得ること
を含む、請求項14又は15に記載の方法。 - 前記焼成を、300〜600℃の範囲の温度で実施することを特徴とする、請求項16記載の方法。
- 請求項16から18までのいずれか1項記載の方法によりフレームワークケイ酸塩を製造すること、及び
(I)フレームワークケイ酸塩及び少なくとも1種のバインダーを含む混合物を製造すること;
(II)混合物を混練すること;
(III)混練した混合物を成形し、少なくとも1種の成形体を得ること;
(IV)少なくとも1種の成形体を乾燥させること;
(V)少なくとも1種の乾燥した成形体を焼成すること
を含む、成形体の製造方法。
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WO2010099651A1 (en) * | 2009-03-03 | 2010-09-10 | Basf Se | Process for preparation of isomorphously substituted layered silicate, silicate prepared by process, and uses thereof |
WO2010099649A1 (en) | 2009-03-03 | 2010-09-10 | Basf Se | Process for preparation of pillared silicates |
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CN102341350B (zh) * | 2009-03-03 | 2015-12-02 | 巴斯夫欧洲公司 | 同晶取代硅酸盐 |
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JP6511039B2 (ja) * | 2014-03-28 | 2019-05-08 | 山口精研工業株式会社 | 研磨剤組成物、および磁気ディスク基板の研磨方法 |
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CN113479897B (zh) * | 2021-07-16 | 2023-10-24 | 常州大学 | 利用凹凸棒石制备二维纳米片硅酸盐的方法及其应用 |
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EP2634145A2 (de) | 2013-09-04 |
US20080253953A1 (en) | 2008-10-16 |
EP1937594B1 (de) | 2014-01-29 |
US8372378B2 (en) | 2013-02-12 |
CN102745699A (zh) | 2012-10-24 |
CN102745699B (zh) | 2016-01-06 |
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JP2013177312A (ja) | 2013-09-09 |
WO2007042531A2 (de) | 2007-04-19 |
US20110182793A1 (en) | 2011-07-28 |
WO2007042531A3 (de) | 2007-09-13 |
DE102005049362A1 (de) | 2007-04-19 |
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